Patents by Inventor Tomoyuki Ando

Tomoyuki Ando has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070015265
    Abstract: A novel gluconate dehydratase derived from Achromobacter xylosoxidans and a gene encoding the gluconate dehydratase are provided. By reacting the gluconate dehydratase or a transformed cell containing the gene with an aldonic acid, the corresponding 2-keto-3-deoxyaldonic acid can be efficiently produced.
    Type: Application
    Filed: September 20, 2006
    Publication date: January 18, 2007
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Hitoki Miyake, Toshifumi Yamaki, Toshihiro Oikawa, Takeshi Nakamura, Hiroki Ishibashi, Yasushi Fukuiri, Atsushi Sakuma, Hironori Komatsu, Tomoyuki Ando, Kazuhiko Togashi, Hideki Umetani
  • Publication number: 20070009828
    Abstract: A positive resist composition, comprising a resin component (A) that exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the component (A) includes either a silsesquioxane resin (A1) containing structural units (a1) represented by a general formula (I) shown below, structural units (a2) represented by a general formula (II) shown below, and structural units (a3) represented by a general formula (III) shown below, or a silsesquioxane resin (A2) containing structural units (al) represented by the general formula (I) shown below, and structural units (a2?) represented by a general formula (II?) shown below.
    Type: Application
    Filed: June 11, 2004
    Publication date: January 11, 2007
    Applicant: TOKYO OHKA KOGYO, CO., LTD.
    Inventors: Koki Tamura, Daisuke Kawana, Tomotaka Yamada, Takayuki Hosono, Taku Hirayama, Kazufumi Sato, Hiroshi Shimbori, Tomoyuki Ando
  • Publication number: 20060240355
    Abstract: A positive resist composition and resist laminate for a low-acceleration electron beam, which exhibit excellent resolution and dry etching resistance, reduced thickness loss, and can be used favorably in a method of forming a resist pattern that includes a step of conducting exposure using a low-acceleration electron beam. This positive resist composition for a low-acceleration electron beam includes a resin component (A), which contains acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the residual film ratio following alkali developing in the unexposed portions of the resist film formed from the positive resist composition for a low-acceleration electron beam is 80% or higher.
    Type: Application
    Filed: June 18, 2004
    Publication date: October 26, 2006
    Inventor: Tomoyuki Ando
  • Patent number: 7125704
    Abstract: A novel gluconate dehydratase derived from Achromobacter xylosoxidans and a gene encoding the gluconate dehydratase are provided. By reacting the gluconate dehydratase or a transformed cell containing the gene with an aldonic acid, the corresponding 2-keto-3-deoxyaldonic acid can be efficiently produced.
    Type: Grant
    Filed: July 8, 2004
    Date of Patent: October 24, 2006
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Hitoki Miyake, Toshifumi Yamaki, Toshihiro Oikawa, Takeshi Nakamura, Hiroki Ishibashi, Yasushi Fukuiri, Atsushi Sakuma, Hironori Komatsu, Tomoyuki Ando, Kazuhiko Togashi, Hideki Umetani
  • Publication number: 20060234164
    Abstract: Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
    Type: Application
    Filed: February 22, 2006
    Publication date: October 19, 2006
    Applicants: Promerus LLC, Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Larry Rhodes, Chun Chang, Pramod Kandanarachchi, Lawrence Seger, Keita Ishiduka, Kotaro Endo, Tomoyuki Ando
  • Publication number: 20060235174
    Abstract: Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
    Type: Application
    Filed: February 21, 2006
    Publication date: October 19, 2006
    Applicants: Promerus LLC, Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Larry Rhodes, Chun Chang, Pramod Kandanarachchi, Lawrence Seger, Keita Ishiduka, Kotaro Endo, Tomoyuki Ando
  • Publication number: 20060094869
    Abstract: A desired isomer is selectively prepared by phosphorolyzing and isomerizing an anomer mixture of a 1-phosphorylated saccharide derivative while crystallizing one of the isomers to displace the equilibrium. Furthermore, using the action of a nucleoside phosphorylase, a nucleoside is prepared from the 1-phosphorylated saccharide derivative obtained and a base with improved stereoselectivity and a higher yield. This process is an anomer-selective process for preparing a 1-phosphorylated saccharide derivative and a nucleoside.
    Type: Application
    Filed: November 28, 2005
    Publication date: May 4, 2006
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Hironori Komatsu, Hirokazu Awano, Nobuyuki Fukazawa, Kiyoshi Ito, Ichirou Ikeda, Tadashi Araki, Takeshi Nakamura, Tamotsu Asano, Junya Fujiwara, Tomoyuki Ando, Katsutoshi Tsuchiya, Kyoko Maruyama, Hideki Umetani, Takahiro Yamauchi, Hitoki Miyake
  • Patent number: 7038039
    Abstract: A desired isomer is selectively prepared by phosphorolyzing and isomerizing an anomer mixture of a 1-phosphorylated saccharide derivative while crystallizing one of the isomers to displace the equilibrium. Furthermore, using the action of a nucleoside phosphorylase, a nucleoside is prepared from the 1-phosphorylated saccharide derivative obtained and a base with improved stereoselectivity and a higher yield. This process is an anomer-selective process for preparing a 1-phosphorylated saccharide derivative and a nucleoside.
    Type: Grant
    Filed: February 13, 2001
    Date of Patent: May 2, 2006
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Hironori Komatsu, Hirokazu Awano, Nobuyuki Fukazawa, Kiyoshi Ito, Ichirou Ikeda, Tadashi Araki, Takeshi Nakamura, Tamotsu Asano, Junya Fujiwara, Tomoyuki Ando, Katsutoshi Tsuchiya, Kyoko Maruyama, Hideki Umetani, Takahiro Yamauchi, Hitoki Miyake
  • Publication number: 20060069289
    Abstract: A method for preparing 2-deoxyaldoses on an industrial scale in which the yield or the volumetric efficiency is excellent and the operation is simple, as compared to the conventionally known preparation method. In one aspect, a compound represented by a defined formula, such as 2-keto-3-deoxygluconic acid or the like, is reduced by the catalytic hydrogenation method using a metal, such as palladium or the like, or a compound such as 2-keto-3-deoxygluconic acid or the like is reduced by using a hydride reducing agent in a solvent of not more than 30 weight times the amount of the above compound, for synthesizing 2-keto-3-deoxyaldonic acid. The 2-keto-deoxyaldonic acid is decarboxylated to obtain 2-deoxyaldoses.
    Type: Application
    Filed: December 24, 2003
    Publication date: March 30, 2006
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Hideki Umetani, Hironori Komatsu, Tomoyuki Ando, Kazuhiko Togashi
  • Publication number: 20050227171
    Abstract: A lift-off positive resist composition capable of forming a fine lift-off pattern is provided. This composition comprises a base resin component (A) and an acid generator component (B) generating an acid under exposure, wherein the base resin component (A) is a silicone resin.
    Type: Application
    Filed: March 28, 2005
    Publication date: October 13, 2005
    Inventors: Daisuke Kawana, Tomotaka Yamada, Hiroshi Shimbori, Koki Tamura, Tomoyuki Ando, Takayuki Hosono
  • Publication number: 20050054042
    Abstract: A novel gluconate dehydratase derived from Achromobacter xylosoxidans and a gene encoding the gluconate dehydratase are provided. By reacting the gluconate dehydratase or a transformed cell containing the gene with an aldonic acid, the corresponding 2-keto-3-deoxyaldonic acid can be efficiently produced.
    Type: Application
    Filed: July 8, 2004
    Publication date: March 10, 2005
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Hitoki Miyake, Toshifumi Yamaki, Toshihiro Oikawa, Takeshi Nakamura, Hiroki Ishibashi, Yasushi Fukuiri, Atsushi Sakuma, Hironori Komatsu, Tomoyuki Ando, Kazuhiko Togashi, Hideki Umetani
  • Publication number: 20040254368
    Abstract: An aldose having n-1 carbon atoms is produced from an aldonic acid having n carbon atoms using hypochlorous acid or a hypochlorite in a high yield at low cost with safety, by treating the reaction mixture with a compound having reactivity with the hypochlorous acid or hypochlorite higher than that with the produced aldose.
    Type: Application
    Filed: June 10, 2004
    Publication date: December 16, 2004
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Kazuhiko Togashi, Hideki Umetani, Tomoyuki Ando, Hiroki Ishibashi, Yasushi Fukuiri, Atsushi Sakuma
  • Patent number: 6794392
    Abstract: The novel benzamide derivative represented by formula (1) and the novel anilide derivative represented by formula (13) of this invention has differentiation-inducing effect, and are, therefore, useful a therapeutic or improving agent for malignant tumors, autoimmune diseases, dermatologic diseases and parasitism. In particular, they are highly effective as an anticancer drug, specifically to a hematologic malignancy and a solid carcinoma.
    Type: Grant
    Filed: October 13, 1999
    Date of Patent: September 21, 2004
    Assignee: Schering Aktiengesellschaft
    Inventors: Tsuneji Suzuki, Tomoyuki Ando, Katsutoshi Tsuchiya, Osamu Nakanishi, Akiko Saito, Takashi Yamashita, Yoshinori Shiraishi, Eishi Tanaka
  • Publication number: 20040147569
    Abstract: The novel benzamide derivative represented by formula (1) and the novel anilide derivative represented by formula (13) of this invention has differentiation-inducing effect, and are, therefore, useful a therapeutic or improving agent for malignant tumors, autoimmune diseases, dermatologic diseases and parasitism. In particular, they are highly effective as an anticancer drug, specifically to a hematologic malignancy and a solid carcinoma.
    Type: Application
    Filed: January 9, 2004
    Publication date: July 29, 2004
    Applicant: Schering Aktiengesellschaft
    Inventors: Tsuneji Suzuki, Tomoyuki Ando, Katsutoshi Tsuchiya, Osamu Nakanishi, Akiko Saito, Takashi Yamashita, Yoshinori Shiraishi
  • Patent number: 6638530
    Abstract: There are provided pharmaceutical formulations with improved oral absorptivity and injections that contain, as active ingredients, high concentrations of benzamide derivatives and their pharmaceutically acceptable salts, which are useful as histone deacetylase inhibitors. A pharmaceutical solution is prepared by dissolving a benzamide derivative or a pharmaceutically acceptable salt thereof in an organic solvent and/or acidic liquid, and a pharmaceutical formulation is prepared by adding a surfactant, an acidic substance and/or a polyethylene glycol. The present invention has enabled dissolution of benzamide derivatives or their pharmaceutically acceptable salts at high concentrations, to prepare practical injections and oral liquid formulations and improve absorptivity with oral administration.
    Type: Grant
    Filed: February 27, 2002
    Date of Patent: October 28, 2003
    Assignee: Schering Aktiengesellschaft
    Inventors: Masahiko Ishibashi, Masahiro Sakabe, Ikuo Sakai, Tsuneji Suzuki, Tomoyuki Ando
  • Publication number: 20020193314
    Abstract: A desired isomer is selectively prepared by phosphorolyzing and isomerizing an anomer mixture of a 1-phosphorylated saccharide derivative while crystallizing one of the isomers to displace the equilibrium. Furthermore, using the action of a nucleoside phosphorylase, a nucleoside is prepared from the 1-phosphorylated saccharide derivative obtained and a base with improved stereoselectivity and a higher yield. This process is an anomer-selective process for preparing a 1-phosphorylated saccharide derivative and a nucleoside.
    Type: Application
    Filed: May 7, 2002
    Publication date: December 19, 2002
    Inventors: Hironori Komatsu, Hirokazu Awano, Nobuyuki Fukazawa, Kiyoshi Ito, Ichirou Ikeda, Tadashi Araki, Takeshi Nakamura, Tamotsu Asano, Junya Fujiwara, Tomoyuki Ando, Katsutoshi Tsuchiya, Kyoko Maruyama, Hideki Umetani, Takahiro Yamauchi, Hitoki Miyake
  • Patent number: 6320078
    Abstract: In the case that a selectively monoacylated phenylenediamine derivative which is useful as any of medicines, agricultural chemicals, animal drugs and the intermediates of chemicals is prepared by reacting a benzoic acid derivative with a phenylenediamine derivative, the benzoic acid derivative is converted into a benzoyl imidazole derivative and this benzoyl imidazole derivative is then reaction with the phenylenediamine derivative, whereby the improvement of a preparation efficiency and the high selectivity of the monoacylation can be achieved, the steps of protection and deprotection being omitted.
    Type: Grant
    Filed: July 23, 1999
    Date of Patent: November 20, 2001
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Tsuneji Suzuki, Tomoyuki Ando, Katsutoshi Tsuchiya, Hiroki Ishibashi
  • Patent number: 6174905
    Abstract: The novel benzamide derivative represented by formula (1) and the novel anilide derivative represented by formula (13) of this invention has differentiation-inducing effect, and are, therefore, useful a therapeutic or improving agent for malignant tumors, autoimmune diseases, dermatologic diseases and parasitism. In particular, they are highly effective as an anticancer drug, specifically to a hematologic malignancy and a solid carcinoma.
    Type: Grant
    Filed: September 26, 1997
    Date of Patent: January 16, 2001
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Tsuneji Suzuki, Tomoyuki Ando, Katsutoshi Tsuchiya, Osamu Nakanishi, Akiko Saito, Takashi Yamashita, Yoshinori Shiraishi, Eishi Tanaka
  • Patent number: 5877478
    Abstract: A semiconductor substrate made of silicon or the like and having an active region is used as part of a package. Bumps are formed on a major surface of the semiconductor substrate. One end of each lead is connected to a corresponding bump, and the other end of the lead is located outside the major surface of the semiconductor substrate. An adhesive such as a thermoplastic resin is applied to the major surface of the semiconductor substrate. An upper substrate is located on the adhesive. The upper substrate is made of a metal plate, an insulating plate, or a semiconductor substrate. The upper substrate covers at least the active region of the semiconductor substrate, the bumps, and the lead portions on the semiconductor substrate.
    Type: Grant
    Filed: September 12, 1994
    Date of Patent: March 2, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Tomoyuki Ando
  • Patent number: 5473188
    Abstract: In a semiconductor device of the LOC (lead on chip) structure type according to the present invention, one ends of external connector leads are fixed to an insulating tape and the other ends thereof extend outside the insulating tape. Inner leads for internal wiring are arranged and fixed on the insulating tape, independently of the others. The insulating tape integral to both of these leads is fixed to the main surface of a semiconductor chip and the leads are connected to their corresponding electrode pads on the semiconductor chip via bonding wires. The insulating tape is bonded to a lead frame before the punching process and it thus made integral to the leads is then punched by the punching process. It therefore needs no bonding margin for the leads.
    Type: Grant
    Filed: July 13, 1994
    Date of Patent: December 5, 1995
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Tomoyuki Ando