Abstract: A storage system that can achieve a cryptographic operation circuit that supports multiple types of cryptographic operation formats. The cryptographic operation circuit is provided that encrypts data according to the format determined by the processor based on a request by the host terminal for writing the data into the storage device, and decrypts the encrypted data on the data stored in the storage device according to the format determined by the processor based on a request by the host terminal for reading the data from the storage device.

Abstract: In at least one embodiment, a control unit of a drawing apparatus determines a distance by which the drawing apparatus causes a stage to move in a direction parallel to an arranging direction of a plurality of shot regions, in such a manner that a plurality of shot regions includes a shot region including a drawing region in which drawing processing by at least one first charged particle beam is able to be performed and also drawing processing by at least one second charged particle beam is able to be performed. The control unit controls a drawing operation of a first charged particle optical system and a drawing operation of a second charged particle optical system to use either the at least one first charged particle beam or the at least one second charged particle beam to perform drawing processing in the shot region including the drawing region.

Abstract: The present invention provides a drawing apparatus for performing drawing on a substrate with a plurality of charged particle beams, comprising a blanker array including first and second groups, each of which includes at least one blanker, a deflector configured to deflect the plurality of charged particle beams to scan the plurality of charged particle beams on the substrate, and a controller configured to respectively supply first and second control signals to the first and second groups at first and second timings, wherein the first and second groups are respectively arranged at such relative positions that a positional difference between respective drawing regions thereof, due to a difference between the first and second timings, in a scanning direction of the deflector is compensated for.

Abstract: A drawing apparatus includes: plural charged particle optical systems arrayed at a pitch in a first direction, each configured to irradiate a substrate with charged particle beams; a stage configured to hold the substrate and be moved relative to the charged particle optical systems in a second direction orthogonal to the first direction; and a controller configured to determine charged particle beams for the drawing with respect to each charged particle optical system so as to satisfy a relation given by SW=Pc/?=Ps/(? where Ps is an array pitch of shot regions in the first direction, SW is a width, in the first direction, of each drawing region by each charged particle optical system, Pc be an array pitch of drawing regions in the first direction, and ? and ? are natural numbers.

Abstract: A drawing apparatus for performing drawing on a substrate with a charged particle beam, includes: a controller configured to control a dose of the charge particle beam at each of a plurality of positions of the charged particle beam on the substrate based on information of displacement of each of the plurality of positions from a target position corresponding thereto and a target dose of the charged particle beam at the target position corresponding to each of the plurality of positions.

Abstract: The present invention provides a blanking apparatus comprising a plurality of blankers configured to respectively blank a plurality of beams with respect to a target position on an object, and a driving device configured to drive the plurality of blankers, wherein the driving device includes a change device configured to change relation between a combination of beams of the plurality of beams, and a target dose.

Abstract: The present invention provides a drawing apparatus which performs drawing on a substrate with a charged particle beam, the apparatus comprising a deflector configured to scan the charged particle beam on the substrate, a stage configured to hold the substrate and be movable, and a controller configured to control main-scan by the deflector and sub-scan by movement of the stage, wherein the controller is configured to control a width of the main-scan based on a width of a target drawing region on the substrate in a direction of the main-scan.

Abstract: A drawing apparatus includes: a blanker; a deflector; a stage configured to hold the substrate and to be movable; and a controller configured to control the deflector and the stage so as to perform drawing by scanning the charged particle beam on the substrate by causing the deflector to deflect the charged particle beam in a first direction and moving the stage in a second direction. The controller is configured to cause the stage moving in the second direction to move in the first direction based on a pattern to be drawn and to control a scan width of the charged particle beam in the first direction by the deflector based on a moving amount of the stage in the first direction and the pattern.

Abstract: A drawing apparatus performs drawing, with an array of charged particle beams, on shot regions arrayed on a substrate in a direction in parallel and with intervention of step movement of the substrate in the direction. The apparatus includes a driving device for relative movement between a stage and a charged-particle optical system in the direction. The optical system causes sub arrays (of charged particle beams), discretely arrayed in the direction, to be incident on the substrate, and includes deflectors configured to respectively deflect sub array sets each including at least one of the sub arrays. A controller controls the optical system and the driving device such that a region at one side of a boundary among the shot regions and a region at the other side are subjected to drawing not in parallel with a sub array existing over the boundary, but sequentially with intervention of the step movement.

Abstract: The present invention provides a blanking apparatus comprising a plurality of blankers configured to respectively blank a plurality of beams with respect to a target position on an object, and a driving device configured to drive the plurality of blankers, wherein the driving device includes a change device configured to change relation between a combination of beams of the plurality of beams, and a target dose.

Abstract: A drawing apparatus for performing drawing on a substrate with a charged particle beam, includes: a controller configured to control a dose of the charge particle beam at each of a plurality of positions of the charged particle beam on the substrate based on information of displacement of each of the plurality of positions from a target position corresponding thereto and a target dose of the charged particle beam at the target position corresponding to each of the plurality of positions.

Abstract: A drawing apparatus includes: plural charged particle optical systems arrayed at a pitch in a first direction, each configured to irradiate a substrate with charged particle beams; a stage configured to hold the substrate and be moved relative to the charged particle optical systems in a second direction orthogonal to the first direction; and a controller configured to determine charged particle beams for the drawing with respect to each charged particle optical system so as to satisfy a relation given by SW=Pc/?=Ps/(? where Ps is an array pitch of shot regions in the first direction, SW is a width, in the first direction, of each drawing region by each charged particle optical system, Pc be an array pitch of drawing regions in the first direction, and ? and ? are natural numbers.

Abstract: A drawing apparatus performs drawing overlaid with a shot formed on a substrate with a plurality of charged particle beams based on a plurality of drawing stripe data that constitute drawing data. The apparatus includes a charged particle optical system configured to generate the plurality of charged particle beams; and a controller configured to generate a plurality of intermediate stripe data as data of a plurality of intermediate stripes, adjacent ones of the plurality of intermediate stripes overlapping with each other, to obtain information on distortion of the shot, and to transform the plurality of intermediate stripe data based on the information on the distortion to generate the plurality of drawing stripe data.

Abstract: The lithography apparatus forms a pattern on a substrate, comprising a holder configured to hold an original or the substrate, and to be moved, an interferometer configured to measure a position of the holder in a measurement direction which intersects with the upper plane of the holder, a reference member provided on the upper plane and having a reference plane, a measuring device provided so as to face the reference plane and configured to measure a position of the reference plane in the measurement direction, and a controller configured to obtain correction data for correcting a measured value obtained by the interferometer based on the measured value obtained by the interferometer and a measured value obtained by the measuring device.

Abstract: The present invention provides a drawing apparatus for performing drawing on a substrate with a plurality of charged particle beams, comprising a blanker array including first and second groups, each of which includes at least one blanker, a deflector configured to deflect the plurality of charged particle beams to scan the plurality of charged particle beams on the substrate, and a controller configured to respectively supply first and second control signals to the first and second groups at first and second timings, wherein the first and second groups are respectively arranged at such relative positions that a positional difference between respective drawing regions thereof, due to a difference between the first and second timings, in a scanning direction of the deflector is compensated for.

Abstract: The present invention provides a drawing apparatus including a plurality of drawing units each of which is configured to perform drawing on a substrate with a charged particle beam, a plurality of first processors configured to be selectively connectable to each of the plurality of drawing units, an information processor configured to determine, from the plurality of first processors, a first processor to be connected to a first drawing unit among the plurality of drawing units, based on drawing data, and a connection unit configured to connect the determined first processor to the first drawing unit.

Abstract: A drawing apparatus performs drawing overlaid with a shot formed on a substrate with a plurality of charged particle beams based on a plurality of drawing stripe data that constitute drawing data. The apparatus includes a charged particle optical system configured to generate the plurality of charged particle beams; and a controller configured to generate a plurality of intermediate stripe data as data of a plurality of intermediate stripes, adjacent ones of the plurality of intermediate stripes overlapping with each other, to obtain information on distortion of the shot, and to transform the plurality of intermediate stripe data based on the information on the distortion to generate the plurality of drawing stripe data.

Abstract: A drawing apparatus performs drawing, with an array of charged particle beams, on shot regions arrayed on a substrate in a direction in parallel and with intervention of step movement of the substrate in the direction. The apparatus includes a driving device for relative movement between a stage and a charged-particle optical system in the direction. The optical system causes sub arrays (of charged particle beams), discretely arrayed in the direction, to be incident on the substrate, and includes deflectors configured to respectively deflect sub array sets each including at least one of the sub arrays. A controller controls the optical system and the driving device such that a region at one side of a boundary among the shot regions and a region at the other side are subjected to drawing not in parallel with a sub array existing over the boundary, but sequentially with intervention of the step movement.

Abstract: A drawing apparatus, that performs drawing on a substrate using an array of charged particle beams, includes a projection system and a controller. The projection system is configured such that the array includes a plurality of sub arrays arranged discretely on the substrate with a space between the sub arrays in a predetermined direction, and a first width of the space in the predetermined direction is n1/n2 times (each of n1 and n2 is a positive integer) a second width of the sub array in the predetermined direction. The controller is configured to control the projection system and a driving mechanism such that drawing is performed in order with the plurality of sub arrays for [n1+n2] sets of drawing regions that are shifted from one another by as much as [1/n2] times the first width so that drawing is performed for a shot region on the substrate.

Abstract: An separation method comprising a temperature control process useful for microchip electrophoresis such as microchip DGGE is provided along with a device therefor. The present invention relates to a microchip electrophoresis method for separating double-stranded nucleic acids by means of differences in nucleotide sequence while maintaining a preset temperature, wherein the temperature during separation of double-stranded nucleic acids in an separation region comprising an separation microchannel is controlled to within ±2.5° C. of the preset temperature.