Abstract: A substrate processing apparatus includes: a process container accommodating a substrate holder that holds a plurality of substrates and including an opening at a lower end of the process container; a lid configured to open and close the opening; and a thermal insulator installed on the lid and configured to thermally insulate a first space below the substrate holder. The thermal insulator includes a partition member that forms a second space partitioned from the first space. The lid includes a supply port for supplying a temperature regulation fluid to the second space and an exhaust port for discharging the temperature regulation fluid from the second space.

Abstract: A substrate processing apparatus includes a vacuum container configured to accommodate a substrate holder configured to hold a plurality of substrates and having an opening provided in a lower end of the vacuum container, a lid configured to open/close the opening, and a heat-insulating unit configured to insulate a first space below the substrate holder, wherein the heat-insulating unit includes a partition member that forms a second space partitioned from the first space, and the partition member is provided to be rotatable with respect to the lid.

Abstract: A substrate processing apparatus includes: a first reaction tube of a vertical shape; and a gas injector configured to supply a gas to an interior of the first reaction tube, wherein the gas injector has a first tubular portion extending horizontally to pass through a sidewall of the first reaction tube, the first reaction tube has a support portion protruding toward a center of the first reaction tube below the first tubular portion, and the support portion is in contact with the gas injector to support the gas injector.

Abstract: There is provided an injector that extends in a longitudinal direction, including: a gas introduction part having a circular or a regular polygonal shape in a cross section perpendicular to the longitudinal direction and having no discharge holes; and a gas supply part having a protruded portion in one direction in the cross section perpendicular to the longitudinal direction, and having a plurality of discharge holes formed in a leading end of the protruded portion along the longitudinal direction, wherein a first end of the gas supply part in the longitudinal direction is connected to the gas introduction portion.

Abstract: An abnormality detection method includes: supplying a gas controlled to a selected rate to a gas supply pipe via the gas pipe connected to the gas supply pipe, thereby introducing the gas into a reaction region of a processing container provided in a processing apparatus from a gas hole of the gas supply pipe; measuring a pressure inside the gas pipe by a pressure gauge attached to the gas pipe; and detecting an abnormality of at least one of the gas supply pipe and the gas pipe based on the pressure measured at the measuring.

Abstract: A design support method includes: acquiring reference diagrams which are control logic diagrams created in the past, and an editing object diagram; and applying each of analysis rules to each control logic diagram, and analyzing the control logic part included in each control logic diagram. The analysis rules satisfy a relation in which a control logic part corresponding to an analysis rule at a higher hierarchy level contains a control logic part corresponding to an analysis rule at a lower hierarchy level. The design support method further includes: specifying, as a similar diagram, a reference diagram including a control logic part common with the control logic part included in the editing object diagram, among the reference diagrams, based on an analysis result; and presenting a control logic part having a hierarchical relation with the common control logic part, among control logic parts included in the similar diagram.

Abstract: There is provided a substrate processing apparatus, including: a cylindrical reaction tube having a lower end opening; a lid configured to open and close the lower end opening of the reaction tube; a substrate holder mounted on the lid and configured to hold a plurality of substrates at vertical intervals in multiple stages; and an inner tube mounted on the lid and configured to cover the substrate holder.

Abstract: A design support method includes: acquiring reference diagrams which are control logic diagrams created in the past, and an editing object diagram; and applying each of analysis rules to each control logic diagram, and analyzing the control logic part included in each control logic diagram. The analysis rules satisfy a relation in which a control logic part corresponding to an analysis rule at a higher hierarchy level contains a control logic part corresponding to an analysis rule at a lower hierarchy level. The design support method further includes: specifying, as a similar diagram, a reference diagram including a control logic part common with the control logic part included in the editing object diagram, among the reference diagrams, based on an analysis result; and presenting a control logic part having a hierarchical relation with the common control logic part, among control logic parts included in the similar diagram.

Abstract: A substrate processing apparatus includes: a substrate holder which holds a plurality of substrates; a processing vessel including an inner tube and an outer tube disposed outside the inner tube; a gas supply part which supplies a process gas in parallel to target surfaces of the substrates; an exhaust part which exhausts the process gas from the processing vessel through a gas outlet; an exhaust port formed in the inner tube; and a rectifying plate installed in an outer wall of the inner tube or an inner wall of the outer tube between the exhaust port and the gas outlet in a circumferential direction of the processing vessel. The rectifying plate is installed to extend upward from a position below a lower end of the substrate holder to a location corresponding at least to a lower end of the exhaust port.

Abstract: There is provided a substrate processing apparatus, including: a cylindrical reaction tube having a lower end opening; a lid configured to open and close the lower end opening of the reaction tube; a substrate holder mounted on the lid and configured to hold a plurality of substrates at vertical intervals in multiple stages; and an inner tube mounted on the lid and configured to cover the substrate holder.

Abstract: There is provided an injector that extends in a longitudinal direction, including: a gas introduction part having a circular or a regular polygonal shape in a cross section perpendicular to the longitudinal direction and having no discharge holes; and a gas supply part having a protruded portion in one direction in the cross section perpendicular to the longitudinal direction, and having a plurality of discharge holes formed in a leading end of the protruded portion along the longitudinal direction, wherein a first end of the gas supply part in the longitudinal direction is connected to the gas introduction portion.

Abstract: A control logic diagram analysis device that efficiently creates a control logic diagram, and a method thereof. The control logic diagram analysis device includes a control logic diagram analysis rule application unit, a control logic diagram template component generation unit, and a control logic diagram project-specific part extraction unit. The control logic diagram analysis rule application unit sequentially applies a control logic diagram analysis rule to the control logic diagram from a lower layer level. The control logic diagram template component generation unit acquires the control logic diagram analysis rule having an agreement section within the control logic diagram. The control logic diagram project-specific part extraction unit extracts an element in the control logic diagram corresponding to the control logic diagram analysis rule having the agreement section within the control logic diagram.

Abstract: An apparatus includes: a similar plant information retrieval unit retrieving plant information of a similar plant similar to a creation object plant from plant information versus control logic diagram association information stored in a plant information versus control logic diagram association information storage unit; a plant information difference detector comparing the plant information of the creation object plant with the plant information of the similar plant to acquire difference information; a plant information editor that, based on the difference information, deletes an element included in the similar plant but unnecessary for the creation object plant, and retrieves an element included in the creation object plant but not included in the similar plant from the plant information versus control logic diagram association information storage unit to add the retrieved element; and a plant information editing result display displaying a result of the plant information editor.

Abstract: An apparatus includes: a similar plant information retrieval unit retrieving plant information of a similar plant similar to a creation object plant from plant information versus control logic diagram association information stored in a plant information versus control logic diagram association information storage unit; a plant information difference detector comparing the plant information of the creation object plant with the plant information of the similar plant to acquire difference information; a plant information editor that, based on the difference information, deletes an element included in the similar plant but unnecessary for the creation object plant, and retrieves an element included in the creation object plant but not included in the similar plant from the plant information versus control logic diagram association information storage unit to add the retrieved element; and a plant information editing result display displaying a result of the plant information editor.

Abstract: There is provided a wafer boat support table that supports a wafer boat having a plurality of posts from below, the plurality of posts being configured to arrange and support a plurality of wafers at intervals in a vertical direction, the wafer boat support table including: a plurality of support points installed on each of linear lines defined by connecting a center of the wafer boat and the plurality of posts and configured to support a bottom surface of the wafer boat while being brought into contact with the bottom surface of the wafer boat.

Abstract: A control logic diagram analysis device that efficiently creates a control logic diagram, and a method thereof. The control logic diagram analysis device includes a control logic diagram analysis rule application unit, a control logic diagram template component generation unit, and a control logic diagram project-specific part extraction unit. The control logic diagram analysis rule application unit sequentially applies a control logic diagram analysis rule to the control logic diagram from a lower layer level. The control logic diagram template component generation unit acquires the control logic diagram analysis rule having an agreement section within the control logic diagram. The control logic diagram project-specific part extraction unit extracts an element in the control logic diagram corresponding to the control logic diagram analysis rule having the agreement section within the control logic diagram.

Abstract: A device embedded substrate (20), includes: an insulation layer (12) including an insulation resin material; an electric or electronic device (4) embedded in the insulation layer (12); a terminal (15) serving as an electrode included in the device (4); a conductor pattern (18) formed on the surface of the insulation layer (12); and a conducting via (21) for electrically connecting the conductor pattern (18) and the terminals (15) with each other. The conducting via (21) is made up of a large-diameter section (21a) having a large diameter and a small-diameter section (21b) having a smaller diameter than that of the large-diameter section (21a), in order starting from the conductor pattern (18) toward the terminal (15). A stepped section (17) is formed between the large-diameter section (21a) and the small-diameter section (21b). The large-diameter section (21a) is formed so as to penetrate a sheet-shaped glass cloth (11) disposed in the insulation layer (12).

Abstract: There is provided a wafer boat support table that supports a wafer boat having a plurality of posts from below, the plurality of posts being configured to arrange and support a plurality of wafers at intervals in a vertical direction, the wafer boat support table including: a plurality of support points installed on each of linear lines defined by connecting a center of the wafer boat and the plurality of posts and configured to support a bottom surface of the wafer boat while being brought into contact with the bottom surface of the wafer boat.

Abstract: A substrate processing apparatus includes: a substrate holder which holds a plurality of substrates; a processing vessel including an inner tube and an outer tube disposed outside the inner tube; a gas supply part which supplies a process gas in parallel to target surfaces of the substrates; an exhaust part which exhausts the process gas from the processing vessel through a gas outlet; an exhaust port formed in the inner tube; and a rectifying plate installed in an outer wall of the inner tube or an inner wall of the outer tube between the exhaust port and the gas outlet in a circumferential direction of the processing vessel. The rectifying plate is installed to extend upward from a position below a lower end of the substrate holder to a location corresponding at least to a lower end of the exhaust port.