Patents by Inventor Tong Fang

Tong Fang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12039418
    Abstract: A method, system, and computer program product for reconstructing training data and building a new incremental learning model with the reconstructed training data that can be further trained. The method may include receiving new data to be inputted into a previously trained machine learning model, where the previously trained machine learning model has inaccessible training data. The method may also include generating simulated training data using a reverse form of the previously trained machine learning model. The method may also include verifying the simulated training data. The method may also include creating a new machine learning model using the simulated training data, where the new machine learning model includes a same structure as the previously trained machine learning model. The method may also include inputting the new data into the new machine learning model, where the new machine learning model is further trained with the new data.
    Type: Grant
    Filed: July 27, 2020
    Date of Patent: July 16, 2024
    Assignee: International Business Machines Corporation
    Inventors: Zhong Fang Yuan, Tong Liu, Li Ni Zhang, Bin Shang, Yong Fang Liang, Chen Gao
  • Patent number: 10832923
    Abstract: A lower plasma-exclusion-zone ring for a bevel etcher is provided that is configured to etch a bevel edge of a substrate. The lower plasma-exclusion-zone ring includes a ring-shaped body and a radially-outer stepped surface. The ring-shaped body of the lower plasma-exclusion-zone ring defines an upper surface, a lower surface, a radially inner surface, and a radially outer surface. The radially-outer stepped surface of the lower plasma-exclusion-zone ring extending inwardly into the ring-shaped body between the radially outer surface of the ring-shaped body and the upper surface of the ring-shaped body. The ring-shaped body is made of a material selected from a group consisting of aluminum oxide, aluminum nitride, silicon, silicon carbide, silicon nitride, and yttria.
    Type: Grant
    Filed: June 29, 2017
    Date of Patent: November 10, 2020
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Tong Fang, Yunsang Kim, Keechan Kim, George Stojakovic
  • Patent number: 10811282
    Abstract: An upper plasma-exclusion-zone ring for a bevel etcher is provided that is configured to etch a bevel edge of a substrate. The upper plasma-exclusion-zone ring includes a ring-shaped body and a radially-inner stepped surface. The ring-shaped body of the upper plasma-exclusion-zone ring defines an upper surface, a lower surface, a radially inner surface, and a radially outer surface. The radially-inner stepped surface of the upper plasma-exclusion-zone ring extends inwardly into the ring-shaped body between the radially inner surface of the ring-shaped body and the lower surface of the ring-shaped body. The ring-shaped body is made of a material selected from a group consisting of aluminum oxide, aluminum nitride, silicon, silicon carbide, silicon nitride, and yttria.
    Type: Grant
    Filed: June 29, 2017
    Date of Patent: October 20, 2020
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Tong Fang, Yunsang Kim, Keechan Kim, George Stojakovic
  • Patent number: 10629458
    Abstract: A method of cleaning a bevel edge of a semiconductor substrate is provided. A semiconductor substrate is placed on a substrate support in a reaction chamber of a plasma processing apparatus. The substrate has a dielectric layer overlying a top surface and a bevel edge of the substrate, the layer extending above and below an apex of the bevel edge. A process gas is introduced into the reaction chamber and energized into a plasma. The bevel edge is cleaned with the plasma so as to remove the layer below the apex without removing all of the layer above the apex.
    Type: Grant
    Filed: March 11, 2013
    Date of Patent: April 21, 2020
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Tong Fang, Yunsang Kim, Keechan Kim, George Stojakovic
  • Patent number: 10240988
    Abstract: A method of calibrating transceiver positions inside an acoustic pyrometry measuring vessel that contains a plurality of transceivers, includes determining (40) a speed of sound in the acoustic pyrometry measuring vessel from a temperature and gas composition of a gas inside the acoustic pyrometry measuring vessel, acquiring (41) time-of-flight (TOFs) ?ti,j measurements from a plurality of pairs i,j of transceivers inside the acoustic pyrometry measuring vessel, estimating (42) a radius of the acoustic pyrometry measuring vessel from an average of the acquired TOF measurements, and using (43) an estimated radius of the acoustic pyrometry measuring vessel to estimate errors ??j of displacement angles of the transceivers.
    Type: Grant
    Filed: May 29, 2014
    Date of Patent: March 26, 2019
    Assignee: SIEMENS ENERGY, INC.
    Inventors: Michelle xiaohong Yan, Heiko Claussen, Upul P. DeSilva, Justinian Rosca, Tong Fang, Nancy H. Ulerich
  • Publication number: 20170301566
    Abstract: A lower plasma-exclusion-zone ring for a bevel etcher is provided that is configured to etch a bevel edge of a substrate. The lower plasma-exclusion-zone ring includes a ring-shaped body and a radially-outer stepped surface. The ring-shaped body of the lower plasma-exclusion-zone ring defines an upper surface, a lower surface, a radially inner surface, and a radially outer surface. The radially-outer stepped surface of the lower plasma-exclusion-zone ring extending inwardly into the ring-shaped body between the radially outer surface of the ring-shaped body and the upper surface of the ring-shaped body. The ring-shaped body is made of a material selected from a group consisting of aluminum oxide, aluminum nitride, silicon, silicon carbide, silicon nitride, and yttria.
    Type: Application
    Filed: June 29, 2017
    Publication date: October 19, 2017
    Inventors: Tong Fang, Yunsang Kim, Keechan Kim, George Stojakovic
  • Publication number: 20170301565
    Abstract: An upper plasma-exclusion-zone ring for a bevel etcher is provided that is configured to etch a bevel edge of a substrate. The upper plasma-exclusion-zone ring includes a ring-shaped body and a radially-inner stepped surface. The ring-shaped body of the upper plasma-exclusion-zone ring defines an upper surface, a lower surface, a radially inner surface, and a radially outer surface. The radially-inner stepped surface of the upper plasma-exclusion-zone ring extends inwardly into the ring-shaped body between the radially inner surface of the ring-shaped body and the lower surface of the ring-shaped body. The ring-shaped body is made of a material selected from a group consisting of aluminum oxide, aluminum nitride, silicon, silicon carbide, silicon nitride, and yttria.
    Type: Application
    Filed: June 29, 2017
    Publication date: October 19, 2017
    Inventors: Tong Fang, Yunsang Kim, Keechan Kim, George Stojakovic
  • Patent number: 9622820
    Abstract: The design process for the surgical plan in orthopedics and/or the design of a personalized cutting guide and/or implant are automated in a workflow frame work. Abstracted rules are scripted through a sequence of operations to alter a bone surface or model for fitting an implant. Using bone information for a specific patient, the proper implant and series of cuts are determined using the rules. A corresponding cutting guide may be fitted to the bone information for the specific patient. Surgical planning of bone replacement implants is performed automatically.
    Type: Grant
    Filed: April 26, 2013
    Date of Patent: April 18, 2017
    Assignee: Siemens Product Lifecycle Management Software Inc.
    Inventors: Sajjad Hussain Baloch, Suraj Ravi Musuvathy, Guanglei Xiong, Lawrence Spivey, James B. Thompson, Tong Fang
  • Patent number: 9474582
    Abstract: A computer assisted method creates accurate CAD/CAM models of custom orthopedic implants is provided. Information about bone geometry is acquired through medical imaging such as CT image scans. The desired bone surface region is extracted as a polygonal mesh after processing the 3D images. A smooth and accurate B-Spline surface is fitted to the polygonal mesh that is thickened to a solid CAD model. A patient-specific customized implant is manufactured from the obtained CAD model. The patient-specific customized implant is implanted in a patient by a surgeon in an operating room. A processor based system to generate a CAD/CAM file of the patient-specific customized implant and a manufacturing system enabled to manufacture the implant from the CAD/CAM file are also disclosed.
    Type: Grant
    Filed: August 16, 2011
    Date of Patent: October 25, 2016
    Assignee: Siemens Aktiengesellschaft
    Inventors: Suraj Ravi Musuvathy, Ruirui Jiang, Sergei Azernikov, Gang Li, Tong Fang
  • Publication number: 20160109304
    Abstract: A method of calibrating transceiver positions inside an acoustic pyrometry measuring vessel that contains a plurality of transceivers, includes determining (40) a speed of sound in the acoustic pyrometry measuring vessel from a temperature and gas composition of a gas inside the acoustic pyrometry measuring vessel, acquiring (41) time-of-flight (TOFs) ?ti,j measurements from a plurality of pairs i,j of transceivers inside the acoustic pyrometry measuring vessel, estimating (42) a radius of the acoustic pyrometry measuring vessel from an average of the acquired TOF measurements, and using (43) an estimated radius of the acoustic pyrometry measuring vessel to estimate errors ??j of displacement angles of the transceivers.
    Type: Application
    Filed: May 29, 2014
    Publication date: April 21, 2016
    Inventors: Michelle xiaohong Yan, Heiko Claussen, Upul P. DeSilva, Justinian Rosca, Tong Fang, Nancy Ulerich
  • Publication number: 20150230874
    Abstract: A computer assisted method creates accurate CAD/CAM models of custom orthopedic implants is provided. Information about bone geometry is acquired through medical imaging such as CT image scans. The desired bone surface region is extracted as a polygonal mesh after processing the 3D images. A smooth and accurate B-Spline surface is fitted to the polygonal mesh that is thickened to a solid CAD model. A patient-specific customized implant is manufactured from the obtained CAD model. The patient-specific customized implant is implanted in a patient by a surgeon in an operating room. A processor based system to generate a CAD/CAM file of the patient-specific customized implant and a manufacturing system enabled to manufacture the implant from the CAD/CAM file are also disclosed.
    Type: Application
    Filed: August 16, 2011
    Publication date: August 20, 2015
    Inventors: Suraj Ravi Musuvathy, Ruirui Jiang, Sergei Azernikov, Gang Li, Tong Fang
  • Patent number: 9014835
    Abstract: A method on a processor customizes a fixation plate for repairing a bone fracture. A digital CAD model of an implant contains smooth analytic geometry representations including NURBS. The CAD geometry is directly manipulated to generate a customized implant CAD model that conforms to the desired region of the bone surface of a patient. Direct manipulation of NURBS geometry is computationally fast and suitable for interactive planning. The patient specific customized implant is produced directly from the generated customized CAD model with a standard CNC machine before surgery. The patient customized implant is implanted in the patient.
    Type: Grant
    Filed: August 18, 2011
    Date of Patent: April 21, 2015
    Assignee: Siemens Aktiengesellschaft
    Inventors: Sergei Azernikov, Suraj Ravi Musuvathy, Tong Fang
  • Publication number: 20150057305
    Abstract: Disclosed in the present invention is a pharmaceutical composition, comprising a weight ratio of 1:120 to 1:1000 of camptothecin compound of formula I and ?-cyclodextrin or derivatives thereof, and an acidic buffer to adjust the pH=3.5-6.0. The composition can be used to treat solid tumours, such as melanoma, pancreatic cancer, hepatoma etc. The pharmaceutical composition of the present invention is miscible with a water-miscible co-solvent system in any proportion, and can be used as an intravenous infusion solvent, and has no obvious hemolysis or vascular stimulation; the pharmaceutical composition has a better tumour inhibiting rate than solubilisation of surfactants.
    Type: Application
    Filed: March 12, 2013
    Publication date: February 26, 2015
    Inventors: Kaiyong Tang, Junfang Pan, Qin Zhu, Tong Fang, Chengcheng Niu, Wanhai Li, Wei Lv, Chen Qing, Guorong Fan
  • Patent number: 8831308
    Abstract: A method for segmenting intracranial aneurysms in digital medical images includes extracting a mesh representing a vessel surface from a volumetric digital image, the mesh comprising a set of points {pi} and edges {eij} respective points, and finding a set of binary labelings that minimizes an energy functional of the labelings and of shape descriptors of each point in the mesh, where the binary labelings segments an aneurysm from the surface by associating one of two labels with each point pi, where a label indicates whether an associated point is on a vessel or on an aneurysm, where the energy functional includes a unary potential term summed over all points that represent a posterior distribution of the labels over the points, and a pairwise potential term summed over all edges that represents neighborhood labeling relationships.
    Type: Grant
    Filed: May 30, 2012
    Date of Patent: September 9, 2014
    Assignee: Siemens Aktiengesellschaft
    Inventors: Sajjad Hussain Baloch, Erkang Cheng, Tong Fang, Ying Zhu
  • Patent number: 8698800
    Abstract: A method and apparatus for the smoothing of a mesh surface is disclosed whereby neighboring vertices of a target vertex are identified, for example, by identifying the neighboring vertices within a desired distance from the target vertex. A normal of the target vertex is determined as a function of, for example, the features of a set of neighbor triangles corresponding to the set of neighboring vertices. A local coordinate system is then established. Unknowns in a quadratic surface function are then solved as a function of the position of the neighboring vertices with respect to the local coordinate system and new x and y coordinates in the local coordinate system are determined for the target vertex. These new x and y coordinates are entered into the quadratic surface function to obtain a new smoothed z coordinate for the target vertex.
    Type: Grant
    Filed: August 22, 2006
    Date of Patent: April 15, 2014
    Assignee: Siemens Corporation
    Inventors: Hui Xie, Jin Zhou, Tong Fang
  • Publication number: 20140081400
    Abstract: A method on a processor customizes a fixation plate for repairing a bone fracture. A digital CAD model of an implant contains smooth analytic geometry representations including NURBS. The CAD geometry is directly manipulated to generate a customized implant CAD model that conforms to the desired region of the bone surface of a patient. Direct manipulation of NURBS geometry is computationally fast and suitable for interactive planning. The patient specific customized implant is produced directly from the generated customized CAD model with a standard CNC machine before surgery. The patient customized implant is implanted in the patient.
    Type: Application
    Filed: August 18, 2011
    Publication date: March 20, 2014
    Applicant: SIEMENS CORPORATION
    Inventors: Sergei Azernikov, Suraj Ravi Musuvathy, Tong Fang
  • Publication number: 20140051255
    Abstract: A method of bevel edge etching a semiconductor substrate having exposed copper surfaces with a fluorine-containing plasma in a bevel etcher in which the semiconductor substrate is supported on a semiconductor substrate support comprises bevel edge etching the semiconductor substrate with the fluorine-containing plasma in the bevel etcher; evacuating the bevel etcher after the bevel edge etching is completed; flowing defluorinating gas into the bevel etcher; energizing the defluorinating gas into a defluorination plasma at a periphery of the semiconductor substrate; and processing the semiconductor substrate with the defluorination plasma under conditions to prevent discoloration of the exposed copper surfaces of the semiconductor substrate upon exposure, the discoloration occurring upon prolonged exposure to air.
    Type: Application
    Filed: October 28, 2013
    Publication date: February 20, 2014
    Applicant: Lam Research Corporation
    Inventors: Tong Fang, Yunsang Kim, Andre D. Bailey, III, Olivier Rigoutat, George Stojakovic
  • Publication number: 20130297265
    Abstract: The design process for the surgical plan in orthopedics and/or the design of a personalized cutting guide and/or implant are automated in a workflow frame work. Abstracted rules are scripted through a sequence of operations to alter a bone surface or model for fitting an implant. Using bone information for a specific patient, the proper implant and series of cuts are determined using the rules. A corresponding cutting guide may be fitted to the bone information for the specific patient. Surgical planning of bone replacement implants is performed automatically.
    Type: Application
    Filed: April 26, 2013
    Publication date: November 7, 2013
    Applicant: SIEMENS PRODUCT LIFECYCLE MANAGEMENT SOFTWARE INC.
    Inventors: Sajjad Hussain Baloch, Suraj Ravi Musuvathy, Guanglei Xiong, Lawrence Spivey, James B. Thompson, Tong Fang
  • Publication number: 20130264015
    Abstract: A method of cleaning a bevel edge of a semiconductor substrate is provided. A semiconductor substrate is placed on a substrate support in a reaction chamber of a plasma processing apparatus. The substrate has a dielectric layer overlying a top surface and a bevel edge of the substrate, the layer extending above and below an apex of the bevel edge. A process gas is introduced into the reaction chamber and energized into a plasma. The bevel edge is cleaned with the plasma so as to remove the layer below the apex without removing all of the layer above the apex.
    Type: Application
    Filed: March 11, 2013
    Publication date: October 10, 2013
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Tong Fang, Yunsang Kim, Keechan Kim, George Stojakovic
  • Patent number: 8542901
    Abstract: For resonance image data of an imaged subject, a method that first detects and estimates the dominant motions of k-space data (i.e., the motion vectors) and then constructs a graphical model for each estimated motion vector. The segments of the k-space that are determined to be corrupted by motion are restored by minimizing the energy associated with the corresponding graphical model. Consequently, the MR image of the imaged subject becomes free of motion artifacts.
    Type: Grant
    Filed: December 7, 2009
    Date of Patent: September 24, 2013
    Assignee: Siemens Aktiengesellschaft
    Inventors: Ti-chiun Chang, Tong Fang, Michelle Xiaohong Yan