Abstract: The present invention relates to a thermal processing method includes a first thermal processing step that carries out thermal processing steps using a plurality of first substrates, wherein thin films are formed on surfaces of the plurality of first substrates by means of less consumption of the process gas than on surfaces of production substrates. Then, a second thermal processing step carries out thermal processing steps by using a plurality of second substrates, wherein thin films are formed on surfaces of the plurality of second substrates by means of more consumption of the process gas than on the surfaces of the plurality of first substrates, and wherein heating units are respectively adjusted to respective temperature set values set during the previous step.

Abstract: A stud bolt (1) is disposed with a bolt head portion (2), a bolt shoulder portion (3) whose diameter is smaller than the diameter of the bolt head portion (2), and a thread portion (4b) whose diameter is smaller than the diameter of the bolt shoulder portion (3), wherein the bolt shoulder portion (3) includes a knurling portion (3b) that includes projecting portions (3b1) and groove portions (3b2) on its outer periphery and at least part of which eats into a container (10) during staking and a bolt base portion (3a) that is disposed between the knurling portion (3b) and the bolt head portion (2) and has a peripheral surface that is smoother than the knurling portion (3b).

Abstract: In a scroll fluid machine, an orbiting scroll is eccentrically revolved with respect to a fixed scroll by a driving shaft to compress a gas toward a center. To manufacture the orbiting scroll, a reference bore is formed at the center of orbiting scroll material, and a reference bore is formed at the center of bearing plate material. A dowel pin is inserted in the two reference bores. The orbiting scroll material is combined with the bearing plate material with a bolt and an adhesive.

Abstract: A substrate treatment apparatus includes a container holder which holds a container for containing multiple substrates vertically stacked in horizontal postures, a substrate treatment section which collectively applies treatment to multiple substrates horizontally stacked in vertical postures, a main conveyance mechanism which conveys multiple substrates horizontally stacked in vertical postures between a substrate delivery position and the substrate treatment section, a carrying in/out mechanism which carries in/out the multiple substrates with respect to the container and changes postures of the multiple substrates between the horizontal postures and the vertical postures, and a sub conveyance mechanism which receives and delivers multiple substrates in vertical postures from and to the carrying in/out mechanism at a transfer position, receives and delivers multiple substrates in vertical postures from and to the main conveyance mechanism at the substrate delivery position, and conveys multiple substrates i

Abstract: A sintered body comprising 95 Wt % or more germanium and tungsten. The sputtering is executed by using sintered body as a target, thereby forming a resistance film to a spacer of an image forming apparatus using electron beam emitting devices and the like. Thus, the resistance film having excellent controllability and high reproducibility can be stably formed.

Abstract: Nitrogen gas is exhausted from a plurality of gas outlets formed in a relatively upper part of a chamber side portion. The gas outlets are configured such that gas exhaust directions as viewed from the gas outlets are deviated at an equal angle from a central axis that passes through the center of a chamber in a vertical direction. The atmosphere in the chamber is exhausted from a bottom opening formed in a central portion of the bottom surface of the chamber. This produces such a tornado-like flow of nitrogen gas as directing from a relatively upper part of the chamber side portion to the central portion of the bottom surface of the chamber. In this condition, a flash of light is emitted with no semiconductor wafer transported into the chamber, whereby particles in the chamber are scattered and exhausted outside along with the flow of nitrogen gas.

Abstract: A method for oxidation of an object to be processed is provided wherein an oxide film can provide favorable film quality and a laminate structure of nitride film and oxide film can be obtained by a thermal oxidation of a nitride film. In a method for oxidation of a surface of an object to be processed in a single processing container 8 which can contain a plurality of objects to be processed, at least a nitride film is exposed on said surface, and said oxidation is performed by mainly using active hydroxyl/oxygen species in a vacuum atmosphere, setting a processing pressure to 133 Pa or below, and setting a processing temperature to 400° C. or above. Under these conditions, high interplanar uniformity is maintained and oxide films with favorable film quality are obtained by oxidizing nitride films on the surfaces of a plurality of objects to be processed.

Abstract: An image output system configured of information terminals, each of which includes an identification information storage unit which stores identification information for identifying each of the information terminals and a transmission unit which transmits the identification information, and an image output apparatus which includes: an identification information receiving unit which receives the identification information transmitted by each of the information terminals; an output unit which obtains image information which is information for outputting images, and outputs images based on the obtained image information; a judgment unit which judges whether or not plural pieces of identification received by the identification information receiving unit satisfy a predetermined condition; and an output control unit which controls the output unit based on the judgment made by the judgment unit.

Abstract: In a scroll fluid machine, an orbiting scroll engages with a stationary scroll to form a sealed chamber in which fluid can be compressed toward a center with revolution of the orbiting scroll with respect to the stationary scroll. An annular groove is formed near the outer circumference of the stationary scroll. A dust seal fits in the annular groove of the stationary scroll. The annular groove has almost the same width, but has a wider portion having the twice the width as the other. In the wider portion of the annular groove, the ends of the dust seal are overlapped. The overlapped surfaces are rough to engage with each other.

Abstract: A scroll fluid machine comprises an orbiting scroll and a stationary scroll. The orbiting scroll comprises an orbiting end plate having an orbiting wrap, and the stationary scroll comprises a stationary end plate having a stationary wrap. The orbiting scroll is supported to turn on an eccentric shaft portion of a drive shaft. The orbiting wrap engages with the stationary wrap to form a sealed chamber therebetween. A bearing tube is detachably disposed in a housing. The drive shaft is supported to turn in the bearing tube.

Abstract: A scroll fluid machine comprises a stationary scroll and an orbiting scroll between which a sealed space is formed. The orbiting scroll is eccentrically revolved with respect to the stationary scroll around a drive shaft via a bearing. An oil-supply hole is formed at the orbiting scroll so that grease may be supplied into the bearing for lubrication; There is a self rotation preventing device for the orbiting scroll and another oil supply hole to that device.

Abstract: The present invention provides an outer surrounding body such as a roof, wall or the like which has good waterproofing and water-tightness in the connection locations between construction sheets and the mounting locations of trough members, and which shows an extremely good finish and working conditions, and an apparatus for manufacturing the same.

Abstract: A method for oxidation of an object to be processed is provided wherein an oxide film can provide favorable film quality and a laminate structure of nitride film and oxide film can be obtained by a thermal oxidation of a nitride film. In a method for oxidation of a surface of an object to be processed in a single processing container 8 which can contain a plurality of objects to be processed, at least a nitride film is exposed on said surface, and said oxidation is performed by mainly using active hydroxyl/oxygen species in a vacuum atmosphere, setting a processing pressure to 133 Pa or below, and setting a processing temperature to 400° C. or above. Under these conditions, high interplanar uniformity is maintained and oxide films with favorable film quality are obtained by oxidizing nitride films on the surfaces of a plurality of objects to be processed.

Abstract: In a scroll fluid machine, an orbiting scroll is eccentrically revolved with respect to a fixed scroll by a driving shaft to compress a gas toward a center. To manufacture the orbiting scroll, a reference bore is formed at the center of orbiting scroll material, and a reference bore is formed at the center of bearing plate material. A dowel pin is inserted in the two reference bores. The orbiting scroll material is combined with the bearing plate material with a bolt and an adhesive.

Abstract: In a scroll fluid machine, an orbiting scroll engages with a stationary scroll to form a sealed chamber in which fluid can be compressed toward a center with revolution of the orbiting scroll with respect to the stationary scroll. An annular groove is formed near the outer circumference of the stationary scroll. A dust seal fits in the annular groove of the stationary scroll. The annular groove has almost the same width, but has a wider portion having the twice the width as the other. In the wider portion of the annular groove, the ends of the dust seal are overlapped. The overlapped surfaces are rough to engage with each other.

Abstract: An antistatic film installed in an airtight vessel containing an electron source of an electron-generating device such as a picture display unit has a structure comprising a plurality of conductor particles with particle diameters of 0.5 to 10 nm dispersed in a medium containing a nitride; and thereby improves controllability for a resistivity value, stability and reproducibility, and the adequate temperature characteristics of resistance.

Abstract: A scroll fluid machine comprises an orbiting scroll and a stationary scroll. The orbiting scroll comprises an orbiting end plate having an orbiting wrap, and the stationary scroll comprises a stationary end plate having a stationary wrap. The orbiting scroll is supported to turn on an eccentric shaft portion of a drive shaft. The orbiting wrap engages with the stationary wrap to form a sealed chamber therebetween. A bearing tube is detachably disposed in a housing. The drive shaft is supported to turn in the bearing tube.

Abstract: A scroll fluid machine comprises a stationary scroll and an orbiting scroll between which a sealed space is formed. The orbiting scroll is eccentrically revolved with respect to the stationary scroll around a drive shaft via a bearing. An oil-supply hole is formed at the orbiting scroll so that grease may be supplied into the bearing for lubrication.

Abstract: The present invention relates to a thermal processing method including thermal processing steps having: a step of holding a plurality of substrates by means of a substrate holder, a step of conveying the substrate holder into a reaction container, a step of heating a plurality of zones of thermal process atmosphere in the reaction container by means of a plurality of heating units, respectively, and a step of forming thin films on surfaces of the plurality of substrates by introducing a process gas into the reaction container.