Patents by Inventor Toru Shibuya

Toru Shibuya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10388419
    Abstract: Provided are an adsorbent capable of removing radioactive water liquid including iodine compounds and/or antimony by means of a water passing treatment, and a method and an apparatus for treating radioactive waste liquid by using the adsorbent. The adsorbent includes a polymer resin and 10 parts by weight or more of a hydrous hydroxide of a rare earth element based on 100 parts by weight of the polymer resin, in which the hydrous hydroxide of the rare earth element has a water content of 1 part by weight to 30 parts by weight based on 100 parts by weight of a dry product thereof, and adsorbs iodine compounds and/or antimony.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: August 20, 2019
    Assignees: EBARA CORPORATION, NIHON KAISU CO., LTD.
    Inventors: Takashi Sakuma, Makoto Komatsu, Takeshi Izumi, Tomohiko Ito, Toru Shibuya
  • Publication number: 20180158558
    Abstract: Provided are an adsorbent capable of removing radioactive water liquid including iodine compounds and/or antimony by means of a water passing treatment, and a method and an apparatus for treating radioactive waste liquid by using the adsorbent. The adsorbent includes a polymer resin and 10 parts by weight or more of a hydrous hydroxide of a rare earth element based on 100 parts by weight of the polymer resin, in which the hydrous hydroxide of the rare earth element has a water content of 1 part by weight to 30 parts by weight based on 100 parts by weight of a dry product thereof, and adsorbs iodine compounds and/or antimony.
    Type: Application
    Filed: June 3, 2016
    Publication date: June 7, 2018
    Inventors: Takashi SAKUMA, Makoto KOMATSU, Takeshi IZUMI, Tomohiko ITO, Toru SHIBUYA
  • Patent number: 9223210
    Abstract: A photosensitive compound represented by formula (1) or formula (2). (Chemical formula 1) (In formula (1) and formula (2), n is an integer of 1-3; R1 is a linear or branched alkyl group having 1-6 carbon atoms or an alkylene group having 2-6 carbon atoms formed from two R1 together; R2 is —NR3R4; R3 and R4 are each independently a linear or branched alkyl group or alkenyl group having 1-6 carbon atoms, a linear or branched alkylene group having 2-6 carbon atoms formed by R3 and R4 together, or a linear or branched alkylene group or alkenylene group having 3-8 carbon atoms optionally containing an oxygen atom or nitrogen atom.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: December 29, 2015
    Assignee: TOYO GOSEI CO., LTD.
    Inventor: Toru Shibuya
  • Publication number: 20150079519
    Abstract: A photosensitive compound represented by formula (1) or formula (2). (Chemical formula 1) (In formula (1) and formula (2), n is an integer of 1-3; R1 is a linear or branched alkyl group having 1-6 carbon atoms or an alkylene group having 2-6 carbon atoms formed from two R1 together; R2 is —NR3R4; R3 and R4 are each independently a linear or branched alkyl group or alkenyl group having 1-6 carbon atoms, a linear or branched alkylene group having 2-6 carbon atoms formed by R3 and R4 together, or a linear or branched alkylene group or alkenylene group having 3-8 carbon atoms optionally containing an oxygen atom or nitrogen atom.
    Type: Application
    Filed: February 28, 2013
    Publication date: March 19, 2015
    Inventor: Toru Shibuya
  • Patent number: 7605191
    Abstract: The invention provides a photosensitive resin which can readily form, through photo-crosslinking, a surface coating which has hydrophilicity and high bioadaptability; a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the photosensitive composition.
    Type: Grant
    Filed: March 31, 2006
    Date of Patent: October 20, 2009
    Assignee: Toyo Gosei Co., Ltd.
    Inventors: Takeshi Ikeya, Toru Shibuya, Kana Miyazaki
  • Publication number: 20090181158
    Abstract: To produce a cell culture container which is suitable for use in, for example, biochemical experiments, clinical experiments, and research and development of drugs. The production of the cell culture container includes providing a cell culture container base 1 having a plurality of wells serving as regions for culturing cells; applying a hydrophilic photosensitive composition to the bottom surface of each of the wells, to thereby form a coating 3; subjecting the coating 3 to patternwise light exposure; and removing an uncured portion of the coating through development, to thereby yield a cell culture container having, on the bottom surface of each well, a patterned hydrophilic coating layer formed of a photo-cured product.
    Type: Application
    Filed: April 24, 2007
    Publication date: July 16, 2009
    Applicant: Toyo Gosei Co., Ltd.
    Inventors: Takeshi Ikeya, Masaharu Watanabe, Kana Miyazaki, Toru Shibuya
  • Patent number: 7252912
    Abstract: A polymer composite comprises a base material, and a polymer membrane provided on at least a part of the base material, the polymer membrane having at least hydrophilicity, and the polymer composite is used in a state exposed to water or a water-based solvent. The polymer membrane is a resin film formed by photo-crosslinking a photosensitive resin composition consisting essentially of a water-soluble polymer, and during crosslinking of the photosensitive resin composition, some of photosensitive groups of the photosensitive resin composition are bound to amino groups fixed to the surface of the base material, whereby the resin film is fixed to the base material.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: August 7, 2007
    Assignees: Toyo Gosei Co., Ltd.
    Inventors: Kazunori Kataoka, Akihiro Hirano, Takeshi Ikeya, Toru Shibuya
  • Publication number: 20060235103
    Abstract: The invention provides a photosensitive resin which can readily form, through photo-crosslinking, a surface coating which has hydrophilicity and high bioadaptability; a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the photosensitive composition.
    Type: Application
    Filed: March 31, 2006
    Publication date: October 19, 2006
    Inventors: Takeshi Ikeya, Toru Shibuya, Kana Miyazaki
  • Publication number: 20060222876
    Abstract: A polymer composite comprises a base material, and a polymer membrane provided on at least a part of the base material, the polymer membrane having at least hydrophilicity, and the polymer composite is used in a state exposed to water or a water-based solvent. The polymer membrane is a resin film formed by photo-crosslinking a photosensitive resin composition consisting essentially of a water-soluble polymer, and during crosslinking of the photosensitive resin composition, some of photosensitive groups of the photosensitive resin composition are bound to amino groups fixed to the surface of the base material, whereby the resin film is fixed to the base material.
    Type: Application
    Filed: March 29, 2005
    Publication date: October 5, 2006
    Inventors: Kazunori Kataoka, Akihiro Hirano, Takeshi Ikeya, Toru Shibuya
  • Patent number: 6861456
    Abstract: The present invention provides a novel photosensitive compound having an azido group suitable for exposure to light of a short wavelength; a photosensitive resin containing the photosensitive compound; and a photosensitive composition containing the photosensitive compound or photosensitive resin. The photosensitive compound containing a photosensitive unit represented by formula (1): wherein R is selected from among the following groups, R: X is selected from among the following groups, X: and each of Y and Z represents a hydrogen atom, an alkyl group, an acetal-group-containing alkyl group, an aryl group, an aralkyl group, or a substituent containing a base-forming nitrogen atom, wherein at least one of R and X contains an azido group.
    Type: Grant
    Filed: March 27, 2003
    Date of Patent: March 1, 2005
    Assignee: Toyo Gosei Kogyo Co., Ltd.
    Inventors: Toru Shibuya, Masanori Kurihara, Mineko Takeda, Kazuo Yamada
  • Publication number: 20040266901
    Abstract: The present invention provides a novel photosensitive compound having an azido group suitable for exposure to light of a short wavelength; a photosensitive resin containing the photosensitive compound; and a photosensitive composition containing the photosensitive compound or photosensitive resin.
    Type: Application
    Filed: March 27, 2003
    Publication date: December 30, 2004
    Inventors: Toru Shibuya, Masanori Kurihara, Mineko Takeda, Kazuo Yamada
  • Patent number: 6610791
    Abstract: The invention provides a photosensitive compound which can be used to prepare a photosensitive resin, and a photosensitive resin obtained from the compound. The compound has a moiety represented by formula (I) or (II): wherein R1 represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group; Y is selected from the following formula groups:  wherein each of R2 and R3 represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group, and l is an integer of 1 to 5; and Ar is selected from the following formula groups:  wherein X represents lithium, sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, trialkylammonium, or tetraalkylammonium.
    Type: Grant
    Filed: February 14, 2001
    Date of Patent: August 26, 2003
    Assignee: Toyo Gosai Kogyo Co., Ltd.
    Inventors: Kentaro Tada, Toru Shibuya
  • Publication number: 20010047068
    Abstract: The invention provides a photosensitive compound which can be used to prepare a photosensitive resin, and a photosensitive resin obtained from the compound.
    Type: Application
    Filed: February 14, 2001
    Publication date: November 29, 2001
    Inventors: Kentaro Tada, Toru Shibuya
  • Patent number: 6020093
    Abstract: The photosensitive compound of the present invention contains the following unit: ##STR1## and is particularly expressed by the following formula: ##STR2## Different photosensitive resin compositions can be prepared from this novel photosensitive resin compound, and the resulting photosensitive resin compositions do not raise the problem of environmental pollution, exhibit high resolution, possess a high level of sensitivity, and exhibit excellent adhesion with substrates, coating characteristics and storage stability.
    Type: Grant
    Filed: May 13, 1998
    Date of Patent: February 1, 2000
    Assignee: Toyo Gosei Kogyo, Ltd.
    Inventors: Toru Shibuya, Jian Rong Xie, Noriaki Tochizawa
  • Patent number: 5994008
    Abstract: The present invention relates to a composition for forming a fluorescent film for a display and a method of forming a fluorescent film for forming a display surface of a display unit. The composition for forming a fluorescent film for a display has an aqueous medium in which photosensitive resin having a styryl pyridium photosensitive group having an internal salt structure and a fluorescent material which easily reacts with acid are dispersed. The composition is applied to the display surface of a display unit so that a fluorescent layer is formed. Then, the fluorescent material layer is developed to form the fluorescent material layer into a predetermined pattern, and then the fluorescent material layer formed into the predetermined pattern is baked so that a fluorescent film is formed.
    Type: Grant
    Filed: April 18, 1997
    Date of Patent: November 30, 1999
    Assignee: Futaba Denshi Kogyo K.K.
    Inventors: Yukio Ogawa, Yoshihisa Yonezawa, Katsutoshi Kougo, Kazuyoshi Ishikawa, Shigeo Itoh, Tetsuaki Tochizawa, Yasuo Kuniyoshi, Toru Shibuya, Hideo Kikuchi
  • Patent number: 5866296
    Abstract: A photosensitive resin composition includes a polymer compound having a component of Formula (I) and a sensitizer having a cationic group in the molecule: ##STR1## (wherein X denotes a cationic species, and n is 0, 1 or 2.) The photosensitive resin composition is high in sensitivity, good in storage stability, and easy to produce, and is suitable for use in a screen printing plate, formation of black matrix or phosphor pattern of a color cathode-ray tube, a CCD or LCD color filter, a printing color proof, and various etching resists.
    Type: Grant
    Filed: April 25, 1997
    Date of Patent: February 2, 1999
    Assignee: Toyo Gosei Co., Ltd.
    Inventors: Toru Shibuya, Noriaki Tochizawa, Mitsuharu Miyazaki, Hideo Kikuchi
  • Patent number: 5345269
    Abstract: In an adaptive prediction encoding device which carries out adaptive encoding of a digital picture signal by making a selector adaptively select a two-previous predictor, a previous field predictor, and a higher order intraline predictor in accordance with the digital picture signal, a first selection forcing circuit forces a selector to select the higher order intraline predictor at first timing of fixed scanning lines which periodically appear at a period of (2N+1) scanning lines in each field of successive frames of the digital picture signal, where N represents a natural number. A second selection forcing circuit forces the selector to select the higher order intraline predictor at second timing of additional scanning lines which precede the fixed scanning lines by (m-1) scanning lines in each field of an m-th frame of the digital picture signal, where m consecutively varies from 2 to (2N+1) which is equal to M.
    Type: Grant
    Filed: September 17, 1993
    Date of Patent: September 6, 1994
    Assignee: NEC Corporation
    Inventors: Noboru Kawayachi, Toru Shibuya
  • Patent number: 5323188
    Abstract: In a DPCM predictive encoder (or performing DPCM prediction by digitizing a NTSC color television signal with a rate three times of a color sub-carrier frequency, a two-frame predictor which outputs a differential signal over two frames is employed as one of predictors. A predictor switcher adaptively selects one of prediction information as an optimal prediction signal and selects corresponding differential information as an optimal differential signal. This differential signal is quantized by a quantizer. The quantized output and the optimal prediction signal are summed by an adder and supplied to the predictors as a local decoding signal.
    Type: Grant
    Filed: September 18, 1992
    Date of Patent: June 21, 1994
    Assignee: NEC Corporation
    Inventors: Noboru Kawayachi, Toru Shibuya
  • Patent number: D783135
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: April 4, 2017
    Assignee: Miki Pulley Co., Ltd.
    Inventors: Katsuhiko Sato, Toru Shibuya
  • Patent number: D788271
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: May 30, 2017
    Assignee: Miki Pulley Co., Ltd.
    Inventors: Katsuhiko Sato, Toru Shibuya