Patents by Inventor Toru Tsuchihashi

Toru Tsuchihashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10663864
    Abstract: The pattern forming method includes forming an actinic ray-sensitive or radiation-sensitive film using an actinic ray-sensitive or radiation-sensitive composition, forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film using a composition for forming an upper layer film, exposing the actinic ray-sensitive or radiation-sensitive film having the upper layer film formed thereon, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer, in which the composition for forming an upper layer film includes a solvent and a crosslinking agent; and in which the content of a solvent having a hydroxyl group is 80% by mass or less with respect to all the solvents included in the composition for forming an upper layer film. The method for manufacturing an electronic device includes the pattern forming method. The laminate has an actinic ray-sensitive or radiation-sensitive film, and an upper layer film including a crosslinking agent.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: May 26, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Wataru Nihashi, Hideaki Tsubaki, Toru Tsuchihashi, Kei Yamamoto
  • Patent number: 10599038
    Abstract: Provided are a rinsing liquid which is used for rinsing a resist film obtained from an actinic ray-sensitive or radiation-sensitive composition and includes a hydrocarbon-based solvent having a branched alkyl group. The hydrocarbon-based solvent having a branched alkyl group contains at least one of isodecane or isododecane.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: March 24, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Toru Tsuchihashi, Wataru Nihashi
  • Patent number: 10562991
    Abstract: Provided is a pattern forming method including the successive steps of: a resist film forming step of forming a resist film using an actinic ray-sensitive or radiation-sensitive composition; an exposure step of exposing the resist film; a step of developing the exposed resist film using a developer, and a step of rinsing the developed resist film using a rinsing liquid containing an organic solvent. The developer includes a ketone-based or ether-based solvent having a branched alkyl group. The organic solvent contained in the rinsing liquid includes an ether-based solvent having a branched alkyl group.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: February 18, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Toru Tsuchihashi, Wataru Nihashi
  • Patent number: 10394127
    Abstract: Provide are a pattern forming method including a step (1) of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition including a resin having an acid-decomposable repeating unit capable of decomposing by the action of an acid to generate an acid having a pKa of 3.0 or less, a step (2) of exposing the film using actinic rays or radiation, and a step (3) of carrying out development using a developer including an organic solvent after the exposure to form a negative tone pattern; and a method for manufacturing an electronic device, including the pattern forming method.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: August 27, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Wataru Nihashi, Hideaki Tsubaki, Toru Tsuchihashi, Tomotaka Tsuchimura
  • Patent number: 10126653
    Abstract: Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.
    Type: Grant
    Filed: February 24, 2011
    Date of Patent: November 13, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Kaoru Iwato, Shohei Kataoka, Shinji Tarutani, Sou Kamimura, Keita Kato, Yuichiro Enomoto, Kazuyoshi Mizutani, Toru Tsuchihashi, Kana Fujii
  • Publication number: 20180217499
    Abstract: An object of the present invention is to provide a treatment liquid for patterning a resist film and a pattern forming method, each of which can simultaneously suppress the occurrence of pattern collapse in a resist L/S pattern and the occurrence of omission failure in a resist C/H pattern. The treatment liquid of the present invention is a treatment liquid for patterning a resist film, which is used for subjecting a resist film obtained from an actinic ray-sensitive or radiation-sensitive resin composition to at least one of development or washing, and contains an organic solvent, in which the treatment liquid contains a first organic solvent having a relative dielectric constant of 4.0 or less and a second organic solvent having a relative dielectric constant of 6.0 or more.
    Type: Application
    Filed: March 28, 2018
    Publication date: August 2, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Shuji HIRANO, Hideaki TSUBAKI, Toru TSUCHIHASHI, Wataru NIHASHI, Kei YAMAMOTO
  • Publication number: 20180217503
    Abstract: An object of the present invention is to provide a treatment liquid for patterning a resist film and a pattern forming method, each of which can simultaneously suppress the occurrence of pattern collapse in a resist L/S pattern and the occurrence of omission failure in a resist C/H pattern. The treatment liquid of the present invention is a treatment liquid for patterning a resist film, which is used for subjecting a resist film obtained from an actinic ray-sensitive or radiation-sensitive resin composition to at least one of development or washing, and contains an organic solvent, in which the treatment liquid contains a first organic solvent having an SP value of 16.3 MPa1/2 or less and a second organic solvent having an SP value of 17.1 MPa1/2 or more.
    Type: Application
    Filed: March 28, 2018
    Publication date: August 2, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Hideaki TSUBAKI, Toru TSUCHIHASHI, Wataru NIHASHI, Kei YAMAMOTO
  • Publication number: 20180186907
    Abstract: Provided is a pattern forming method including the successive steps of: a resist film forming step of forming a resist film using an actinic ray-sensitive or radiation-sensitive composition; an exposure step of exposing the resist film; a step of developing the exposed resist film using a developer, and a step of rinsing the developed resist film using a rinsing liquid containing an organic solvent. The developer includes a ketone-based or ether-based solvent having a branched alkyl group. The organic solvent contained in the rinsing liquid includes an ether-based solvent having a branched alkyl group.
    Type: Application
    Filed: December 21, 2017
    Publication date: July 5, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Hideaki TSUBAKI, Toru TSUCHIHASHI, Wataru NIHASHI
  • Publication number: 20180181003
    Abstract: The pattern forming method includes forming an actinic ray-sensitive or radiation-sensitive film using an actinic ray-sensitive or radiation-sensitive composition, forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film using a composition for forming an upper layer film, exposing the actinic ray-sensitive or radiation-sensitive film having the upper layer film formed thereon, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer, in which the composition for forming an upper layer film includes a solvent and a crosslinking agent; and in which the content of a solvent having a hydroxyl group is 80% by mass or less with respect to all the solvents included in the composition for forming an upper layer film. The method for manufacturing an electronic device includes the pattern forming method. The laminate has an actinic ray-sensitive or radiation-sensitive film, and an upper layer film including a crosslinking agent.
    Type: Application
    Filed: February 26, 2018
    Publication date: June 28, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Wataru NIHASHI, Hideaki TSUBAKI, Toru TSUCHIHASHI, Kei YAMAMOTO
  • Publication number: 20180180996
    Abstract: The pattern forming method includes forming an actinic ray-sensitive or radiation-sensitive film using an actinic ray-sensitive or radiation-sensitive composition, forming an upper layer film using a composition for forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film, exposing the actinic ray-sensitive or radiation-sensitive film having the upper layer film formed thereon, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer containing an organic solvent, in which the composition for forming an upper layer film includes a resin and at least one of a compound capable of generating an acid with actinic rays or radiation, a compound capable of generating an acid with heat, and an acid, in which the resin includes a repeating unit represented by General Formula (II). The method for manufacturing an electronic device includes the pattern forming method. A laminate includes the film and the upper layer film.
    Type: Application
    Filed: February 26, 2018
    Publication date: June 28, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Wataru Nihashi, Toru Tsuchihashi, Kei Yamamoto
  • Publication number: 20180120705
    Abstract: Provided are a positive tone pattern forming method in which development is carried out using a developer containing an organic solvent with use of a composition containing (A) a resin which has a repeating unit containing a moiety capable of forming a polar interaction and whose polarity is decreased due to release of the polar interaction by the action of an acid or a base, or a composition containing (A?) a resin having a repeating unit containing a polar group and (B) a compound capable of forming a polar interaction with the polar group of the resin (A?); and an electronic device manufacturing method including such a pattern forming method.
    Type: Application
    Filed: December 26, 2017
    Publication date: May 3, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Wataru NIHASHI, Toru TSUCHIHASHI, Hideaki TSUBAKI
  • Publication number: 20180120697
    Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive composition which has excellent heat stability and makes it possible to achieve high sensitivity and good roughness characteristics. The actinic ray-sensitive or radiation-sensitive composition according to the present invention contains (A) a compound in which in an organic/inorganic composite composition containing a metal or metalloid element, the aggregated domain size of the metal or metalloid element is 1 to 5 nm, and 1.2 to 2.0 mol times of a carboxylic acid and/or a carboxylic acid derivative with respect to the metal or metalloid element exists to form a coordinated structure; (B) a compound (Q) capable of generating an acid upon irradiation with actinic rays or radiation; and (C) an organic solvent.
    Type: Application
    Filed: December 27, 2017
    Publication date: May 3, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Toru FUJIMORI, Toru TSUCHIHASHI
  • Publication number: 20180120708
    Abstract: Provided are a rinsing liquid which is used for rinsing a resist film obtained from an actinic ray-sensitive or radiation-sensitive composition and includes a hydrocarbon-based solvent having a branched alkyl group. The hydrocarbon-based solvent having a branched alkyl group contains at least one of isodecane or isododecane.
    Type: Application
    Filed: December 21, 2017
    Publication date: May 3, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Hideaki TSUBAKI, Toru TSUCHIHASHI, Wataru NIHASHI
  • Publication number: 20180101100
    Abstract: A treatment liquid for rinsing and patterning a resist film obtained from an actinic ray-sensitive composition includes an organic solvent in which a content of a compound containing a sulfur atom in the treatment liquid is 10 mmol/L or lower, and the organic solvent is a hydrocarbon solvent. A pattern forming method includes: forming a resist film using an actinic ray-sensitive or radiation-sensitive composition; exposing the resist film; and treating the exposed resist film with the treatment liquid.
    Type: Application
    Filed: December 12, 2017
    Publication date: April 12, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Hideaki TSUBAKI, Toru TSUCHIHASHI, Wataru NIHASHI
  • Publication number: 20180017872
    Abstract: Provide are a pattern forming method including a step (1) of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition including a resin having an acid-decomposable repeating unit capable of decomposing by the action of an acid to generate an acid having a pKa of 3.0 or less, a step (2) of exposing the film using actinic rays or radiation, and a step (3) of carrying out development using a developer including an organic solvent after the exposure to form a negative tone pattern; and a method for manufacturing an electronic device, including the pattern forming method.
    Type: Application
    Filed: September 28, 2017
    Publication date: January 18, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Wataru NIHASHI, Hideaki TSUBAKI, Toru TSUCHIHASHI, Tomotaka TSUCHIMURA
  • Publication number: 20170285482
    Abstract: Disclosed herein are an organic processing liquid for resist film patterning which is capable of suppressing the occurrence of defects in resist patterns, and a pattern forming method. Provided is an organic processing liquid for resist film patterning, which is used to carry out at least one of developing or cleaning of a resist film obtained from an actinic ray-sensitive or radiation-sensitive composition, the liquid including an organic solvent, in which the content of an oxidant in the organic processing liquid is 10 mmol/L or less.
    Type: Application
    Filed: June 22, 2017
    Publication date: October 5, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Toru TSUCHIHASHI, Hideaki TSUBAKI, Kei YAMAMOTO
  • Patent number: 9709892
    Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa??1.5 when exposed to actinic rays or radiation.
    Type: Grant
    Filed: March 25, 2011
    Date of Patent: July 18, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Kaoru Iwato, Sou Kamimura, Toru Tsuchihashi, Yuichiro Enomoto, Kana Fujii, Kazuyoshi Mizutani, Shinji Tarutani, Keita Kato
  • Patent number: 9632410
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (A) containing a repeating unit represented by a specific formula (1), and an ionic compound (B) represented by a specific formula (2), a resist film formed by using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method including: (a) a step of forming the resist film, (b) a step of exposing the film, and (c) a step of developing the exposed film using a developer to form a pattern.
    Type: Grant
    Filed: September 29, 2015
    Date of Patent: April 25, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Shuhei Yamaguchi, Toru Tsuchihashi, Tomotaka Tsuchimura
  • Publication number: 20170075222
    Abstract: A pattern forming method includes, in this order, forming a film on a substrate, using an active-light-sensitive or radiation-sensitive resin composition containing a resin (A) which has a repeating unit having a phenolic hydroxyl group, and a repeating unit having a group that decomposes by the action of an acid to generate a carboxyl group, and a compound (B) that generates an acid upon irradiation with active light or radiation; exposing the film; and developing the exposed film using a developer including an organic solvent, in which the developer including an organic solvent contains an organic solvent having 8 or more carbon atoms and 2 or less heteroatoms in the amount of 50% by mass or more.
    Type: Application
    Filed: November 22, 2016
    Publication date: March 16, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Toru TSUCHIHASHI, Wataru NIHASHI, Hideaki TSUBAKI
  • Patent number: 9563121
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group has been substituted with a group represented by the following General Formula (1) (in the formula, M11 represents a single bond or a divalent linking group; Q11 represents an alkyl group, a cycloalkyl group, or an aryl group).
    Type: Grant
    Filed: August 5, 2014
    Date of Patent: February 7, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Takeshi Inasaki, Takeshi Kawabata, Tomotaka Tsuchimura, Toru Tsuchihashi