Patents by Inventor Toshiaki Kodama

Toshiaki Kodama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9607389
    Abstract: An alignment apparatus for aligning a wafer by optically detecting an alignment mark includes an imaging unit configured to image an imaging region extending across a circumferential edge of the wafer, an irradiation unit configured to irradiate light toward the imaging region, a reflection part configured to reflect toward the imaging region the light that is irradiated from the irradiation unit upwardly, and a control unit configured to detect the circumferential edge. The reflection part has a reflectance making a luminance difference between the outside of the wafer and the circumferential edge of the wafer in a luminance distribution pattern obtained by imaging the imaging region. The control unit detects the alignment mark and the circumferential edge based on the luminance distribution pattern.
    Type: Grant
    Filed: September 17, 2015
    Date of Patent: March 28, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Toshiaki Kodama
  • Publication number: 20170028547
    Abstract: A posture holding device is for use in a transfer device which has a holding part configured to hold an object and a first link and a second link connected to the holding part. The transfer device moves the first link and the second link relative to the holding part so as to move the holding part between a transfer position and a standby position. The posture holding device holds a posture of the holding part and includes a magnetic gear rotatably connecting the first link and the second link to the holding part. The magnetic gear is disposed such that the one end of the first link connected to the holding part is rotated about a first axis and the one end of the second link connected to the holding part is rotated about the first axis or a second axis different from the first axis.
    Type: Application
    Filed: July 18, 2016
    Publication date: February 2, 2017
    Inventor: Toshiaki KODAMA
  • Publication number: 20160240412
    Abstract: There is provided a substrate detection apparatus of detecting whether or not a substrate is normally supported by a support part at a predetermined position, in a transfer device including the support part configured to support a plurality of disc-like substrates in multi-stage processing at vertical intervals. The substrate detection apparatus includes: a plurality of optical sensors, each of the plurality of optical sensors including a light transmitting part configured to irradiate a light and a light receiving part configured to receive the light from the light transmitting part, wherein at least one pair of the plurality of optical sensors are disposed such that the light from the light transmitting part is sequentially blocked at each of the plurality of disc-like substrates, during the plurality of disc-like substrates is collectively transferred while being normally supported by the support part at the predetermined positions.
    Type: Application
    Filed: February 8, 2016
    Publication date: August 18, 2016
    Inventors: Toshiaki KODAMA, Shinji WAKABAYASHI
  • Publication number: 20160078626
    Abstract: An alignment apparatus for aligning a wafer includes a mounting unit, an imaging unit, an elevation unit, and a controlling unit. The control unit outputs a control signal for controlling the elevation unit such that a luminance variation between the outer side and the inner side of the wafer obtained by the imaging unit becomes the same as a luminance variation obtained when the imaging unit is focused, for estimating a warpage state of the wafer based on an amount of relative movement of the imaging unit and the mounting unit with respect to a relative height position of the imaging unit and the mounting unit obtained when the imaging unit is focused on a reference wafer having no warpage, and for detecting the alignment mark of the wafer by the imaging unit by rotating the mounting unit in a state where the imaging unit is focused.
    Type: Application
    Filed: September 17, 2015
    Publication date: March 17, 2016
    Inventors: Toshiaki KODAMA, Toru YAMAUCHI
  • Publication number: 20160078612
    Abstract: An alignment apparatus for aligning a wafer by optically detecting an alignment mark includes an imaging unit configured to image an imaging region extending across a circumferential edge of the wafer, an irradiation unit configured to irradiate light toward the imaging region, a reflection part configured to reflect toward the imaging region the light that is irradiated from the irradiation unit upwardly, and a control unit configured to detect the circumferential edge. The reflection part has a reflectance making a luminance difference between the outside of the wafer and the circumferential edge of the wafer in a luminance distribution pattern obtained by imaging the imaging region. The control unit detects the alignment mark and the circumferential edge based on the luminance distribution pattern.
    Type: Application
    Filed: September 17, 2015
    Publication date: March 17, 2016
    Inventor: Toshiaki KODAMA
  • Patent number: 9043020
    Abstract: A substrate transportation path is determined by first determining a trajectory of a first straight line passing through a start point, calculating a trajectory of a circular arc in contact with the first straight line, calculating a trajectory of a second straight line in contact with the circular arc and passing through the end point, then, if the position of the end point is changed, re-calculating the second straight line as a straight line passing through the changed end point and in contact with the circular arc, and allowing the center of the substrate holding unit to move on the first straight line, and then, move on the circular arc from a first contact point, followed by moving on the second straight line from a second contact point so as to reach the end point.
    Type: Grant
    Filed: February 18, 2014
    Date of Patent: May 26, 2015
    Assignee: Tokyo Electron Limited
    Inventor: Toshiaki Kodama
  • Publication number: 20140249674
    Abstract: A substrate transportation path is determined by first determining a trajectory of a first straight line passing through a start point, calculating a trajectory of a circular arc in contact with the first straight line, calculating a trajectory of a second straight line in contact with the circular arc and passing through the end point, then, if the position of the end point is changed, re-calculating the second straight line as a straight line passing through the changed end point and in contact with the circular arc, and allowing the center of the substrate holding unit to move on the first straight line, and then, move on the circular arc from a first contact point, followed by moving on the second straight line from a second contact point so as to reach the end point.
    Type: Application
    Filed: February 18, 2014
    Publication date: September 4, 2014
    Applicant: Tokyo Electron Limited
    Inventor: Toshiaki Kodama
  • Publication number: 20140240484
    Abstract: A support information display method is provided with an acquiring process for acquiring a first image by photographing, via a camera provided in a head mount display, a predetermined part of a substrate processing apparatus as a maintenance object, an estimating process for estimating the support information related to the predetermined part in the first image from information stored in a database, an image creating process for creating a second image by converting the support information estimated in the estimating process into an image, and a displaying process for displaying the second image on the head mount display in order for the operator to visually recognize the support information.
    Type: Application
    Filed: February 6, 2014
    Publication date: August 28, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Toshiaki KODAMA, Toru YAMAUCHI, Sensho KOBAYASHI, Hiroshi NAKAMURA, Gaku IKEDA, Kazuya UOYAMA
  • Publication number: 20140128388
    Abstract: Drug candidates for inhibition of HIV-1 replication can target Src family kinases (SFK), such as Hck, that interact with Nef protein of the virus. Compounds characterized by such inhibitory activity were identified via an assay for kinase activity of an SFK in a Nef:SFK complex. Illustrative of inhibitors identified using the kinase assay are various 2,3-diaminoquinaxolines and furo[2,3-d]pyrimidines. The inventive inhibitors were found to arrest HIV-1 viral replication in vitro.
    Type: Application
    Filed: July 31, 2013
    Publication date: May 8, 2014
    Applicant: University of Pittsburgh - Of the Commonwealth System of Higher Education
    Inventors: Lori Emert-Sedlak, Toshiaki Kodama, Billy W. Day, Weixiang Dai, Ronald P. Trible, Thomas E. Smithgall
  • Patent number: 8541415
    Abstract: Drug candidates for inhibition of HIV-I replication can target Src family kinases (SFK), such as Hck, that interact with Nef protein of the virus. Compounds characterized by such inhibitory activity were identified via an assay for kinase activity of an SFK in a Nef:SFK complex. Illustrative of inhibitors identified using the kinase assay are various 2,3-diaminoquinaxolines and furo[2,3-d]pyrimidines. The inventive inhibitors were found to arrest HIV-I viral replication in vitro.
    Type: Grant
    Filed: May 14, 2009
    Date of Patent: September 24, 2013
    Assignee: University of Pittsburgh—of the Commonwealth System of Higher Education
    Inventors: Lori Emert-Sedlak, Toshiaki Kodama, Billy W. Day, Weixiang Dai, Ronald P. Trible, Thomas E. Smithgall
  • Publication number: 20110190241
    Abstract: Drug candidates for inhibition of HIV-I replication can target Src family kinases (SFK), such as Hck, that interact with Nef protein of the virus. Compounds characterized by such inhibitory activity were identified via an assay for kinase activity of an SFK in a Nef:SFK complex. Illustrative of inhibitors identified using the kinase assay are various 2,3-diaminoquinaxolines and furo[2,3-d]pyrimidines. The inventive inhibitors were found to arrest HIV-I viral replication in vitro.
    Type: Application
    Filed: May 14, 2009
    Publication date: August 4, 2011
    Inventors: Lori Emert-Sedlak, Toshiaki Kodama, Billy W. Day, Weixiang Dai, Ronald P. Trible, Thomas E. Smithgall
  • Patent number: 5411956
    Abstract: A lipolytic enzyme inhibitor is disclosed which comprises as an active ingredient at least one of a basic protein, a basic polypeptide and salt thereof. The inhibitor is useful as a dieting agent for the prevention of obesity and lipemia and as an additive for food and feed.
    Type: Grant
    Filed: September 24, 1992
    Date of Patent: May 2, 1995
    Assignee: Nisshin Flour Milling Co., Ltd.
    Inventors: Toshiyuki Miyazaki, Hirofumi Motoi, Toshiaki Kodama, Taturo Maeda, Takahiro Tsujita, Hiromichi Okuda
  • Patent number: 5376640
    Abstract: A method of inhibiting enzymatic hydrolysis of lipids in a mammal concerns orally administering an effective amount of a purothionin or an .epsilon.-polylysine of the formula: ##STR1## or a salt thereof, wherein n is a number of from 5 to 9, to a mammal in need thereof. Alternatively, the method concerns orally administering an .epsilon.-polylysine of the formula above or a salt thereof, wherein n is a number of from 4 to 30, to a mammal suffering from lipemia or obesity. The purothionin, .epsilon.-polylysine or salt thereof is a lipolytic enzyme inhibitor, useful as a dieting agent, an agent for the prevention of obesity and lipemia, and as an additive for food and feed.
    Type: Grant
    Filed: November 9, 1992
    Date of Patent: December 27, 1994
    Assignee: Nisshin Flour Milling Co., Ltd.
    Inventors: Toshiyuki Miyazaki, Hirofumi Motoi, Toshiaki Kodama, Taturo Maeda, Takahiro Tsujita, Hiromichi Okuda