Patents by Inventor Toshihide Yoshida

Toshihide Yoshida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9127796
    Abstract: A gasket type orifice includes a first orifice base having a through-type passage in a central area thereof, a second orifice base having in a central area thereof a through-type passage communicating with the passage of the first orifice base, and an orifice plate having an orifice hole formed in a central area thereof, wherein the orifice plate is mounted by insertion in an airtight manner between both orifice bases, and the gasket type orifice is installed in a fluid passage, in which the outer end faces of both orifice bases respectively serve as sealing faces, and an outer diameter of the second orifice base, located on the downstream side, is larger than an outer diameter of the first orifice base located on the upstream side, and an outer peripheral edge portion of an inner end face of the second orifice base serves as another sealing face.
    Type: Grant
    Filed: June 27, 2011
    Date of Patent: September 8, 2015
    Assignee: FUJIKIN INCORPORATED
    Inventors: Takashi Hirose, Tsutomu Shinohara, Toshihide Yoshida, Kohei Shigyou, Michio Yamaji
  • Patent number: 9115813
    Abstract: This invention provides a fluid control device which is capable of visually recognizing its opening and closing states with a simple configuration. The casing 3 is formed so as to be opened upward. The piston 8 is disposed at an upper end portion of a valve rod 7 such that a piston upper end portion is exposed from an opening of the casing 3 when the valve rod 7 is located at the upper position.
    Type: Grant
    Filed: December 9, 2010
    Date of Patent: August 25, 2015
    Assignee: FUJIKIN INCORPORATED
    Inventors: Takashi Hirose, Hiroshi Ogawa, Toshihide Yoshida, Kohei Shigyou
  • Publication number: 20150160662
    Abstract: A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m (P1?P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
    Type: Application
    Filed: February 19, 2015
    Publication date: June 11, 2015
    Inventors: Tadahiro Ohmi, Masahito Saito, Shoichi Hino, Tsuyoshi Shimazu, Kazuyuki Miura, Kouji Nishino, Masaaki Nagase, Katsuyuki Sugita, Kaoru Hirata, Ryousuke Dohi, Takashi Hirose, Tsutomu Shinohara, Nobukazu Ikeda, Tomokazu Imai, Toshihide Yoshida, Hisashi Tanaka
  • Patent number: 9010369
    Abstract: A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m (P1?P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: April 21, 2015
    Assignees: Fujikin Incorporated, National University Corporation Tohoku University, Tokyo Electron Ltd.
    Inventors: Tadahiro Ohmi, Masahito Saito, Shoichi Hino, Tsuyoshi Shimazu, Kazuyuki Miura, Kouji Nishino, Masaaki Nagase, Katsuyuki Sugita, Kaoru Hirata, Ryousuke Dohi, Takashi Hirose, Tsutomu Shinohara, Nobukazu Ikeda, Tomokazu Imai, Toshihide Yoshida, Hisashi Tanaka
  • Patent number: 8418714
    Abstract: A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m(P1?P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
    Type: Grant
    Filed: June 22, 2006
    Date of Patent: April 16, 2013
    Assignees: Fujikin Incorporated, National University Corporation Tohoku University, Tokyo Electron Ltd.
    Inventors: Tadahiro Ohmi, Masahito Saito, Shoichi Hino, Tsuyoshi Shimazu, Kazuyuki Miura, Kouji Nishino, Masaaki Nagase, Katsuyuki Sugita, Kaoru Hirata, Ryousuke Dohi, Takashi Hirose, Tsutomu Shinohara, Nobukazu Ikeda, Tomokazu Imai, Toshihide Yoshida, Hisashi Tanaka
  • Patent number: 8381755
    Abstract: A pressure type flow rate control reference allows the performance of flow rate calibrations of a flow rate controller on all types of gases, including corrosive gases, at low costs, and also has excellent flow rate control accuracy. The pressure type flow rate control reference includes a pressure controller for adjusting the pressure of a calibration gas from a calibration gas supply source, a first volume provided on the downstream side of a pressure controller, a first connection mouth of an uncalibrated flow rate controller provided on the downstream side of the first volume, a reference pressure type flow rate controller connected to a second connection mouth on the downstream side of the uncalibrated flow rate controller, a second volume provided on the downstream side of a reference pressure type flow rate controller, and an evacuation device provided on the downstream side of the second volume.
    Type: Grant
    Filed: May 30, 2012
    Date of Patent: February 26, 2013
    Assignees: Fujikin Incorporated, Tokyo Electron Limited
    Inventors: Shuji Moriya, Wataru Okase, Tsutomu Shinohara, Nobukazu Ikeda, Michio Yamaji, Yasutaka Hayashi, Toshihide Yoshida, Yasuyuki Omata
  • Publication number: 20130001453
    Abstract: This invention provides a fluid control device capable of making compact a fluid control device in which a valve and a limit switch are combined. A valve 6 includes a piston 26 as a moving member which includes a protruding portion protruding from an opening of a casing 21, and which linearly moves according to opening and closing of the valve 6 so as to abut against a limit switch 7. The limit switch 7 is made to face the piston 26 and is attached via a limit switch positioning unit 8 so as to be adjustable about its position. The limit switch positioning unit 8 includes a first bolt 42 fixed to a body 2, a second bolt 43 fixed to the limit switch 7, and a connection screw 44 which connects both the bolts 42, 43. The first bolt 42 and the second bolt 43 have different pitches from each other.
    Type: Application
    Filed: November 25, 2010
    Publication date: January 3, 2013
    Applicant: FUJIKIN INCORPORATED
    Inventors: Takashi Hirose, Hiroshi Ogawa, Toshihide Yoshida, Kohei Shigyou
  • Publication number: 20120319024
    Abstract: This invention provides a fluid control device which is capable of visually recognizing its opening and closing states with a simple configuration. The casing 3 is formed so as to be opened upward. The piston 8 is disposed at an upper end portion of a valve rod 7 such that a piston upper end portion is exposed from an opening of the casing 3 when the valve rod 7 is located at the upper position.
    Type: Application
    Filed: December 9, 2010
    Publication date: December 20, 2012
    Applicant: FUJIKIN INCORPORATED
    Inventors: Takashi Hirose, Hiroshi Ogawa, Toshihide Yoshida, Kohei Shigyou
  • Publication number: 20120234406
    Abstract: A pressure type flow rate control reference allows the performance of flow rate calibrations of a flow rate controller on all types of gases, including corrosive gases, at low costs, and also has excellent flow rate control accuracy. The pressure type flow rate control reference includes a pressure controller for adjusting the pressure of a calibration gas from a calibration gas supply source, a first volume provided on the downstream side of a pressure controller, a first connection mouth of an uncalibrated flow rate controller provided on the downstream side of the first volume, a reference pressure type flow rate controller connected to a second connection mouth on the downstream side of the uncalibrated flow rate controller, a second volume provided on the downstream side of a reference pressure type flow rate controller, and an evacuation device provided on the downstream side of the second volume.
    Type: Application
    Filed: May 30, 2012
    Publication date: September 20, 2012
    Applicants: TOKYO ELECTRON LIMITED, FUJIKIN INCORPORATED
    Inventors: Shuji Moriya, Wataru Okase, Tsutomu Shinohara, Nobukazu Ikeda, Michio Yamaji, Yasutaka Hayashi, Toshihide Yoshida, Yasuyuki Omata
  • Patent number: 8210022
    Abstract: A pressure type flow rate control reference allows the performance of flow rate calibrations of a flow rate controller on all types of gases, including corrosive gases, at low costs, and also has excellent flow rate control accuracy. The pressure type flow rate control reference includes a pressure controller for adjusting the pressure of a calibration gas from a calibration gas supply source, a first volume provided on the downstream side of a pressure controller, a first connection mouth of an uncalibrated flow rate controller provided on the downstream side of the first volume, a reference pressure type flow rate controller connected to a second connection mouth on the downstream side of the uncalibrated flow rate controller, a second volume provided on the downstream side of a reference pressure type flow rate controller, and an evacuation device provided on the downstream side of the second volume.
    Type: Grant
    Filed: December 11, 2008
    Date of Patent: July 3, 2012
    Assignees: Fujikin Incorporated, Tokyo Electron Limited
    Inventors: Shuji Moriya, Wataru Okase, Tsutomu Shinohara, Nobukazu Ikeda, Michio Yamaji, Yasutaka Hayashi, Toshihide Yoshida, Yasuyuki Omata
  • Publication number: 20110315905
    Abstract: A gasket type orifice includes a first orifice base having a through-type passage in a central area thereof, a second orifice base having in a central area thereof a through-type passage communicating with the passage of the first orifice base, and an orifice plate having an orifice hole formed in a central area thereof, wherein the orifice plate is mounted by insertion in an airtight manner between both orifice bases, and the gasket type orifice is installed in a fluid passage, in which the outer end faces of both orifice bases respectively serve as sealing faces, and an outer diameter of the second orifice base, located on the downstream side, is larger than an outer diameter of the first orifice base located on the upstream side, and an outer peripheral edge portion of an inner end face of the second orifice base serves as another sealing face.
    Type: Application
    Filed: June 27, 2011
    Publication date: December 29, 2011
    Applicant: FUJIKIN INCORPORATED
    Inventors: Takashi HIROSE, Tsutomu SHINOHARA, Toshihide YOSHIDA, Kohei SHIGYOU, Michio YAMAJI
  • Publication number: 20110120566
    Abstract: A fluid flow rate control method is provided that uses a flow rate range variable type pressure type flow rate control device provided with at least two or more parallel fluid passages disposed between the downstream side of a control valve of the control device and a fluid supply pipe passage, and orifices having different fluid flow rate characteristics are respectively interposed in parallel fluid passages to pass fluid in a first flow rate region through one orifice for flow rate control, and to pass fluid in a second flow rate region through at least another orifice for flow rate control. Flow rate characteristics of the respective orifices are selected so that a maximum controllable flow rate of fluid in the first flow rate region at low flow rate is smaller than 10% of a maximum controllable flow rate in the second flow rate region at high flow rate.
    Type: Application
    Filed: November 19, 2010
    Publication date: May 26, 2011
    Applicants: FUJIKIN INCORPORATED, NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY, TOKYO ELECTRON LIMITED
    Inventors: Tadahiro OHMI, Kouji NISHINO, Ryousuke DOHI, Masaaki NAGASE, Katsuyuki SUGITA, Kaoru HIRATA, Takashi HIROSE, Tsutomu SHINOHARA, Nobukazu IKEDA, Toshihide YOSHIDA, Hisashi TANAKA
  • Publication number: 20100139775
    Abstract: A pressure type flow control device enabling a reduction in size and an installation cost by accurately controlling the flow of a fluid in a wide flow range. Specifically, the flow of the fluid flowing in an orifice (8) is calculated as Qc=KP1 (K is a proportionality factor) or Qc=KP2m(P1?P2)n (K is a proportionality factor and m and n are constants) by using a pressure P1 on the upstream side of the orifice and a pressure P2 on the downstream side of the orifice. A fluid passage between the downstream side of the control valve of the flow control device and a fluid feed pipe is formed of at least two or more fluid passages positioned parallel with each other. Orifices with different fluid flow characteristics are interposed in the fluid passages positioned parallel with each other. For the control of the fluid in a small flow area, the fluid in the small flow area is allowed to flow to one orifice.
    Type: Application
    Filed: June 22, 2006
    Publication date: June 10, 2010
    Applicants: FUJIKIN INCORPORATED, NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY, TOKYO ELECTRON LTD.
    Inventors: Tadahiro Ohmi, Masahito Saito, Shoichi Hino, Tsuyoshi Shimazu, Kazuyuki Miura, Kouji Nishino, Masaaki Nagase, Katsuyuki Sugita, Kaoru Hirata, Ryousuke Dohi, Takashi Hirose, Tsutomu Shinohara, Nobukazu Ikeda, Tomokazu Imai, Toshihide Yoshida, Hisashi Tanaka
  • Publication number: 20090171507
    Abstract: An orifice changeable pressure type flow rate control apparatus comprises a valve body of a control valve for a pressure type flow rate control apparatus installed between an inlet side fitting block provided with a coupling part of a fluid supply pipe and an outlet side fitting block provided with a coupling part of a fluid takeout pipe; a fluid inlet side of the valve body and the inlet side fitting block, and a fluid outlet side of the valve body and the outlet side fitting block are detachably and hermitically connected respectively so a flow passage for gases through the control valve is formed; and, a gasket type orifice for a pressure type flow rate control apparatus is removably inserted between a gasket type orifice insertion hole provided on the outlet side of the valve body and a gasket type orifice insertion hole of the outlet side fitting block.
    Type: Application
    Filed: May 10, 2006
    Publication date: July 2, 2009
    Applicants: FUJIKIN INCORPORATED, NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
    Inventors: Tadahiro Ohmi, Kouji Nishino, Ryousuke Dohi, Nobukazu Ikeda, Masaaki Nagase, Kaoru Hirata, Katsuyuki Sugita, Tsutomu Shinohara, Takashi Hirose, Tomokazu Imai, Toshihide Yoshida, Hisashi Tanaka
  • Publication number: 20090146089
    Abstract: A pressure type flow rate control reference which allows performance of flow rate calibrations of a flow rate controller on all types of gases, including corrosive gases, at low costs, and also has excellent flow rate control accuracy. The pressure type flow rate control reference includes a pressure controller for adjusting the pressure of a calibration gas from a calibration gas supply source, a first volume provided on the downstream side of a pressure controller, a first connection mouth of an uncalibrated flow rate controller provided on the downstream side of the first volume, a reference pressure type flow rate controller connected to a second connection mouth on the downstream side of the uncalibrated flow rate controller, a second volume provided on the downstream side of a reference pressure type flow rate controller, and an evacuation device provided on the downstream side of the second volume.
    Type: Application
    Filed: December 11, 2008
    Publication date: June 11, 2009
    Applicants: FUJIKIN INCORPORATED, TOKYO ELECTRON LIMITED
    Inventors: Shuji Moriya, Wataru Okase, Tsutomu Shinohara, Nobukazu Ikeda, Michio Yamaji, Yasutaka Hayashi, Toshihide Yoshida, Yasuyuki Omata
  • Patent number: 6645229
    Abstract: Slimming device capable of effectively activating an uncoupling protein to provide a good slimming action. The slimming device physically stimulates an uncoupling protein that is responsible for thermogenesis to activate the uncoupling protein, thereby generating heat. An uncoupling protein can be effectively activated by the physical stimulation.
    Type: Grant
    Filed: December 20, 2000
    Date of Patent: November 11, 2003
    Assignees: Matsushita Electric Works, Ltd.
    Inventors: Yuko Matsumura, Yasuhiro Sato, Hideo Iwata, Toshihide Yoshida
  • Publication number: 20010014815
    Abstract: A slimming device capable of activating effectively an uncoupling protein to provide a good slimming action is disclosed. The slimming device comprises a means for a physical stimulation that comprises physically stimulating an uncoupling protein that is responsible for thermogenesis to activate the same, thereby generating the heat. An uncoupling protein can be effectively activated by the physical stimulation.
    Type: Application
    Filed: December 20, 2000
    Publication date: August 16, 2001
    Applicant: MATSUSHITA ELECTRIC WORKS, Ltd. And Toshihide YOSHIDA
    Inventors: Yuko Matsumura, Yasuhiro Sato, Hideo Iwata, Toshihide Yoshida