Abstract: When a coin-type battery is manufactured using a sealing can in which a fold portion is not provided in a side wall portion, a coin-type battery with excellent reliability, which has excellent mass productivity and sealing properties and a capacity of which has been increased by increasing a housing space in which an electrode body is housed is manufactured. An open end portion of a side wall portion of a sealing can is formed not to bend toward an inner circumference side and an outer circumference side, an edge of the open end portion is formed not to have a sharp angle, a cut off portion is formed in an inner circumference side of an upper end portion, the sealing can is fitted to a gasket an inner diameter of which is made smaller than an external diameter of the side wall portion of the sealing can, an exterior can is caulked, thereby manufacturing a coin-type battery.

Abstract: When a coin-type battery is manufactured using a sealing can in which a fold portion is not provided in a side wall portion, a coin-type battery with excellent reliability, which has excellent mass productivity and sealing properties and a capacity of which has been increased by increasing a housing space in which an electrode body is housed is manufactured. An open end portion of a side wall portion of a sealing can is formed not to bend toward an inner circumference side and an outer circumference side, an edge of the open end portion is formed not to have a sharp angle, a cut off portion is formed in an inner circumference side of an upper end portion, the sealing can is fitted to a gasket an inner diameter of which is made smaller than an external diameter of the side wall portion of the sealing can, an exterior can is caulked, thereby manufacturing a coin-type battery.

Abstract: Provided is a flat battery with a molded gasket extending from the opening edge of the seal can to the flat portion, where the gasket may be prevented from exfoliating from the inner surface of the seal can. A flat battery (1) includes: a negative electrode can (10) (exterior can) shaped as a cylinder with a bottom; a positive electrode can (20) (seal can) having a peripheral wall (22) (cylinder portion) and a flat portion (21), the positive electrode can being disposed as an inverted dish with respect to the negative electrode can (10); and a gasket (30) molded at least on an inner surface of the positive electrode can (20), extending from the opening edge of the peripheral wall (22) to the flat portion (21).

Abstract: Provided is a flat battery with a molded gasket extending from the opening edge of the seal can to the flat portion, where the gasket may be prevented from exfoliating from the inner surface of the seal can. A flat battery (1) includes: a negative electrode can (10) (exterior can) shaped as a cylinder with a bottom; a positive electrode can (20) (seal can) having a peripheral wall (22) (cylinder portion) and a flat portion (21), the positive electrode can being disposed as an inverted dish with respect to the negative electrode can (10); and a gasket (30) molded at least on an inner surface of the positive electrode can (20), extending from the opening edge of the peripheral wall (22) to the flat portion (21).

Abstract: An apparatus and method which may comprise a seed laser defining an optical cavity producing an output. An amplifier may amplify the seed laser output. A bandwidth error signal generator may provide a bandwidth error signal from measured bandwidth and a target. A bandwidth selection element, which may comprise an adjustable sized aperture external to the cavity of the seed laser may selectively alter the bandwidth of the seed laser output. A bandwidth control system may control the bandwidth control element and also selectively adjust a differential firing time between the seed laser and amplifier or another bandwidth selection actuator to cooperated (coarsely or finely) with the bandwidth selection element to control bandwidth of the laser system.

Abstract: A multi-chambered excimer or molecular halogen gas discharge laser system comprising at least one oscillator chamber and at least one amplifier chamber producing oscillator output laser light pulses that are amplified in the at least one power chamber, having a fluorine injection control system and a method of using same is disclosed, which may comprise: a halogen gas consumption estimator: estimating the amount of halogen gas that has been consumed in one of the at least one oscillator chamber based upon at least a first operating parameter of one of the least one oscillator chamber and the at least one amplifier chamber, and the difference between a second operating parameter of the at least one oscillator chamber and the at least one amplifier chamber, and estimating the amount of halogen gas that has been consumed in the other of the at least one oscillator chamber and the at least one amplifier chamber based upon at least a third operating parameter of the other of the at least one oscillator chamber and

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

Abstract: An apparatus and method which may comprise a seed laser defining an optical cavity producing an output. An amplifier may amplify the seed laser output. A bandwidth error signal generator may provide a bandwidth error signal from measured bandwidth and a target. A bandwidth selection element, which may comprise an adjustable sized aperture external to the cavity of the seed laser may selectively alter the bandwidth of the seed laser output. A bandwidth control system may control the bandwidth control element and also selectively adjust a differential firing time between the seed laser and amplifier or another bandwidth selection actuator to cooperated (coarsely or finely) with the bandwidth selection element to control bandwidth of the laser system.

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

Abstract: An automatic F2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor for monitoring the F2 consumption rates through the operating life of the laser system. These consumption rates are used by a processor programmed with an algorithm to determine F2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F2 controls for a two-chamber MOPA laser system.

Abstract: A multi-chambered excimer or molecular halogen gas discharge laser system comprising at least one oscillator chamber and at least one amplifier chamber producing oscillator output laser light pulses that are amplified in the at least one power chamber, having a fluorine injection control system and a method of using same is disclosed, which may comprise: a halogen gas consumption estimator: estimating the amount of halogen gas that has been consumed in one of the at least one oscillator chamber based upon at least a first operating parameter of one of the least one oscillator chamber and the at least one amplifier chamber, and the difference between a second operating parameter of the at least one oscillator chamber and the at least one amplifier chamber, and estimating the amount of halogen gas that has been consumed in the other of the at least one oscillator chamber and the at least one amplifier chamber based upon at least a third operating parameter of the other of the at least one oscillator chamber and

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber.

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.

Abstract: An automatic F2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor for monitoring the F2 consumption rates through the operating life of the laser system. These consumption rates are used by a processor programmed with an algorithm to determine F2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F2 controls for a two-chamber MOPA laser system.

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.

Abstract: The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz or greater. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved communication module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod.

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.