Abstract: Disclosed is a microsize driving device in which falling of track proteins from an arrangement of motor protein molecules arranged on a linear track groove provided on a substrate is suppressed and utilization of kinetic energy of track proteins as a driving energy is made possible by controlling the moving direction to a single direction. Namely, provided is a microsize driving device which comprises a substrate, an arrangement of motor protein molecules such as, for example, kinesin molecules deposited on the bottom of a linear track groove provided thereon and track proteins such as, for example, microtubules disposed thereon and is characterized in that the said linear track groove has side surfaces shaped in such a structure as to permit a linear movement of the track proteins moving in a certain specific direction but to inhibit the track proteins moving in the reverse direction thereto causing reversion for the movement in the above mentioned specific direction.

Abstract: A carborane supercluster consisting of carborane (C2B10H12) as its constituent unit expressed as a molecular formula C2mB10mH12m-x, where x is a positive integer (i.e., x=1, 2, 3, . . . ) and m is an integer greater than unity (i.e., m=2, 3, . . . ). The parameter x represents the count of removed or detached hydrogen atoms. The parameter a represents the count of the clusters linked together. To produce the supercluster, carborane (C2B10H12) is ionized in a reaction chamber to generate carborane ions and then, the carborane ions thus generated are successively reacted with the remaining neutral (i.e., non-ionized) carborane (C2B10H12), thereby generating the carborane supercluster. Preferably, the cluster of the carborane consists of at least two of o-carborane, m-carborane, and p-carborane.

Abstract: In order to provide a coating apparatus in which an edge can be fixed rigidly so as to apply a coating agent at a uniform thickness, edge units are provided which comprise edge support members and edges which are attached to the tips of the edge support members so as to slide on a flexible tape support member. The edge which is not disposed at both ends in the running direction of the flexible tape support member is fixed to the edge support member by an edge fixing member which is inserted in a direction from a bottom portion of the coating apparatus toward the edge. The edge is fixed so as to be pulled into a recessed section formed on the edge support member by the edge fixing member.

Abstract: A carborane supercluster consisting of carborane (C2B10H12) as its constituent unit expressed as a molecular formula C2mB10mH12m-x, where x is a positive integer (i.e., x=1, 2, 3, . . . ) and m is an integer greater than unity (i.e., m=2, 3, . . . ). The parameter x represents the count of removed or detached hydrogen atoms. The parameter a represents the count of the clusters linked together. To produce the supercluster, carborane (C2B10H12) is ionized in a reaction chamber to generate carborane ions and then, the carborane ions thus generated are successively reacted with the remaining neutral (i.e., non-ionized) carborane (C2B10H12), thereby generating the carborane supercluster. Preferably, the cluster of the carborane consists of at least two of o-carborane, m-carborane, and p-carborane.

Abstract: A high resolution patterning method of a resist layer is disclosed by patternwise irradiation of a resist layer with electron beam utilizing a polysubstituted triphenylene compound as the electron beam resist material, which is graphitized and made insoluble in both polar and non-polar organic solvents for electron doses greater than 2×10−3 C/cm2, and which undergoes cleavage of the adduct chains and extensive de-aromatization of the triphenylene core therefore enhancing the solubility in polar solvents only for electron doses between 3×10−4 and 2×10−3 C/cm2. The thus formed positive or negative tone resist layer is highly resistant against dry etching to ensure the utility of the method in fine patterning work for the manufacture of semiconductor devices.

Abstract: A high-resolution patterning method of a resist layer is disclosed by patternwise irradiation of the resist layer with electron beams utilizing a methanofullerene compound as the electron beam resist material, which is graphitized and made insoluble in an organic solvent by the electron beam irradiation in a dose of, for example, 1.times.10.sup.-4 C/cm.sup.2 or larger. The thus formed resist layer is highly resistant against dry etching to ensure utilizability of the method in the fine patterning work for the manufacture of semiconductor devices.

Abstract: A method of fabricating nanometric structures on a substrate by dry etching includes setting the substrate at a temperature at which condensation of etching gas products of etching gas decomposed, recombined and reacted, or products of reactions between the etching gas and substrate material starts to occur, forming condensates at specific locations on the substrate. The condensates form an etching mask for the dry etching process.

Abstract: A unique method is proposed for fine patterning of a polymeric resin film on a substrate surface or fine patterning of the substrate surface with the patterned resin film as the resist. The method comprises the steps of: (a) forming a thin film of the resin on the substrate surface; (b) pressing the resin film pattern-wise under a pressure in a specified range by using, for example, a fine needle tip so as to enhance adhesion of the resin molecules to the substrate surface; and (c) dissolving away the resin film with an organic solvent selectively in the areas where the pressure is not applied in step (c) leaving the resin in a pattern-wise area after application of the pressure. The fineness of this patterning can be extremely high to be in the molecular size order.

Abstract: A method and apparatus for trapping charged particles employs at least one central electrode. An AC voltage and a DC voltage are superimposed and are applied to the central electrode resulting in an AC electric field having an intensity which declines with an increase in the distance from the central electrode, and a DC electric field which attracts charged particles forces toward the central electrodes. Charge particles are trapped in the space outside the central electrode by these fields. A wide trapping range in terms of mass and energy can be achieved with a high trapping density. The central electrode can consist of four element electrodes which are supplied with AC voltages superimposed on a DC bias voltage in such a manner that respective adjacent element electrodes are supplied with opposite phase AC voltages.

Abstract: Minute particles are produced by holding charged nucleating particles in an electric field and supplying source particles to the region where the nucleating particles are held. The source particles adhere to the nucleating particles, thus growing minute particles with electric charges. This method permits the production of minute particles which are uniform in their mass and shape or the like. Minute particles having composite structures consisting of different kinds of substances can also be produced.

Abstract: A relative displacement among a plurality of objects is measured with a high degree of accuracy by utilizing diffraction and interference phenomena of waves through diffraction gratings formed on the objects. Forming diffraction gratings on a plurality of objects, aligned or registered with each other, a wave is made incident to the diffraction gratings, thereby diffracted waves are obtained. A phase difference of the diffracted waves is measured. As a result, relative-displacements among the plurality of objects are obtained with a high degree of accuracy.