Patents by Inventor Toshihiko Takeda
Toshihiko Takeda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12256520Abstract: A wick sheet for a vapor chamber includes a sheet body having a first body surface and a second body surface, a first vapor flow channel portion, a liquid flow channel portion provided on the second body surface, and the second vapor flow channel portion provided on the first body surface. The sheet body includes a land portion having the longitudinal direction being a first direction, and the first vapor flow channel portion is disposed around the land portion. The second vapor flow channel portion includes a vapor flow channel groove extending from one of side edges of the land portion to the other side edge in a second direction orthogonal to the first direction.Type: GrantFiled: January 8, 2021Date of Patent: March 18, 2025Assignee: DAI NIPPON PRINTING CO., LTD.Inventors: Kazunori Oda, Toshihiko Takeda, Shinichiro Takahashi, Takayuki Ota
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Publication number: 20250071941Abstract: A liquid flow path portion of a vapor chamber according to the present invention includes a plurality of main flow grooves which each extend in the first direction and through which working fluid in liquid form passes. A convex array which includes a plurality of liquid flow path convex portions arranged in the first direction via a communicating groove, is provided between a pair of the main flow grooves adjacent to each other. Each of the communicating grooves allows communication between the corresponding pair of the main flow grooves. The width of the communicating groove is larger than the width of the main flow groove.Type: ApplicationFiled: November 8, 2024Publication date: February 27, 2025Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Shinichiro TAKAHASHI, Takayuki OTA, Kiyotaka TAKEMATSU, Kenro HIRATA, Taizo HASHIMOTO, Yoko NAKAMURA, Kazunori ODA, Toshihiko TAKEDA, Terutoshi MOMOSE
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Publication number: 20250048591Abstract: A vapor chamber includes a body sheet, and a first sheet stacked on the body sheet. The body sheet includes a vapor flow channel portion through which vapor of a working fluid flows and a liquid flow channel portion which is in communication with the vapor flow channel portion and through which liquid of the working fluid flows. The vapor flow channel portion includes a vapor passage extending in a first direction. The first sheet includes a first sheet inner surface facing the body sheet and a first sheet groove provided in the first sheet inner surface. The first sheet groove is provided at a position of overlapping with the vapor passage in a plan view and extends in a direction intersecting with the first direction.Type: ApplicationFiled: December 6, 2022Publication date: February 6, 2025Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Shinichiro TAKAHASHI, Kazunori ODA, Takayuki OTA, Makoto YAMAKI, Youji KOZURU, Toshihiko TAKEDA, Shinya KIURA, Takayuki TERAUCHI, Naohiro TAKAHASHI
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Patent number: 12167571Abstract: A liquid flow path portion of a vapor chamber according to the present invention includes a plurality of main flow grooves which each extend in the first direction and through which working fluid in liquid form passes. A convex array which includes a plurality of liquid flow path convex portions arranged in the first direction via a communicating groove, is provided between a pair of the main flow grooves adjacent to each other. Each of the communicating grooves allows communication between the corresponding pair of the main flow grooves. The width of the communicating groove is larger than the width of the main flow groove.Type: GrantFiled: September 28, 2018Date of Patent: December 10, 2024Assignee: DAI NIPPON PRINTING CO., LTD.Inventors: Shinichiro Takahashi, Takayuki Ota, Kiyotaka Takematsu, Kenro Hirata, Taizo Hashimoto, Yoko Nakamura, Kazunori Oda, Toshihiko Takeda, Terutoshi Momose
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Publication number: 20240224469Abstract: A wick sheet for a vapor chamber includes a first main body surface, second main body surface, frame, and plurality of lands. A vapor passage that extends through from the first main body surface to the second main body surface. The vapor passage through which vapor of a working fluid passes is formed. A liquid channel that communicates with the vapor passage and through which a liquid working fluid passes is formed on the second main body surface side of the lands. An end of the vapor passage in an extension direction is in contact with at least one land, and a first main body surface-side channel that communicates with the vapor passage is formed in a connection region that is on the first main body surface side of the land and in which the end of the vapor passage in the extension direction is in contact with the land.Type: ApplicationFiled: April 21, 2022Publication date: July 4, 2024Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Kazunori ODA, Shinichiro TAKAHASHI, Takayuki OTA, Makoto YAMAKI, Youji KOZURU, Toshihiko TAKEDA
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Publication number: 20240172395Abstract: A wick sheet for a vapor chamber includes a first main body surface, a second main body surface located opposite the first main body surface, a frame body section, and a plurality of land sections apart from each other within the frame body section. A vapor path through which a vapor of a working fluid travels is between the plurality of land sections. A liquid flow channel section that communicates with the vapor path and through which the working fluid in a liquid form travels is at the second main body surface side of at least one of the land sections. A bridge that couples the land sections to the frame body section or that couples the land sections to each other is included. The bridge is reduced in thickness from at least one of the first main body surface side and the second main body surface side.Type: ApplicationFiled: March 9, 2022Publication date: May 23, 2024Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Kazunori ODA, Shinichiro TAKAHASHI, Toshihiko TAKEDA, Takayuki OTA, Makoto YAMAKI, Youji KOZURU
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Publication number: 20240125559Abstract: A body sheet for a vapor chamber includes a first body surface, a second body surface disposed opposite to the first body surface, and a penetration space extending from the first body surface to the second body surface. The penetration space extends in a first direction in plan view. As seen in a cross section perpendicular to the first direction, the penetration space includes a first opening positioned on the first body surface and a second opening positioned on the second body surface. The second opening extends from a region overlapping with the first opening in plan view to a position overlapping with the first groove in plan view.Type: ApplicationFiled: February 2, 2022Publication date: April 18, 2024Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Kazunori ODA, Shinichiro TAKAHASHI, Takayuki OTA, Toshihiko TAKEDA, Shinya KIURA, Makoto YAMAKI, Isao INOUE
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Publication number: 20240130083Abstract: A vapor chamber in which an enclosed space is formed, and a working fluid is sealed in this space, the enclosed space including: a plurality of condensate flow paths through which a fluid that is the working fluid in a condensing state flows; and vapor flow paths through which a vapor that is the working fluid in a vaporizing state flows, wherein each of projecting parts with which each of the vapor flow paths is provided has a projecting amount varying in an extending direction of the vapor flow paths; a pitch for opening parts that allow the vapor flow paths and the condensate flow paths to communicate varies in the extending direction of the vapor flow paths; or wall parts that separate the flow paths each have a given relationship with a transverse cross section of a given flow path.Type: ApplicationFiled: December 28, 2023Publication date: April 18, 2024Applicant: DAI NIPPON PRINTING CO.,LTD.Inventors: Shinichiro TAKAHASHI, Takayuki OTA, Kazunori ODA, Toshihiko TAKEDA, Kiyotaka TAKEMATSU, Terutoshi MOMOSE, Yoko NAKAMURA
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Publication number: 20240130081Abstract: A vapor chamber includes a main body sheet having a first main body surface and a second main body surface provided on an opposite side to the first main body surface, a space provided on the first main body surface of the main body sheet, a first sheet laminated on the first main body surface of the main body sheet and covering the space, and a retracted portion retracted toward the space beyond an outer periphery of the main body sheet or an outer periphery of the first sheet in a plan view.Type: ApplicationFiled: February 18, 2022Publication date: April 18, 2024Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Kazunori ODA, Takayuki OTA, Shinichiro TAKAHASHI, Toshihiko TAKEDA, Kohei OZAWA, Hiroshi KOI
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Patent number: 11903167Abstract: A vapor chamber in which an enclosed space is formed, and a working fluid is sealed in this space, the enclosed space including: a plurality of condensate flow paths through which a fluid that is the working fluid in a condensing state flows; and vapor flow paths through which a vapor that is the working fluid in a vaporizing state flows, wherein each of projecting parts with which each of the vapor flow paths is provided has a projecting amount varying in an extending direction of the vapor flow paths; a pitch for opening parts that allow the vapor flow paths and the condensate flow paths to communicate varies in the extending direction of the vapor flow paths; or wall parts that separate the flow paths each have a given relationship with a transverse cross section of a given flow path.Type: GrantFiled: May 30, 2019Date of Patent: February 13, 2024Assignee: DAI NIPPON PRINTING CO., LTD.Inventors: Shinichiro Takahashi, Takayuki Ota, Kazunori Oda, Toshihiko Takeda, Kiyotaka Takematsu, Terutoshi Momose, Yoko Nakamura
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Patent number: 11859913Abstract: A wick sheet for a vapor chamber is sandwiched between a first sheet and a second sheet of the vapor chamber that encloses a working fluid. The wick sheet for a vapor chamber includes a sheet body having a first body surface and a second body surface, a penetration space that penetrates the sheet body, a first groove assembly that is disposed on the second body surface and that communicates with the penetration space, and the second groove assembly that is disposed on the first body surface and that communicates with the penetration space. The flow channel cross-sectional area of a second mainstream groove of the second groove assembly is greater than the flow channel cross-sectional area of a first mainstream groove of the first groove assembly.Type: GrantFiled: September 9, 2020Date of Patent: January 2, 2024Assignee: DAI NIPPON PRINTING CO., LTD.Inventors: Kazunori Oda, Toshihiko Takeda, Shinichiro Takahashi, Takayuki Ota
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Publication number: 20230026517Abstract: A wick sheet for a vapor chamber includes a sheet body having a first body surface and a second body surface, a first vapor flow channel portion, a liquid flow channel portion provided on the second body surface, and the second vapor flow channel portion provided on the first body surface. The sheet body includes a land portion having the longitudinal direction being a first direction, and the first vapor flow channel portion is disposed around the land portion. The second vapor flow channel portion includes a vapor flow channel groove extending from one of side edges of the land portion to the other side edge in a second direction orthogonal to the first direction.Type: ApplicationFiled: January 8, 2021Publication date: January 26, 2023Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Kazunori ODA, Toshihiko TAKEDA, Shinichiro TAKAHASHI, Takayuki OTA
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Publication number: 20230006139Abstract: A step of preparing a resin plate-equipped metal mask including a metal mask in which a slit is provided and a resin plate, and a step of laser irradiation from the metal mask side to form an opening corresponding to a pattern to be produced by vapor deposition in the resin plate are included, wherein in the step of forming the opening, by using a laser mask in which an opening region corresponding to the opening and an attenuating region that is positioned in a periphery of the opening region and attenuates energy of the laser, the opening corresponding to the pattern to be produced by vapor deposition is formed with respect to the resin plate with the laser that passes through the opening region, and a thin part is formed in a periphery of the opening of the resin plate with the laser that passes through the attenuating region.Type: ApplicationFiled: September 7, 2022Publication date: January 5, 2023Applicant: Dai Nippon Printing Co., Ltd.Inventors: Yoshiko MIYADERA, Takayoshi NIRENGI, Toshihiko TAKEDA
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Patent number: 11511301Abstract: A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size increased, a method for producing a vapor deposition mask device capable of aligning the vapor deposition mask to a frame with high precision, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A metal mask provided with a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows, are stacked.Type: GrantFiled: November 18, 2020Date of Patent: November 29, 2022Assignee: Dai Nippon Printing Co., Ltd.Inventors: Yoshinori Hirobe, Yutaka Matsumoto, Masato Ushikusa, Toshihiko Takeda, Hiroyuki Nishimura, Katsunari Obata, Takashi Takekoshi
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Patent number: 11437578Abstract: A method for producing a frame-equipped vapor deposition mask sequentially includes preparing a vapor deposition mask including a metal mask having a slit and a resin mask having an opening corresponding to a pattern to be produced by vapor deposition at a position overlapping the slit, the metal mask and the resin mask being stacked, retaining a part of the vapor deposition mask by a retainer and stretching the vapor deposition mask retained by the retainer outward, and fixing the vapor deposition mask in a state of being stretched to a frame having a through hole. During stretching, any one or both adjustments of a rotating adjustment and a moving adjustment of the vapor deposition mask are performed with respect to the vapor deposition mask in the state of being stretched or with the vapor deposition mask being stretched.Type: GrantFiled: July 8, 2020Date of Patent: September 6, 2022Assignee: Dai Nippon Printing Co., Ltd.Inventors: Katsunari Obata, Toshihiko Takeda, Yoshiyuki Honma, Hideyuki Okamoto
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Publication number: 20220279678Abstract: Included are a plurality of first flow paths, and second flow paths arranged between adjacent ones of the first flow paths; and a layer including grooves constituting the first flow paths and the second flow paths, and a layer laminated on the insides of the grooves, and constituting inner surfaces of the first flow paths and the second flow paths.Type: ApplicationFiled: September 4, 2020Publication date: September 1, 2022Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Shinichiro TAKAHASHI, Takayuki OTA, Kazunori ODA, Toshihiko TAKEDA, Kiyotaka TAKEMATSU, Terutoshi MOMOSE
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Patent number: 11404640Abstract: A vapor deposition mask includes a metal mask and a resin mask having an opening. An inner wall surface for composing the opening has an inflection point in a thicknesswise cross section of the resin mask. When an intersection of a first surface, not facing the metal mask, of the resin mask and the inner wall surface is set to be a first intersection, an intersection of a second surface, facing the metal mask, of the resin mask and the inner wall surface is set to be a second intersection, and there is set a first inflection point first positioned from the first intersection toward the second intersection, an angle formed by a line connecting the first intersection and the first inflection point and the first surface is larger than an angle formed by a line connecting the first inflection point and the second intersection and the second surface.Type: GrantFiled: September 30, 2020Date of Patent: August 2, 2022Assignee: Dai Nippon Printing Co., Ltd.Inventors: Toshihiko Takeda, Katsunari Obata, Hiroshi Kawasaki
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Publication number: 20220120509Abstract: A vapor chamber having an enclosure which a working fluid is sealed in, the enclosure including: a first flow path; and a fluid flow path part that is adjacent to the first flow path.Type: ApplicationFiled: March 11, 2020Publication date: April 21, 2022Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Toshihiko TAKEDA, Kazunori ODA, Takayuki OTA, Kiyotaka TAKEMATSU, Shinichiro TAKAHASHI, Terutoshi MOMOSE, Yohei TSUGANEZAWA, Yoko NAKAMURA
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Publication number: 20210392781Abstract: A wick sheet for a vapor chamber is sandwiched between a first sheet and a second sheet of the vapor chamber that encloses a working fluid. The wick sheet for a vapor chamber includes a sheet body having a first body surface and a second body surface, a penetration space that penetrates the sheet body, a first groove assembly that is disposed on the second body surface and that communicates with the penetration space, and the second groove assembly that is disposed on the first body surface and that communicates with the penetration space. The flow channel cross-sectional area of a second mainstream groove of the second groove assembly is greater than the flow channel cross-sectional area of a first mainstream groove of the first groove assembly.Type: ApplicationFiled: September 9, 2020Publication date: December 16, 2021Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Kazunori ODA, Toshihiko TAKEDA, Shinichiro TAKAHASHI, Takayuki OTA
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Publication number: 20210269913Abstract: There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a method for producing a vapor deposition mask and a vapor deposition mask preparation body capable of simply producing the vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal mask 10 in which a plurality of slits 15 are provided and a resin mask 20 are stacked. Openings 25 required for composing a plurality of screens are provided in the resin mask 20. The openings 25 correspond to a pattern to be produced by vapor deposition. Each of the slits 15 is provided at a position of overlapping with an entirety of at least one screen.Type: ApplicationFiled: May 24, 2021Publication date: September 2, 2021Applicant: Dai Nippon Printing Co., Ltd.Inventors: Toshihiko Takeda, Katsunari Obata, Hiromitsu Ochiai