Abstract: The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.

Abstract: Disclosed is a scanning exposure apparatus in which laser light from an excimer laser is used and in which a reticle is illuminated by an illumination optical system with use of slit-like light. A patter of the reticle is projected onto a substrate through a projection optical system. The reticle and the substrate are relatively and scanningly moved relative to a widthwise direction of the slit shape. The illumination optical system is arranged to scan the laser light from the excimer laser and to define a secondary light source on a pupil plane of the illumination optical system. When the width of the illumination region is W (mm), the scan speed of the original and/or the substrate is V (mm/sec), and the time necessary for defining the secondary light source once is T (sec), a relation W/V=nT is satisfied, where n is an integer. This assures uniform projection of the reticle pattern on the substrate, through the scan exposure.

Abstract: In an irradiance photometer comprising a chassis having a light receiving opening formed thereon, and a light detector having a light receiving surface 3a installed in the chassis corresponding to the light receiving opening, a cylindrical portion (shading portion) for intercepting oblique incident radiation to the light receiving opening is provided on the chassis.

Abstract: An illumination system includes a light source, an emission angle preserving optical element for emitting light from the light source, at a certain emission angle, a collecting optical system for collecting the light from the emission angle preserving optical element, a pattern forming optical system having at least a diffractive optical element, for producing, on a predetermined plane, a light pattern of a desired shape having a uniform light intensity distribution, by use of light from the light collecting optical system, a multiple-beam producing system for producing a plurality of light beams, a zooming optical system for projecting the light intensity distribution on the predetermined plane, onto a light entrance surface of the multiple-beam producing system at a predetermined magnification, and an illuminating device for superposedly projecting lights from a light exit surface of the multiple-beam producing system, upon a surface to be illuminated.

Abstract: An illuminance measurement apparatus of the present invention is comprised of a chassis (20) having a detection surface (22) formed with a light receiving aperture (21) and a light receiving element having a light receiving surface arranged at a position corresponding to the light receiving aperture (21) in the chassis (20), wherein the chassis (20) is provided with a reflection surface (23) for detection light for detecting at least one of the position and posture of the detection surface (22).

Abstract: An optical unit and an optical instrument having the same, wherein the unit includes an optical element for deflecting light incident thereon toward different directions, and an attenuating device for attenuating light deflected in a predetermined direction, of the different directions.

Abstract: Disclosed is an illumination system for illuminating a surface by use of light from a light source, which includes an emission angle conserving optical unit effective to emit the light from the light source at a constant divergent angle, and a diffractive optical element for producing a desired light intensity distribution on a predetermined plane, wherein the diffractive optical element is disposed at or adjacent a position where light from the emission angle conserving optical unit is collected.

Abstract: Near-field light pumped in the vicinity of an alignment mark upon irradiating pumping light onto the alignment mark formed on the object surface is detected by a probe. Based on the near-field light detected by the probe, the position information of the object is detected.

Abstract: An illumination system includes a first optical integrator of inside reflection type, for reflecting at least a portion of received light, with its inside surface, and for defining a surface light source at or adjacent a light exit surface thereof, a second optical integrator of wavefront division type, for dividing the wavefront of received light and for defining a plurality of light sources at or adjacent a light exit surface thereof, an imaging optical system for imaging the surface light source at or adjacent a light entrance surface of the second optical integrator, and a collecting optical system for superposing light rays from the plurality of light sources one upon another, on a surface to be illuminated, wherein the imaging optical system has a variable imaging magnification.

Abstract: A method of measuring an illuminance distribution on a substrate; which is characterized in that the method comprises a step of reciprocatively moving a detecting sensor positioned on a substrate stage along a route during which the detecting sensor is intermittently stopped at a plurality of locations within an exposure region over the substrate, and, after reaching a turning location, moved to return along the route during which the detecting sensor is intermittently stopped again at these locations; in that measurement of illuminance is performed an even number of times at each location; and in that the illuminance distribution in the exposure region over the substrate is determined based not only on a measured value of illuminance obtained at each location during the forward movement of the detecting sensor but also on a measured value of illuminance obtained at each location during the returning movement of the detecting sensor.

Abstract: The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.

Abstract: The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.

Abstract: An exposure apparatus for transferring a pattern on a mask onto a photosensitized substrate by exposure, having an illumination optical system, a mask stage for moving the mask and a substrate stage for moving the substrate. An attenuator is disposed between the light source and the photosensitized substrate for attenuating the illumination beam with a variable attenuator rate. A controller controls the output power of the light source and attenuator of the illumination beam such that the exposure energy approaches a predetermined desired value. A stage controller controls the velocities at which the mask stage and the substrate stage are moved for scanning according to the difference between the exposure energy measured by the sensing system and the predetermined desired value.

Abstract: A reticle and a wafer are relatively scanned in a scanning exposure type of projection exposure apparatus so that a pattern on the reticle is transferred onto the wafer by exposure. Heat exchangers which has the Peltier device are provided on a side surface of an integrator sensor which measures the quantity of exposure to control temperature of a photosensitive surface of the integrator sensor. In a side of heat irradiation surface of the heat exchangers, cooling water is circulated so that the heat exchangers are cooled. Saturation temperature at which temperature of the photosensitive surface is saturated when an illumination beam is irradiated to the photosensitive surface is determined and then the quantity of light irradiated to the photosensitive surface is measured with the temperature of the photosensitive surface being maintained at the saturation temperature.

Abstract: A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.

Abstract: The invention relates to a projection exposure apparatus for detecting a light-intensity distribution of a spatial image of a mask pattern formed through a projection optical system. The projection exposure apparatus has a knife-edge member which is disposed on the main surface of a wafer stage such that a plane including an exposure surface of a photosensitive substrate is leveled with a light incidence surface of the knife-edge member. The knife-edge member has a transmission area for transmitting the exposure light passing through the projection optical system, a light shielding area for preventing transmission of the exposure light, and a knife-edge defined as a boundary line between the transmission area and the light shielding area. The projection exposure apparatus detects the light-intensity distribution of light from the spatial image while moving the spatial image of the mask pattern and the knife-edge of the knife-edge member relatively to each other.

Abstract: An inspection system includes a light source, a scanning device for scanning a surface to be inspected, with light from the light source, wherein the scanning device includes an optical member disposed with inclination with respect to a primary scan direction, the optical member being adapted to provide a convergent light being converged to form a spot at a distance changeable with the position of a scan, and a light receiving device for receiving scattered light from the surface.

Abstract: A device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object include an illumination optical system for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system for forming at least one interference light beam from the plurality of diffracted light beams, a detector for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.

Abstract: An apparatus for detecting foreign matter on a substrate includes an optical system for projecting a light beam onto a pellicle and a pattern surface, a first detector for detecting scattered light from foreign matter on the pattern surface, a second detector for detecting information relating to the reflectivity or the transmittance of the pellicle by detecting a light beam reflected by the pellicle, and a correction unit for correcting an output signal from the first detector using an output signal from the second detector.

Abstract: An inspection system inspecting an original with a pellicle, which system includes a light source for providing a light beam, a first detecting device for receiving light produced as a result of passage of the light beam through the pellicle, a second detecting device for receiving light produced as a result of non-passage of the light beam through the pellicle, and a processing system for determining information related to transmissivity of the pellicle, on the basis of outputs of the first and second detecting devices.