Abstract: When writing a fine pattern on a substrate applied with a resist by scanning an electron beam on the substrate such that each element of the fine pattern is completely filled by the electron beam, the rotational speed of the rotation stage is controlled so as to be fast in writing on an inner circumferential track and slow in writing on an outer circumferential track in inversely proportional to the radius of the writing position. A write control signal of the electron beam is generated based on a writing clock signal generated in association with the rotation of the rotation stage, and the number of clocks of the writing clock signal in one rotation of the rotation stage is maintained at a constant value for each track irrespective of the radius of the writing position.

Abstract: When writing elements of a fine pattern on a substrate applied with a resist by scanning an electron beam on the substrate, the electron beam is scan controlled so as to completely fill the shape of each of the elements by vibrating the electron beam rapidly in a radius direction of the rotation stage and at the same time deflecting in a direction orthogonal to the radius direction of the rotation stage faster than a rotational speed thereof, thereby sequentially writing the elements.

Abstract: An electron beam lithographic method and system for forming a micro-pattern, including servo patterns each of which comprises a plurality of recessed servo elements in a track and groove patterns each of which comprises an inter-track groove extending along the track and to be formed on a discrete track medium, on the a resist coated disc substrate by scanning the resist-coated surface with an electron beam during rotation of the disc substrate.

Abstract: An imprint mold structure of the present invention is for producing a magnetic recording medium having servo areas each of which has a preamble area where servo data for synchronization with a clock cycle is recorded, and data areas where user data is written, and contains a first convexo-concave pattern corresponding to the servo areas and a second convexo-concave pattern corresponding to the data areas, wherein a ratio L/S of a width “L” in the circumferential direction of a convex portion corresponding to a non-magnetic portion formed in the preamble area to a width “S” in the circumferential direction of a concave portion corresponding to a magnetic portion formed in the preamble area varies depending on a distance “R” from a center of the imprint mold structure to a center of a pattern unit composed of the convex portion and the concave portion in the first convexo-concave pattern.

Abstract: The present invention provides a mold structure including: a concavo-convex pattern formed on its surface, wherein the mold structure is used for transferring the concavo-convex pattern onto an imprint resist layer formed on a surface of a substrate having a thickness of 0.3 mm to 2.0 mm by placing the concavo-convex pattern against the imprint resist layer, and wherein a thickness Dm (mm) of the mold structure, a thickness Ds (mm) of the substrate and a curl amount C (mm) of the mold structure satisfy the relationship 0.01?10,000×(Dm3/Ds3)1/2×C2?250.

Abstract: There is provided a mold structure containing a substrate, and a plurality of convex portions formed in the shape of concentric circles at predetermined intervals on one surface of the substrate, wherein a cross-sectional shape of the convex portions with respect to a radial direction of the concentric circles is such that a middle width M of each of the convex portions with respect to a heightwise direction is greater than a width T of a top portion of each of the convex portions with respect to the radial direction of the concentric circles.

Abstract: Linear movement direction of the stage and the actual deflection direction of the electron beam deflected by the first command signal for deflecting the electron beam in the linear movement direction of the stage do not necessarily align with each other for reasons such as the disposition precision of the stage driving device, a lens system, and the deflecting device. Therefore, the first command signal output from the first command device is processed based on the angle between the linear movement direction of the stage driven by the stage driving device and the deflection direction of the electron beam deflected by the first command signal so that the deflection direction of the electron beam aligns with the linear movement direction of the stage. With this processed first command signal, the deflection direction of the electron beam can be changed (rotated) to align with the linear movement direction of the stage.

Abstract: An aspect of the present invention provides a master medium for perpendicular magnetic transfer, comprising: a disk-like substrate on a surface of which a plurality of protruding magnetic-layer patterns corresponding to information to be transferred to a magnetic recording medium targeted for transfer are formed. In the master medium for perpendicular magnetic transfer, a ratio of a circumferential width L of the protruding magnetic-layer patterns to a circumferential gap S between the protruding magnetic-layer patterns is L/S<1. According to the aspect of the present invention, good magnetic transfer can be performed and, therefore, a perpendicular magnetic recording medium (a slave disk) that is free from defects and has a good C/N ratio can be obtained. In addition, it is possible to perform good magnetic transfer.

Abstract: A fine pattern having first elements within track widths and second elements, which are shifted half a track pitch from the first elements, are drawn across the entire surface of a disk accurately and at high speed. A transfer pattern for a magnetic transfer master carrier is drawn by scanning an electron beam on a disk coated with resist. The first elements and the second elements, which are shifted half a track pitch such that they straddle adjacent tracks, are drawn. While the disk is rotated unidirectionally, the electron beam is deflected in the radial direction within a single track of the disk to draw the first elements. Deflection of the electron beam in the radial direction is shifted half a track, to draw the second elements that straddle adjacent tracks at the same time.

Abstract: Deflecting means, for deflecting an electron beam in a radial direction and the circumferential direction, and blanking means, for shielding irradiation of the electron beam at portions other than drawing portions, are provided. While the disk is rotated unidirectionally, the electron beam is repeatedly deflected in a figure 8 pattern, in which the electron beam is deflected toward the next deflection initiation point in the radial direction at track edge portions, such that the deflected directions toward the inner periphery of the disk and toward the outer periphery of the disk intersect each other. Parallel scanning is performed alternately toward the outer periphery and the inner periphery of the disk. Elements of a transfer pattern, having lengths which are integer multiples of a reference value, are drawn by performing scanning a number of times equal to the integer that the reference value is multiplied by.

Abstract: A master information carrier for magnetic transfer to an in-plane magnetic recording medium includes a base sheet having an irregularity pattern representing information to be transferred to an in-plane magnetic recording medium and a magnetic layer formed along the irregularity pattern. The thickness da1 of the magnetic layer on the upper surface of a protruding portion of the irregularity pattern and the thickness da2 of the magnetic layer on each of the side surfaces of the protruding portion satisfy the following condition, 0.05<da2/da1?1.3.

Abstract: The present invention provides a method of manufacturing a master disk for magnetic transfer, comprising steps of: forming a magnetic layer on the surface of a substrate on which concavo-convex patterns are formed; forming a reverse plate made of a metal plate having a prescribed thickness by electrodepositing a metal on the surface of the substrate on which the magnetic layer is formed; and exfoliating the reverse plate from the substrate and obtaining a master disk for magnetic transfer which has, on the surface thereof, patters reverse to the concavo-convex patterns and is the reverse plate in which the magnetic layer is formed on a surface of the reverse patterns.

Abstract: A method of producing a master information carrier by scanning a track a number of times. The method produces a master information carrier has a pattern of a magnetic layer representing information to be transferred to a high-density recording slave medium where the track width is not larger than 0.3 ?m. The pattern is drawn by scanning a given track a plurality of times with an electron beam whose drawing diameter is smaller than the track width.

Abstract: An electron beam lithography method for performing lithography of elements included in a pattern by scanning a disk having resist coated thereon, placed on a rotating stage which is movable in a radial direction of the disk, with an electron beam while rotating the rotating stage. The electron beam has a beam diameter smaller than a minimum width of an element shape. The electron beam is reciprocally oscillated in a circumferential direction X approximately orthogonal to a radial direction Y of the disk and deflected in the radial direction Y, thereby filling in the element shape. Lithography of the elements is sequentially performed by rotating the disk unidirectionally, and thus a desired micropattern is drawn in the entire region of the disk. A lithographic length L of the element in the circumferential direction X may be defined by amplitude of the reciprocal oscillation of the electron beam.

Abstract: A fine pattern having first elements within track widths and second elements, which are shifted half a track pitch from the first elements, are drawn across the entire surface of a disk accurately and at high speed. A transfer pattern for a magnetic transfer master carrier is drawn by scanning an electron beam on a disk coated with resist. The first elements and the second elements, which are shifted half a track pitch such that they straddle adjacent tracks, are drawn. While the disk is rotated unidirectionally, the electron beam is deflected in the radial direction within a single track of the disk to draw the first elements. Deflection of the electron beam in the radial direction is shifted half a track, to draw the second elements that straddle adjacent tracks at the same time.

Abstract: Deflecting means, for deflecting an electron beam in a radial direction and the circumferential direction, and blanking means, for shielding irradiation of the electron beam at portions other than drawing portions, are provided. While the disk is rotated unidirectionally, the electron beam is repeatedly deflected in a figure 8 pattern, in which the electron beam is deflected toward the next deflection initiation point in the radial direction at track edge portions, such that the deflected directions toward the inner periphery of the disk and toward the outer periphery of the disk intersect each other. Parallel scanning is performed alternately toward the outer periphery and the inner periphery of the disk. Elements of a transfer pattern, having lengths which are integer multiples of a reference value, are drawn by performing scanning a number of times equal to the integer that the reference value is multiplied by.

Abstract: A desired pattern of elements, including an element having a slant side intersecting a recording track, is depicted on a resist layer on a disc-like substrate. The element is depicted by causing an electron beam whose beam diameter is smaller than the minimum width of the element to scan the resist layer so that the trajectory of the beam center of the electron beam on the resist layer draws a periodic waveform traveling along an axis parallel to the recording track. The periodic waveform is drawn from a starting point which is on a valley or a peak of the waveform. Angles ?3, ?1 and ?2 satisfy the relation ?1<?3<?2.

Abstract: To improve the quality of transfer signal by reducing loss of azimuth when the magnetic transfer is performed by bringing a master carrier and a slave medium into close contact with each other and applying transfer magnetic field thereto, even if the width of track is narrowed. The master carrier 3 has a pattern which corresponds to a transfer information for high density recording and is formed of a soft magnetic layer 32 with a width W of track of 3 ?m or less, wherein the pattern is written and formed by scanning with an electron beam EB of which a writing diameter d is smaller than the width W of track, on a same track over plural times. Writing is performed approximately to a rectangular shape, whereby the loss of azimuth can be reduced and the accuracy of transfer can be enhanced.

Abstract: To improve the quality of transfer signal by reducing loss of azimuth when the magnetic transfer is performed by bringing a master carrier and a slave medium into close contact with each other and applying transfer magnetic field thereto, even if the width of track is narrowed. The master carrier 3 has a pattern which corresponds to a transfer information for high density recording and is formed of a soft magnetic layer 32 with a width W of track of 3 ?m or less, wherein the pattern is written and formed by scanning with an electron beam EB of which a writing diameter d is smaller than the width W of track, on a same track over plural times. Writing is performed approximately to a rectangular shape, whereby the loss of azimuth can be reduced and the accuracy of transfer can be enhanced.

Abstract: A master information carrier for magnetic transfer includes a base sheet which is formed of a magnetic material. The master information carrier is provided with an irregularity pattern representing information to be transferred to a magnetic recording medium and a magnetic layer formed along the irregularity pattern. The saturation magnetization Mm of the magnetic layer and the saturation magnetization Ms of the base sheet satisfy the condition 1.0<Mm/Ms<100.