Patents by Inventor Toshikazu Matsui
Toshikazu Matsui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10910394Abstract: A semiconductor memory array includes a first nonvolatile memory cell having a first charge storage layer and a first gate electrode and a second nonvolatile memory cell, adjacent to the first memory cell in a first direction, having a second charge storage layer and a second gate electrode. The first and second electrodes extend in a second direction perpendicular to the first direction, the first electrode has a first contact section extending toward the second electrode in the first direction, and the second electrode has a second contact section extending toward the first electrode in the first direction. The first and second contact positions are shifted in the second direction, respectively, and the first electrode and the first contact section are electrically separated from the second electrode and the second contact section.Type: GrantFiled: May 22, 2020Date of Patent: February 2, 2021Assignee: Renesas Electronics CorporationInventors: Tsutomu Okazaki, Akira Kato, Kan Yasui, Kyoya Nitta, Digh Hisamoto, Yasushi Ishii, Daisuke Okada, Toshihiro Tanaka, Toshikazu Matsui
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Publication number: 20200357807Abstract: A semiconductor memory array includes a first nonvolatile memory cell having a first charge storage layer and a first gate electrode and a second nonvolatile memory cell, adjacent to the first memory cell in a first direction, having a second charge storage layer and a second gate electrode. The first and second electrodes extend in a second direction perpendicular to the first direction, the first electrode has a first contact section extending toward the second electrode in the first direction, and the second electrode has a second contact section extending toward the first electrode in the first direction. The first and second contact positions are shifted in the second direction, respectively, and the first electrode and the first contact section are electrically separated from the second electrode and the second contact section.Type: ApplicationFiled: May 22, 2020Publication date: November 12, 2020Inventors: Tsutomu OKAZAKI, Akira KATO, Kan YASUI, Kyoya NITTA, Digh HISAMOTO, Yasushi ISHII, Daisuke OKADA, Toshihiro TANAKA, Toshikazu MATSUI
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Patent number: 10692878Abstract: A semiconductor memory array includes a first nonvolatile memory cell having a first charge storage layer and a first gate electrode and a second nonvolatile memory cell, adjacent to the first memory cell in a first direction, having a second charge storage layer and a second gate electrode. The first and second electrodes extend in a second direction perpendicular to the first direction, the first electrode has a first contact section extending toward the second electrode in the first direction, and the second electrode has a second contact section extending toward the first electrode in the first direction. The first and second contact positions are shifted in the second direction, respectively, and the first electrode and the first contact section are electrically separated from the second electrode and the second contact section.Type: GrantFiled: August 27, 2019Date of Patent: June 23, 2020Assignee: Renesas Electronics CorporationInventors: Tsutomu Okazaki, Akira Kato, Kan Yasui, Kyoya Nitta, Digh Hisamoto, Yasushi Ishii, Daisuke Okada, Toshihiro Tanaka, Toshikazu Matsui
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Publication number: 20190386013Abstract: A semiconductor memory array includes a first nonvolatile memory cell having a first charge storage layer and a first gate electrode and a second nonvolatile memory cell, adjacent to the first memory cell in a first direction, having a second charge storage layer and a second gate electrode. The first and second electrodes extend in a second direction perpendicular to the first direction, the first electrode has a first contact section extending toward the second electrode in the first direction, and the second electrode has a second contact section extending toward the first electrode in the first direction. The first and second contact positions are shifted in the second direction, respectively, and the first electrode and the first contact section are electrically separated from the second electrode and the second contact section.Type: ApplicationFiled: August 27, 2019Publication date: December 19, 2019Inventors: Tsutomu OKAZAKI, Akira KATO, Kan YASUI, Kyoya NITTA, Digh HISAMOTO, Yasushi ISHII, Daisuke OKADA, Toshihiro TANAKA, Toshikazu MATSUI
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Patent number: 10396089Abstract: A semiconductor memory array includes a first nonvolatile memory cell having a first charge storage layer and a first gate electrode and a second nonvolatile memory cell, adjacent to the first memory cell in a first direction, having a second charge storage layer and a second gate electrode. The first and second electrodes extend in a second direction perpendicular to the first direction, the first electrode has a first contact section extending toward the second electrode in the first direction, and the second electrode has a second contact section extending toward the first electrode in the first direction. The first and second contact positions are shifted in the second direction, respectively, and the first electrode and the first contact section are electrically separated from the second electrode and the second contact section.Type: GrantFiled: November 27, 2018Date of Patent: August 27, 2019Assignee: Renesas Electronics CorporationInventors: Tsutomu Okazaki, Daisuke Okada, Kyoya Nitta, Toshihiro Tanaka, Akira Kato, Toshikazu Matsui, Yasushi Ishii, Digh Hisamoto, Kan Yasui
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Publication number: 20190096896Abstract: A semiconductor memory array includes a first nonvolatile memory cell having a first charge storage layer and a first gate electrode and a second nonvolatile memory cell, adjacent to the first memory cell in a first direction, having a second charge storage layer and a second gate electrode. The first and second electrodes extend in a second direction perpendicular to the first direction, the first electrode has a first contact section extending toward the second electrode in the first direction, and the second electrode has a second contact section extending toward the first electrode in the first direction. The first and second contact positions are shifted in the second direction, respectively, and the first electrode and the first contact section are electrically separated from the second electrode and the second contact section.Type: ApplicationFiled: November 27, 2018Publication date: March 28, 2019Inventors: Tsutomu OKAZAKI, Daisuke OKADA, Kyoya NITTA, Toshihiro TANAKA, Akira KATO, Toshikazu MATSUI, Yasushi ISHII, Digh HISAMOTO, Kan YASUI
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Patent number: 10141324Abstract: A semiconductor memory array includes a first nonvolatile memory cell having a first charge storage layer and a first gate electrode and a second nonvolatile memory cell, adjacent to the first memory cell in a first direction, having a second charge storage layer and a second gate electrode. The first and second electrodes extend in a second direction perpendicular to the first direction, the first electrode has a first contact section extending toward the second electrode in the first direction, and the second electrode has a second contact section extending toward the first electrode in the first direction. The first and second contact positions are shifted in the second direction, respectively, and the first electrode and the first contact section are electrically separated from the second electrode and the second contact section.Type: GrantFiled: April 28, 2017Date of Patent: November 27, 2018Assignee: Renesas Electronics CorporationInventors: Tsutomu Okazaki, Daisuke Okada, Kyoya Nitta, Toshihiro Tanaka, Akira Kato, Toshikazu Matsui, Yasushi Ishii, Digh Hisamoto, Kan Yasui
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Patent number: 9755012Abstract: In connection with a semiconductor device including a capacitor element there is provided a technique capable of improving the reliability of the capacitor element. A capacitor element is formed in an element isolation region formed over a semiconductor substrate. The capacitor element includes a lower electrode and an upper electrode formed over the lower electrode through a capacitor insulating film. Basically, the lower electrode and the upper electrode are formed from polysilicon films and a cobalt silicide film formed over the surfaces of the polysilicon films. End portions of the cobalt silicide film formed over the upper electrode are spaced apart a distance from end portions of the upper electrode. Besides, end portions of the cobalt silicide film formed over the lower electrode are spaced apart a distance from boundaries between the upper electrode and the lower electrode.Type: GrantFiled: September 2, 2016Date of Patent: September 5, 2017Assignee: Renesas Electronics CorporationInventors: Yoshiyuki Kawashima, Koichi Toba, Yasushi Ishii, Toshikazu Matsui, Takashi Hashimoto
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Publication number: 20170229469Abstract: A semiconductor memory array includes a first nonvolatile memory cell having a first charge storage layer and a first gate electrode and a second nonvolatile memory cell, adjacent to the first memory cell in a first direction, having a second charge storage layer and a second gate electrode. The first and second electrodes extend in a second direction perpendicular to the first direction, the first electrode has a first contact section extending toward the second electrode in the first direction, and the second electrode has a second contact section extending toward the first electrode in the first direction. The first and second contact positions are shifted in the second direction, respectively, and the first electrode and the first contact section are electrically separated from the second electrode and the second contact section.Type: ApplicationFiled: April 28, 2017Publication date: August 10, 2017Inventors: Tsutomu OKAZAKI, Daisuke OKADA, Kyoya NITTA, Toshihiro TANAKA, Akira KATO, Toshikazu MATSUI, Yasushi ISHII, Digh HISAMOTO, Kan YASUI
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Patent number: 9640546Abstract: A semiconductor memory array includes a first nonvolatile memory cell having a first charge storage layer and a first gate electrode and a second nonvolatile memory cell, adjacent to the first memory cell in a first direction, having a second charge storage layer and a second gate electrode. The first and second electrodes extend in a second direction perpendicular to the first direction, the first electrode has a first contact section extending toward the second electrode in the first direction, and the second electrode has a second contact section extending toward the first electrode in the first direction. The first and second contact positions are shifted in the second direction, respectively, and the first electrode and the first contact section are electrically separated from the second electrode and the second contact section.Type: GrantFiled: January 30, 2015Date of Patent: May 2, 2017Assignee: Renesas Electronics CorporationInventors: Tsutomu Okazaki, Daisuke Okada, Kyoya Nitta, Toshihiro Tanaka, Akira Kato, Toshikazu Matsui, Yasushi Ishii, Digh Hisamoto, Kan Yasui
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Publication number: 20160372537Abstract: In connection with a semiconductor device including a capacitor element there is provided a technique capable of improving the reliability of the capacitor element. A capacitor element is formed in an element isolation region formed over a semiconductor substrate. The capacitor element includes a lower electrode and an upper electrode formed over the lower electrode through a capacitor insulating film. Basically, the lower electrode and the upper electrode are formed from polysilicon films and a cobalt silicide film formed over the surfaces of the polysilicon films. End portions of the cobalt silicide film formed over the upper electrode are spaced apart a distance from end portions of the upper electrode. Besides, end portions of the cobalt silicide film formed over the lower electrode are spaced apart a distance from boundaries between the upper electrode and the lower electrode.Type: ApplicationFiled: September 2, 2016Publication date: December 22, 2016Inventors: Yoshiyuki KAWASHIMA, Koichi TOBA, Yasushi ISHII, Toshikazu MATSUI, Takashi HASHIMOTO
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Patent number: 9461105Abstract: In connection with a semiconductor device including a capacitor element there is provided a technique capable of improving the reliability of the capacitor element. A capacitor element is formed in an element isolation region formed over a semiconductor substrate. The capacitor element includes a lower electrode and an upper electrode formed over the lower electrode through a capacitor insulating film. Basically, the lower electrode and the upper electrode are formed from polysilicon films and a cobalt silicide film formed over the surfaces of the polysilicon films. End portions of the cobalt silicide film formed over the upper electrode are spaced apart a distance from end portions of the upper electrode. Besides, end portions of the cobalt silicide film formed over the lower electrode are spaced apart a distance from boundaries between the upper electrode and the lower electrode.Type: GrantFiled: March 3, 2015Date of Patent: October 4, 2016Assignee: Renesas Electronics CorporationInventors: Yoshiyuki Kawashima, Koichi Toba, Yasushi Ishii, Toshikazu Matsui, Takashi Hashimoto
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Publication number: 20150171160Abstract: In connection with a semiconductor device including a capacitor element there is provided a technique capable of improving the reliability of the capacitor element. A capacitor element is formed in an element isolation region formed over a semiconductor substrate. The capacitor element includes a lower electrode and an upper electrode formed over the lower electrode through a capacitor insulating film. Basically, the lower electrode and the upper electrode are formed from polysilicon films and a cobalt silicide film formed over the surfaces of the polysilicon films. End portions of the cobalt silicide film formed over the upper electrode are spaced apart a distance from end portions of the upper electrode. Besides, end portions of the cobalt silicide film formed over the lower electrode are spaced apart a distance from boundaries between the upper electrode and the lower electrode.Type: ApplicationFiled: March 3, 2015Publication date: June 18, 2015Inventors: Yoshiyuki KAWASHIMA, Koichi TOBA, Yasushi ISHII, Toshikazu MATSUI, Takashi HASHIMOTO
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Publication number: 20150137215Abstract: A semiconductor memory array includes a first nonvolatile memory cell having a first charge storage layer and a first gate electrode and a second nonvolatile memory cell, adjacent to the first memory cell in a first direction, having a second charge storage layer and a second gate electrode. The first and second electrodes extend in a second direction perpendicular to the first direction, the first electrode has a first contact section extending toward the second electrode in the first direction, and the second electrode has a second contact section extending toward the first electrode in the first direction. The first and second contact positions are shifted in the second direction, respectively, and the first electrode and the first contact section are electrically separated from the second electrode and the second contact section.Type: ApplicationFiled: January 30, 2015Publication date: May 21, 2015Inventors: Tsutomu OKAZAKI, Daisuke OKADA, Kyoya NITTA, Toshihiro TANAKA, Akira KATO, Toshikazu MATSUI, Yasushi ISHII, Digh HISAMOTO, Kan YASUI
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Patent number: 8975678Abstract: In connection with a semiconductor device including a capacitor element there is provided a technique capable of improving the reliability of the capacitor element. A capacitor element is formed in an element isolation region formed over a semiconductor substrate. The capacitor element includes a lower electrode and an upper electrode formed over the lower electrode through a capacitor insulating film. Basically, the lower electrode and the upper electrode are formed from polysilicon films and a cobalt silicide film formed over the surfaces of the polysilicon films. End portions of the cobalt silicide film formed over the upper electrode are spaced apart a distance from end portions of the upper electrode. Besides, end portions of the cobalt silicide film formed over the lower electrode are spaced apart a distance from boundaries between the upper electrode and the lower electrode.Type: GrantFiled: April 22, 2013Date of Patent: March 10, 2015Assignee: Renesas Electronics CorporationInventors: Yoshiyuki Kawashima, Koichi Toba, Yasushi Ishii, Toshikazu Matsui, Takashi Hashimoto
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Patent number: 8963226Abstract: A semiconductor memory array includes a first nonvolatile memory cell having a first charge storage layer and a first gate electrode and a second nonvolatile memory cell, adjacent to the first memory cell in a first direction, having a second charge storage layer and a second gate electrode. The first and second electrodes extend in a second direction perpendicular to the first direction, the first electrode has a first contact section extending toward the second electrode in the first direction, and the second electrode has a second contact section extending toward the first electrode in the first direction. The first and second contact positions are shifted in the second direction, respectively, and the first electrode and the first contact section are electrically separated from the second electrode and the second contact section.Type: GrantFiled: August 20, 2013Date of Patent: February 24, 2015Assignee: Renesas Electronics CorporationInventors: Tsutomu Okazaki, Daisuke Okada, Kyoya Nitta, Toshihiro Tanaka, Akira Kato, Toshikazu Matsui, Yasushi Ishii, Digh Hisamoto, Kan Yasui
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Patent number: 8796923Abstract: The present invention aims at providing a photocathode which can improve various characteristics. In a photocathode 10, an intermediate layer 14, an underlayer 16, and a photoelectron emission layer 18 are formed in this order on a substrate 12. The photoelectron emission layer 18 contains Sb and Bi and functions to emit a photoelectron in response to light incident thereon. The photoelectron emission layer 18 contains 32 mol % or less of Bi relative to SbBi. This can dramatically improve the linearity at low temperatures.Type: GrantFiled: November 7, 2008Date of Patent: August 5, 2014Assignee: Hamamatsu Photonics K.K.Inventors: Toshikazu Matsui, Yasumasa Hamana, Kimitsugu Nakamura, Yoshihiro Ishigami, Daijiro Oguri
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Publication number: 20130334592Abstract: A semiconductor memory array includes a first nonvolatile memory cell having a first charge storage layer and a first gate electrode and a second nonvolatile memory cell, adjacent to the first memory cell in a first direction, having a second charge storage layer and a second gate electrode. The first and second electrodes extend in a second direction perpendicular to the first direction, the first electrode has a first contact section extending toward the second electrode in the first direction, and the second electrode has a second contact section extending toward the first electrode in the first direction. The first and second contact positions are shifted in the second direction, respectively, and the first electrode and the first contact section are electrically separated from the second electrode and the second contact section.Type: ApplicationFiled: August 20, 2013Publication date: December 19, 2013Applicant: Renesas Electronics CorporationInventors: Tsutomu OKAZAKI, Daisuke OKADA, Kyoya NITTA, Toshihiro TANAKA, Akira KATO, Toshikazu MATSUI, Yasushi ISHII, Digh HISAMOTO, Kan YASUI
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Publication number: 20130234289Abstract: In connection with a semiconductor device including a capacitor element there is provided a technique capable of improving the reliability of the capacitor element. A capacitor element is formed in an element isolation region formed over a semiconductor substrate. The capacitor element includes a lower electrode and an upper electrode formed over the lower electrode through a capacitor insulating film. Basically, the lower electrode and the upper electrode are formed from polysilicon films and a cobalt silicide film formed over the surfaces of the polysilicon films. End portions of the cobalt silicide film formed over the upper electrode are spaced apart a distance from end portions of the upper electrode. Besides, end portions of the cobalt silicide film formed over the lower electrode are spaced apart a distance from boundaries between the upper electrode and the lower electrode.Type: ApplicationFiled: April 22, 2013Publication date: September 12, 2013Applicant: Renesas Electronics CorporationInventors: Yoshiyuki KAWASHIMA, Koichi TOBA, Yasushi ISHII, Toshikazu MATSUI, Takashi HASHIMOTO
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Patent number: 8530958Abstract: A semiconductor device having a non-volatile memory is disclosed, whose disturb defect can be diminished or prevented. A memory cell of the non-volatile memory has a memory gate electrode formed over a main surface of a semiconductor substrate through an insulating film for charge storage. A first side wall is formed on a side face of the memory gate electrode, and at a side face of the first side wall, a second side wall is formed. On an upper surface of an n+-type semiconductor region for source in the memory cell there is formed a silicide layer whose end portion on the memory gate electrode MG side is defined by the second side wall.Type: GrantFiled: March 5, 2010Date of Patent: September 10, 2013Assignee: Renesas Electronics CorporationInventors: Koichi Toba, Yasushi Ishii, Yoshiyuki Kawashima, Satoru Machida, Munekatsu Nakagawa, Kentaro Saito, Toshikazu Matsui, Takashi Hashimoto, Kosuke Okuyama