Patents by Inventor Toshio Fujita

Toshio Fujita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240322719
    Abstract: According to an embodiment, a field winding interlayer short-circuit monitoring device comprises: an input unit configured to obtain field winding current values and field winding voltage values at a predetermined sampling cycle; a memory configured to store field winding resistance versus current characteristic curves at an abnormal state and a normal state; and a field winding resistance calculator configured to calculate a field winding resistance value by dividing the field winding voltage value by the field winding current; an average value calculator configured to calculate an average resistance value and an average current value by averaging those obtained during a predetermined time interval; and an image data generator configured to generate image data to display a predetermined number of average value data along with the field winding resistance versus current characteristic curves at the normal state and the abnormal state.
    Type: Application
    Filed: January 2, 2024
    Publication date: September 26, 2024
    Applicant: TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATION
    Inventors: Masafumi FUJITA, Yasuo KABATA, Toshio HIRANO, Yuichiro GUNJI, Masashi KOBAYASHI, Hirotada ENDO, Koji ANDO
  • Patent number: 12077244
    Abstract: A bicycle derailleur comprises a unit mounting portion, a battery mounting portion, a wireless communicator, an electrical connector, and a battery. The wireless communicator is detachably disposed at the unit mounting portion. The electrical connector receiving portion is configured to receive a connector. The battery is configured to be disposed at the battery mounting portion.
    Type: Grant
    Filed: November 23, 2022
    Date of Patent: September 3, 2024
    Assignee: SHIMANO INC.
    Inventors: Tadashi Ichida, Toshio Tetsuka, Hiroshi Matsumoto, Naoshi Fujita
  • Patent number: 11126695
    Abstract: A polymer design device according to an embodiment of the present disclosure receives a requirement for a target physical property of a desired polymer, and acquires structural information of polymers. For each polymer corresponding to the acquired structural information, the polymer design device estimates physical property information of the polymer including a mean value and a standard deviation, based on the structural information of the polymer and a regression model, and calculates a score of the polymer based on the requirement for the target physical property and based on the mean value and the standard deviation. From among the acquired structural information of the polymers, the polymer design device selects at least one polymer as the desired polymer, based on the score of each of the polymers, and outputs information of the selected at least one polymer.
    Type: Grant
    Filed: October 29, 2019
    Date of Patent: September 21, 2021
    Assignee: SHOWA DENKO K.K.
    Inventors: Takuya Minami, Yoshishige Okuno, Katsumi Murofushi, Toshio Fujita
  • Publication number: 20200142951
    Abstract: A polymer design device according to an embodiment of the present disclosure receives a requirement for a target physical property of a desired polymer, and acquires structural information of polymers. For each polymer corresponding to the acquired structural information, the polymer design device estimates physical property information of the polymer including a mean value and a standard deviation, based on the structural information of the polymer and a regression model, and calculates a score of the polymer based on the requirement for the target physical property and based on the mean value and the standard deviation. From among the acquired structural information of the polymers, the polymer design device selects at least one polymer as the desired polymer, based on the score of each of the polymers, and outputs information of the selected at least one polymer.
    Type: Application
    Filed: October 29, 2019
    Publication date: May 7, 2020
    Inventors: Takuya MINAMI, Yoshishige OKUNO, Katsumi MUROFUSHI, Toshio FUJITA
  • Patent number: 10294500
    Abstract: To provide a method for directly and efficiently producing methacrylic acid in a single step from renewable raw materials and/or biomass arising from the utilization of the renewable raw materials. Further provided is a method for producing methacrylic acid using microbes having the ability to produce methacrylic acid, from renewable raw materials and/or biomass arising from the utilization of the renewable raw materials, as a carbon source and/or energy source. The method for producing methacrylic acid enables methacrylic acid to be safely and easily produced from biomass, without using petroleum-derived raw materials, by utilizing microbes having the ability to produce methacrylic acid.
    Type: Grant
    Filed: September 10, 2013
    Date of Patent: May 21, 2019
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Eiji Sato, Michiko Yamazaki, Eiji Nakajima, Fujio Yu, Toshio Fujita, Wataru Mizunashi
  • Patent number: 9085728
    Abstract: Provided are a composition containing a quantum dot fluorescent body, a molded body of a quantum dot fluorescent body dispersion resin, a structure containing a quantum dot fluorescent body, a light-emitting device, an electronic apparatus or a mechanical device, and a method for producing the molded body. The quantum dot fluorescent body is dispersed in a cycloolefin (co)polymer, which is a dispersion resin, to form the composition containing a quantum dot fluorescent body. The composition containing the quantum dot fluorescent body is molded, forming the molded body of the quantum dot fluorescent body dispersion resin. A gas barrier layer is formed at a portion or the entirety of the surface of the molded body of the quantum dot fluorescent body dispersion resin. A light-emitting device is configured using the composition containing the quantum dot fluorescent body as a sealing material that seals an LED chip.
    Type: Grant
    Filed: January 16, 2012
    Date of Patent: July 21, 2015
    Assignee: SHOWA DENKO K.K.
    Inventors: Hiroshi Uchida, Takaki Yasuda, Toshio Fujita
  • Publication number: 20150191756
    Abstract: To provide a method for directly and efficiently producing methacrylic acid in a single step from renewable raw materials and/or biomass arising from the utilization of the renewable raw materials. Further provided is a method for producing methacrylic acid using microbes having the ability to produce methacrylic acid, from renewable raw materials and/or biomass arising from the utilization of the renewable raw materials, as a carbon source and/or energy source. The method for producing methacrylic acid enables methacrylic acid to be safely and easily produced from biomass, without using petroleum-derived raw materials, by utilizing microbes having the ability to produce methacrylic acid.
    Type: Application
    Filed: September 10, 2013
    Publication date: July 9, 2015
    Applicant: MITSUBISHI RAYON CO., LTD
    Inventors: Eiji Sato, Michiko Yamazaki, Eiji Nakajima, Fujio Yu, Toshio Fujita, Wataru Mizunashi
  • Publication number: 20130334557
    Abstract: Provided are a composition that contains a quantum dot fluorescent body and that is able to suppress quenching of the quantum dot fluorescent body, a molded body of a quantum dot fluorescent body dispersion resin, a structure containing a quantum dot fluorescent body, a light-emitting device, an electronic apparatus, or a mechanical device, and a method for producing the molded body of a quantum dot fluorescent body dispersion resin.
    Type: Application
    Filed: January 16, 2012
    Publication date: December 19, 2013
    Applicant: SHOWA DENKO K.K.
    Inventors: Hiroshi Uchida, Takaki Yasuda, Toshio Fujita
  • Publication number: 20130331531
    Abstract: According to the present invention, a novel epoxy group-containing copolymer, including a production process thereof, and an epoxy (meth)acrylate copolymer starting from the epoxy group-containing copolymer, including a production process thereof are provided. The epoxy group-containing copolymer of the present invention contains a specific epoxy group-containing repeating unit and an olefin-based repeating unit. A novel epoxy (meth)acrylate copolymer of the present invention is produced by reacting the epoxy group-containing copolymer with (meth)acrylic acid.
    Type: Application
    Filed: August 12, 2013
    Publication date: December 12, 2013
    Applicant: SHOWA DENKO K.K.
    Inventors: Hiroshi UCHIDA, Kazuhiko OOGA, Toshio FUJITA, Masanao HARA
  • Patent number: 8604150
    Abstract: The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. A curable composition for transfer materials of the present invention contains a curable silicon compound produced by subjecting a silicon compound (A) having a Si—H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group to a hydrosilylation reaction.
    Type: Grant
    Filed: November 5, 2008
    Date of Patent: December 10, 2013
    Assignee: Showa Denko K.K.
    Inventors: Katsutoshi Morinaka, Yoshikazu Arai, Hiroshi Uchida, Toshio Fujita
  • Publication number: 20130294959
    Abstract: Disclosed is a ferritic heat-resistant steel which has the following chemical composition (by weight): C: from 0.01% to less than 0.08%; Si: 0.30-1.0%; P: 0.02 or less; S: 0.010% or less; Mn: 0.2-1.2%; Ni: 0.3% or less; Cr: 8.0-11.0%; Mo: 0.1-1.2%; W: 1.0-2.5%; V: 0.10-0.30%; Nb: 0.02-0.12%; Co: 0.01-4.0%; N: 0.01-0.08%; B: not less than 0.001% and less than 0.010%; Cu: 0.3% or less; and Al: 0.010% or less, provided that the chemical composition satisfies the following equations: Mo(%)+0.5×W(%)=1.0-1.6, and C(%)+N(%)=0.02-0.15%, and which comprises a tempered martensite single-phase tissue produced by thermal refining and contains 30% by weight or less of 5 ferrite.
    Type: Application
    Filed: June 28, 2013
    Publication date: November 7, 2013
    Inventors: Toshio FUJITA, Takashi SATO, Kohji TAMURA
  • Patent number: 8541508
    Abstract: According to the present invention, a novel epoxy group-containing copolymer, including a production process thereof, and an epoxy (meth)acrylate copolymer starting from the epoxy group-containing copolymer, including a production process thereof are provided. The epoxy group-containing copolymer of the present invention contains a specific epoxy group-containing repeating unit and an olefin-based repeating unit. A novel epoxy (meth)acrylate copolymer of the present invention is produced by reacting the epoxy group-containing copolymer with (meth)acrylic acid.
    Type: Grant
    Filed: August 7, 2009
    Date of Patent: September 24, 2013
    Assignee: Showa Denko K.K.
    Inventors: Hiroshi Uchida, Kazuhiko Ooga, Toshio Fujita, Masanao Hara
  • Patent number: 8476361
    Abstract: A transfer material that can favorably form a fine pattern by nanoimprinting. The nanoimprinting transfer material is a fine pattern resin composition that includes an organosilicon compound and a metal compound of a metal from groups 3 through 14 of the periodic table.
    Type: Grant
    Filed: February 7, 2008
    Date of Patent: July 2, 2013
    Assignee: Showa Denko K.K.
    Inventors: Toshio Fujita, Hiroshi Uchida, Katsutoshi Morinaka, Katsumasa Hirose
  • Patent number: 8445609
    Abstract: An object of the present invention is to provide a method for producing an olefin polymer, with which an olefin polymer having good particle properties can be produced in high activity, fouling inside the polymerization vessel, such as a vessel wall or an impeller, can be effectively prevented, and a long-term stable operation is achieved. A method for producing an olefin polymer according to the present invention is characterized by including (co)polymerizing at least one olefin selected from the group consisting of ethylene and ?-olefins having 3 to 20 carbon atoms in a polymerization vessel in the presence of (A) a solid catalyst component for olefin polymerization, (B) an aliphatic amide, and (C) an organoaluminum compound.
    Type: Grant
    Filed: April 21, 2010
    Date of Patent: May 21, 2013
    Assignees: Mitsui Chemicals, Inc., Prime Polymer Co., Ltd.
    Inventors: Yasushi Tohi, Ken Yoshitsugu, Naoya Akiyama, Toshio Fujita, Masatoshi Chinaka
  • Patent number: 8138296
    Abstract: Novel epoxy compounds represented by the general formula: (wherein R1 and R2 each represent hydrogen, a C1-6 alkyl group or a C1-4 trialkylsilyl group, each R3 may be the same or different and each independently represents hydrogen, alkyl, aryl, aralkyl, alkenyl or fluoroalkyl, and n is 0 or a positive integer), and the general formula: (wherein R3 represents the same groups specified above, R4 represents hydrogen, a C1-6 alkyl group or a C1-4 trialkylsilyl group, and n is 0 or a positive integer), and a process for their production.
    Type: Grant
    Filed: May 30, 2007
    Date of Patent: March 20, 2012
    Assignee: Showa Denko K.K.
    Inventors: Nobutoshi Sasaki, Toshio Fujita, Hiroshi Uchida
  • Publication number: 20120041162
    Abstract: [Object] An object of the present invention is to provide a method for producing an olefin polymer, with which an olefin polymer having good particle properties can be produced in high activity, contamination inside the polymerization vessel, such as a vessel wall or an impeller, can be effectively prevented, and a long-term stable operation is achieved. [Means for Achieving the Object] A method for producing an olefin polymer according to the present invention is characterized by including (co)polymerizing at least one olefin selected from the group consisting of ethylene and ?-olefins having 3 to 20 carbon atoms in a polymerization vessel in the presence of (A) a solid catalyst component for olefin polymerization, (B) an aliphatic amide, and (C) an organoaluminum compound.
    Type: Application
    Filed: April 21, 2010
    Publication date: February 16, 2012
    Inventors: Yasushi Tohi, Ken Yoshitsugu, Naoya Akiyama, Toshio Fujita, Masatoshi Chinaka
  • Publication number: 20110144279
    Abstract: According to the present invention, a novel epoxy group-containing copolymer, including a production process thereof, and an epoxy (meth)acrylate copolymer starting from the epoxy group-containing copolymer, including a production process thereof are provided. The epoxy group-containing copolymer of the present invention contains a specific epoxy group-containing repeating unit and an olefin-based repeating unit. A novel epoxy (meth)acrylate copolymer of the present invention is produced by reacting the epoxy group-containing copolymer with (meth)acrylic acid.
    Type: Application
    Filed: August 7, 2009
    Publication date: June 16, 2011
    Applicant: SHOWA DENKO K.K.
    Inventors: Hiroshi Uchida, Kazuhiko Ooga, Toshio Fujita, Masanao Hara
  • Patent number: 7880018
    Abstract: A novel epoxy compound represented by the following general formula (I), and a production process thereof, is provided: Y—(CH2)3—Si(OR1)nR23-n??(I) (wherein, Y is represented by any of the following formulas: wherein, R1 and R2 represent alkyl groups having 1 to 5 carbon atoms, n represents an integer of 1 to 3, R3 and R4 represent hydrogen atoms, alkyl groups having 1 to 6 carbon atoms or trialkylsilyl groups having 1 to 4 carbon atoms, R5 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a trialkylsilyl group having 1 to 4 carbon atoms, R6 to R12 represent hydrogen atoms, alkyl groups having 1 to 6 carbon atoms or trialkylsilyl groups having 1 to 4 carbon atoms, and R13 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, a trialkylsilyl group having 1 to 4 carbon atoms or an aryl group).
    Type: Grant
    Filed: August 13, 2007
    Date of Patent: February 1, 2011
    Assignee: Showa Denko K.K.
    Inventors: Nobutoshi Sasaki, Toshio Fujita, Hiroshi Uchida
  • Publication number: 20110017355
    Abstract: Disclosed is a ferritic heat-resistant steel which has the following chemical composition (by weight): C: from 0.01% to less than 0.08%; Si: 0.30-1.0%; P: 0.02 or less; S: 0.010% or less; Mn: 0.2-1.2%; Ni: 0.3% or less; Cr: 8.0-11.0%; Mo: 0.1-1.2%; W: 1.0-2.5%; V: 0.10-0.30%; Nb: 0.02-0.12%; Co: 0.01-4.0%; N: 0.01-0.08%; B: not less than 0.001% and less than 0.010%; Cu: 0.3% or less; and Al: 0.010% or less, provided that the chemical composition satisfies the following equations: Mo (%)+0.5×W (%)=1.0-1.6, and C (%)+N (%)=0.02-0.15%, and which comprises a tempered martensite single-phase tissue produced by thermal refining and contains 30% by weight or less of ? ferrite.
    Type: Application
    Filed: October 8, 2010
    Publication date: January 27, 2011
    Applicants: BABCOCK-HITACHI KABUSHIKI KAISHA
    Inventors: Takashi SATO, Kohji TAMURA, Toshio FUJITA
  • Patent number: 7863461
    Abstract: Novel epoxy compounds having imide structures represented by general formula (I) or general formula (II) below, and having an allyl group in the same molecule, as well as a process for their production (wherein R1 and R2 each represent hydrogen, a C1-6 alkyl group, or a C1-4 trialkylsilyl group) (wherein R3 represents hydrogen, a C1-6 alkyl group, or a C1-4 trialkylsilyl group).
    Type: Grant
    Filed: May 17, 2007
    Date of Patent: January 4, 2011
    Assignees: Showa Denko K.K., National Institute of Advanced Industrial Science and Technology
    Inventors: Toshio Fujita, Yuji Kobayashi, Hiroshi Uchida, Nobutoshi Sasaki, Kazuhiko Sato, Masanori Ookoshi, Masao Shimizu