Patents by Inventor Toshiro Okamura

Toshiro Okamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4902551
    Abstract: Adhesion of copper to a resin layer is improved by reducing a copper oxide layer with an aqueous aldehyde solution (a) while applying a potential of -1000 mV to -400 mV to the copper oxide layer, (b) after contacting with a metal piece made of copper or a metal nobler than copper, or (c) after contacting with an aqueous solution of alkali borohydride.
    Type: Grant
    Filed: July 27, 1988
    Date of Patent: February 20, 1990
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Akishi Nakaso, Toshiro Okamura, Haruo Ogino, Tomoko Watanabe, Yuko Kimura
  • Patent number: 4859505
    Abstract: Crystallized glass roughened by using a roughening solution having a larger dissolving rate as to a non-crystalline phase compared with a crystalline phase, followed by metallizing by electroless plating shows strong adhesive strength between the crystallized glass substrate and the plated film.
    Type: Grant
    Filed: March 31, 1987
    Date of Patent: August 22, 1989
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Hajime Nakayama, Kouichi Tsuyama, Toshiro Okamura
  • Patent number: 4842899
    Abstract: A metallic film can be formed on a ceramic surface with high adhesive strength by roughening the ceramic surface by (a) dissolving and removing a vitreous substance and (b) roughening a substance constituting mainly a first surface layer, followed by conventional electroless plating.
    Type: Grant
    Filed: March 31, 1987
    Date of Patent: June 27, 1989
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Yoshiyuki Tsuru, Toshiro Okamura, Tetsuya Okishima, Masayoshi Ikeda, Masahiro Kawamura
  • Patent number: 4643793
    Abstract: A process for treating a surface of a metal such as copper with a liquid composition comprising (I) copper ions, a complexing agent, a reducing agent, a pH adjusting agent, water, and (II) a nitrogen-containing organic compound such as heterocyclic compound or containing --N.dbd. and --NH.sub.2 and/or --OH groups in its molecule can give multilayer printed wiring boards having excellent adhesive strength and line definition of inner layer copper conductors with long shelf life.
    Type: Grant
    Filed: July 1, 1985
    Date of Patent: February 17, 1987
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Akishi Nakaso, Youichi Kaneko, Toshiro Okamura, Kiyoshi Yamanoi
  • Patent number: 4557762
    Abstract: An electroless copper plating solution comprising cupric ions, a complexing agent, a reducing agent, a pH adjuster, a perfluoropolyether, a cyanide and/or .alpha.,.alpha.'-dipyridyl and/or 1,10-phenanthroline or a derivative thereof is capable of forming a deposited film with high elongation.
    Type: Grant
    Filed: July 30, 1984
    Date of Patent: December 10, 1985
    Assignee: Hitachi Chemical Company
    Inventors: Akishi Nakaso, Toshiro Okamura, Kiyoshi Yamanoi, Sumiko Nakajima
  • Patent number: 4548644
    Abstract: An electroless copper deposition solution comprising (a) cupric ions, a complexing agent for cupric ions, a reducing agent and a pH adjusting agent, (b) a polyoxyethylene ether and (c) at least one member selected from the group consisting of an inorganic cyanide and .alpha.,.alpha.'-dipyridyl can give a deposited film with high elongation.
    Type: Grant
    Filed: September 23, 1983
    Date of Patent: October 22, 1985
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Akishi Nakaso, Kiyoshi Yamanoi, Toshiro Okamura, Yoshiyuki Tsuru
  • Patent number: 4216246
    Abstract: A method of improving adhesion between the surface of a substrate and a metal deposit electrolessly plated thereon by forming a novel adhesive material layer comprising (A) a rubber material and (B) a thermosetting resin which is present in a proportion defined by the formula 20.ltoreq.(B)/(A)+(B).ltoreq.85 volume %. In the adhesive layer the thermosetting resin is dispersed, in the form of substantially spherical particles of 0.5 to 15.mu., in the continuous phase of the rubber material. The method is useful for producing printed circuit boards having a high precision and high accuracy pattern circuit. Further, the method is extremely advantageous when it is applied to the so-called photo-forming process since disappearance of the catalyst nuclei on the circuit pattern image can be eliminated.
    Type: Grant
    Filed: May 12, 1978
    Date of Patent: August 5, 1980
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Yorio Iwasaki, Toshiro Okamura, Akishi Nakaso, Nobuo Uozu, Hiroshi Takahashi