Patents by Inventor Toshiyuki Ishii

Toshiyuki Ishii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090269259
    Abstract: An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to an internal reaction passageway to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein the reaction passageway includes: a supply side passageway which is connected to the gas supply section at a central portion of the reaction vessel and flows the supply gas toward the outside while meandering in the reaction vessel; a return passageway which is connected to a downstream end of the supply side passageway and extends to the central portion of the reaction vessel; and a discharge side passageway that is disposed so as to be connected to a downstream end of the return passag
    Type: Application
    Filed: October 24, 2007
    Publication date: October 29, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Toshiyuki Ishii, Hideo Ito, Yuji Shimizu
  • Publication number: 20090246113
    Abstract: A polymer inactivation method for a polycrystalline silicon manufacturing device, wherein humidified gas such as water vapor and humidified nitrogen gas is supplied into a reacting furnace for manufacturing polycrystalline silicon to hydrolyze polymers adhered to an inner surface of the reacting furnace. It is preferable that a furnace wall of the reacting furnace is heated when the humidified gas is supplied.
    Type: Application
    Filed: March 26, 2009
    Publication date: October 1, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Toshihide Endoh, Masayuki Tebakari, Toshiyuki Ishii, Masaaki Sakaguchi
  • Publication number: 20090241838
    Abstract: A polycrystalline silicon manufacturing apparatus is provided which supplies raw gas to the inside of a reaction furnace and supplies a current from an electrode to a silicon seed rod in a state where the vertically extending silicon seed rod is uprightly stood on each of the plural electrodes disposed in a bottom plate portion of the reaction furnace so as to heat the silicon seed rod and thus to deposit polycrystalline silicon on a surface of the silicon seed rod by means of the reaction of the raw gas.
    Type: Application
    Filed: March 20, 2009
    Publication date: October 1, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Toshihide Endoh, Masayuki Tebakari, Toshiyuki Ishii, Masaaki Sakaguchi
  • Publication number: 20090238992
    Abstract: A polycrystalline silicon reactor 1 which can prevent polycrystalline silicon which deposits on the surface of an electrode 5 holding a silicon seed rod 4 from being peeled off is provided. In a polycrystalline silicon reactor 1 which applies an electric current to a silicon seed rod 4 provided within a furnace, thereby heating the silicon seed rod 4, brings a source gas supplied into the furnace into reaction, and deposits polycrystalline silicon on the surface of the silicon seed rod 4, the reactor includes, at a bottom plate 2 (furnace bottom) of the furnace, an electrode holder 10 provided so as to be electrically insulated from the bottom plate 2 (furnace bottom), and a seed rod holding electrode 15 connected to the electrode holder 10, and holding the silicon seed rod 4 toward the upside. Concavo-convex portions (male thread portion) 15B exposed to a furnace atmosphere is provided at an outer peripheral surface of the seed rod holding electrode 15.
    Type: Application
    Filed: March 18, 2009
    Publication date: September 24, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Toshihide ENDOH, Masayuki TEBAKARI, Toshiyuki ISHII, Masaaki SAKAGUCHI
  • Publication number: 20090202404
    Abstract: An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein a reaction passageway is formed in the interior of the reaction vessel, in which a plurality of small spaces partitioned by a plurality of reaction tubular walls that have different inner diameters and are substantially concentrically disposed communicate by flow penetration sections formed alternately in lower portions and upper portions of the reaction tubular walls in order from the inside, and the gas supply section and the gas discharge section are connected to the reaction passageway.
    Type: Application
    Filed: October 23, 2007
    Publication date: August 13, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Toshiyuki Ishii, Hideo Ito, Yuji Shimizu
  • Publication number: 20090201391
    Abstract: There is provided a color processing apparatus that performs color reproduction in accordance with the brightness of a subject at the time of photographing. An acquisition unit acquires image data. A setting unit sets viewing environment parameters for a plurality of luminance ranges based on a luminance histogram of the image data that is acquired. A processing unit performs color conversion processing using a color appearance model, using the viewing environment parameters that are set in accordance with the luminance of pixels of the image data that is acquired.
    Type: Application
    Filed: January 26, 2009
    Publication date: August 13, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Toshiyuki Ishii
  • Patent number: 7571702
    Abstract: A resin composition for a component of an air intake system of an internal combustion engine including the following components (1), (2), and (3): [Components] (1) polypropylene-based resin: 67 to 89 wt % (2) acid-modified polypropylene-based resin: 1 to 3 wt % (3) carbon fiber and graphite powder: 10 to 30 wt %, the relationship between the thickness and the resonance frequency of a test specimen formed of the resin composition satisfying the following expression: [Relationship between thickness and resonance frequency]resonance frequency (Hz)?(98.5×thickness (mm))+15.
    Type: Grant
    Filed: October 6, 2006
    Date of Patent: August 11, 2009
    Assignee: Toyo Roki Mfg. Co., Ltd.
    Inventors: Sueki Sugawara, Toshiyuki Ishii, Kazuyuki Iida, Taketoshi Matsumoto, Kunimoto Sugiyama, Makoto Nakamichi
  • Publication number: 20090188532
    Abstract: In a reactor cleaning apparatus 1 which cleans an inner wall surface 72 of a reactor 70 which generates polycrystalline silicon, a bell jar of the reactor 70 has a dual structure, a through hole 11 is formed along a vertical direction at a central portion of a substantially disc-like tray 10 placed in a horizontal state, a flange portion 13 in which an opening edge of the reactor 70 is placed is formed at an outer peripheral portion of the tray 10, a shaft 20 is provided through the through hole 11 of the tray 10 so as to be rotatable and movable in the vertical direction, a nozzle device 50 which sprays a cleaning water at high pressure in three-dimensional directions is provided at an upper end of the shaft 20, a drive mechanism 30 which rotates the shaft 20 and moves the shaft in the vertical direction is provided at a base end of the shaft 20, and steam piping 62 capable of supplying the steam within the bell jar of the reactor 70 is provided.
    Type: Application
    Filed: January 22, 2009
    Publication date: July 30, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Toshihide Endoh, Masayuki Tebakari, Toshiyuki Ishii, Masaaki Sakaguchi
  • Publication number: 20090155138
    Abstract: An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a storage container that stores the reaction vessel and the heating mechanism; a gas supply internal cylinder that supplies the supply gas in the reaction vessel; a gas discharge external cylinder that is substantially concentrically disposed outside the gas supply internal cylinder, forming a discharge passageway of the reaction product gas between an outer circumferential surface of the gas supply internal cylinder and an inner circumferential surface of the gas discharge external cylinder; and a cooling cylinder that supports the gas discharge external cylinder disposed inside thereof and includes a refrigerant passageway formed therein for circulating a refrigerant.
    Type: Application
    Filed: October 25, 2007
    Publication date: June 18, 2009
    Applicant: Mitsubishi Materials Corporation
    Inventors: Toshiyuki Ishii, Hideo Ito, Yuji Shimizu
  • Publication number: 20090155140
    Abstract: An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to an internal reaction passageway to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism having a heater that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein the heater is disposed in the center of the reaction vessel, and the reaction passageway is disposed in the periphery of the heater.
    Type: Application
    Filed: October 24, 2007
    Publication date: June 18, 2009
    Applicant: Mitsubishi Materials Corporation
    Inventors: Toshiyuki Ishii, Hideo Ito, Yuji Shimizu
  • Publication number: 20090136408
    Abstract: A polycrystalline silicon manufacturing apparatus efficiently produces high-quality polycrystalline silicon. There is provided a polycrystalline silicon manufacturing apparatus, in which a plurality of gas supplying ports 6A for ejecting raw gas upward in a reactor 1 and gas exhausting ports 7 for exhausting exhaust gas after a reaction are provided on an inner bottom of the reactor 1 in which a plurality of silicon seed rods 4 are stood, the silicon seed rods 4 are heated and the polycrystalline silicon is deposited from the raw gas on the surfaces.
    Type: Application
    Filed: November 21, 2008
    Publication date: May 28, 2009
    Applicant: Mitsubishi Materials Corporation
    Inventors: Toshihide Endoh, Masayuki Tebakari, Toshiyuki Ishii, Masaaki Sakaguchi, Naoki Hatakeyama
  • Publication number: 20090136666
    Abstract: A method for manufacturing polycrystalline silicon with high quality by effectively preventing undesired shape such as giving an rough surface to silicon rods or an irregularity in diameter of the silicon rods. The method for manufacturing polycrystalline silicon includes: an initial stabilizing step of deposition wherein a velocity of ejecting the raw material gas from the gas ejection ports is gradually increased; the shaping step wherein first the ejection velocity is increased at a rate higher than that in the stabilizing step and then the ejection velocity is gradually increased at a rate lower than the previous increasing rate; and a growing step wherein, after the shaping step, the ejection velocity is made slower than that at the end of the shaping step until the end of the deposition.
    Type: Application
    Filed: November 26, 2008
    Publication date: May 28, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Toshihide Endoh, Masayuki Tebakari, Toshiyuki Ishii, Masaaki Sakaguchi, Naoki Hatakeyama
  • Patent number: 7519612
    Abstract: An information processing system uses data processing for content. The system includes a preference-data manager for managing user's preferences concerning types of the data processing which are used for said content, a content generator for generating content by using a user-preferred type of the data processing for said content, a content storage unit for storing said content as original content and the content generated by said content generating means, and a resource manager which manages system resources and which, in response to availability of the resources, requests said content generating means to process said content.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: April 14, 2009
    Assignee: Sony Corporation
    Inventors: Yuichi Araki, Toshiyuki Ishii, Takamichi Mitsuhashi
  • Publication number: 20090081380
    Abstract: The reactor for polycrystalline silicon is a reactor for polycrystalline silicon in which a silicon seed rod installed inside the reactor is heated by supplying electricity, a raw material gas supplied inside the reactor is allowed to react, thereby producing polycrystalline silicon on the surface of the silicon seed rod, and specifically, the reactor for polycrystalline silicon is provided with a raw material gas supply port installed on the bottom of the reactor and a raw material gas supply nozzle attached to the raw material gas supply port so as to be communicatively connected and extending upward, in which the upper end of the raw material gas supply nozzle is set to a height in a range from ?10 cm to +5 cm on the basis of the upper end of the electrode which retains the silicon seed rod.
    Type: Application
    Filed: September 19, 2008
    Publication date: March 26, 2009
    Applicant: Mitsubishi Materials Corporation
    Inventors: Toshihide Endoh, Toshiyuki Ishii, Masaaki Sakaguchi, Naoki Hatakeyama
  • Publication number: 20080266313
    Abstract: In order to obtain calorimetric data close to the color appearance under an actual viewing condition, a plurality of conversion data for converting calorimetric data measured under the first geometric condition of colorimetry into that measured under the second geometric condition of colorimetry are held, and the information of a viewing illuminant and calorimetric data measured under the first geometric condition of colorimetry are obtained. Conversion data which corresponds to the information of the viewing illuminant is interpolated from the plurality of conversion data which are held. The calorimetric data measured under the first geometric condition of colorimetry is converted into that measured under the second geometric condition of colorimetry using the interpolated conversion data.
    Type: Application
    Filed: April 23, 2008
    Publication date: October 30, 2008
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Toshiyuki Ishii
  • Publication number: 20080227543
    Abstract: A plurality of first missions (mission A (M 1A), mission B (M1B), and mission C (M1C)) are set corresponding to different battle areas in a game space 2. The operations of NPCs are automatically controlled so that friend NPCs 8 and enemy NPCs 9 involved in each first mission simultaneously fight a battle in parallel. A player character 6 is automatically determined to have participated in the first mission for which the player character 6 has approached the battle area or the first mission in which the enemy NPC 9 which has been shot down by the player character 6 is involved, and individual mission support contribution points Pa, Pb, Pc, and total support contribution points Pt are increased when the player character 6 has shot down the enemy NPC 9. When the player has performed a support request operation input, the total support contribution points Pt are decreased by given points.
    Type: Application
    Filed: March 11, 2008
    Publication date: September 18, 2008
    Applicant: NAMCO BANDAI GAMES INC.
    Inventors: Satoshi Kawase, Toshiyuki Ishii
  • Publication number: 20080110429
    Abstract: A resin composition for a component of an air intake system of an internal combustion engine including the following components (1), (2), and (3): [Components] (1) polypropylene-based resin: 67 to 89 wt % (2) acid-modified polypropylene-based resin: 1 to 3 wt % (3) carbon fiber and graphite powder: 10 to 30 wt %, the relationship between the thickness and the resonance frequency of a test specimen formed of the resin composition satisfying the following expression: [Relationship between thickness and resonance frequency]resonance frequency (Hz)?(98.5×thickness (mm))+15.
    Type: Application
    Filed: October 6, 2006
    Publication date: May 15, 2008
    Applicant: TOYO ROKI MFG. CO.,LTD.
    Inventors: Sueki Sugawara, Toshiyuki Ishii, Kazuyuki Iida, Taketoshi Matsumoto, Kunimoto Sugiyama, Makoto Nakamichi
  • Publication number: 20080009580
    Abstract: A fuel cell member-forming resin composition including (1) 67 to 89 wt % of a polypropylene-based resin, (2) 1 to 3 wt % of an acid-modified polypropylene-based resin, and (3) 10 to 30 wt % of carbon fibers and a high-purity ultrathin graphite powder having an ash content of less than 0.5 wt %.
    Type: Application
    Filed: October 6, 2006
    Publication date: January 10, 2008
    Applicant: Tokyo Roki Mfg Co., Ltd
    Inventors: Sueki Sugawara, Toshiyuki Ishii, Kazuyuki Iida, Hidenori Ichikawa, Hiroyuki Muramatsu
  • Patent number: 7297406
    Abstract: The present invention relates to a cationic electrodeposition coating composition substantially free of lead compounds, which is excellent in curability and can be finish-coated with a splendid appearance, and an article coated with the composition. The invention provides a lead-free electrodeposition coating composition excellent in curability and a coated article, the composition being capable of forming a coating film, which emits less tin compounds to have no influence on appearance of a finish coating film and film performances.
    Type: Grant
    Filed: March 3, 2004
    Date of Patent: November 20, 2007
    Assignees: Honda Motor Co., Ltd., Nippon Paint Co., Ltd.
    Inventors: Hiroyuki Morishita, Katsuyoshi Kaneko, Fumiaki Niisato, Toshiyuki Ishii, Kageki Fujimoto
  • Patent number: 7294410
    Abstract: The present invention relates to a cationic electrodeposition coating composition substantially free of lead compounds, and more specifically to a method of coating an alloyed hot-dip galvanized steel plate with the composition and a coated article obtained by the method having edge portions and general surfaces excellent in corrosion resistance. The invention provides a method of coating an alloyed hotdip galvanized steel plate with a lead-free cationic electrodeposition coating composition containing a rust preventive pigment to form an electrodeposition coating film excellent in corrosion resistance, and a coated article obtained by the electrodeposition.
    Type: Grant
    Filed: March 3, 2004
    Date of Patent: November 13, 2007
    Assignees: Honda Motor Co., Ltd., Nippon Paint Co., Ltd.
    Inventors: Hiroyuki Morishita, Katsuyoshi Kaneko, Fumiaki Niisato, Toshiyuki Ishii