Patents by Inventor TRAVIS KOH

TRAVIS KOH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170162365
    Abstract: Methods and apparatus for controlling a magnetic field in a plasma chamber are provided herein. In some embodiments, a process chamber liner may include a cylindrical body, an inner electromagnetic cosine-theta (cos ?) coil ring including a first plurality of inner coils embedded in the body and configured to generate a magnetic field in a first direction, and an outer electromagnetic cosine-theta (cos ?) coil ring including a second plurality of outer coils embedded in the body and configured to generate a magnetic field in a second direction orthogonal to the first direction, wherein the outer electromagnetic cos ? coil ring is disposed concentrically about the inner electromagnetic cos ? coil ring.
    Type: Application
    Filed: February 21, 2017
    Publication date: June 8, 2017
    Inventors: STEVEN LANE, TZA-JING GUNG, KARTIK RAMASWAMY, TRAVIS KOH, JOSEPH F. AUBUCHON, YANG YANG
  • Patent number: 9659751
    Abstract: Spatial distribution of RF power delivered to plasma in a processing chamber is controlled using an arrangement of primary and secondary inductors, wherein the current through the secondary inductors affects the spatial distribution of the plasma. The secondary inductors are configured to resonate at respectively different frequencies. A first secondary inductor is selectively excited to resonance, during a first time period within a duty cycle, by delivering power to a primary inductor at the resonant frequency of the first secondary inductor. A second secondary inductor is selectively excited to resonance, during a second time period within a duty cycle, by delivering power to a primary inductor at the resonant frequency of the second secondary inductor. The secondary inductors are isolated from one another and terminated such that substantially all current that passes through them and into the plasma results from mutual inductance with a primary inductor.
    Type: Grant
    Filed: July 25, 2014
    Date of Patent: May 23, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Kartik Ramaswamy, Yang Yang, Steven Lane, Lawrence Wong, Joseph F. Aubuchon, Travis Koh
  • Patent number: 9613783
    Abstract: Methods and apparatus for controlling a magnetic field in a plasma chamber are provided herein. In some embodiments, a process chamber liner may include a cylindrical body, an inner electromagnetic cosine-theta (cos ?) coil ring including a first plurality of inner coils embedded in the body and configured to generate a magnetic field in a first direction, and an outer electromagnetic cosine-theta (cos ?) coil ring including a second plurality of outer coils embedded in the body and configured to generate a magnetic field in a second direction orthogonal to the first direction, wherein the outer electromagnetic cos ? coil ring is disposed concentrically about the inner electromagnetic cos ? coil ring.
    Type: Grant
    Filed: July 24, 2014
    Date of Patent: April 4, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Steven Lane, Tza-Jing Gung, Kartik Ramaswamy, Travis Koh, Joseph F. Aubuchon, Yang Yang
  • Publication number: 20160027616
    Abstract: Spatial distribution of RF power delivered to plasma in a processing chamber is controlled using an arrangement of primary and secondary inductors, wherein the current through the secondary inductors affects the spatial distribution of the plasma. The secondary inductors are configured to resonate at respectively different frequencies. A first secondary inductor is selectively excited to resonance, during a first time period within a duty cycle, by delivering power to a primary inductor at the resonant frequency of the first secondary inductor. A second secondary inductor is selectively excited to resonance, during a second time period within a duty cycle, by delivering power to a primary inductor at the resonant frequency of the second secondary inductor. The secondary inductors are isolated from one another and terminated such that substantially all current that passes through them and into the plasma results from mutual inductance with a primary inductor.
    Type: Application
    Filed: July 25, 2014
    Publication date: January 28, 2016
    Inventors: KARTIK RAMASWAMY, YANG YANG, STEVEN LANE, LAWRENCE WONG, JOSEPH F. AUBUCHON, TRAVIS KOH
  • Publication number: 20160027613
    Abstract: Methods and apparatus for controlling a magnetic field in a plasma chamber are provided herein. In some embodiments, a process chamber liner may include a cylindrical body, an inner electromagnetic cosine-theta (cos ?) coil ring including a first plurality of inner coils embedded in the body and configured to generate a magnetic field in a first direction, and an outer electromagnetic cosine-theta (cos ?) coil ring including a second plurality of outer coils embedded in the body and configured to generate a magnetic field in a second direction orthogonal to the first direction, wherein the outer electromagnetic cos ? coil ring is disposed concentrically about the inner electromagnetic cos ? coil ring.
    Type: Application
    Filed: July 24, 2014
    Publication date: January 28, 2016
    Inventors: STEVEN LANE, TZA-JING GUNG, KARTIK RAMASWAMY, TRAVIS KOH, JOSEPH F. AUBUCHON, YANG YANG