Patents by Inventor Tsukasa Hayashi
Tsukasa Hayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11986891Abstract: The machining method uses a tool to machine a workpiece set in a jig, the workpiece has a plate-like web part arc-shaped in plan view and a flange part bent and arranged vertically from an edge along the arc shape, the tool has an end cutting edge and a peripheral cutting edge, and the jig has a surface where the web part is placed and a contacting surface where the flange part comes into surface contact. The machining method includes: pressing the flange part against the contacting surface; cutting the flange part by the peripheral cutting edge by feeding the tool in an arc direction of the arc shape; and cutting the web part by the end cutting edge by feeding the tool in the arc direction.Type: GrantFiled: November 17, 2022Date of Patent: May 21, 2024Assignees: MITSUBISHI HEAVY INDUSTRIES, LTD., AT ROBOTICS INC.Inventors: Jun Eto, Joji Asano, Manabu Hayashi, Tsukasa Takenaka
-
Publication number: 20240159845Abstract: A diamond magneto-optical sensor includes: a diamond that includes a color center with an electronic spin and is irradiated with excitation light, and an irradiation unit that irradiates the diamond with the excitation light of the color center and electromagnetic waves for magnetic resonance, wherein the irradiation unit receives modulated light having been subjected to amplitude modulation, and a modulation frequency of the modulated light is included in a microwave frequency band.Type: ApplicationFiled: March 29, 2022Publication date: May 16, 2024Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Hiroshige DEGUCHI, Natsuo TATSUMI, Tsukasa HAYASHI, Yoshiki NISHIBAYASHI
-
Publication number: 20240118327Abstract: A diamond sensor unit includes: a diamond having a color center with electron spin; an excitation light irradiation part that irradiates the diamond with excitation light; a first patch antenna that receives electromagnetic waves; an electromagnetic wave irradiation part that irradiates the diamond with the electromagnetic waves received by the first patch antenna; a detection part that detects radiated light radiated from the color center of the diamond after the diamond is irradiated with the excitation light and the electromagnetic waves; and an optical waveguide that transmits the excitation light and the radiated light.Type: ApplicationFiled: January 26, 2022Publication date: April 11, 2024Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Yoshiki NISHIBAYASHI, Hiromi NAKANISHI, Hiroshige DEGUCHI, Tsukasa HAYASHI, Natsuo TATSUMI
-
Publication number: 20240111008Abstract: A diamond sensor unit includes: a sensor part that includes a diamond having a color center with electron spin; an irradiation part that irradiates the diamond with excitation light; a detection part that detects radiated light from the color center of the diamond; and an optical waveguide that transmits the excitation light, and the radiated light.Type: ApplicationFiled: January 26, 2022Publication date: April 4, 2024Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Yoshiki NISHIBAYASHI, Hiromi NAKANISHI, Hiroshige DEGUCHI, Tsukasa HAYASHI, Natsuo TATSUMI
-
Patent number: 9347944Abstract: Provided are a method and a kit for accurately and rapidly detecting ten types of targeting pneumonia bacteria: Streptococcus pneumoniae, Haemophilus influenzae, Mycoplasma pneumoniae, Chlamydophila pneumoniae, Legionella pneumophila, Klebsiella pneumoniae, Pseudomonas aeruginosa, Moraxella catarrhalis, methicillin-resistant Staphylococcus aureus (MRSA), and Staphylococcus aureus. A set of primer pairs directed to their respective target regions contained in the DnaJ gene, etc., of the ten types of pneumonia causative bacteria is designed for the ten bacterial strains and used to amplify gene products. A set of bacterial strain-specific probe pairs is further designed for the ten bacterial strains such that the probe pairs hybridize with the amplification products via sequences in the respective target regions differing from the sequences hybridized by the set of primer pairs.Type: GrantFiled: March 30, 2011Date of Patent: May 24, 2016Assignee: Yamaguchi Technology Licensing Organization, Ltd.Inventors: Mutsunori Shirai, Takayuki Ezaki, Tsukasa Hayashi, Takeshi Ujiiye, Makoto Ganaha, Shigekazu Yamamoto
-
Patent number: 8406972Abstract: When a read-ahead vehicle speed is calculated using an integrator and a delay element, a predetermined gain used for an integral calculation is made small if a result of the integral calculation greater than a predetermined value based on an actual vehicle speed.Type: GrantFiled: January 26, 2009Date of Patent: March 26, 2013Assignee: Jatco LtdInventors: Naohiro Yamada, Tsukasa Hayashi
-
Publication number: 20130023443Abstract: Provided are a method and a kit for accurately and rapidly detecting ten types of targeting pneumonia bacteria: Streptococcus pneumoniae, Haemophilus influenzae, Mycoplasma pneumoniae, Chlamydophila pneumoniae, Legionella pneumophila, Klebsiella pneumoniae, Pseudomonas aeruginosa, Moraxella catarrhalis, methicillin-resistant Staphylococcus aureus (MRSA), and Staphylococcus aureus. A set of primer pairs directed to their respective target regions contained in the DnaJ gene, etc., of the ten types of pneumonia causative bacteria is designed for the ten bacterial strains and used to amplify gene products. A set of bacterial strain-specific probe pairs is further designed for the ten bacterial strains such that the probe pairs hybridize with the amplification products via sequences in the respective target regions differing from the sequences hybridized by the set of primer pairs.Type: ApplicationFiled: March 30, 2011Publication date: January 24, 2013Inventors: Mutsunori Shirai, Takayuki Ezaki, Tsukasa Hayashi, Takeshi Ujiiye, Makoto Ganaha, Shigekazu Yamamoto
-
Patent number: 8321099Abstract: When an accelerator pedal opening angle is large, a target vehicle speed is calculated using a read-ahead vehicle speed and, when the accelerator pedal opening angle is small, the target gear shift ratio is calculated using an actual vehicle speed.Type: GrantFiled: January 26, 2009Date of Patent: November 27, 2012Assignee: Jatco LtdInventors: Naohiro Yamada, Tsukasa Hayashi
-
Patent number: 7988835Abstract: There are provided a method and an apparatus which form silicon dots having substantially uniform particle diameters and exhibiting a substantially uniform density distribution directly on a substrate at a low temperature. A hydrogen gas (or a hydrogen gas and a silane-containing gas) is supplied into a vacuum chamber (1) provided with a silicon sputter target (e.g., target 30), or the hydrogen gas and the silane-containing gas are supplied into the chamber (1) without arranging the silicon sputter target therein, a high-frequency power is applied to the gas(es) so that plasma is generated such that a ratio (Si(288 nm)/H?) between an emission intensity Si(288 nm) of silicon atoms at a wavelength of 288 nm and an emission intensity H? of hydrogen atoms at a wavelength of 484 nm in plasma emission is 10.0 or lower, and preferably 3.0 or lower, or 0.Type: GrantFiled: September 12, 2006Date of Patent: August 2, 2011Assignees: Nissin Electric Co., Ltd., EMD CorporationInventors: Eiji Takahashi, Takashi Mikami, Shigeaki Kishida, Kenji Kato, Atsushi Tomyo, Tsukasa Hayashi, Kiyoshi Ogata, Yuichi Setsuhara
-
Patent number: 7887677Abstract: A silicon object formation target substrate is arranged in a first chamber, a silicon sputter target is arranged in a second chamber communicated with the first chamber, plasma for chemical sputtering is formed from a hydrogen gas in the second chamber, chemical sputtering is effected on the silicon sputter target with the plasma thus formed, producing particles contributing to formation of silicon object, whereby a silicon object is formed, on the substrate, from the particles moved from the second chamber to the first chamber.Type: GrantFiled: September 21, 2006Date of Patent: February 15, 2011Assignee: Nissin Electric Co., Ltd.Inventors: Takashi Mikami, Atsushi Tomyo, Kenji Kato, Eiji Takahashi, Tsukasa Hayashi
-
Publication number: 20110004381Abstract: [Task] It is an object of the present invention to provide control device and control method for an automatic transmission which are capable of quickly converging an estimated vehicle speed 2 into a highly accurate state while an estimation response characteristic of the estimated vehicle speed 2 is secured. [Means for Solution] When a read-ahead vehicle speed is calculated using an integrator and a delay element, a predetermined gain used for an integral calculation is made small if a result of integral calculation is in excess of a predetermined value based on an actual vehicle speed.Type: ApplicationFiled: January 26, 2009Publication date: January 6, 2011Inventors: Naohiro Yamada, Tsukasa Hayashi
-
Publication number: 20100332092Abstract: It is an object of the present invention to provide control device and control method for an automatic transmission which are capable of selecting a gear shift stage which accords with an intention of a vehicle driver irrespective of an accelerator opening angle. When an accelerator pedal opening angle is large, a target vehicle speed is calculated using a read-ahead vehicle speed and, when the accelerator pedal opening angle is small, the target gear shift ratio is calculated using an actual vehicle speed.Type: ApplicationFiled: January 26, 2009Publication date: December 30, 2010Inventors: Naohiro Yamada, Tsukasa Hayashi
-
Publication number: 20080035471Abstract: A silicon object formation target substrate is arranged in a first chamber, a silicon sputter target is arranged in a second chamber communicated with the first chamber, plasma for chemical sputtering is formed from a hydrogen gas in the second chamber, chemical sputtering is effected on the silicon sputter target with the plasma thus formed, producing particles contributing to formation of silicon object, whereby a silicon object is formed, on the substrate, from the particles moved from the second chamber to the first chamber.Type: ApplicationFiled: September 21, 2006Publication date: February 14, 2008Inventors: Takashi Mikami, Atsushi Tomyo, Kenji Kato, Eiji Takahashi, Tsukasa Hayashi
-
Publication number: 20070063183Abstract: A substrate having silicon dots wherein at least one insulating layer and at least one group of silicon dots are formed on a substrate selected from a non-alkali glass substrate and a substrate made of a polymer material.Type: ApplicationFiled: September 19, 2006Publication date: March 22, 2007Inventors: Kenji Kato, Atsushi Tomyo, Eiji Takahashi, Takashi Mikami, Tsukasa Hayashi
-
Publication number: 20070056846Abstract: A substrate is accommodated in a vacuum chamber provided with a silicon sputter target, a sputtering gas (typically a hydrogen gas) is supplied into the vacuum chamber, a high-frequency power is applied to the gas to form plasma in the chamber, a bias voltage is applied to the target for control of chemical sputtering, and the chemical sputtering is effected on the target by the plasma to form silicon dots on the substrate.Type: ApplicationFiled: September 13, 2006Publication date: March 15, 2007Inventors: Eiji Takahashi, Atsushi Tomyo, Kenji Kato, Takashi Mikami, Tsukasa Hayashi
-
Publication number: 20070007123Abstract: There are provided a method and an apparatus which form silicon dots having substantially uniform particle diameters and exhibiting a substantially uniform density distribution directly on a substrate at a low temperature. A hydrogen gas (or a hydrogen gas and a silane-containing gas) is supplied into a vacuum chamber (1) provided with a silicon sputter target (e.g., target 30), or the hydrogen gas and the silane-containing gas are supplied into the chamber (1) without arranging the silicon sputter target therein, a high-frequency power is applied to the gas(es) so that plasma is generated such that a ratio (Si(288 nm)/H?) between an emission intensity Si(288 nm) of silicon atoms at a wavelength of 288 nm and an emission intensity H? of hydrogen atoms at a wavelength of 484 nm in plasma emission is 10.0 or lower, and preferably 3.0 or lower, or 0.Type: ApplicationFiled: September 12, 2006Publication date: January 11, 2007Inventors: Eiji Takahashi, Takashi Mikami, Shigeaki Kishida, Kenji Kato, Atsushi Tomyo, Tsukasa Hayashi, Kiyoshi Ogata
-
Patent number: 6365783Abstract: Provided is a process for producing alcohols or aldehydes by reacting monoolefins with carbon monoxide and hydrogen with less formation of by-products. The process comprises the step of reacting a monoolefin with carbon monoxide and hydrogen in the presence of a cobalt carbonyl catalyst until the conversion of monoolefin reaches 50-90% (the first reaction step), the step of separating unreacted monoolefin from the reaction mixture obtained in the first reaction step (the step of separation of unreacted monoolefin) and the step of reacting the separated unreacted monoolefin with carbon monoxide and hydrogen in the presence of a cobalt carbonyl catalyst (the second reaction step), wherein at least one of the first reaction step and the second reaction step is carried out in the presence of water.Type: GrantFiled: May 25, 2000Date of Patent: April 2, 2002Assignee: Kyowa Yuka Co., Ltd.Inventors: Yorozu Yokomori, Tsukasa Hayashi, Toshiaki Ogata, Junichi Yamada, Seiji Saito
-
Patent number: 6335535Abstract: A method for implanting negative hydrogen ions includes the following steps. Plasma containing hydrogen is generated. Negative hydrogen ions are generated in the plasma. An electric field is formed between the plasma and a substrate. Negative hydrogen ions from the plasma is accelerated by using the electric field so as to implant negative hydrogen ions into a predetermined depth of a substrate.Type: GrantFiled: June 25, 1999Date of Patent: January 1, 2002Assignee: Nissin Electric Co., LTDInventors: Koji Miyake, Tsukasa Hayashi, Hajime Kuwahara
-
Patent number: 6271498Abstract: A vaporizing apparatus has a vaporizing container into which a liquid raw material is introduced and which is made of metal, a heater for heating the vaporizing container to vaporize liquid introduced into the vaporizing container and a metal nozzle (an electrode) disposed in the vaporizing container in such a manner that the nozzle is electrically insulated from the vaporizing container. Moreover, the vaporizing apparatus has a cleaning-solution supply apparatus for supplying, to the inside portion of the vaporizing container, a cleaning solution for solving residues generated in the vaporizing container and a plasma generating power source for supplying high-frequency electric power to a position between the nozzle and the vaporizing container to generate plasma in the vaporizing container by using the vaporized cleaning solution.Type: GrantFiled: June 22, 1998Date of Patent: August 7, 2001Assignee: Nissin Electric Co., LTDInventors: Koji Miyake, Hajime Kuwahara, Tsukasa Hayashi
-
Patent number: 6156507Abstract: Disclosed is a specific identification method of an MRSA and MRC-NS, which is speedy, simple and reliable. Specifically, the present invention provides a diagnostic method of an MRSA or MRC-NS, which comprises performing a reaction with a sample by making combined use of a part of a mecDNA, which is an integrated adventitious DNA existing on a chromosome of the MRSA or MRC-NS and carrying an mecA gene thereon, and a part of a nucleotide sequence of a chromosomal DNA surrounding the integrated DNA; and also a diagnostic method of an MRSA or MRC-NS by PCR, LCR or hybridization, which comprises performing a reaction with a sample by using a nucleotide sequence of a chromosomal DNA surrounding an integrated site of a mecDNA in a chromosome of an MSSA or MSC-NS, wherein said method makes use of an occurrence of a negative reaction when said sample contains a mecDNA integrated therein.Type: GrantFiled: October 23, 1997Date of Patent: December 5, 2000Assignee: Kainos Laboratories, Inc.Inventors: Keiichi Hiramatsu, Teruyo Ito, Akira Awaya, Hiroie Ohno, Tsukasa Hayashi