Patents by Inventor Tsukasa Hayashi

Tsukasa Hayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11986891
    Abstract: The machining method uses a tool to machine a workpiece set in a jig, the workpiece has a plate-like web part arc-shaped in plan view and a flange part bent and arranged vertically from an edge along the arc shape, the tool has an end cutting edge and a peripheral cutting edge, and the jig has a surface where the web part is placed and a contacting surface where the flange part comes into surface contact. The machining method includes: pressing the flange part against the contacting surface; cutting the flange part by the peripheral cutting edge by feeding the tool in an arc direction of the arc shape; and cutting the web part by the end cutting edge by feeding the tool in the arc direction.
    Type: Grant
    Filed: November 17, 2022
    Date of Patent: May 21, 2024
    Assignees: MITSUBISHI HEAVY INDUSTRIES, LTD., AT ROBOTICS INC.
    Inventors: Jun Eto, Joji Asano, Manabu Hayashi, Tsukasa Takenaka
  • Publication number: 20240159845
    Abstract: A diamond magneto-optical sensor includes: a diamond that includes a color center with an electronic spin and is irradiated with excitation light, and an irradiation unit that irradiates the diamond with the excitation light of the color center and electromagnetic waves for magnetic resonance, wherein the irradiation unit receives modulated light having been subjected to amplitude modulation, and a modulation frequency of the modulated light is included in a microwave frequency band.
    Type: Application
    Filed: March 29, 2022
    Publication date: May 16, 2024
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Hiroshige DEGUCHI, Natsuo TATSUMI, Tsukasa HAYASHI, Yoshiki NISHIBAYASHI
  • Publication number: 20240118327
    Abstract: A diamond sensor unit includes: a diamond having a color center with electron spin; an excitation light irradiation part that irradiates the diamond with excitation light; a first patch antenna that receives electromagnetic waves; an electromagnetic wave irradiation part that irradiates the diamond with the electromagnetic waves received by the first patch antenna; a detection part that detects radiated light radiated from the color center of the diamond after the diamond is irradiated with the excitation light and the electromagnetic waves; and an optical waveguide that transmits the excitation light and the radiated light.
    Type: Application
    Filed: January 26, 2022
    Publication date: April 11, 2024
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Yoshiki NISHIBAYASHI, Hiromi NAKANISHI, Hiroshige DEGUCHI, Tsukasa HAYASHI, Natsuo TATSUMI
  • Publication number: 20240111008
    Abstract: A diamond sensor unit includes: a sensor part that includes a diamond having a color center with electron spin; an irradiation part that irradiates the diamond with excitation light; a detection part that detects radiated light from the color center of the diamond; and an optical waveguide that transmits the excitation light, and the radiated light.
    Type: Application
    Filed: January 26, 2022
    Publication date: April 4, 2024
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Yoshiki NISHIBAYASHI, Hiromi NAKANISHI, Hiroshige DEGUCHI, Tsukasa HAYASHI, Natsuo TATSUMI
  • Patent number: 9347944
    Abstract: Provided are a method and a kit for accurately and rapidly detecting ten types of targeting pneumonia bacteria: Streptococcus pneumoniae, Haemophilus influenzae, Mycoplasma pneumoniae, Chlamydophila pneumoniae, Legionella pneumophila, Klebsiella pneumoniae, Pseudomonas aeruginosa, Moraxella catarrhalis, methicillin-resistant Staphylococcus aureus (MRSA), and Staphylococcus aureus. A set of primer pairs directed to their respective target regions contained in the DnaJ gene, etc., of the ten types of pneumonia causative bacteria is designed for the ten bacterial strains and used to amplify gene products. A set of bacterial strain-specific probe pairs is further designed for the ten bacterial strains such that the probe pairs hybridize with the amplification products via sequences in the respective target regions differing from the sequences hybridized by the set of primer pairs.
    Type: Grant
    Filed: March 30, 2011
    Date of Patent: May 24, 2016
    Assignee: Yamaguchi Technology Licensing Organization, Ltd.
    Inventors: Mutsunori Shirai, Takayuki Ezaki, Tsukasa Hayashi, Takeshi Ujiiye, Makoto Ganaha, Shigekazu Yamamoto
  • Patent number: 8406972
    Abstract: When a read-ahead vehicle speed is calculated using an integrator and a delay element, a predetermined gain used for an integral calculation is made small if a result of the integral calculation greater than a predetermined value based on an actual vehicle speed.
    Type: Grant
    Filed: January 26, 2009
    Date of Patent: March 26, 2013
    Assignee: Jatco Ltd
    Inventors: Naohiro Yamada, Tsukasa Hayashi
  • Publication number: 20130023443
    Abstract: Provided are a method and a kit for accurately and rapidly detecting ten types of targeting pneumonia bacteria: Streptococcus pneumoniae, Haemophilus influenzae, Mycoplasma pneumoniae, Chlamydophila pneumoniae, Legionella pneumophila, Klebsiella pneumoniae, Pseudomonas aeruginosa, Moraxella catarrhalis, methicillin-resistant Staphylococcus aureus (MRSA), and Staphylococcus aureus. A set of primer pairs directed to their respective target regions contained in the DnaJ gene, etc., of the ten types of pneumonia causative bacteria is designed for the ten bacterial strains and used to amplify gene products. A set of bacterial strain-specific probe pairs is further designed for the ten bacterial strains such that the probe pairs hybridize with the amplification products via sequences in the respective target regions differing from the sequences hybridized by the set of primer pairs.
    Type: Application
    Filed: March 30, 2011
    Publication date: January 24, 2013
    Inventors: Mutsunori Shirai, Takayuki Ezaki, Tsukasa Hayashi, Takeshi Ujiiye, Makoto Ganaha, Shigekazu Yamamoto
  • Patent number: 8321099
    Abstract: When an accelerator pedal opening angle is large, a target vehicle speed is calculated using a read-ahead vehicle speed and, when the accelerator pedal opening angle is small, the target gear shift ratio is calculated using an actual vehicle speed.
    Type: Grant
    Filed: January 26, 2009
    Date of Patent: November 27, 2012
    Assignee: Jatco Ltd
    Inventors: Naohiro Yamada, Tsukasa Hayashi
  • Patent number: 7988835
    Abstract: There are provided a method and an apparatus which form silicon dots having substantially uniform particle diameters and exhibiting a substantially uniform density distribution directly on a substrate at a low temperature. A hydrogen gas (or a hydrogen gas and a silane-containing gas) is supplied into a vacuum chamber (1) provided with a silicon sputter target (e.g., target 30), or the hydrogen gas and the silane-containing gas are supplied into the chamber (1) without arranging the silicon sputter target therein, a high-frequency power is applied to the gas(es) so that plasma is generated such that a ratio (Si(288 nm)/H?) between an emission intensity Si(288 nm) of silicon atoms at a wavelength of 288 nm and an emission intensity H? of hydrogen atoms at a wavelength of 484 nm in plasma emission is 10.0 or lower, and preferably 3.0 or lower, or 0.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: August 2, 2011
    Assignees: Nissin Electric Co., Ltd., EMD Corporation
    Inventors: Eiji Takahashi, Takashi Mikami, Shigeaki Kishida, Kenji Kato, Atsushi Tomyo, Tsukasa Hayashi, Kiyoshi Ogata, Yuichi Setsuhara
  • Patent number: 7887677
    Abstract: A silicon object formation target substrate is arranged in a first chamber, a silicon sputter target is arranged in a second chamber communicated with the first chamber, plasma for chemical sputtering is formed from a hydrogen gas in the second chamber, chemical sputtering is effected on the silicon sputter target with the plasma thus formed, producing particles contributing to formation of silicon object, whereby a silicon object is formed, on the substrate, from the particles moved from the second chamber to the first chamber.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: February 15, 2011
    Assignee: Nissin Electric Co., Ltd.
    Inventors: Takashi Mikami, Atsushi Tomyo, Kenji Kato, Eiji Takahashi, Tsukasa Hayashi
  • Publication number: 20110004381
    Abstract: [Task] It is an object of the present invention to provide control device and control method for an automatic transmission which are capable of quickly converging an estimated vehicle speed 2 into a highly accurate state while an estimation response characteristic of the estimated vehicle speed 2 is secured. [Means for Solution] When a read-ahead vehicle speed is calculated using an integrator and a delay element, a predetermined gain used for an integral calculation is made small if a result of integral calculation is in excess of a predetermined value based on an actual vehicle speed.
    Type: Application
    Filed: January 26, 2009
    Publication date: January 6, 2011
    Inventors: Naohiro Yamada, Tsukasa Hayashi
  • Publication number: 20100332092
    Abstract: It is an object of the present invention to provide control device and control method for an automatic transmission which are capable of selecting a gear shift stage which accords with an intention of a vehicle driver irrespective of an accelerator opening angle. When an accelerator pedal opening angle is large, a target vehicle speed is calculated using a read-ahead vehicle speed and, when the accelerator pedal opening angle is small, the target gear shift ratio is calculated using an actual vehicle speed.
    Type: Application
    Filed: January 26, 2009
    Publication date: December 30, 2010
    Inventors: Naohiro Yamada, Tsukasa Hayashi
  • Publication number: 20080035471
    Abstract: A silicon object formation target substrate is arranged in a first chamber, a silicon sputter target is arranged in a second chamber communicated with the first chamber, plasma for chemical sputtering is formed from a hydrogen gas in the second chamber, chemical sputtering is effected on the silicon sputter target with the plasma thus formed, producing particles contributing to formation of silicon object, whereby a silicon object is formed, on the substrate, from the particles moved from the second chamber to the first chamber.
    Type: Application
    Filed: September 21, 2006
    Publication date: February 14, 2008
    Inventors: Takashi Mikami, Atsushi Tomyo, Kenji Kato, Eiji Takahashi, Tsukasa Hayashi
  • Publication number: 20070063183
    Abstract: A substrate having silicon dots wherein at least one insulating layer and at least one group of silicon dots are formed on a substrate selected from a non-alkali glass substrate and a substrate made of a polymer material.
    Type: Application
    Filed: September 19, 2006
    Publication date: March 22, 2007
    Inventors: Kenji Kato, Atsushi Tomyo, Eiji Takahashi, Takashi Mikami, Tsukasa Hayashi
  • Publication number: 20070056846
    Abstract: A substrate is accommodated in a vacuum chamber provided with a silicon sputter target, a sputtering gas (typically a hydrogen gas) is supplied into the vacuum chamber, a high-frequency power is applied to the gas to form plasma in the chamber, a bias voltage is applied to the target for control of chemical sputtering, and the chemical sputtering is effected on the target by the plasma to form silicon dots on the substrate.
    Type: Application
    Filed: September 13, 2006
    Publication date: March 15, 2007
    Inventors: Eiji Takahashi, Atsushi Tomyo, Kenji Kato, Takashi Mikami, Tsukasa Hayashi
  • Publication number: 20070007123
    Abstract: There are provided a method and an apparatus which form silicon dots having substantially uniform particle diameters and exhibiting a substantially uniform density distribution directly on a substrate at a low temperature. A hydrogen gas (or a hydrogen gas and a silane-containing gas) is supplied into a vacuum chamber (1) provided with a silicon sputter target (e.g., target 30), or the hydrogen gas and the silane-containing gas are supplied into the chamber (1) without arranging the silicon sputter target therein, a high-frequency power is applied to the gas(es) so that plasma is generated such that a ratio (Si(288 nm)/H?) between an emission intensity Si(288 nm) of silicon atoms at a wavelength of 288 nm and an emission intensity H? of hydrogen atoms at a wavelength of 484 nm in plasma emission is 10.0 or lower, and preferably 3.0 or lower, or 0.
    Type: Application
    Filed: September 12, 2006
    Publication date: January 11, 2007
    Inventors: Eiji Takahashi, Takashi Mikami, Shigeaki Kishida, Kenji Kato, Atsushi Tomyo, Tsukasa Hayashi, Kiyoshi Ogata
  • Patent number: 6365783
    Abstract: Provided is a process for producing alcohols or aldehydes by reacting monoolefins with carbon monoxide and hydrogen with less formation of by-products. The process comprises the step of reacting a monoolefin with carbon monoxide and hydrogen in the presence of a cobalt carbonyl catalyst until the conversion of monoolefin reaches 50-90% (the first reaction step), the step of separating unreacted monoolefin from the reaction mixture obtained in the first reaction step (the step of separation of unreacted monoolefin) and the step of reacting the separated unreacted monoolefin with carbon monoxide and hydrogen in the presence of a cobalt carbonyl catalyst (the second reaction step), wherein at least one of the first reaction step and the second reaction step is carried out in the presence of water.
    Type: Grant
    Filed: May 25, 2000
    Date of Patent: April 2, 2002
    Assignee: Kyowa Yuka Co., Ltd.
    Inventors: Yorozu Yokomori, Tsukasa Hayashi, Toshiaki Ogata, Junichi Yamada, Seiji Saito
  • Patent number: 6335535
    Abstract: A method for implanting negative hydrogen ions includes the following steps. Plasma containing hydrogen is generated. Negative hydrogen ions are generated in the plasma. An electric field is formed between the plasma and a substrate. Negative hydrogen ions from the plasma is accelerated by using the electric field so as to implant negative hydrogen ions into a predetermined depth of a substrate.
    Type: Grant
    Filed: June 25, 1999
    Date of Patent: January 1, 2002
    Assignee: Nissin Electric Co., LTD
    Inventors: Koji Miyake, Tsukasa Hayashi, Hajime Kuwahara
  • Patent number: 6271498
    Abstract: A vaporizing apparatus has a vaporizing container into which a liquid raw material is introduced and which is made of metal, a heater for heating the vaporizing container to vaporize liquid introduced into the vaporizing container and a metal nozzle (an electrode) disposed in the vaporizing container in such a manner that the nozzle is electrically insulated from the vaporizing container. Moreover, the vaporizing apparatus has a cleaning-solution supply apparatus for supplying, to the inside portion of the vaporizing container, a cleaning solution for solving residues generated in the vaporizing container and a plasma generating power source for supplying high-frequency electric power to a position between the nozzle and the vaporizing container to generate plasma in the vaporizing container by using the vaporized cleaning solution.
    Type: Grant
    Filed: June 22, 1998
    Date of Patent: August 7, 2001
    Assignee: Nissin Electric Co., LTD
    Inventors: Koji Miyake, Hajime Kuwahara, Tsukasa Hayashi
  • Patent number: 6156507
    Abstract: Disclosed is a specific identification method of an MRSA and MRC-NS, which is speedy, simple and reliable. Specifically, the present invention provides a diagnostic method of an MRSA or MRC-NS, which comprises performing a reaction with a sample by making combined use of a part of a mecDNA, which is an integrated adventitious DNA existing on a chromosome of the MRSA or MRC-NS and carrying an mecA gene thereon, and a part of a nucleotide sequence of a chromosomal DNA surrounding the integrated DNA; and also a diagnostic method of an MRSA or MRC-NS by PCR, LCR or hybridization, which comprises performing a reaction with a sample by using a nucleotide sequence of a chromosomal DNA surrounding an integrated site of a mecDNA in a chromosome of an MSSA or MSC-NS, wherein said method makes use of an occurrence of a negative reaction when said sample contains a mecDNA integrated therein.
    Type: Grant
    Filed: October 23, 1997
    Date of Patent: December 5, 2000
    Assignee: Kainos Laboratories, Inc.
    Inventors: Keiichi Hiramatsu, Teruyo Ito, Akira Awaya, Hiroie Ohno, Tsukasa Hayashi