Patents by Inventor Tsukasa Hayashi
Tsukasa Hayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240377485Abstract: The present invention measures, with high sensitivity, the phase difference between a plurality of physical fields. A phase difference measurement device (10) comprises: an electromagnetic irradiation unit (2) that repeatedly irradiates a quantum sensor element (1) with electromagnetic waves for manipulating an electron spin state of the quantum sensor element (1) which changes via interaction with a second physical field or a first physical field generated by an AC signal; and a phase difference measurement unit (3) that acquires a plurality of electron spin states after interaction with the second physical field or the first physical field, and measures the phase difference between a plurality of physical fields on the basis of the acquired plurality of electron spin states.Type: ApplicationFiled: October 26, 2022Publication date: November 14, 2024Applicants: Kyoto University, NISSIN ELECTRIC CO., LTD.Inventors: Norikazu MIZUOCHI, Ernst David HERBSCHLEB, Hiroki MORISHITA, Hiroya SAITO, Hiroshige DEGUCHI, Natsuo TATSUMI, Tsukasa HAYASHI
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Publication number: 20240302460Abstract: A diamond magnetic sensor unit includes: a sensor part that includes a diamond having a color center with electron spin; an excitation light irradiation part that irradiates the diamond with excitation light; and a detection part that detects radiated light from the color center of the diamond, wherein the detection part detects the radiated light caused by irradiation of the diamond with the excitation light by the excitation light irradiation part without the diamond being irradiated with electromagnetic waves, and a conductive member that is disposed 10 mm or more apart from the sensor part, and transmits the electromagnetic waves can be included.Type: ApplicationFiled: January 26, 2022Publication date: September 12, 2024Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Yoshiki NISHIBAYASHI, Hiromi NAKANISHI, Hiroshige DEGUCHI, Tsukasa HAYASHI, Natsuo TATSUMI
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Publication number: 20240175945Abstract: A diamond magneto-optical sensor includes: a diamond including a color center with an electronic spin, and a reflecting surface that reflects excitation light propagated through an optical system into the diamond, wherein the reflecting surface reflects light radiated from the color center excited by the excitation light and condenses the light in the direction of the optical system.Type: ApplicationFiled: March 29, 2022Publication date: May 30, 2024Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Hiroshige DEGUCHI, Natsuo TATSUMI, Tsukasa HAYASHI, Yoshiki NISHIBAYASHI
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Publication number: 20240168107Abstract: A diamond magneto-optical sensor includes: a diamond including a color center with an electronic spin, a transmission circuit that transmits electromagnetic waves, and an irradiation unit that irradiates the diamond with electromagnetic waves transmitted by the transmission circuit, wherein the transmission circuit includes an impedance converter that reduces or increases, with respect to the irradiation unit, the impedance of an electromagnetic source for outputting electromagnetic waves.Type: ApplicationFiled: March 29, 2022Publication date: May 23, 2024Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Hiroshige DEGUCHI, Natsuo TATSUMI, Tsukasa HAYASHI, Yoshiki NISHIBAYASHI
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Publication number: 20240159845Abstract: A diamond magneto-optical sensor includes: a diamond that includes a color center with an electronic spin and is irradiated with excitation light, and an irradiation unit that irradiates the diamond with the excitation light of the color center and electromagnetic waves for magnetic resonance, wherein the irradiation unit receives modulated light having been subjected to amplitude modulation, and a modulation frequency of the modulated light is included in a microwave frequency band.Type: ApplicationFiled: March 29, 2022Publication date: May 16, 2024Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Hiroshige DEGUCHI, Natsuo TATSUMI, Tsukasa HAYASHI, Yoshiki NISHIBAYASHI
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Publication number: 20240118327Abstract: A diamond sensor unit includes: a diamond having a color center with electron spin; an excitation light irradiation part that irradiates the diamond with excitation light; a first patch antenna that receives electromagnetic waves; an electromagnetic wave irradiation part that irradiates the diamond with the electromagnetic waves received by the first patch antenna; a detection part that detects radiated light radiated from the color center of the diamond after the diamond is irradiated with the excitation light and the electromagnetic waves; and an optical waveguide that transmits the excitation light and the radiated light.Type: ApplicationFiled: January 26, 2022Publication date: April 11, 2024Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Yoshiki NISHIBAYASHI, Hiromi NAKANISHI, Hiroshige DEGUCHI, Tsukasa HAYASHI, Natsuo TATSUMI
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Publication number: 20240111008Abstract: A diamond sensor unit includes: a sensor part that includes a diamond having a color center with electron spin; an irradiation part that irradiates the diamond with excitation light; a detection part that detects radiated light from the color center of the diamond; and an optical waveguide that transmits the excitation light, and the radiated light.Type: ApplicationFiled: January 26, 2022Publication date: April 4, 2024Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Yoshiki NISHIBAYASHI, Hiromi NAKANISHI, Hiroshige DEGUCHI, Tsukasa HAYASHI, Natsuo TATSUMI
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Patent number: 9347944Abstract: Provided are a method and a kit for accurately and rapidly detecting ten types of targeting pneumonia bacteria: Streptococcus pneumoniae, Haemophilus influenzae, Mycoplasma pneumoniae, Chlamydophila pneumoniae, Legionella pneumophila, Klebsiella pneumoniae, Pseudomonas aeruginosa, Moraxella catarrhalis, methicillin-resistant Staphylococcus aureus (MRSA), and Staphylococcus aureus. A set of primer pairs directed to their respective target regions contained in the DnaJ gene, etc., of the ten types of pneumonia causative bacteria is designed for the ten bacterial strains and used to amplify gene products. A set of bacterial strain-specific probe pairs is further designed for the ten bacterial strains such that the probe pairs hybridize with the amplification products via sequences in the respective target regions differing from the sequences hybridized by the set of primer pairs.Type: GrantFiled: March 30, 2011Date of Patent: May 24, 2016Assignee: Yamaguchi Technology Licensing Organization, Ltd.Inventors: Mutsunori Shirai, Takayuki Ezaki, Tsukasa Hayashi, Takeshi Ujiiye, Makoto Ganaha, Shigekazu Yamamoto
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Patent number: 8406972Abstract: When a read-ahead vehicle speed is calculated using an integrator and a delay element, a predetermined gain used for an integral calculation is made small if a result of the integral calculation greater than a predetermined value based on an actual vehicle speed.Type: GrantFiled: January 26, 2009Date of Patent: March 26, 2013Assignee: Jatco LtdInventors: Naohiro Yamada, Tsukasa Hayashi
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Publication number: 20130023443Abstract: Provided are a method and a kit for accurately and rapidly detecting ten types of targeting pneumonia bacteria: Streptococcus pneumoniae, Haemophilus influenzae, Mycoplasma pneumoniae, Chlamydophila pneumoniae, Legionella pneumophila, Klebsiella pneumoniae, Pseudomonas aeruginosa, Moraxella catarrhalis, methicillin-resistant Staphylococcus aureus (MRSA), and Staphylococcus aureus. A set of primer pairs directed to their respective target regions contained in the DnaJ gene, etc., of the ten types of pneumonia causative bacteria is designed for the ten bacterial strains and used to amplify gene products. A set of bacterial strain-specific probe pairs is further designed for the ten bacterial strains such that the probe pairs hybridize with the amplification products via sequences in the respective target regions differing from the sequences hybridized by the set of primer pairs.Type: ApplicationFiled: March 30, 2011Publication date: January 24, 2013Inventors: Mutsunori Shirai, Takayuki Ezaki, Tsukasa Hayashi, Takeshi Ujiiye, Makoto Ganaha, Shigekazu Yamamoto
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Patent number: 8321099Abstract: When an accelerator pedal opening angle is large, a target vehicle speed is calculated using a read-ahead vehicle speed and, when the accelerator pedal opening angle is small, the target gear shift ratio is calculated using an actual vehicle speed.Type: GrantFiled: January 26, 2009Date of Patent: November 27, 2012Assignee: Jatco LtdInventors: Naohiro Yamada, Tsukasa Hayashi
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Patent number: 7988835Abstract: There are provided a method and an apparatus which form silicon dots having substantially uniform particle diameters and exhibiting a substantially uniform density distribution directly on a substrate at a low temperature. A hydrogen gas (or a hydrogen gas and a silane-containing gas) is supplied into a vacuum chamber (1) provided with a silicon sputter target (e.g., target 30), or the hydrogen gas and the silane-containing gas are supplied into the chamber (1) without arranging the silicon sputter target therein, a high-frequency power is applied to the gas(es) so that plasma is generated such that a ratio (Si(288 nm)/H?) between an emission intensity Si(288 nm) of silicon atoms at a wavelength of 288 nm and an emission intensity H? of hydrogen atoms at a wavelength of 484 nm in plasma emission is 10.0 or lower, and preferably 3.0 or lower, or 0.Type: GrantFiled: September 12, 2006Date of Patent: August 2, 2011Assignees: Nissin Electric Co., Ltd., EMD CorporationInventors: Eiji Takahashi, Takashi Mikami, Shigeaki Kishida, Kenji Kato, Atsushi Tomyo, Tsukasa Hayashi, Kiyoshi Ogata, Yuichi Setsuhara
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Patent number: 7887677Abstract: A silicon object formation target substrate is arranged in a first chamber, a silicon sputter target is arranged in a second chamber communicated with the first chamber, plasma for chemical sputtering is formed from a hydrogen gas in the second chamber, chemical sputtering is effected on the silicon sputter target with the plasma thus formed, producing particles contributing to formation of silicon object, whereby a silicon object is formed, on the substrate, from the particles moved from the second chamber to the first chamber.Type: GrantFiled: September 21, 2006Date of Patent: February 15, 2011Assignee: Nissin Electric Co., Ltd.Inventors: Takashi Mikami, Atsushi Tomyo, Kenji Kato, Eiji Takahashi, Tsukasa Hayashi
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Publication number: 20110004381Abstract: [Task] It is an object of the present invention to provide control device and control method for an automatic transmission which are capable of quickly converging an estimated vehicle speed 2 into a highly accurate state while an estimation response characteristic of the estimated vehicle speed 2 is secured. [Means for Solution] When a read-ahead vehicle speed is calculated using an integrator and a delay element, a predetermined gain used for an integral calculation is made small if a result of integral calculation is in excess of a predetermined value based on an actual vehicle speed.Type: ApplicationFiled: January 26, 2009Publication date: January 6, 2011Inventors: Naohiro Yamada, Tsukasa Hayashi
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Publication number: 20100332092Abstract: It is an object of the present invention to provide control device and control method for an automatic transmission which are capable of selecting a gear shift stage which accords with an intention of a vehicle driver irrespective of an accelerator opening angle. When an accelerator pedal opening angle is large, a target vehicle speed is calculated using a read-ahead vehicle speed and, when the accelerator pedal opening angle is small, the target gear shift ratio is calculated using an actual vehicle speed.Type: ApplicationFiled: January 26, 2009Publication date: December 30, 2010Inventors: Naohiro Yamada, Tsukasa Hayashi
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Publication number: 20080035471Abstract: A silicon object formation target substrate is arranged in a first chamber, a silicon sputter target is arranged in a second chamber communicated with the first chamber, plasma for chemical sputtering is formed from a hydrogen gas in the second chamber, chemical sputtering is effected on the silicon sputter target with the plasma thus formed, producing particles contributing to formation of silicon object, whereby a silicon object is formed, on the substrate, from the particles moved from the second chamber to the first chamber.Type: ApplicationFiled: September 21, 2006Publication date: February 14, 2008Inventors: Takashi Mikami, Atsushi Tomyo, Kenji Kato, Eiji Takahashi, Tsukasa Hayashi
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Publication number: 20070063183Abstract: A substrate having silicon dots wherein at least one insulating layer and at least one group of silicon dots are formed on a substrate selected from a non-alkali glass substrate and a substrate made of a polymer material.Type: ApplicationFiled: September 19, 2006Publication date: March 22, 2007Inventors: Kenji Kato, Atsushi Tomyo, Eiji Takahashi, Takashi Mikami, Tsukasa Hayashi
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Publication number: 20070056846Abstract: A substrate is accommodated in a vacuum chamber provided with a silicon sputter target, a sputtering gas (typically a hydrogen gas) is supplied into the vacuum chamber, a high-frequency power is applied to the gas to form plasma in the chamber, a bias voltage is applied to the target for control of chemical sputtering, and the chemical sputtering is effected on the target by the plasma to form silicon dots on the substrate.Type: ApplicationFiled: September 13, 2006Publication date: March 15, 2007Inventors: Eiji Takahashi, Atsushi Tomyo, Kenji Kato, Takashi Mikami, Tsukasa Hayashi
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Publication number: 20070007123Abstract: There are provided a method and an apparatus which form silicon dots having substantially uniform particle diameters and exhibiting a substantially uniform density distribution directly on a substrate at a low temperature. A hydrogen gas (or a hydrogen gas and a silane-containing gas) is supplied into a vacuum chamber (1) provided with a silicon sputter target (e.g., target 30), or the hydrogen gas and the silane-containing gas are supplied into the chamber (1) without arranging the silicon sputter target therein, a high-frequency power is applied to the gas(es) so that plasma is generated such that a ratio (Si(288 nm)/H?) between an emission intensity Si(288 nm) of silicon atoms at a wavelength of 288 nm and an emission intensity H? of hydrogen atoms at a wavelength of 484 nm in plasma emission is 10.0 or lower, and preferably 3.0 or lower, or 0.Type: ApplicationFiled: September 12, 2006Publication date: January 11, 2007Inventors: Eiji Takahashi, Takashi Mikami, Shigeaki Kishida, Kenji Kato, Atsushi Tomyo, Tsukasa Hayashi, Kiyoshi Ogata
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Patent number: 6365783Abstract: Provided is a process for producing alcohols or aldehydes by reacting monoolefins with carbon monoxide and hydrogen with less formation of by-products. The process comprises the step of reacting a monoolefin with carbon monoxide and hydrogen in the presence of a cobalt carbonyl catalyst until the conversion of monoolefin reaches 50-90% (the first reaction step), the step of separating unreacted monoolefin from the reaction mixture obtained in the first reaction step (the step of separation of unreacted monoolefin) and the step of reacting the separated unreacted monoolefin with carbon monoxide and hydrogen in the presence of a cobalt carbonyl catalyst (the second reaction step), wherein at least one of the first reaction step and the second reaction step is carried out in the presence of water.Type: GrantFiled: May 25, 2000Date of Patent: April 2, 2002Assignee: Kyowa Yuka Co., Ltd.Inventors: Yorozu Yokomori, Tsukasa Hayashi, Toshiaki Ogata, Junichi Yamada, Seiji Saito