Abstract: The present invention is a semiconductor nanoparticle composed of a semiconductor crystal of a compound containing Ag, Au and S as essential constitutional elements. A AgAuS-based compound constituting the semiconductor nanoparticle has a total content of Ag, Au and S of 95 mass % or more. In addition, the compound is preferably a AgAuS ternary compound represented by the general formula Ag(nx)Au(ny)S(nz). In the formula, n is any positive integer. x, y and z represent proportions of the number of atoms of the respective atoms of Ag, Au and S in the compound and are real numbers satisfying 0<x, y, z?1, and x/y is 1/7 or more and 7 or less.

Abstract: An information processing device includes an input unit for inputting a human influence parameter influenced by a human activity and a natural environment parameter influenced by non-human ecosystem and non-ecosystem activities, a computing unit that calculates a natural capital stock prediction value from the human influence parameter and the natural environment parameter, using a function representing an integration of an amount of change per unit time in natural capital stock, which has elements of internal factors that may change over time and external factors including the human influence parameter and the natural environment parameter, and an output unit for outputting the natural capital stock prediction value calculated by the computing unit.

Abstract: A method for manufacturing a vibrator includes a preparation step of preparing a quartz crystal substrate having a first surface and a second surface which are in a front and back relationship, a first film formation step of forming a first stacked body by sequentially stacking a first underlying film, a second underlying film, and a first protective film at the first surface, a first patterning step of patterning the first stacked body in a manner in which the first underlying film, the second underlying film, and the first protective film remain in a region of an element formation region other than a first groove formation region and a second groove formation region, the first underlying film and the second underlying film remain in the first groove formation region, and the first underlying film remains in the second groove formation region, and a first dry etching step of dry etching the quartz crystal substrate from the first surface through the first stacked body.

Abstract: A method for manufacturing a vibrator includes a preparation step of preparing a quartz crystal substrate having a first surface and a second surface which are in a front and back relationship, a first protective film formation step of forming a first protective film in a second groove formation region when a region of the quartz crystal substrate where the vibrator is formed is referred to as an element formation region, a region where the first groove is formed is referred to as a first groove formation region, and a region where the second groove is formed is referred to as the second groove formation region, a second protective film formation step of forming, in the first groove formation region, a second protective film having a lower etching rate than the first protective film, a third protective film formation step of forming a third protective film in a region of the element formation region other than the first groove formation region and the second groove formation region, and a first dry etching st

Abstract: A method for manufacturing a vibrator includes a preparation step of preparing a quartz crystal substrate having a first surface and a second surface which are in a front and back relationship, a first protective film formation step of forming a first protective film in a region of an element formation region other than a first groove formation region and a second groove formation region when a region of the quartz crystal substrate where the vibrator is formed is referred to as the element formation region, a region where the first groove is formed is referred to as the first groove formation region, and a region where the second groove is formed is referred to as the second groove formation region, a first dry etching step of dry etching the quartz crystal substrate from the first surface through the first protective film, a second protective film formation step of forming a second protective film in the first groove formation region, and a second dry etching step of dry etching the quartz crystal substrate

Abstract: The present invention is a thermosetting silicon-containing material containing one or more of a repeating unit shown by the following general formula (Sx-1), a repeating unit shown by the following general formula (Sx-2), and a partial structure shown by the following general formula (Sx-3): where R1 represents an iodine-containing organic group; and R2 and R3 are each independently identical to R1, a hydrogen atom, or a monovalent organic group having 1 to 30 carbon atoms. This provides: a thermosetting silicon-containing material used for forming a resist underlayer film which is capable of contributing to sensitivity enhancement of an upper layer resist while keeping LWR thereof from degrading; a composition for forming a silicon-containing resist underlayer film, the composition containing the thermosetting silicon-containing material; and a patterning process using the composition.

Abstract: The present invention is a thermosetting silicon-containing material containing one or more of a repeating unit shown by the following general formula (Sx-1), a repeating unit shown by the following general formula (Sx-2), and a partial structure shown by the following general formula (Sx-3): where R1 represents an iodine-containing organic group; and R2 and R3 are each independently identical to R1, a hydrogen atom, or a monovalent organic group having 1 to 30 carbon atoms. This provides: a thermosetting silicon-containing material used for forming a resist underlayer film which is capable of contributing to sensitivity enhancement of an upper layer resist while keeping LWR thereof from degrading; a composition for forming a silicon-containing resist underlayer film, the composition containing the thermosetting silicon-containing material; and a patterning process using the composition.

Abstract: Provided is a bearing device for a vehicle wheel comprising: an outer-side seal that is resistant to deterioration over time and can prevent foreign matter. This bearing device for a vehicle wheel comprises an outer-side seal member 7 that closes an outer-side opening end of an annular space formed by an outer ring 2 and a hub ring 3. The outer-side seal member 7 including a core metal 8 which is fitted to the outer ring 2, a seal member 10 which is joined to the core metal 8, and a metal ring 9 which is fitted to the hub ring 3 and with which the seal member 10 is in sliding contact. An annular space S is provided between the metal ring 9 and the hub ring 3, and the annular space S being filled with a sealing material 20.

Abstract: Provided is a temperature measuring device which includes: a flexible printed circuit board with wiring; a thermistor element; a heat collecting plate; and a pressing member. The flexible printed circuit board is configured to be attached to a case that is fixed to an object to be measured, the thermistor element is electrically connected to the wiring, the heat collecting plate is disposed on a side opposite to the thermistor element via the flexible printed circuit board so as to be pressed against a temperature measuring point in the object to be measured, and the pressing member is made of a foam material and is configured to be compressed when the case is fixed to the object to be measured and to press the heat collecting plate against the object to be measured.

Abstract: An electricity storage module includes a plurality of electricity storage cells, a plurality of resin frames, and a bus bar module. Each of the electricity storage cells includes a pair of external terminals. The bus bar module includes a plurality of bus bars and a bus bar case. The resin frame includes a retaining portion configured to retain the bus bar case. The bus bar case includes a retained portion that is configured to engage with the retaining portion, and a biasing portion that is configured to bias the bus bar toward a side of the retained portion, in a state in which the retained portion is engaged with the retaining portion.

Abstract: A resist composition is provided comprising (A) a metal compound having formula (A-1), a hydrolysate or hydrolytic condensate thereof, or the reaction product of the metal compound, hydrolysate or hydrolytic condensate thereof with a di- or trihydric alcohol having formula (A-2), and (B) a sensitizer containing a compound having formula (B-1). The resist composition is adapted to change a solubility in developer upon exposure to high-energy radiation, has high resolution and sensitivity, and forms a pattern of good profile with minimal edge roughness after exposure.

Abstract: A method for measuring a distance of diffusion of a curing catalyst for a thermosetting silicon-containing material includes the steps of: forming a silicon-containing film from a composition containing a thermosetting silicon-containing material, a curing catalyst and a solvent; coating the silicon-containing film with a photosensitive resin composition containing a resin whose solubility in alkaline developer is increased by the action of an acid, an acid generator and a solvent, and subsequently heating to prepare a substrate on which the silicon-containing film and a resin film are formed; irradiating the substrate with a high energy beam or an electron beam to generate an acid and heat-treating the substrate to increase the solubility of the resin in an alkaline developer by the action of the acid in the resin film; dissolving the resin film in an alkaline developer; and measuring a film thickness of the remaining resin.

Abstract: Oil-based particles have an average particle size of 0.05 mm to 10 mm, and include: (A) polar oil; and (B) an oily gelling agent having a melting point of 60° C. or more.

Abstract: An objective of the invention is to provide a sunscreen cosmetic that increases the ultraviolet protection power of ultraviolet protectants, thereby achieving high ultraviolet protection power using only a small amount of ultraviolet protectants, while simultaneously providing an excellent texture and placing little strain on the skin. The sunscreen cosmetic according to the present invention contains the following components (A) to (C): (A) an ultraviolet protectant; (B) silica having a particle size of 0.3 to 1 µm; and (C) a powder having a particle size of 1 to 30 µm; wherein the (C) powder is of one or more types selected from the group consisting of silica, aluminum starch octenyl succinate, cellulose or derivatives thereof, waxes, mica, sericite and biodegradable resins.

Abstract: A method for measuring a distance of diffusion of a curing catalyst for a thermosetting silicon-containing material includes the steps of: forming a silicon-containing film from a composition containing a thermosetting silicon-containing material, a curing catalyst and a solvent; coating the silicon-containing film with a photosensitive resin composition containing a resin whose solubility in alkaline developer is increased by the action of an acid, an acid generator and a solvent, and subsequently heating to prepare a substrate on which the silicon-containing film and a resin film are formed; irradiating the substrate with a high energy beam or an electron beam to generate an acid and heat-treating the substrate to increase the solubility of the resin in an alkaline developer by the action of the acid in the resin film; dissolving the resin film in an alkaline developer; and measuring a film thickness of the remaining resin.

Abstract: A method for producing a silicon compound containing an iodophenyl group, including substituting iodine for a trialkylsilyl ((R0)3Si) group bonded to a phenyl group by using an iodine-containing electrophilic reagent (I-X) as shown by the following reaction equation: where all of R0's may be identical to or different from each other and each represent an alkyl group having 1 to 6 carbon atoms; R1 represents a single bond or a divalent organic group; R2 represents an organic group having 1 to 10 carbon atoms; R3 represents an organic group having 1 to 10 carbon atoms; R represents an organic group having 1 to 6 carbon atoms; n0 is 1, 2, or 3, n1 is 1, 2, or 3, n2 is 0, 1, or 2, and n3 is 0, 1, or 2, provided that 1?n1+n3?3; and X represents a counter substituent of iodine, acting as an electrophilic reactive species.

Abstract: The present invention provides a resist underlayer film capable of improving LWR and CDU in a fine pattern formed by a chemically-amplified resist which uses an acid as a catalyst. A composition for forming a silicon-containing resist underlayer film, including a thermosetting silicon-containing material (Sx), a curing catalyst (Xc), and a solvent, in which a distance of diffusion of the curing catalyst (Xc) from a resist underlayer film formed from the composition for forming a silicon-containing resist underlayer film to a resist upper layer film to be formed on the resist underlayer film is 5 nm or less.

Abstract: A composition for forming a silicon-containing resist underlayer film contains at least: one or more compounds shown by the following general formula (P-0); and a thermally crosslinkable polysiloxane (Sx), where R100 represents divalent organic group substituted with one or more fluorine atoms; R101 and R102 each independently represent a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms optionally substituted with a hetero-atom or optionally interposed by hetero-atom; R103 represents linear, branched, or cyclic divalent hydrocarbon group having 1 to 20 carbon atoms optionally substituted with a hetero-atom or optionally interposed by hetero-atom; R101 and R102, or R101 and R103, are optionally bonded to each other to form a ring with sulfur atom in the formula; and L104 represents a single bond or linear, branched, or cyclic divalent hydrocarbon group having 1 to 20 carbon atoms optionally substituted with a hetero-atom or optionally interposed by hetero-atom.

Abstract: A patterning process, including: forming the first resist film from first resist material containing an acid generator and thermosetting compound having a hydroxy group and/or carboxy group protected by an acid-labile group; forming the second resist film on first resist film from a second resist material containing a metal compound (A) and a sensitizer; irradiating the first and second resist film with a high energy beam or an electron beam to perform pattern exposure to deprotect the hydroxy group and/or carboxy group in a pattern exposed portion of first resist film and to form a crosslinked portion of the component (A) with the deprotected hydroxy and/or carboxy group on the pattern exposed portion; and developing the second resist film with a developer to give a metal film pattern composed of the crosslinked portion. This provides a method for forming a thin film resist pattern with higher resolution and higher sensitivity.

Abstract: A wheel bearing device (1) provided with an outer sealing member (7) in which: a core metal (8) having formed therein multiple seal lips is fitted to the outer opening of an outer ring (2); a metal ring (9) is fitted to the outer peripheral section of a hub ring (3) so as to oppose the core metal. The multiple seal lips are brought into contact with the metal ring, so that a portion between the outer ring and the hub ring is sealed. An annular outer member side weir part (11f) that protrudes to the outer side, in a radial direction, as compared to the outer edge of the metal ring so as to surround the metal ring is provided to the core metal, and an outer member side expanded-diameter part (8g) that holds grease is formed in the inner peripheral surface of the outer member side weir part.