Abstract: Magnets are arranged at intervals along a stroke direction with an interposed space. Magnetic pole surfaces of adjacent ones of the magnets have opposite poles. A detector is arranged with a gap in a gap direction against a magnetic pole surface of each of the magnets and acquires a sine signal and a cosine signal as detection signals of phases corresponding to the positions of the magnets, based on a change in a magnetic field received from the magnets according to movement of the detector relative to the detection object in the stroke direction. A signal processor acquires the sine signal and the cosine signal from the detector, generates, based on the sine signal and the cosine signal, an arctangent signal corresponding to a stroke amount of the detection object relative to the detector, and acquires the arctangent signal as a position signal.

Abstract: A resist composition is provided comprising (A) a metal compound having formula (A-1), a hydrolysate or hydrolytic condensate thereof, or the reaction product of the metal compound, hydrolysate or hydrolytic condensate thereof with a di- or trihydric alcohol having formula (A-2), and (B) a sensitizer containing a compound having formula (B-1). The resist composition is adapted to change a solubility in developer upon exposure to high-energy radiation, has high resolution and sensitivity, and forms a pattern of good profile with minimal edge roughness after exposure.

Abstract: A method for measuring a distance of diffusion of a curing catalyst for a thermosetting silicon-containing material includes the steps of: forming a silicon-containing film from a composition containing a thermosetting silicon-containing material, a curing catalyst and a solvent; coating the silicon-containing film with a photosensitive resin composition containing a resin whose solubility in alkaline developer is increased by the action of an acid, an acid generator and a solvent, and subsequently heating to prepare a substrate on which the silicon-containing film and a resin film are formed; irradiating the substrate with a high energy beam or an electron beam to generate an acid and heat-treating the substrate to increase the solubility of the resin in an alkaline developer by the action of the acid in the resin film; dissolving the resin film in an alkaline developer; and measuring a film thickness of the remaining resin.

Abstract: An objective of the invention is to provide a sunscreen cosmetic that increases the ultraviolet protection power of ultraviolet protectants, thereby achieving high ultraviolet protection power using only a small amount of ultraviolet protectants, while simultaneously providing an excellent texture and placing little strain on the skin. The sunscreen cosmetic according to the present invention contains the following components (A) to (C): (A) an ultraviolet protectant; (B) silica having a particle size of 0.3 to 1 µm; and (C) a powder having a particle size of 1 to 30 µm; wherein the (C) powder is of one or more types selected from the group consisting of silica, aluminum starch octenyl succinate, cellulose or derivatives thereof, waxes, mica, sericite and biodegradable resins.

Abstract: Oil-based particles have an average particle size of 0.05 mm to 10 mm, and include: (A) polar oil; and (B) an oily gelling agent having a melting point of 60° C. or more.

Abstract: A method for measuring a distance of diffusion of a curing catalyst for a thermosetting silicon-containing material includes the steps of: forming a silicon-containing film from a composition containing a thermosetting silicon-containing material, a curing catalyst and a solvent; coating the silicon-containing film with a photosensitive resin composition containing a resin whose solubility in alkaline developer is increased by the action of an acid, an acid generator and a solvent, and subsequently heating to prepare a substrate on which the silicon-containing film and a resin film are formed; irradiating the substrate with a high energy beam or an electron beam to generate an acid and heat-treating the substrate to increase the solubility of the resin in an alkaline developer by the action of the acid in the resin film; dissolving the resin film in an alkaline developer; and measuring a film thickness of the remaining resin.

Abstract: A method for producing a silicon compound containing an iodophenyl group, including substituting iodine for a trialkylsilyl ((R0)3Si) group bonded to a phenyl group by using an iodine-containing electrophilic reagent (I-X) as shown by the following reaction equation: where all of R0's may be identical to or different from each other and each represent an alkyl group having 1 to 6 carbon atoms; R1 represents a single bond or a divalent organic group; R2 represents an organic group having 1 to 10 carbon atoms; R3 represents an organic group having 1 to 10 carbon atoms; R represents an organic group having 1 to 6 carbon atoms; n0 is 1, 2, or 3, n1 is 1, 2, or 3, n2 is 0, 1, or 2, and n3 is 0, 1, or 2, provided that 1?n1+n3?3; and X represents a counter substituent of iodine, acting as an electrophilic reactive species.

Abstract: The present invention provides a resist underlayer film capable of improving LWR and CDU in a fine pattern formed by a chemically-amplified resist which uses an acid as a catalyst. A composition for forming a silicon-containing resist underlayer film, including a thermosetting silicon-containing material (Sx), a curing catalyst (Xc), and a solvent, in which a distance of diffusion of the curing catalyst (Xc) from a resist underlayer film formed from the composition for forming a silicon-containing resist underlayer film to a resist upper layer film to be formed on the resist underlayer film is 5 nm or less.

Abstract: A composition for forming a silicon-containing resist underlayer film contains at least: one or more compounds shown by the following general formula (P-0); and a thermally crosslinkable polysiloxane (Sx), where R100 represents divalent organic group substituted with one or more fluorine atoms; R101 and R102 each independently represent a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms optionally substituted with a hetero-atom or optionally interposed by hetero-atom; R103 represents linear, branched, or cyclic divalent hydrocarbon group having 1 to 20 carbon atoms optionally substituted with a hetero-atom or optionally interposed by hetero-atom; R101 and R102, or R101 and R103, are optionally bonded to each other to form a ring with sulfur atom in the formula; and L104 represents a single bond or linear, branched, or cyclic divalent hydrocarbon group having 1 to 20 carbon atoms optionally substituted with a hetero-atom or optionally interposed by hetero-atom.

Abstract: A patterning process, including: forming the first resist film from first resist material containing an acid generator and thermosetting compound having a hydroxy group and/or carboxy group protected by an acid-labile group; forming the second resist film on first resist film from a second resist material containing a metal compound (A) and a sensitizer; irradiating the first and second resist film with a high energy beam or an electron beam to perform pattern exposure to deprotect the hydroxy group and/or carboxy group in a pattern exposed portion of first resist film and to form a crosslinked portion of the component (A) with the deprotected hydroxy and/or carboxy group on the pattern exposed portion; and developing the second resist film with a developer to give a metal film pattern composed of the crosslinked portion. This provides a method for forming a thin film resist pattern with higher resolution and higher sensitivity.

Abstract: A wheel bearing device (1) provided with an outer sealing member (7) in which: a core metal (8) having formed therein multiple seal lips is fitted to the outer opening of an outer ring (2); a metal ring (9) is fitted to the outer peripheral section of a hub ring (3) so as to oppose the core metal. The multiple seal lips are brought into contact with the metal ring, so that a portion between the outer ring and the hub ring is sealed. An annular outer member side weir part (11f) that protrudes to the outer side, in a radial direction, as compared to the outer edge of the metal ring so as to surround the metal ring is provided to the core metal, and an outer member side expanded-diameter part (8g) that holds grease is formed in the inner peripheral surface of the outer member side weir part.

Abstract: Provided is a wiring material which is advantageous for space saving while ensuring seismic resistance of a flexible circuit board. A wiring material 7 including a flexible circuit board 10 in which a plurality of batteries 3A to 3L arranged in one direction is connected to one another via a bus bar 20 and an arrangement direction of the batteries 3A to 3L is a longitudinal direction of the flexible circuit board 10, includes: a narrow connecting portion 18 connected to the bus bar 20; and a main body 68 that is connected to the connecting portion 18 and includes a portion wider than the connecting portion 18. The connecting portion 18 is configured to have a longitudinal extending portion 18a that projects from the main body 68 in the longitudinal direction and extends in the longitudinal direction.

Abstract: Provided is a temperature measuring device which includes: a flexible printed circuit board with wiring; a thermistor element; a heat collecting plate; and a pressing member. The flexible printed circuit board is configured to be attached to a case that is fixed to an object to be measured, the thermistor element is electrically connected to the wiring, the heat collecting plate is disposed on a side opposite to the thermistor element via the flexible printed circuit board so as to be pressed against a temperature measuring point in the object to be measured, and the pressing member is made of a foam material and is configured to be compressed when the case is fixed to the object to be measured and to press the heat collecting plate against the object to be measured.

Abstract: A patterning process, including steps of: forming the first resist film from the first resist material containing a thermosetting compound having a hydroxy group and/or a carboxy group each protected by an acid-labile group, an acid generator, and a sensitizer; irradiating the first resist film with a high energy beam or an electron beam to perform pattern exposure to deprotect the hydroxy group and/or carboxy group in a pattern exposed portion; forming the second resist film from second resist material containing (A) metal compound on the first resist film, and forming a crosslinked portion wherein the component (A) and deprotected hydroxy group and/or deprotected carboxy group are crosslinked on the pattern exposed portion; and developing the second resist film with a developer to give a metal film pattern composed of the crosslinked portion. This provides a method for forming a thin film resist pattern with higher resolution and higher sensitivity.

Abstract: An emulsion-type cosmetic composition contains from 3 to 50% by mass of an oil-soluble UV absorber, and from 0.2 to 20% by mass of a powder containing a polymer powder. An average IOB value of a monomer or monomers constituting the polymer powder is from 1 to 10.

Abstract: A wheel bearing device (1) provided with an outer sealing member (7) in which: a core metal (8) having formed therein multiple seal lips is fitted to the outer opening of an outer ring (2); a metal ring (9) is fitted to the outer peripheral section of a hub ring (3) so as to oppose the core metal. The multiple seal lips are brought into contact with the metal ring, so that a portion between the outer ring and the hub ring is sealed. An annular outer member side weir part (11f) that protrudes to the outer side, in a radial direction, as compared to the outer edge of the metal ring so as to surround the metal ring is provided to the core metal, and an outer member side expanded-diameter part (8g) that holds grease is formed in the inner peripheral surface of the outer member side weir part.

Abstract: An oil-in-water type emulsion cosmetic exhibits a high-level sunscreen effect and has a low viscosity and a high stability and is easy to use. The oil-in-water type emulsion cosmetic includes (A) an agar microgel, (B) one or more kinds of powders selected from (b1) a clay mineral powder and (b2) a highly oil-absorbing spherical powder, (C) a polyoxyethylene-hardened castor oil having an HLB value of 10-17; (D) an oil-soluble UV absorber, (E) 0.01-0.13 mass % of an (acrylate/alkyl acrylate (C10-30)) cross polymer, and (F) 0-0.5 mass % of a UV scattering agent, and is characterized in that the viscosity at 25° C. is not higher than 10,000 mPa·s.

Abstract: The present invention is a resist material containing: (i) a metal compound shown by the following general formula (M-1) and (ii) an organic solvent. An object of the present invention is to provide a metal-containing resist material having high sensitivity and high resolution particularly in EUV and electron beam lithography; and a patterning process using this material.

Abstract: The present invention is a resist material containing: (i) a compound (i-1), which is a (partial) condensate or a (partial) hydrolysis-condensate of a metal compound shown by the following general formula (A-1), or a compound (i-2), which is a reaction product of the compound (i-1) and a dihydric or trihydric alcohol shown by the following general formula (A-2), (ii) a photo-acid generator, (iii) a basic compound, and (iv) an organic solvent. An object of the present invention is to provide a metal-containing resist material having high sensitivity and high resolution particularly in EUV and electron beam lithography; and a patterning process using this material.

Abstract: The present invention provides a resist underlayer film capable of improving LWR and CDU in a fine pattern formed by a chemically-amplified resist which uses an acid as a catalyst. A composition for forming a silicon-containing resist underlayer film, including a thermosetting silicon-containing material (Sx), a curing catalyst (Xc), and a solvent, in which a distance of diffusion of the curing catalyst (Xc) from a resist underlayer film formed from the composition for forming a silicon-containing resist underlayer film to a resist upper layer film to be formed on the resist underlayer film is 5 nm or less.