Patents by Inventor Tsutomu Tanaka
Tsutomu Tanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11227735Abstract: A gas circuit breaker comprises: a first arc contactor 21; a cylindrical second arc contactor 41; a rod-shaped trigger electrode 31 that is disposed to be movable between the first arc contactor 21 and the second arc contactor 41, and moves inside the cylindrical second arc contactor 41 to ignite an arc at the second arc contactor 41 in the latter half of the current break interval; and a guide portion 41b that has an inner diameter larger than the outer diameter of the trigger electrode 31, has an inner diameter smaller than the inner diameter of a portion of the second arc contactor 41 which is close to the trigger electrode 31, and is disposed in the cylinder of the second arc contactor 41 so as to go around the trigger electrode 31 when the trigger electrode 31 is in a closed state with the first arc contactor 21.Type: GrantFiled: December 1, 2017Date of Patent: January 18, 2022Assignees: KABUSHIKI KAISHATOSHIBA, TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATIONInventors: Toshiyuki Uchii, Tomoyuki Yoshino, Takato Ishii, Akira Shimamura, Tsutomu Tanaka
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Patent number: 11222760Abstract: A gas circuit breaker of an embodiment includes a sealed container, a first contact part and a second contact part, an operation mechanism, an insulating nozzle, a pressure accumulator, and an electric field shield. The insulating nozzle is displaced in conjunction with the first contact part in a separation process of the first contact part and the second contact part. The insulating nozzle surrounds arc discharge generated between the first contact part and the second contact part. The electric field shield is attached to the insulating nozzle. The electric field shield has a floating potential during a period of at least part of the separation process. The electric field shield is electrically connected to the second contact part such that the electric field shield has the same potential in a completely open electrode state in which separation between the first contact part and the second contact part is terminated.Type: GrantFiled: July 29, 2020Date of Patent: January 11, 2022Assignees: KABUSHIKI KAISHA TOSHIBA, TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATIONInventors: Amane Majima, Tooru Inoue, Toshiyuki Uchii, Norimitsu Kato, Akira Shimamura, Takanori Yasuoka, Tsutomu Tanaka, Tadashi Mori
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Patent number: 11217408Abstract: A gas circuit breaker 1 includes an insulation nozzle 23 that guides arc-extinguishing gas to an arc between a first arc contactor 21 and a second arc contactor 41 when a trigger electrode 31 becomes an opened state relative to the first arc contactor 21. The second arc contactor 41 has an opening 41a for spraying the arc-extinguishing gas, and the opening 41a is closed by the trigger electrode 31 in the first half of a current breaking action, and is opened by separation of the trigger electrode in the latter half of the current breaking action. An opening area of a first exhaust port 41b formed between the second arc contactor 41 and the insulation nozzle 23 for exhausting the arc-extinguishing gas is 0.2 times or more and two times or less of an opening area of the opening 41a of the second arc contactor 41.Type: GrantFiled: November 10, 2017Date of Patent: January 4, 2022Assignees: KABUSHIKI KAISHA TOSHIBA, TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATIONInventors: Toshiyuki Uchii, Takanori Iijima, Tomoyuki Yoshino, Norimitsu Kato, Tsutomu Tanaka
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Publication number: 20210388497Abstract: Methods of depositing thin films for an electronic device, for example a semiconductor device include applying a first pulsed plasma with or without a reactant and a second continuous plasma with a reactant.Type: ApplicationFiled: June 10, 2021Publication date: December 16, 2021Applicant: Applied Materials, Inc.Inventors: Cong Trinh, Maribel Maldonado-Garcia, Mihaela A. Balseanu, Alexander V. Garachtchenko, Tsutomu Tanaka
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Patent number: 11158489Abstract: Apparatus and methods to control the phase of power sources for plasma process regions in a batch process chamber. A master exciter controls the phase of the power sources during the process sequence based on feedback from the match circuits of the respective plasma sources.Type: GrantFiled: November 7, 2017Date of Patent: October 26, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Tsutomu Tanaka, John C. Forster, Ran Liu, Kenichi Ohno, Ning Li, Mihaela Balseanu, Keiichi Tanaka, Li-Qun Xia
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Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer Deposition (PE-ALD) Processing Tool
Publication number: 20210327686Abstract: Plasma source assemblies, gas distribution assemblies including the plasma source assembly and methods of generating a plasma are described. The plasma source assemblies include a powered electrode with a ground electrode adjacent a first side and a dielectric adjacent a second side. A first microwave generator is electrically coupled to the first end of the powered electrode through a first feed and a second microwave generator is electrically coupled to the second end of the powered electrode through a second feed.Type: ApplicationFiled: April 29, 2021Publication date: October 21, 2021Applicant: Applied Materials, Inc.Inventors: Xiaopu Li, Jozef Kudela, Kallol Bera, Tsutomu Tanaka, Dmitry A. Dzilno -
Patent number: 11151431Abstract: A printer includes an input device for receiving an input operation to the printer from a user, a memory, a printing device, and a controller. The controller is configured to: receive print data from a terminal; in a case where the controller determines that the print data received from the terminal is raster data, determine whether a particular condition is met; in a case where the controller determines that the particular condition is met, send, to the terminal, request information that requests the terminal to send page description language (PDL) data; and, in a case where the controller receives the PDL data from the terminal after sending the request information to the terminal, allow the printing device to execute printing on a basis of the PDL data. The PDL data specifies types of drawing objects and drawing positions with commands.Type: GrantFiled: January 27, 2020Date of Patent: October 19, 2021Assignee: BROTHER KOGYO KABUSHIKI KAISHAInventor: Tsutomu Tanaka
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Publication number: 20210289905Abstract: A smartphone case equipped with a pocket warmer storage function that can be used while warming up the smartphone with a disposable pocket warmer, and can promote heat generation due to oxidation by rubbing when the temperature drops. A smartphone case 1 equipped with a pocket warmer storage function that can store a disposable pocket warmer 10 and can use to warming up the smartphone equipped with the pocket warmer 10, is disposed on the back side of the smartphone body 100 and has the flexibility capable of rubbing the stored disposable pocket warmer 10 from the outside, and has a pocket warmer storage body 3 having a heat retaining property of retaining the heat generated from the disposable pocket warmer 10 inside.Type: ApplicationFiled: March 19, 2021Publication date: September 23, 2021Inventor: Tsutomu TANAKA
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Patent number: 11081318Abstract: Apparatus and methods for depositing and treating or etching a film are described. A batch processing chamber includes a plurality of processing regions with at least one plasma processing region. A low frequency bias generator is connected to a susceptor assembly to intermittently apply a low frequency bias to perform a directional treatment or etching the deposited film.Type: GrantFiled: December 14, 2018Date of Patent: August 3, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Kenichi Ohno, Keiichi Tanaka, Li-Qun Xia, Tsutomu Tanaka, Dmitry A. Dzilno, Mario D. Silvetti, John C. Forster, Rakesh Ramadas, Mike Murtagh, Alexander V. Garachtchenko
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Publication number: 20210217568Abstract: There is provided a gas circuit breaker that can suppress the mechanical vibration during movement of the moving electrode, reduce the generation of a triple junction during operation of the gas circuit breaker and the generation of the metal foreign materials, and maintain the electrical insulation performance more reliably.Type: ApplicationFiled: December 1, 2017Publication date: July 15, 2021Applicants: KABUSHIKI KAISHA TOSHIBA, Toshiba Energy Systems & Solutions CorporationInventors: Toshiyuki UCHII, Tomoyuki YOSHINO, Takato ISHII, Akira SHIMAMURA, Tsutomu TANAKA
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Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer Deposition (PE-ALD) Processing Tool
Publication number: 20210050187Abstract: Plasma source assemblies, gas distribution assemblies including the plasma source assembly and methods of generating plasma are described. The plasma source assemblies include a powered electrode with a ground electrode adjacent a first side and a dielectric adjacent a second side. A first microwave generator is electrically coupled to the first end of the powered electrode through a first feed and a second microwave generator is electrically coupled to the second end of the powered electrode through a second feed.Type: ApplicationFiled: March 1, 2019Publication date: February 18, 2021Applicant: Applied Materials, Inc.Inventors: Jozef Kudela, Tsutomu Tanaka, Alexander V. Garachtchenko, Dmitry A. Dzilno, Avinash Shervegar, Kallol Bera, Xiaopu Li, Anantha K. Subramani, John C. Forster -
Publication number: 20200395194Abstract: Plasma source assemblies comprising an RF hot electrode having a body and at least one return electrode spaced from the RF hot electrode to provide a gap in which a plasma can be formed. An RF feed is connected to the RF hot electrode at a distance from the inner peripheral end of the RF hot electrode that is less than or equal to about 25% of the length of the RF hot electrode. The RF hot electrode can include a leg and optional triangular portion near the leg that extends at an angle to the body of the RF hot electrode. A cladding material on one or more of the RF hot electrode and the return electrode can be variably spaced or have variable properties along the length of the plasma gap.Type: ApplicationFiled: September 1, 2020Publication date: December 17, 2020Applicant: Applied Materials, Inc.Inventors: Kallol Bera, Dmitry A. Dzilno, Anantha K. Subramani, John C. Forster, Tsutomu Tanaka
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Patent number: 10860330Abstract: An electronic apparatus includes a first processor configured to restrict direct memory access by one or more peripheral circuits to a volatile memory, and thereafter make a transition from an active state to a sleep state, and a second processor configured to, after the first processor has been brought into the sleep state, set the volatile memory into a self-refresh mode in which a refresh circuit of the volatile memory periodically rewrites data stored in the volatile memory, and thereafter reboot the electronic apparatus.Type: GrantFiled: September 12, 2018Date of Patent: December 8, 2020Assignee: Brother Kogyo Kabushiki KaishaInventor: Tsutomu Tanaka
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Patent number: 10854428Abstract: Apparatus and methods of processing a substrate in a plasma enhanced spatial atomic layer deposition chamber. A substrate is moved through one or more plasma processing regions and one or more non-plasma processing regions while the plasma power is pulsed to prevent a voltage differential on the substrate from exceeding a breakdown voltage of the substrate or device being formed on the substrate.Type: GrantFiled: December 12, 2018Date of Patent: December 1, 2020Assignee: Applied Materials, Inc.Inventors: Tsutomu Tanaka, Dmitry A. Dzilno, Alexander V. Garachtchenko, Keiichi Tanaka
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Publication number: 20200357586Abstract: A gas circuit breaker of an embodiment includes a sealed container, a first contact part and a second contact part, an operation mechanism, an insulating nozzle, a pressure accumulator, and an electric field shield. The insulating nozzle is displaced in conjunction with the first contact part in a separation process of the first contact part and the second contact part. The insulating nozzle surrounds arc discharge generated between the first contact part and the second contact part. The electric field shield is attached to the insulating nozzle. The electric field shield has a floating potential during a period of at least part of the separation process. The electric field shield is electrically connected to the second contact part such that the electric field shield has the same potential in a completely open electrode state in which separation between the first contact part and the second contact part is terminated.Type: ApplicationFiled: July 29, 2020Publication date: November 12, 2020Applicants: KABUSHIKI KAISHA TOSHIBA, TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATIONInventors: Amane MAJIMA, Tooru INOUE, Toshiyuki UCHII, Norimitsu KATO, Akira SHIMAMURA, Takanori YASUOKA, Tsutomu TANAKA, Tadashi MORI
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Patent number: 10763085Abstract: Plasma source assemblies comprising an RF hot electrode having a body and at least one return electrode spaced from the RF hot electrode to provide a gap in which a plasma can be formed. An RF feed is connected to the RF hot electrode at a distance from the inner peripheral end of the RF hot electrode that is less than or equal to about 25% of the length of the RF hot electrode. The RF hot electrode can include a leg and optional triangular portion near the leg that extends at an angle to the body of the RF hot electrode. A cladding material on one or more of the RF hot electrode and the return electrode can be variably spaced or have variable properties along the length of the plasma gap.Type: GrantFiled: December 14, 2018Date of Patent: September 1, 2020Assignee: Applied Materials, Inc.Inventors: Kallol Bera, Dmitry A. Dzilno, Anantha K. Subramani, John C. Forster, Tsutomu Tanaka
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Publication number: 20200273647Abstract: There is provided a gas circuit breaker that can spray arc-extinguishing gas to arcs while preventing a spraying velocity from being reduced and can efficiently and more surely extinguish the arcs that have been generated in a scatteredly around electrodes. A gas circuit breaker 1 includes an insulation nozzle 23 that guides arc-extinguishing gas to an arc between the first arc contactor 21 and a second arc contactor 41 when a trigger electrode 31 becomes an opened state relative to a first arc contactor 21. A second arc contactor 41 has an opening 41a for spraying the arc-extinguishing gas, and the opening 41a is closed by the trigger electrode 31 in the first half of a current breaking action, and is opened by separation of the trigger electrode in the latter half of the current breaking action. An opening area of a first exhaust port 41b formed between the second arc contactor 41 and the insulation nozzle 23 for exhausting the arc-extinguishing gas is 0.Type: ApplicationFiled: November 10, 2017Publication date: August 27, 2020Applicants: KABUSHIKI KAISHA TOSHIBA, TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATIONInventors: Toshiyuki UCHII, Takanori IIJIMA, Tomoyuki YOSHINO, Norimitsu KATO, Tsutomu TANAKA
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Publication number: 20200242429Abstract: A printer includes an input device for receiving an input operation to the printer from a user, a memory, a printing device, and a controller. The controller is configured to: receive print data from a terminal; in a case where the controller determines that the print data received from the terminal is raster data, determine whether a particular condition is met; in a case where the controller determines that the particular condition is met, send, to the terminal, request information that requests the terminal to send page description language (PDL) data; and, in a case where the controller receives the PDL data from the terminal after sending the request information to the terminal, allow the printing device to execute printing on a basis of the PDL data. The PDL data specifies types of drawing objects and drawing positions with commands.Type: ApplicationFiled: January 27, 2020Publication date: July 30, 2020Applicant: BROTHER KOGYO KABUSHIKI KAISHAInventor: Tsutomu TANAKA
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Publication number: 20190385819Abstract: Processing chambers with a plurality of processing stations and individual wafer support surfaces are described. The processing stations and wafer support surfaces are arranged so that there is an equal number of processing stations and heaters. An RF generator is connected to a first electrode in a first station and a second electrode in a second station. A bottom RF path is formed by a connection between the a first support surface and a second support surface.Type: ApplicationFiled: June 18, 2019Publication date: December 19, 2019Inventors: Hari Ponnekanti, Tsutomu Tanaka, Mandyam Sriram, Dmitry A. Dzilno, Sanjeev Baluja, Mario D. Silvetti
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Publication number: 20190311886Abstract: Plasma source assemblies, gas distribution assemblies including the plasma source assembly and methods of generating plasma are described. The plasma source assemblies include a powered electrode with a ground electrode adjacent a first side, a first dielectric adjacent a second side of the powered electrode and at least one second dielectric adjacent the first dielectric on a side opposite the first dielectric. The sum of the thicknesses of the first dielectric and each of the second dielectrics is in the range of about 10 mm to about 17 mm.Type: ApplicationFiled: April 10, 2019Publication date: October 10, 2019Inventors: Siva Chandrasekar, Quoc Truong, Dmitry A. Dzilno, Avinash Shervegar, Jozef Kudela, Tsutomu Tanaka, Alexander V. Garachtchenko, Yanjun Xia, Balamurugan Ramasamy, Kartik Shah