Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A), in which the resin (A) includes a repeating unit having an acidic group and a repeating unit having an acid-decomposable group, a content of the repeating unit having an acidic group is 15% by mole or more with respect to all the repeating units in the resin (A), a content of the repeating unit having an acid-decomposable group is more than 20% by mole with respect to all the repeating units in the resin (A), a glass transition temperature of the resin (A) is 145° C. or lower, and the actinic ray-sensitive or radiation-sensitive resin composition is used for formation of a film having a film thickness of 2 ?m or more; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin which has a repeating unit derived from a compound represented by Formula (1) as defined herein; and (B) a compound which generates an acid by irradiation with an actinic ray or a radiation. The present invention also provides an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, a method for manufacturing an electronic device, a compound and a resin.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin that has a repeating unit which has an aromatic ring having a halogen atom or an organic group having a halogen atom, and having a halogen atom-free substituent; and (Y) an ionic compound having a halogen atom in a cationic moiety, in which a content of the ionic compound (Y) is 5.0% by mass or more with respect to a total solid content of the composition.

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition having excellent defect suppressing properties, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition according to an embodiment of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition including a resin A having a repeating unit a1 having a group represented by any one of General Formula (1), . . . , or (6), which is a nonionic group that decomposes upon irradiation with actinic rays or radiation, and an additive B that is at least any one of an acid having an acid group having a pKa of ?3.60 or more, or a salt having a structure in which a hydrogen atom of an acid group having a pKa of ?3.60 or more is substituted with a cation.

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A), in which the resin (A) includes a repeating unit having an acidic group and a repeating unit having an acid-decomposable group, a content of the repeating unit having an acidic group is 15% by mole or more with respect to all the repeating units in the resin (A), a content of the repeating unit having an acid-decomposable group is more than 20% by mole with respect to all the repeating units in the resin (A), a glass transition temperature of the resin (A) is 145° C. or lower, and the actinic ray-sensitive or radiation-sensitive resin composition is used for formation of a film having a film thickness of 2 ?m or more; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A), in which the resin (A) includes a repeating unit having an acidic group and a repeating unit having an acid-decomposable group, a content of the repeating unit having an acidic group is 15% by mole or more with respect to all the repeating units in the resin (A), a content of the repeating unit having an acid-decomposable group is more than 20% by mole with respect to all the repeating units in the resin (A), a glass transition temperature of the resin (A) is 145° C. or lower, and the actinic ray-sensitive or radiation-sensitive resin composition is used for formation of a film having a film thickness of 2 µm or more; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A), in which the resin (A) includes a repeating unit having an acidic group and a repeating unit having an acid-decomposable group, a content of the repeating unit having an acidic group is 15% by mole or more with respect to all the repeating units in the resin (A), a content of the repeating unit having an acid-decomposable group is more than 20% by mole with respect to all the repeating units in the resin (A), a glass transition temperature of the resin (A) is 145° C. or lower, and the actinic ray-sensitive or radiation-sensitive resin composition is used for formation of a film having a film thickness of 2 ?m or more; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.

Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition which has an excellent resolution and is capable of forming a pattern having suppressed defects. Another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition.

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) which contains a repeating unit (a1) having a specific ring structure, a compound (B) which generates an acid by an irradiation with an actinic ray or a radiation, and a specific compound (C) which is decomposed by an irradiation with an actinic ray or a radiation so that an acid-trapping property is lowered; an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition; and a method for manufacturing an electronic device.

Abstract: A method for recovering an unreacted ?,?-ethylenically unsaturated nitrile monomer contained in a latex of a nitrile rubber obtained by emulsion polymerizing a monomer mixture comprising an ?,?-ethylenically unsaturated nitrile monomer and a carboxyl group-containing monomer is provided. The method includes the steps of: adjusting a pH of the latex of the carboxyl group-containing nitrile rubber to 6.5 or more; decompressing the latex of the carboxyl group-containing nitrile rubber having the pH adjusted to 6.5 or more under a heating condition; and recovering a component evaporated by the decompression under the heating condition.

Abstract: A method for producing a carboxyl group-containing nitrile rubber including the steps of: polymerizing a monomer mixture including an ?,?-ethylenically unsaturated nitrile monomer and a carboxyl group-containing monomer in a solvent; terminating a polymerization reaction by adding a nitrous acid salt and a water-insoluble hydroquinone as polymerization terminators to the polymerization system, thereby obtaining a dispersion of the carboxyl group-containing nitrile rubber having a pH of 7 or below; and coagulating the dispersion of the carboxyl group-containing nitrile rubber, thereby obtaining the carboxyl group-containing nitrile rubber in the solid state, wherein the amount of the nitrous acid salt to be used is 0.15 parts by weight or less relative to 100 parts by weight of the monomer mixture used in the polymerization reaction.

Abstract: A method of producing a carboxyl group-containing nitrile rubber including a coagulation step of coagulating a carboxyl group-containing nitrile rubber component by mixing a monovalent metal salt and a polymer flocculating agent into a carboxyl group-containing nitrile rubber latex having an iodine value of 120 or less, wherein the monovalent metal salt is compounded in an amount of 3 to 25 parts by weight and the polymer flocculating agent is compounded in an amount of 0.

Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition, in which the cross-sectional shape of a pattern thus formed has excellent rectangularity and a dimensional variation of the line width of the pattern thus formed hardly occurs even over time after preparation. Furthermore, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a polarity that increases through decomposition by an action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a halogen-based solvent, in which a content of the halogen-based solvent is from 1 ppb by mass to 50 ppm by mass with respect to a total mass of the composition.

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A), in which the resin (A) includes a repeating unit having an acidic group and a repeating unit having an acid-decomposable group, a content of the repeating unit having an acidic group is 15% by mole or more with respect to all the repeating units in the resin (A), a content of the repeating unit having an acid-decomposable group is more than 20% by mole with respect to all the repeating units in the resin (A), a glass transition temperature of the resin (A) is 145° C. or lower, and the actinic ray-sensitive or radiation-sensitive resin composition is used for formation of a film having a film thickness of 2 ?m or more; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.

Abstract: A method for recovering an unreacted ?,?-ethylenically unsaturated nitrile monomer contained in a latex of a nitrile rubber obtained by emulsion polymerizing a monomer mixture comprising an ?,?-ethylenically unsaturated nitrile monomer and a carboxyl group-containing monomer is provided. The method includes the steps of: adjusting a pH of the latex of the carboxyl group-containing nitrile rubber to 6.5 or more; decompressing the latex of the carboxyl group-containing nitrile rubber having the pH adjusted to 6.5 or more under a heating condition; and recovering a component evaporated by the decompression under the heating condition.

Abstract: A resist composition includes a resin (A) including at least one repeating unit selected from the group consisting of a repeating unit represented by General Formula (1) as defined herein and a repeating unit represented by General Formula (2) as defined herein, and a repeating unit having an acid-decomposable group.

Abstract: A method for producing a carboxyl group-containing nitrile rubber including the steps of: polymerizing a monomer mixture including an ?,?-ethylenically unsaturated nitrile monomer and a carboxyl group-containing monomer in a solvent; terminating a polymerization reaction by adding a nitrous acid salt and a water-insoluble hydroquinone as polymerization terminators to the polymerization system, thereby obtaining a dispersion of the carboxyl group-containing nitrile rubber having a pH of 7 or below; and coagulating the dispersion of the carboxyl group-containing nitrile rubber, thereby obtaining the carboxyl group-containing nitrile rubber in the solid state, wherein the amount of the nitrous acid salt to be used is 0.15 parts by weight or less relative to 100 parts by weight of the monomer mixture used in the polymerization reaction.

Abstract: A method of producing a carboxyl group-containing nitrile rubber including a coagulation step of coagulating a carboxyl group-containing nitrile rubber component by mixing a monovalent metal salt and a polymer flocculating agent into a carboxyl group-containing nitrile rubber latex having an iodine value of 120 or less, wherein the monovalent metal salt is compounded in an amount of 3 to 25 parts by weight and the polymer flocculating agent is compounded in an amount of 0.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: a resin, in which the actinic ray-sensitive or radiation-sensitive resin composition has a concentration of a solid content of 10% by mass or more, and in which the resin includes: a repeating unit A which is a repeating unit derived from a monomer allowing a homopolymer formed therefrom to have a glass transition temperature of 50° C. or lower, and a repeating unit B which is a repeating unit having an acid-decomposable group, a content of the repeating unit B is 20% by mole or less with respect to all the repeating units in the resin, and at least one of the repeating unit contained in the resin is a repeating unit having an aromatic ring.

Abstract: A nitrile copolymer rubber obtained by emulsion polymerization using 2,2,4,6,6-pentamethylheptane-4-thiol as a chain transfer agent and which has a polymer pH of 8.5 or less is provided. The polymer pH is preferably 8.0 or less. According to the present invention, a nitrile copolymer rubber which is able to give a cross-linked rubber which is excellent in heat resistance and compression set resistance can be provided.