Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.

Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.

Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes forming a photosensitive film on the substrate by said first processing unit before exposure processing by said exposure device and applying washing processing to the substrate by supplying a washing liquid to the substrate in said second processing unit after the formation of said photosensitive film and before the exposure processing. The method also includes applying drying processing to the substrate in said second processing unit after the washing processing by said second processing unit and before the exposure processing and applying development processing to the substrate by said third processing unit after the exposure processing. Applying the drying processing to the substrate includes the step of supplying an inert gas onto the substrate, to which the washing liquid is supplied.

Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of: forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying washing processing to the substrate by said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device and transporting the substrate after the washing processing to said exposure device. The method further includes transporting the substrate from said exposure device and applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.

Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of forming a film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device.

Abstract: In a sealing device for a bearing, a sub-seal lip is configured such that a slide contact surface is formed like an annular band. As the rotation speed of the bearing increases, the width of the slide contact surface is reduced by a centrifugal force. Thus, sliding friction can effectively be minimized. The torque of the bearing can be prevented from increasing at high-speed rotation. Even when the centrifugal force increases somewhat, only reduction in the width of the slide contact surface is caused. Thus, a slide-contacted state can be maintained. Consequently, the problem of floating-up of the sub-seal lip from a slinger is difficult to occur.

Abstract: An image display device of the present invention comprises a casing including a front cabinet and a back cabinet, a liquid crystal display panel, a main circuit board for causing an image to be displayed on the liquid crystal display panel and a power supply unit board. A recess is defined on a rear surface of the back cabinet and the main circuit board and the power supply unit board are placed in the recess.

Abstract: Blocks and inner rings of rolling bearings are arranged on the outer surface of a hollow shaft at predetermined intervals in the axial direction thereof. The outer surface of the hollow shaft is plastically deformed in its diameter enlarging direction so as to be press-fit to the inner surface of the blocks and inner surface of the inner rings of the rolling bearings. In this state, the blocks and inner rings of the rolling bearings are fixed to the outer surface of the hollow shaft.

Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a drying/development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The drying/development processing block comprises a drying processing group. The interface block comprises an interface transport mechanism. A substrate is subjected to exposure processing by the exposure device, and subsequently transported to the drying processing group by the interface transport mechanism. The substrate is cleaned and dried by the drying processing group.

Abstract: An image display device of the present invention includes a liquid crystal display panel, a resin frame for attaching the liquid crystal display panel to a front cabinet and a circuit board that are arranged inside a casing. The resin frame is provided with a grounding clamp arranged between the circuit board and the liquid crystal display panel. The grounding clamp establishes electrical connection between a ground pattern formed on the circuit board and a metal plate arranged on the rear surface of the liquid crystal display panel.

Abstract: A rolling bearing apparatus is provided that rotatably supports a cam shaft in a cylinder head of an engine. The rolling bearing apparatus includes a plurality of rolling elements; a cage that positions the rolling elements so as to be spaced at regular intervals from each other in a circumferential direction and that retains the rolling elements in a freely rotatable manner; a shell-type outer ring configured to receive the rolling elements and the cage and having a raceway surface of the rolling elements at an inner side thereof; and an outer ring fastening member formed of a material having almost the same thermal expansion coefficient as the shell-type outer ring and having a press-fit portion press-fitted to the shell-type outer ring.

Abstract: The clearance between the outer peripheral surface of an annular portion of a cage and the inner peripheral surface of each of rib portions of outer-ring split pieces is set to be smaller than the clearance between the radial end surface of a projection portion of the cage and the inner peripheral surface of each of body portions of the outer-ring split pieces. When a centrifugal force due to engine rotation acts upon the cage, the inner peripheral surface of each of the rib portions of the outer-ring split pieces touches the outer peripheral surface of the annular portion of the cage before the inner peripheral surface of each of the body portions of the outer-ring split pieces touches the radial end surface of the projection portion of the cage. Thus, the radial displacement of the cage can be prevented in good time.

Abstract: A substrate treatment apparatus includes a substrate holding mechanism for holding a substrate, a brush made of an elastically deformable material and having a cleaning surface formed in a shape tapered toward one side in a perpendicular direction perpendicular to one surface of the substrate held by the substrate holding mechanism and inclined with respect to the perpendicular direction, a brush moving mechanism for moving the brush with respect to the substrate held by the substrate holding mechanism, and a control unit for controlling the brush moving mechanism so that the cleaning surface is pushed to a peripheral area on the one surface and a peripheral end face of the substrate held by the substrate holding mechanism.

Abstract: A substrate treatment apparatus of the present invention includes a substrate holding mechanism for holding a substrate, a brush made of an elastically deformable material and having a cleaning surface intersecting a parallel direction along one surface of the substrate held by the substrate holding mechanism, a brush moving mechanism for moving the brush with respect to the substrate held by the substrate holding mechanism, a control unit for controlling the brush moving mechanism so that the cleaning surface is made to contact with the peripheral end face of the substrate held by the substrate holding mechanism, and a pushing pressure holding mechanism for holding the pushing pressure of the brush to the peripheral end face of the substrate in the parallel direction at a preset pushing pressure.

Abstract: A substrate treatment apparatus including a substrate holding mechanism for holding a substrate; a first brush made of an elastically deformable material and having a cleaning surface inclined with respect to a perpendicular direction perpendicular to one surface of the substrate held by the substrate holding mechanism; a first brush moving mechanism for moving the first brush with respect to the substrate held by the substrate holding mechanism; a controller for controlling the first brush moving mechanism so that the cleaning surface is made to contact with a peripheral area on the one surface and a peripheral end face of the substrate held by the substrate holding mechanism; and a first pushing pressure holding mechanism for holding a pushing pressure of the first brush in the perpendicular direction to the peripheral area on the one surface of the substrate at a preset pushing pressure.

Abstract: A split roller bearing device of the invention includes a roller bearing of which at least the outer ring is separated into a plurality of split parts and a cap member that fixes the outer ring of the roller bearing between the body shaft and a housing and the outer ring split part is fixed inside the arc-shaped recess of the cap member.

Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The drying processing block comprises a drying processing group. The interface block comprises an interface transport mechanism. A substrate is subjected to exposure processing by the exposure device, and subsequently transported to the drying processing group by the interface transport mechanism. The substrate is subjected to cleaning and drying processing by the drying processing group.

Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a processing block for liquid immersion exposure processing, and an interface block. An exposure device is arranged adjacent to the interface block. The processing block for liquid immersion exposure processing comprises a coating processing group for resist cover film and a removal processing group for resist cover film. The resist cover film is formed in the processing block for liquid immersion exposure processing before the exposure processing. The resist cover film is removed in the processing block for liquid immersion exposure processing after the exposure processing.

Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a washing processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The washing processing block comprises washing processing group. A resist film is formed in the resist film processing block. Before the substrate is subjected to exposure processing by the exposure device, the substrate is subjected to washing and drying processing in the washing processing group.

Abstract: An interface transport mechanism employs an upper hand during the transport of a substrate to an exposure device, and employs a lower hand during the transport of the substrate that has been carried out of the exposure device. A fifth central robot employs a lower hand during the transport of a substrate after the exposure processing by an exposure device, and employs an upper hand during the transport of a substrate after the drying processing that has been carried out of a drying processing group. That is, the upper hand is employed to transport a substrate to which no liquid is attached, and the lower hand is employed to transport a substrate to which a liquid is attached after the exposure processing.