Patents by Inventor Tsuyoshi Shibata
Tsuyoshi Shibata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7683291Abstract: According to an aspect of the invention, there is provided a single substrate processing method which continuously heats substrates to be processed to which films containing solvents are applied, by use of a heating apparatus having an opening/closing mechanism, including supplying a gas containing a solvent contained in a film of a first substrate to be processed into the heating apparatus in a closed state of the opening/closing mechanism between processing of the first substrate to be processed and processing of a second substrate to be processed.Type: GrantFiled: April 26, 2006Date of Patent: March 23, 2010Assignee: Kabushiki Kaisha ToshibaInventors: Kei Hayasaki, Tsuyoshi Shibata, Koutarou Sho, Shinichi Ito
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Publication number: 20100033526Abstract: A multipass printing is performed by setting the print permission ratios, predetermined for the nozzles in adjoining first and second blocks, in a way that satisfies the following conditions (i) and (ii). (i) The print permission ratio in the boundary section between the first and second blocks represents a value between the print permission ratio in the non-boundary section of the first block and that of the second block. (ii) The print permission ratios in the non-boundary sections of the first and second blocks are each set substantively constant. This arrangement allows the print permission ratio to be adjusted among nozzle blocks, thus satisfying the condition that the print permission ratio in a boundary between adjoining nozzles blocks does not change sharply and that the print permission ratio is substantively constant in each of the nozzle blocks. It is possible to suppress “interband variations”, “seam lines” and “intraband variations” coincidentally.Type: ApplicationFiled: August 4, 2009Publication date: February 11, 2010Applicant: CANON KABUSHIKI KAISHAInventors: Masaru Toda, Tsuyoshi Shibata
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Patent number: 7628612Abstract: In the present invention, a plurality of heat treatment units are arranged side by side in a linear form and a substrate transfer mechanism for transferring the substrate between the heat treatment units is provided in a heat treatment apparatus. The substrate is sequentially heat-treated in the arrangement order, whereby one heat treatment as a whole is dividedly and successively performed in the plurality of heat treatment units. This allows substrates to be heat-treated along the same route and uniforms the thermal history among the substrates. At the time when heat-treating a plurality of substrates, the present invention causes less variation in thermal history among the substrates as compared to the case of parallel heat treatments.Type: GrantFiled: January 24, 2007Date of Patent: December 8, 2009Assignee: Tokyo Electron LimitedInventors: Takahisa Otsuka, Tsuyoshi Shibata
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Patent number: 7618119Abstract: An ink jet print head is provided which can print a high-quality image with no density variation-caused lines at high speed and which can be manufactured at low cost and with ease. For this purpose, the print head of this invention has a plurality of nozzle groups each having at least one nozzle array arranged in a predetermined array direction Y crossing a relative motion direction X. A distance in the relative motion direction between the nozzles in each nozzle group adjoining each other in the array direction Y is set almost equal to a distance in the relative motion direction between the nozzle groups adjoining each other in the array direction Y.Type: GrantFiled: December 13, 2004Date of Patent: November 17, 2009Assignee: Canon Kabushiki KaishaInventors: Tsuyoshi Shibata, Seiichiro Karita, Hiroyuki Ogino
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Publication number: 20090277363Abstract: An oxyfuel boiler system, comprising: an oxygen generator to separate oxygen from air; a coal supply unit to dry and pulverize coal; a burner having a fuel feed path for feeding pulverized coal supplied from the coal supply unit and an oxidizer feed path for feeding oxidizer; a boiler provided with the burner; an exhaust gas discharge line to discharge exhaust gas generated in the boiler into environment; an exhaust gas treatment apparatus provided in the exhaust gas discharge line, a CO2 separator provided downstream of the exhaust gas treatment apparatus in the exhaust gas discharge line to separate CO2 from the exhaust gas; an exhaust gas recirculation line including an exhaust gas tapping port provided in the exhaust gas discharge line to extract a part of the exhaust gas; and an oxygen supply line to supply the oxygen generated at the oxygen generator to the exhaust gas flowing through the exhaust gas recirculation line, wherein the exhaust gas treatment apparatus is provided with at least an SO3 removinType: ApplicationFiled: May 5, 2009Publication date: November 12, 2009Applicant: Hitachi, Ltd.Inventors: Tsuyoshi SHIBATA, Masayuki TANIGUCHI, Hisayuki ORITA, Osamu ITO
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Publication number: 20090269686Abstract: A processing temperature of thermal processing is corrected based on measurement of a first dimension of a resist pattern on a substrate from a previously obtained relation between a dimension of a resist pattern and a temperature of thermal processing, a second dimension of the resist pattern after thermal processing is performed at the corrected processing temperature is measured, a distribution within the substrate of the second dimension is classified into a linear component expressed by an approximated curved surface and a nonlinear component, a processing condition of exposure processing is corrected based on the linear component from a previously obtained relation between a dimension of a resist pattern and a processing condition of exposure processing, and thermal processing at the processing temperature corrected in a temperature correcting step and exposure processing under the processing condition corrected in an exposure condition correcting step are performed to form a predetermined pattern.Type: ApplicationFiled: April 20, 2009Publication date: October 29, 2009Applicant: TOKYO ELECTRON LIMITEDInventors: Kunie OGATA, Masahide TADOKORO, Tsuyoshi SHIBATA, Shinichi SHINOZUKA
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Publication number: 20090246710Abstract: A pattern forming method is disclosed, which comprises forming a photo resist film on a substrate, irradiating the photo resist film with an energy ray to form a desired latent image pattern, placing the substrate on a spacer provided on a hot plate, heating the photo resist film by using the hot plate, and developing the photo resist film to form a photo resist pattern, wherein an amount of irradiation of the energy ray is set such that the amount of irradiation of the energy ray in an exposure region in which a distance between a back surface of the substrate and an upper surface of the hot plate is long is larger than the amount of irradiation of the energy ray in an exposure region in which a distance between the back surface of the substrate and the upper surface of the hot plate is short.Type: ApplicationFiled: June 1, 2009Publication date: October 1, 2009Inventors: Kenji Kawano, Tsuyoshi Shibata, Kei Hayasaki
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Patent number: 7585040Abstract: A printing apparatus divides printing elements of a printhead into blocks, time-divisionally drives the printing elements, and prints a halftone image on a printing medium in accordance with a result obtained by performing digital-halftoning for input multi-valued image data in each matrix of a predetermined size. The apparatus includes a scanner for reciprocally scanning the printhead, a conveyor for conveying the printing medium in a direction different from a scanning direction of the printhead, and a controller for printing a halftone image in each matrix. An arrayed direction of the printing elements is the convey direction of the conveyor. The controller sets a size of the block to be equal to or an integral multiple of a size of the matrix in the convey direction. The digital-halftoning increases the number of dots from a center of the matrix as a density expressed by the multi-valued image data increases.Type: GrantFiled: December 7, 2005Date of Patent: September 8, 2009Assignee: Canon Kabushiki KaishaInventors: Takashi Ochiai, Tsuyoshi Shibata, Hiromitsu Yamaguchi, Eri Goto
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Patent number: 7585038Abstract: The present invention makes it possible to print a good quality image even if ink is ejected abnormally from a nozzle. To attain this, when there is an abnormal nozzle (N) exhibiting an abnormal ink ejection state, the printing data corresponding to the abnormal nozzle (N) is added to the printing data corresponding to neighboring nozzles (N?1) and (N+1) arranged in the neighborhood of the abnormal nozzle (N). In this way, the printing data corresponding to the abnormal nozzle (N) can be compensated.Type: GrantFiled: July 22, 2003Date of Patent: September 8, 2009Assignee: Canon Kabushiki KaishaInventors: Tsuyoshi Shibata, Kazuyuki Maeda, Hitoshi Tsuboi
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Publication number: 20090189934Abstract: A recording apparatus for recording an image on a recording medium by scanning the recording medium with a recording head for discharging ink includes a thinning unit configured to thin data for discharging ink by the recording head on a plurality of areas formed by dividing scanning regions including at least a first scanning region and a second scanning region to be recorded each by one scan of the recording head in the scan direction, and a recording head drive unit configured to discharge ink by driving the recording head based on data which has been thinned by the thinning unit, wherein a boundary between the areas in the first scanning region is located in a different position from that of a boundary between areas in the second scanning region, which is adjacent to the first scanning region, in the scan direction.Type: ApplicationFiled: January 29, 2009Publication date: July 30, 2009Applicant: CANON KABUSHIKI KAISHAInventors: Hiromitsu Yamaguchi, Tsuyoshi Shibata, Takashi Ochiai, Eri Noguchi, Makoto Akahira
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Patent number: 7563561Abstract: A pattern forming method is disclosed, which comprises forming a photo resist film on a substrate, irradiating the photo resist film with an energy ray to form a desired latent image pattern, placing the substrate on a spacer provided on a hot plate, heating the photo resist film by using the hot plate, and developing the photo resist film to form a photo resist pattern, wherein an amount of irradiation of the energy ray is set such that the amount of irradiation of the energy ray in an exposure region in which a distance between a back surface of the substrate and an upper surface of the hot plate is long is larger than the amount of irradiation of the energy ray in an exposure region in which a distance between the back surface of the substrate and the upper surface of the hot plate is short.Type: GrantFiled: November 4, 2005Date of Patent: July 21, 2009Assignee: Kabushiki Kaisha ToshibaInventors: Kenji Kawano, Tsuyoshi Shibata, Kei Hayasaki
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Publication number: 20090181316Abstract: In a pattern measuring unit installed in a coating and developing treatment system, the height of a pattern formed on a substrate is measured using the Scatterometry method. Based on the measured height of the pattern, an appropriate number of rotations of the substrate during application of a coating solution is calculated, so that the rotation of the substrate during the application is controlled by the calculated number of rotations of the substrate. Since the number of rotations of the substrate when the coating solution is applied to the substrate is controlled, it is unnecessary to stop the system which performs photolithography processing on the substrate, resulting in improved productivity of the substrate.Type: ApplicationFiled: May 11, 2007Publication date: July 16, 2009Applicant: TOKYO ELECTRON LIMITEDInventors: Heiko Weichert, Kunie Ogata, Tsuyoshi Shibata
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Publication number: 20090161130Abstract: There is provided an ink jet printing apparatus in which unevenness that may occur at the edges of printing areas can be reduced also for various printing media including unspecified printing media. In the ink jet printing apparatus which uses a print head for ejecting ink and performs printing by scanning a predetermined area on a printing medium with the print head multiple times, the multiple times of scan including a forward scan and a backward scan, the apparatus comprising: a control unit that cases the print head to print patterns each of which is printed through multiple times of scan of the print head and has different portions in a time interval between the multiple times of scan, with different printing ratios for the multiple times of scan; and a setting unit that sets the printing ratios based on the test patterns.Type: ApplicationFiled: December 12, 2008Publication date: June 25, 2009Applicant: CANON KABUSHIKI KAISHAInventors: Hidehisa Mabuchi, Tsuyoshi Shibata
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Patent number: 7528124Abstract: A 1,3-dihydro-2H-indol-2-one derivative expressed by Formula 1 (wherein R1 is a halogen atom, a C1 to C4 alkyl group, etc., and R2 is a hydrogen atom, a halogen atom, etc., or R2 is in the 6-position of the indol-2-one and R1 and R2 join together to form a C3 to C6 alkylene group, R3 is a halogen atom, a hydroxyl group, etc., and R4 is a hydrogen atom, a halogen atom, a C1 to C4 alkyl group, etc., or R4 is in the 3-position of the phenyl and R3 and R4 join together to form a methylenedioxy group, R5 is a hydrogen atom or a fluorine atom, R6 is an ethylamino group, a dimethylamino group, etc., R7 is a C1 to C4 alkoxy group, and R8 is a C1 to C4 alkoxy group), or a pharmaceutically acceptable salt of this derivative. This is a novel compound that has antagonistic activity against an aruginine-vasopressin V1b receptor.Type: GrantFiled: August 27, 2004Date of Patent: May 5, 2009Assignee: Taisho Pharmaceutical Co., Ltd.Inventors: Toshihito Kumagai, Takeshi Kuwada, Tsuyoshi Shibata, Masato Hayashi, Yuri Fujisawa, Yoshinori Sekiguchi
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Publication number: 20090109414Abstract: A lithography apparatus includes a resist processing apparatus to perform a process of applying a resist on a substrate, a process of heating a resist film on the substrate, and a process of developing the resist film on the substrate, an immersion exposure apparatus including a projection optical system which projects an image of a pattern on a photomask onto the resist film and configured to perform exposure through liquid located on an optical path between the projection optical system and resist film, a trans-porting apparatus connected to the resist processing and immersion exposure apparatuses to perform transportation of the substrate between the resist processing and immersion exposure apparatuses, and a temperature/humidity control apparatus configured to control at least one of temperature and humidity in at least one of the resist processing and transporting apparatuses based on temperature and humidity or the in humidity the immersion exposure apparatus.Type: ApplicationFiled: December 22, 2008Publication date: April 30, 2009Applicant: KABUSHIKI KAISHA TOSHIBAInventors: SHINICHI ITO, Tsuyoshi Shibata
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Patent number: 7517052Abstract: A spliced ink-jet head including head chips, each of which is capable of discharging inks of two or more colors, and which are spliced in a staggered manner which restrains the occurrence of splice streaks, white streaks caused by deflection at ends or uneven colors attributable to different landing orders of ink droplets in spliced portions of different colors when one-pass recording is carried out. The head chips is arranged such that, in a relationship between two adjoining head chips, at least one discharge port of one head chip and one discharge port of the other head chip for the same color tone ink in end portions overlap on a line in a recording material feeding direction, while discharge ports for different color tone inks do not overlap.Type: GrantFiled: December 8, 2004Date of Patent: April 14, 2009Assignee: Canon Kabushiki KaishaInventors: Satoshi Wada, Makoto Akahira, Tsuyoshi Shibata, Hiromitsu Yamaguchi, Yoshitomo Marumoto, Ryoki Jahana, Yasunori Fujimoto, Takashi Ochiai, Eri Goto
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Patent number: 7510341Abstract: A temperature calibration method for a baking apparatus comprising forming a photoresist film onto a substrate, forming a latent image of a dose monitor mark onto the photoresist film, preparing baking processing apparatuses, baking the substrate or another substrate by temperature settings performed every repeat of a series of the forming the resist film and the forming the latent image with each prepared baking apparatus, cooling the baking-processed substrate, measuring a length of the latent image of the dose monitor mark after the cooling or a length of a dose monitor mark which being obtained by developing the resist film, determining relationship between a temperature setting and an effective dose in advance, and calibrating temperature settings corresponding to the each baking processing apparatus to be obtained a predetermined effective dose on the basis of the determining relationship and the measured length corresponding to the each baking processing apparatus.Type: GrantFiled: June 29, 2004Date of Patent: March 31, 2009Assignee: Kabushiki Kaisha ToshibaInventors: Kei Hayasaki, Daizo Mutoh, Masafumi Asano, Tadahito Fujisawa, Tsuyoshi Shibata, Shinichi Ito
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Publication number: 20090014125Abstract: A substrate processing system includes a resist pattern forming apparatus including modules each configured to perform a predetermined process on a substrate with an underlying film formed thereon, an etched pattern forming apparatus including chambers each configured to perform patterning of the underlying film by use of a resist pattern as a mask, and examination devices configured to perform measurement and examination of a pattern attribute rendered on a substrate after a process in the resist pattern forming apparatus and after a process in the etched pattern forming apparatus. A controller is preset to utilize measurement results and transfer data to calculate correction value ranges respectively settable in the modules and the chambers and to determine combinations of the modules and the chambers such that corrections made within the correction value ranges cause a pattern attribute to approximate a predetermined value for each of the substrates.Type: ApplicationFiled: June 18, 2008Publication date: January 15, 2009Applicant: TOKYO ELECTRON LIMITEDInventors: Tsuyoshi SHIBATA, Eiichi Nishimura
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Patent number: 7477353Abstract: A lithography apparatus includes a resist processing apparatus to perform a process of applying a resist on a substrate, a process of heating a resist film on the substrate, and a process of developing the resist film on the substrate, an immersion exposure apparatus including a projection optical system which projects an image of a pattern on a photomask onto the resist film and configured to perform exposure through liquid located on an optical path between the projection optical system and resist film, a transporting apparatus connected to the resist processing and immersion exposure apparatuses to perform transportation of the substrate between the resist processing and immersion exposure apparatuses, and a temperature/humidity control apparatus configured to control at least one of temperature and humidity in at least one of the resist processing and transporting apparatuses based on temperature and humidity or the in humidity the immersion exposure apparatus.Type: GrantFiled: July 6, 2005Date of Patent: January 13, 2009Assignee: Kabushiki Kaisha ToshibaInventors: Shinichi Ito, Tsuyoshi Shibata
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Publication number: 20090002414Abstract: There is provided an inkjet printing apparatus which prints using a printhead for discharging ink by a plurality of scanning operations of the printhead including forward scanning and reverse scanning in a single area of a print medium. In the inkjet printing apparatus, the ink discharge amount is acquired for each unit area obtained by dividing the end area of the single area in the scanning direction. The acquired ink discharge amount of each unit area is compared with a predetermined threshold. The printing ratios of the plurality of scanning operations are controlled to set the printing ratio of the final scanning operation lower than the average one of the remaining scanning operations in a unit area where the ink discharge amount is larger than the predetermined threshold.Type: ApplicationFiled: June 24, 2008Publication date: January 1, 2009Applicant: CANON KABUSHIKI KAISHAInventors: Tsuyoshi Shibata, Hiromitsu Yamaguchi, Satoshi Wada, Ryoki Jahana