Patents by Inventor Tzu-Jin Yeh
Tzu-Jin Yeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20150084158Abstract: The three dimensional (3D) circuit includes a first tier including a semiconductor substrate, a second tier disposed adjacent to the first tier, a three dimensional inductor including an inductive element portion, the inductive element portion including a conductive via extending from the first tier to a dielectric layer of the second tier. The 3D circuit includes a ground shield surrounding at least a portion of the conductive via. In some embodiments, the ground shield includes a hollow cylindrical cage. In some embodiments, the 3D circuit is a low noise amplifier.Type: ApplicationFiled: September 25, 2013Publication date: March 26, 2015Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Ming-Hsien Tsai, Hsieh-Hung Hsieh, Tzu-Jin Yeh, Chewn-Pu Jou, Sa-Lly Liu, Fu-Lung Hsueh
-
Patent number: 8958185Abstract: A circuit includes a first node configured to receive a radio frequency (“RF”) signal, a first electrostatic discharge (ESD) protection circuit coupled to a first voltage supply rail for an RF circuit and to a second node, and a second ESD protection circuit coupled to the second node and to a second voltage supply node for the RF circuit. An RF choke circuit is coupled to the second node and to a third node disposed between the first node and the RF circuit.Type: GrantFiled: February 17, 2011Date of Patent: February 17, 2015Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Ming Hsien Tsai, Jun-De Jin, Hsieh-Hung Hsieh, Tzu-Jin Yeh
-
Publication number: 20150015336Abstract: A circuit includes a first CMOS device forming a gain stage of a power amplifier and a second CMOS device forming a voltage buffer stage of the power amplifier. The first CMOS device includes a first doped well formed in a substrate, a first drain region and a first source region spaced laterally from one another in the first doped well, and a first gate structure formed over a first channel region in the first doped well. The second CMOS device includes a second doped well formed in the semiconductor substrate such that the first doped well and the second is disposed adjacent to the second doped well. A second drain region and a second source region are spaced laterally from one another in the second doped well, and a second gate structure formed over a second channel region in the second doped well.Type: ApplicationFiled: July 11, 2013Publication date: January 15, 2015Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Tzu-Jin YEH, Chewn-Pu JOU, Jun-De JIN, Hsieh-Hung HSIEH, Chia-Chung CHEN
-
Publication number: 20150014786Abstract: A power cell designed for an RF power amplifier comprises an enhancement MOSFET formed in an P-Well in an P-Substrate and a depletion or Schottky MOSFET formed in an N-Well in the same P-Substrate with a horizontal or a vertical channel between the source, drain, and gate electrodes of the depletion or Schottky MOSFET. The source node of the enhancement MOSFET and source node of the depletion or Schottky MOSFET are connected together to form the power cell.Type: ApplicationFiled: July 9, 2013Publication date: January 15, 2015Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: JUN-DE JIN, TZU-JIN YEH, CHEWN-PU JOU
-
Publication number: 20140374881Abstract: A concentric capacitor structure generally comprising concentric capacitors is disclosed. Each concentric capacitor comprises a first plurality of perimeter plates formed on a first layer of a substrate and a second plurality of perimeter plates formed on a second layer of the substrate. The first plurality of perimeter plates extend in a first direction and the second plurality of perimeter plates extend in a second direction different than the first direction. A first set of the first plurality of perimeter plates is electrically coupled to a first set of the second plurality of perimeter plates and a second set of the first plurality of perimeter plates is electrically coupled to a second set of the second plurality of perimeter plates. A plurality of capacitive cross-plates are formed in the first layer such that each cross-plate overlaps least two of the second plurality of perimeter plates.Type: ApplicationFiled: August 8, 2014Publication date: December 25, 2014Inventors: Ying-Ta LU, Chi-Hsien LIN, Hsien-Yuan LIAO, Ho-Hsiang CHEN, Tzu-Jin YEH
-
Patent number: 8848390Abstract: A multi-chip module includes a chip stack package including at least one pair of stacked dies, the dies having overlapping opposing faces, and at least one capacitive proximity communication (CPC) interconnect between the pair of stacked dies. The CPC interconnect includes a first capacitor plate at a first one of the overlapping opposing faces and a second capacitor plate at a second one of the overlapping opposing faces spaced from and aligned with the first capacitor plate. The CPC interconnect further includes an inductive element connected in series with the first capacitor plate and second capacitor plate, wherein the capacitor plates form part of a capacitor and the capacitor cooperates with the inductor element to form a LC circuit having a resonant frequency.Type: GrantFiled: February 16, 2011Date of Patent: September 30, 2014Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Jun-De Jin, Ming Hsien Tsai, Tzu-Jin Yeh
-
Publication number: 20140264635Abstract: A device includes a semiconductor substrate of a first conductivity type, and a deep well region in the semiconductor substrate, wherein the deep well region is of a second conductivity type opposite to the first conductivity type. The device further includes a well region of the first conductivity type over the deep well region. The semiconductor substrate has a top portion overlying the well region, and a bottom portion underlying the deep well region, wherein the top portion and the bottom portion are of the first conductivity type, and have a high resistivity. A gate dielectric is over the semiconductor substrate. A gate electrode is over the gate dielectric. A source region and a drain region extend into the top portion of the semiconductor substrate. The source region, the drain region, the gate dielectric, and the gate electrode form a Radio Frequency (RF) switch.Type: ApplicationFiled: April 19, 2013Publication date: September 18, 2014Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chia-Chung Chen, Chi-Feng Huang, Shu Fang Fu, Tzu-Jin Yeh, Chewn-Pu Jou
-
Publication number: 20140266419Abstract: One or more systems and techniques for limiting a voltage potential between an antenna and a radio-frequency switch circuit are provided. A voltage controller comprises a voltage generator, a voltage detection circuit and a switch cell. The voltage detection circuit is coupled to the voltage generator and to the switch cell, and the switch cell is coupled to a voltage source, and to a node between the radio-frequency switch circuit and the antenna. When the voltage potential exceeds a specified threshold, the voltage generator produces a voltage which the voltage detection circuit measures such that the voltage detection circuit activates the switch cell, resulting in a short circuit between the radio-frequency switch circuit and the voltage source. This serves to inhibit the voltage potential from exceeding the specified threshold, for example.Type: ApplicationFiled: August 21, 2013Publication date: September 18, 2014Applicant: Taiwan Semiconductor Manufacturing Company LimitedInventors: Jun-De Jin, Tzu-Jin Yeh, Chewn-Pu Jou
-
Publication number: 20140266512Abstract: A band-pass filter is provided that is configured to output a signal with a frequency within a desired frequency range and to attenuate signals with frequencies outside the desired frequency range. The band-pass filter comprises a CMOS resonator that comprises a resonator cavity and a reflector. The band-pass filter also comprises an impedance convertor that is configured to inhibit at least some insertion losses on the band-pass filter. The band-pass filter also comprises a variable capacitor that is connected between the CMOS resonator and the impedance convertor. The desired frequency range of the band-pass filter can be tuned by adjusting the capacitance of the variable capacitor.Type: ApplicationFiled: January 28, 2014Publication date: September 18, 2014Applicant: Tiawan Semiconductor Manufacturing Company LimitedInventors: Jun-De Jin, Tzu-Jin Yeh, Chewn-Pu Jou
-
Patent number: 8830011Abstract: A band-pass filter includes an input node coupled to receive an oscillating input signal, an output node, and a first LC resonator coupled to a first node coupled between the input node and the output node and to a first power supply node coupled to provide a first voltage. The first LC resonator includes a first capacitor, and a first inductor coupled in series with the first capacitor. The output node is coupled to output a filtered response signal that includes at least one zero based on the oscillating input signal and the first LC resonator.Type: GrantFiled: October 27, 2011Date of Patent: September 9, 2014Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Jun-De Jin, Tzu-Jin Yeh
-
Publication number: 20140225676Abstract: A device comprises a radio frequency peak detector configured to receive an ac signal from a voltage controlled oscillator and generate a dc value proportional to the ac signal at an output of the radio frequency peak detector and a feedback control unit coupled between an output of the radio frequency peak detector and an input of the voltage controlled oscillator.Type: ApplicationFiled: April 15, 2014Publication date: August 14, 2014Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hsieh-Hung Hsieh, Ming Hsien Tsai, Tzu-Jin Yeh, Chewn-Pu Jou, Fu-Lung Hsueh
-
Patent number: 8797104Abstract: A low-noise amplifier includes a first transistor having a gate configured to receive an oscillating input signal and a source coupled to ground. A second transistor has a source coupled to a drain of the first transistor, a gate coupled to a bias voltage, and a drain coupled to an output node. At least one of the first and second transistors includes a floating deep n-well that is coupled to an isolation circuit.Type: GrantFiled: April 13, 2012Date of Patent: August 5, 2014Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Hsieh-Hung Hsieh, Yi-Hsuan Liu, Chiao-Han Lee, Tzu-Jin Yeh, Chewn-Pu Jou
-
Patent number: 8773866Abstract: A device includes an interposer and a radio-frequency (RF) device bonded to a first side of the interposer. The interposer includes a first side and a second side opposite to the first side. The interposer does not have through-interposer vias formed therein. First passive devices are formed on the first side of the interposer and electrically coupled to the RF device. Second passive devices are formed on the second side of the interposer. The first and the second passive devices are configured to transmit signals wirelessly between the first passive devices and the second passive devices.Type: GrantFiled: December 10, 2010Date of Patent: July 8, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Jun-De Jin, Mei-Show Chen, Tzu-Jin Yeh
-
Publication number: 20140183660Abstract: A power cell includes a fin over a substrate, the fin extending in a direction substantially perpendicular to a bottom surface of the substrate. The fin includes a first dopant type. The power cell further includes at least one isolation region over the substrate between the fin and an adjacent fin. The power cell further includes a gate structure in contact with the fin and the at least one isolation region, wherein the gate structure comprises a doped region in the fin, wherein the doped region has a second dopant type different from the first dopant type and the doped region defines a channel region in the fin.Type: ApplicationFiled: December 31, 2012Publication date: July 3, 2014Inventors: Chewn-Pu JOU, Tzu-Jin YEH, Chia-Chung CHEN
-
Publication number: 20140184275Abstract: A power cell including an isolation region having a first dopant type formed in a substrate. The power cell further includes a bottom gate having a second dopant type different from the first dopant type formed on the isolation region and a channel layer having the first dopant type formed on the bottom gate. The power cell further includes source/drain regions having the first dopant type formed in the channel layer and a first well region having the second dopant type formed around the channel layer and the source/drain regions, and the first well region electrically connected to the bottom gate. The power cell further includes a second well region having the first dopant type formed around the channel layer and contacting the isolation region and a gate structure formed on the channel layer.Type: ApplicationFiled: January 30, 2013Publication date: July 3, 2014Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Tzu-Jin YEH, Chewn-Pu JOU, Jun-De JIN
-
Patent number: 8759181Abstract: Methods for forming reduced gate resistance finFETs. Methods for a metal gate transistor structure are disclosed including forming a plurality of semiconductor fins formed over a semiconductor substrate, the fins being arranged in parallel and spaced apart; a metal containing gate electrode formed over the semiconductor substrate and overlying a channel gate region of each of the semiconductor fins, and extending over the semiconductor substrate between the semiconductor fins; an interlevel dielectric layer overlying the gate electrode and the semiconductor substrate; and a plurality of contacts disposed in the interlevel dielectric layer and extending through the interlevel dielectric layer to the gate electrode; a low resistance metal strap formed over the interlevel dielectric layer and coupled to the gate electrode by the plurality of contacts; wherein the plurality of contacts are spaced apart from the channel gate regions of the semiconductor fins. Additional methods are disclosed.Type: GrantFiled: June 26, 2013Date of Patent: June 24, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chewn-Pu Jou, Tzu-Jin Yeh, Hsieh-Hung Hsieh
-
Patent number: 8742871Abstract: A bandpass filter comprises a first capacitor, a second capacitor, a third capacitor and at least two resonators. The first and second capacitors are coupled in parallel with each other, and each of the first and second capacitors includes an input. The third capacitor is coupled between the first capacitor and the second capacitor at their respective inputs. The at least two resonators are coupled in parallel with the first capacitor and the second capacitor and are positioned adjacent to each other at a distance such that the at least one component of the resonators are electromagnetically coupled together to provide three (3) transmission zeros.Type: GrantFiled: March 10, 2011Date of Patent: June 3, 2014Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Jun-De Jin, Ming Hsien Tsai, Tzu-Jin Yeh
-
Patent number: 8729968Abstract: A built-in self-test circuit for testing a voltage controlled oscillator comprises a voltage controlled oscillator, a buffer having an input coupled to an output of the voltage controlled oscillator and a radio frequency peak detector coupled to the output of the buffer. The radio frequency peak detector is configured to receive an ac signal from the voltage controlled oscillator and generate a dc value proportional to the ac signal at an output of the radio frequency peak detector. Furthermore, the output of the radio frequency peak detector generates a dc value proportional to an amplitude of the ac signal from the voltage controlled oscillator when the voltage controlled oscillator functions correctly. On the other hand, the output of the radio frequency peak detector is at zero volts when the voltage controlled oscillator fails to generate an ac signal.Type: GrantFiled: May 9, 2011Date of Patent: May 20, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hsieh-Hung Hsieh, Ming Hsien Tsai, Tzu-Jin Yeh, Chewn-Pu Jou, Fu-Lung Hsueh
-
Publication number: 20140132333Abstract: A method of electrically coupling a first node and a second node of a switch cell includes biasing the second node and a bias node of the switch cell at a direct current (DC) voltage level of a second voltage level greater than a first voltage level. A first switch unit coupled between the first node and the second node is tuned on by a first control signal having a third voltage level. The third voltage level being greater than the first voltage level, and a difference between the third voltage level and the first voltage level is about twice a difference between the second voltage level and the first voltage level. Also, a second switch unit coupled between the second node and the bias node is turned off by a second control signal having the first voltage level.Type: ApplicationFiled: November 9, 2012Publication date: May 15, 2014Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Jun-De JIN, Ming Hsien TSAI, Tzu-Jin YEH
-
Patent number: 8664729Abstract: Methods and apparatus for reduced gate resistance finFET. A metal gate transistor structure is disclosed including a plurality of semiconductor fins formed over a semiconductor substrate, the fins being arranged in parallel and spaced apart; a metal containing gate electrode formed over the semiconductor substrate and overlying a channel gate region of each of the semiconductor fins, and extending over the semiconductor substrate between the semiconductor fins; an interlevel dielectric layer overlying the gate electrode and the semiconductor substrate; and a plurality of contacts disposed in the interlevel dielectric layer and extending through the interlevel dielectric layer to the gate electrode; a low resistance metal strap formed over the interlevel dielectric layer and coupled to the gate electrode by the plurality of contacts; wherein the plurality of contacts are spaced apart from the channel gate regions of the semiconductor fins. Methods for forming the reduced gate finFET are disclosed.Type: GrantFiled: December 14, 2011Date of Patent: March 4, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chewn-Pu Jou, Tzu-Jin Yeh, Hsieh-Hung Hsieh