Patents by Inventor Ulrich Mantz

Ulrich Mantz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Inspection system and inspection method to qualify semiconductor structures
    Patent number: 11378532
    Abstract: An inspection system serves to qualify semiconductor structures. The inspection system has an ion beam source for space-resolved exposition of the structures to be qualified with an ion beam. The inspection system also includes a secondary ion detection device with a mass spectrometer. The mass spectrometer is configured to measure an ion mass to charge ratio in a given bandwidth.
    Type: Grant
    Filed: December 21, 2020
    Date of Patent: July 5, 2022
    Assignees: Carl Zeiss SMT GmbH, Carl Zeiss Microscopy, LLC
    Inventors: Brett Lewis, Wilhelm Kuehn, Deying Xia, Shawn McVey, Ulrich Mantz
  • INSPECTION SYSTEM AND INSPECTION METHOD TO QUALIFY SEMICONDUCTOR STRUCTURES
    Publication number: 20210109046
    Abstract: An inspection system serves to qualify semiconductor structures. The inspection system has an ion beam source for space-resolved exposition of the structures to be qualified with an ion beam. The inspection system also includes a secondary ion detection device with a mass spectrometer. The mass spectrometer is configured to measure an ion mass to charge ratio in a given bandwidth.
    Type: Application
    Filed: December 21, 2020
    Publication date: April 15, 2021
    Inventors: Brett Lewis, Wilhelm Kuehn, Deying Xia, Shawn McVey, Ulrich Mantz
  • Method and device for characterizing a wafer patterned using at least one lithography step
    Patent number: 10509330
    Abstract: In an aspect, a plurality of parameters characteristic of the patterned wafer are determined based on measurements of the intensity of electromagnetic radiation after the diffraction thereof at the patterned wafer. The intensity measurements are carried out for at least one used structure and at least one auxiliary structure. The parameters are determined based on intensity values measured during the intensity measurements for respectively different combinations of wavelength, polarization and/or order of diffraction, and also on the basis of correspondingly calculated intensity values, with a mathematical optimization method being applied.
    Type: Grant
    Filed: March 12, 2018
    Date of Patent: December 17, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hans-Michael Stiepan, Andy Zott, Ulrich Mantz
  • METHOD AND DEVICE FOR CHARACTERIZING A WAFER PATTERNED USING AT LEAST ONE LITHOGRAPHY STEP
    Publication number: 20180203369
    Abstract: In an aspect, a plurality of parameters characteristic of the patterned wafer are determined based on measurements of the intensity of electromagnetic radiation after the diffraction thereof at the patterned wafer. The intensity measurements are carried out for at least one used structure and at least one auxiliary structure. The parameters are determined based on intensity values measured during the intensity measurements for respectively different combinations of wavelength, polarization and/or order of diffraction, and also on the basis of correspondingly calculated intensity values, with a mathematical optimization method being applied.
    Type: Application
    Filed: March 12, 2018
    Publication date: July 19, 2018
    Inventors: Hans-Michael Stiepan, Andy Zott, Ulrich Mantz
  • Ion sources, systems and methods
    Patent number: 9236225
    Abstract: Ion sources, systems and methods are disclosed.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: January 12, 2016
    Assignee: Carl Zeiss Microscopy, LLC
    Inventors: Billy W. Ward, John A. Notte, IV, Louis S. Farkas, III, Randall G. Percival, Raymond Hill, Klaus Edinger, Lars Markwort, Dirk Aderhold, Ulrich Mantz
  • ION SOURCES, SYSTEMS AND METHODS
    Publication number: 20150213997
    Abstract: Ion sources, systems and methods are disclosed.
    Type: Application
    Filed: April 13, 2015
    Publication date: July 30, 2015
    Inventors: Billy W. Ward, John A. Notte, IV, Louis S. Farkas, III, Randall G. Percival, Raymond Hill, Klaus Edinger, Lars Markwort, Dirk Aderhold, Ulrich Mantz
  • Ion sources, systems and methods
    Patent number: 9012867
    Abstract: Ion sources, systems and methods are disclosed.
    Type: Grant
    Filed: May 23, 2014
    Date of Patent: April 21, 2015
    Assignee: Carl Zeiss Microscopy, LLC
    Inventors: Billy W. Ward, John A. Notte, IV, Louis S. Farkas, Randall G. Percival, Raymond Hill, Klaus Edinger, Lars Markwort, Dirk Aderhold, Ulrich Mantz
  • ION SOURCES, SYSTEMS AND METHODS
    Publication number: 20140306121
    Abstract: Ion sources, systems and methods are disclosed.
    Type: Application
    Filed: May 23, 2014
    Publication date: October 16, 2014
    Applicant: Carl Zeiss Microscopy, LLC
    Inventors: Billy W. Ward, John A. Notte, IV, Louis S. Farkas, III, Randall G. Percival, Raymond Hill, Klaus Edinger, Lars Markwort, Dirk Aderhold, Ulrich Mantz
  • Ion sources, systems and methods
    Patent number: 8748845
    Abstract: Ion sources, systems and methods are disclosed.
    Type: Grant
    Filed: January 24, 2012
    Date of Patent: June 10, 2014
    Assignee: Carl Zeiss Microscopy, LLC
    Inventors: Billy W. Ward, John A. Notte, Louis S. Farkas, Randall G. Percival, Raymond Hill, Klaus Edinger, Lars Markwort, Dirk Aderhold, Ulrich Mantz
  • Electron beam source and method of manufacturing the same
    Patent number: 8723138
    Abstract: A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.
    Type: Grant
    Filed: February 9, 2012
    Date of Patent: May 13, 2014
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Volker Drexel, Ulrich Mantz, Bernd Irmer, Christian Penzkofer
  • Cross-section systems and methods
    Patent number: 8384029
    Abstract: A first instrument (230) is used to image a first semiconductor article having a trench (110) of defined cross-section, while a second instrument (220) is used to simultaneously prepare a second semiconductor article with a trench of defined cross-section. Furthermore, a method is disclosed to prepare a trench (110) of defined cross-section in a semiconductor article by rough milling and subsequent fine milling.
    Type: Grant
    Filed: June 16, 2009
    Date of Patent: February 26, 2013
    Assignee: Carl Zeiss NTS, LLC
    Inventors: Rainer Knippelmeyer, Lawrence Scipioni, Christoph Riedesel, John Morgan, Ulrich Mantz, Ulrich Wagemann
  • ION SOURCES, SYSTEMS AND METHODS
    Publication number: 20120141693
    Abstract: Ion sources, systems and methods are disclosed.
    Type: Application
    Filed: January 24, 2012
    Publication date: June 7, 2012
    Applicant: ALIS CORPORATION
    Inventors: Billy W. Ward, John A. Notte, IV, Louis S. Farkas, III, Randall G. Percival, Raymond Hill, Klaus Edinger, Lars Markwort, Dirk Aderhold, Ulrich Mantz
  • ELECTRON BEAM SOURCE AND METHOD OF MANUFACTURING THE SAME
    Publication number: 20120131785
    Abstract: A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.
    Type: Application
    Filed: February 9, 2012
    Publication date: May 31, 2012
    Applicants: NANOTOOLS GMBH, CARL ZEISS NTS GMBH
    Inventors: Volker Drexel, Ulrich Mantz, Bernd Irmer, Christian Penzkofer
  • Electron beam source and method of manufacturing the same
    Patent number: 8164071
    Abstract: A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.
    Type: Grant
    Filed: September 30, 2009
    Date of Patent: April 24, 2012
    Assignees: Carl Zeiss NTS GmbH, nanotools GmbH
    Inventors: Volker Drexel, Ulrich Mantz, Bernd Irmer, Christian Penzkofer
  • CROSS-SECTION SYSTEMS AND METHODS
    Publication number: 20120085906
    Abstract: A first instrument (230) is used to image a first semiconductor article having a trench (110) of defined cross-section, while a second instrument (220) is used to simultaneously prepare a second semiconductor article with a trench of defined cross-section. Furthermore, a method is disclosed to prepare a trench (110) of defined cross-section in a semiconductor article by rough milling and subsequent fine milling.
    Type: Application
    Filed: June 16, 2009
    Publication date: April 12, 2012
    Applicant: CARL ZEISS NTS, LLC.
    Inventors: Rainer Knippelmeyer, Lawrence Scipioni, Christoph Riedesel, John Morgan, Ulrich Mantz, Ulrich Wagemann
  • Ion sources, systems and methods
    Patent number: 8110814
    Abstract: Ion sources, systems and methods are disclosed.
    Type: Grant
    Filed: February 2, 2009
    Date of Patent: February 7, 2012
    Assignee: ALIS Corporation
    Inventors: Billy W. Ward, John A. Notte, IV, Louis S. Farkas, III, Randall G. Percival, Raymond Hill, Klaus Edinger, Lars Markwort, Dirk Aderhold, Ulrich Mantz
  • ELECTRON BEAM SOURCE AND METHOD OF MANUFACTURING THE SAME
    Publication number: 20100078557
    Abstract: A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.
    Type: Application
    Filed: September 30, 2009
    Publication date: April 1, 2010
    Applicants: CARL ZEISS NTS GMBH, NANOTOOLS GMBH
    Inventors: Volker Drexel, Ulrich Mantz, Bernd Irmer, Christian Penzkofer
  • ION SOURCES, SYSTEMS AND METHODS
    Publication number: 20090179161
    Abstract: Ion sources, systems and methods are disclosed.
    Type: Application
    Filed: February 2, 2009
    Publication date: July 16, 2009
    Inventors: BILLY W. WARD, JOHN A. NOTTE, IV, LOUIS S. FARKAS, III, RANDAL G. PERCIVAL, RAYMOND HILL, KLAUS EDINGER, LARS MARKWORT, DIRK ADERHOLD, ULRICH MANTZ
  • Ion sources, systems and methods
    Patent number: 7518122
    Abstract: Ion sources, systems and methods are disclosed.
    Type: Grant
    Filed: November 15, 2006
    Date of Patent: April 14, 2009
    Assignee: ALIS Corporation
    Inventors: Billy W. Ward, John A. Notte, IV, Louis S. Farkas, III, Randall G. Percival, Raymond Hill, Ulrich Mantz, Michael Steigerwald
  • Ion sources, systems and methods
    Patent number: 7485873
    Abstract: Ion sources, systems and methods are disclosed.
    Type: Grant
    Filed: November 15, 2006
    Date of Patent: February 3, 2009
    Assignee: ALIS Corporation
    Inventors: Billy W. Ward, John A. Notte, IV, Louis S. Farkas, III, Randall G. Percival, Raymond Hill, Klaus Edinger, Lars Markwort, Dirk Aderhold, Ulrich Mantz