Patents by Inventor Ulrich Schoenhoff
Ulrich Schoenhoff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230279919Abstract: A vibration isolator (10; 210) for supporting a payload and isolating the payload from vibrations has a contact member (12) configured for supporting the payload, at least two pressurized gas compartments (24) arranged offset from each other to support the contact member at different locations, which pressurized gas compartments are connected to each other via a tubing system (54). The tubing system contains at least one restriction (66) at which a cross section of the tubing system is reduced by at least 50%.Type: ApplicationFiled: March 3, 2023Publication date: September 7, 2023Inventors: Alexander Petrus Josephus VAN LANKVELT, Michiel VERVOORDELDONK, Pavel KAGAN, Marc Wilhelmus Maria VAN DER WIJST, Galip Tuna TURKBEY, Marco HUISKAMP, Ulrich SCHOENHOFF
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Patent number: 11703770Abstract: An arrangement of a microlithographic optical imaging device includes first and supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each supporting spring device defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device configured to measure the position and/or orientation of the optical element in relation to a reference in at least one degree of freedom and up to all six degrees of freedom in space. A creep compensation device compensates a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.Type: GrantFiled: June 22, 2021Date of Patent: July 18, 2023Assignee: Carl Zeiss SMT GmbHInventors: Eylem Bektas Knauf, Ulrich Schoenhoff, Marwène Nefzi, Ralf Zweering, Konrad Carl Steimer, Yim-Bun Patrick Kwan
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Publication number: 20210405359Abstract: An arrangement of a microlithographic optical imaging device includes first and supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each supporting spring device defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device configured to measure the position and/or orientation of the optical element in relation to a reference in at least one degree of freedom and up to all six degrees of freedom in space. A creep compensation device compensates a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.Type: ApplicationFiled: June 22, 2021Publication date: December 30, 2021Inventors: Eylem Bektas Knauf, Ulrich Schoenhoff, Marwène Nefzi, Ralf Zweering, Konrad Carl Steimer, Yim-Bun Patrick Kwan
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Publication number: 20210405358Abstract: An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each supporting spring device defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device which is configured to measure the position and/or orientation of the at least one optical element in relation to a reference in at least one degree of freedom. A creep compensation device compensates a creep-induced change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.Type: ApplicationFiled: June 22, 2021Publication date: December 30, 2021Inventors: Eylem Bektas Knauf, Ulrich Schoenhoff, Marwène Nefzi, Ralf Zweering
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Patent number: 10838306Abstract: A microlithographic projection exposure apparatus optical 22 system includes a first reflective surface and at least one second reflective surface, each in the optical beam path. The first reflective surface is movable for the correction of an aberration that occurs during the operation of the optical system. The optical system is configured in so that, during the travel movement of the first reflective surface, the relative position of the first reflective surface and of the second reflective surface is maintainable in a stable manner. Either the first reflective surface and the second reflective surface directly succeed one another in the optical beam path, or there are only reflective optical elements between the first reflective surface and the second reflective surface.Type: GrantFiled: May 1, 2018Date of Patent: November 17, 2020Assignee: Carl Zeiss SMT GmbHInventor: Ulrich Schoenhoff
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Patent number: 10185221Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.Type: GrantFiled: December 4, 2017Date of Patent: January 22, 2019Assignee: Carl Zeiss SMT GmbHInventors: Sascha Bleidistel, Ulrich Schoenhoff, Juergen Fischer
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Patent number: 10108097Abstract: The disclosure relates to arrangements for manipulating the position of an element. An arrangement according has at least one actuator for each degree of freedom of the positional manipulation for exerting adjustable forces on the element, at least one position sensor for each degree of freedom of the positional manipulation for generating in each case a sensor signal that is characteristic of the position of the element, and at least one position controller, which in a position control circuit controls a force exerted on the element by the at least one actuator for the positioning of the element in dependence on the at least one sensor signal. At least one actuator and at least one position sensor are mounted on a common module frame.Type: GrantFiled: July 12, 2017Date of Patent: October 23, 2018Assignee: Carl Zeiss SMT GmbHInventors: Ulrich Schoenhoff, Eylem Bektas, Markus Hauf
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Publication number: 20180246416Abstract: A microlithographic projection exposure apparatus optical 22 system includes a first reflective surface and at least one second reflective surface, each in the optical beam path. The first reflective surface is movable for the correction of an aberration that occurs during the operation of the optical system. The optical system is configured in so that, during the travel movement of the first reflective surface, the relative position of the first reflective surface and of the second reflective surface is maintainable in a stable manner. Either the first reflective surface and the second reflective surface directly succeed one another in the optical beam path, or there are only reflective optical elements between the first reflective surface and the second reflective surface.Type: ApplicationFiled: May 1, 2018Publication date: August 30, 2018Inventor: Ulrich Schoenhoff
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Publication number: 20180181005Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.Type: ApplicationFiled: December 4, 2017Publication date: June 28, 2018Inventors: Sascha Bleidistel, Ulrich Schoenhoff, Juergen Fischer
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Patent number: 9958793Abstract: A lithographic apparatus having a reference body and a positioning system, the positioning system including a main body; a reaction body; an actuator; and a controller. The main body is moveable relative to the reference body along a path in a first direction and a second opposite direction. The reaction body is moveable relative to the main body along a further path in the first and second directions and is moveably connected to the reference body to be moveable relative to the reference body in the first and second directions. The controller provides a first and a second signal to the actuator. The actuator is arranged between the main body and the reaction body to accelerate the main body in the first direction and to accelerate the reaction body in the second direction under control of the first signal, and to accelerate the main body in the second direction and to accelerate the reaction body in the first direction under control of the second signal.Type: GrantFiled: June 26, 2014Date of Patent: May 1, 2018Assignees: ASML NETHERLANDS B.V., CARL ZEISS SMT GMBHInventors: Roan Marinus Westerhof, Hubertus Luberta Hagenaars, Ulrich Schönhoff, Adrianus Josephus Petrus Van Engelen
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Patent number: 9841682Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.Type: GrantFiled: February 10, 2017Date of Patent: December 12, 2017Assignee: Carl Zeiss SMT GmbHInventors: Sascha Bleidistel, Ulrich Schoenhoff, Juergen Fischer
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Publication number: 20170329238Abstract: The disclosure relates to arrangements for manipulating the position of an element. An arrangement according has at least one actuator for each degree of freedom of the positional manipulation for exerting adjustable forces on the element, at least one position sensor for each degree of freedom of the positional manipulation for generating in each case a sensor signal that is characteristic of the position of the element, and at least one position controller, which in a position control circuit controls a force exerted on the element by the at least one actuator for the positioning of the element in dependence on the at least one sensor signal. At least one actuator and at least one position sensor are mounted on a common module frame.Type: ApplicationFiled: July 12, 2017Publication date: November 16, 2017Inventors: Ulrich Schoenhoff, Eylem Bektas, Markus Hauf
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Publication number: 20170153553Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.Type: ApplicationFiled: February 10, 2017Publication date: June 1, 2017Inventors: Sascha Bleidistel, Ulrich Schoenhoff, Juergen Fischer
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Patent number: 9568837Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.Type: GrantFiled: August 5, 2015Date of Patent: February 14, 2017Assignee: Carl Zeiss SMT GmbHInventors: Sascha Bleidistel, Ulrich Schoenhoff, Juergen Fischer
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Patent number: 9448384Abstract: The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising a weight force compensation device for exerting a compensation force on the optical element, wherein the compensation force at least partly compensates for the weight force acting on the optical element, wherein the weight force compensation device has a passive magnetic circuit for generating a force component of the compensation force acting on the optical element, and wherein at least one adjustment element is provided via which the force component generated by the passive magnetic circuit is continuously adjustable.Type: GrantFiled: May 28, 2013Date of Patent: September 20, 2016Assignee: Carl Zeiss SMT GmbHInventors: Michael Erath, Florian Bach, Ulrich Schoenhoff, Rodolfo Rabe, Norbert Muehlberger, Dirk Eicher, Jasper Wesselingh
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Patent number: 9410662Abstract: The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising at least one actuator which exerts a controllable force on the optical element; wherein between the actuator and the optical element a mechanical coupling in the form of a pin is embodied in such a way that, relative to the drive axis of the actuator, the ratio of the stiffness of the mechanical coupling in an axial direction to the stiffness in a lateral direction is at least 100; and at least one damping element which brings about a damping of a natural vibration form of the pin in a lateral direction.Type: GrantFiled: July 12, 2013Date of Patent: August 9, 2016Assignee: Carl Zeiss SMT GmbHInventors: Bernhard Geuppert, Rodolfo Rabe, Ulrich Schoenhoff
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Publication number: 20160109814Abstract: A lithographic apparatus having a reference body and a positioning system, the positioning system including a main body; a reaction body; an actuator; and a controller. The main body is moveable relative to the reference body along a path in a first direction and a second opposite direction. The reaction body is moveable relative to the main body along a further path in the first and second directions and is moveably connected to the reference body to be moveable relative to the reference body in the first and second directions. The controller provides a first and a second signal to the actuator. The actuator is arranged between the main body and the reaction body to accelerate the main body in the first direction and to accelerate the reaction body in the second direction under control of the first signal, and to accelerate the main body in the second direction and to accelerate the reaction body in the first direction under control of the second signal.Type: ApplicationFiled: June 26, 2014Publication date: April 21, 2016Applicants: ASML Netherlands B.V., CARL ZEISS SMT GmbHInventors: Roan Marinus WESTERHOF, Hubertus Luberta HAGENAARS, Ulrich SCHOENHOFF, Adrianus Josephus Petrus VAN ENGELEN
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Patent number: 9304404Abstract: An arrangement actuates an element in a microlithographic projection exposure apparatus. The arrangement includes first and second actuators and first and second mechanical couplings. The first and second actuators are coupled to the element via corresponding ones of the first and second mechanical couplings for applying respective forces to the element which is regulatable in at least one degree of freedom. The first and second actuators have first and second actuator masses, respectively, and the first actuator mass and the first mechanical coupling conjointly define a first mass-spring system operating as a first low-pass filter. The second actuator mass and the second mechanical coupling conjointly define a second mass-spring system operating as a second low-pass filter. The first and second mass-spring systems have first and second natural frequencies deviating from each other by a maximum deviation equal to 10% of the largest of the first and second natural frequencies.Type: GrantFiled: October 21, 2013Date of Patent: April 5, 2016Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.Inventors: Juergen Fischer, Ulrich Schoenhoff, Bernhard Geuppert, Hans Butler, Robertus Johannes Marinus De Jongh
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Publication number: 20160054661Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.Type: ApplicationFiled: August 5, 2015Publication date: February 25, 2016Inventors: Sascha Bleidistel, Ulrich Schoenhoff, Juergen Fischer
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Patent number: 9081292Abstract: The invention relates to an arrangement for actuating an element in an optical system of a projection exposure apparatus, wherein the projection exposure apparatus has a carrying frame, comprising at least one actuator for exerting controllable forces on the element, wherein the actuator has a first actuator part, which is coupled to the carrying frame via at least one mechanical filter, and a second actuator part, which is mechanically coupled directly to the carrying frame, and wherein the loading on the first actuator part is at least partly relieved by the second actuator part when forces are exerted on the element.Type: GrantFiled: September 10, 2013Date of Patent: July 14, 2015Assignee: Carl Zeiss SMT GmbHInventors: Markus Hauf, Ulrich Schoenhoff