Patents by Inventor Ulrich Schoenhoff
Ulrich Schoenhoff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8891172Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.Type: GrantFiled: March 11, 2009Date of Patent: November 18, 2014Assignee: Carl Zeiss SMT GmbHInventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
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Patent number: 8861102Abstract: A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.Type: GrantFiled: July 21, 2011Date of Patent: October 14, 2014Assignee: ASML Netherlands B.V.Inventors: Bastiaan Stephanus Hendricus Jansen, Ulrich Schönhoff, Markus Hauf
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Publication number: 20140300882Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the-degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.Type: ApplicationFiled: June 23, 2014Publication date: October 9, 2014Inventors: Sascha Bleidistel, Ulrich Schoenhoff, Juergen Fischer
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Publication number: 20140204356Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.Type: ApplicationFiled: January 17, 2014Publication date: July 24, 2014Inventors: Sascha Bleidistel, Ulrich Schoenhoff, Juergen Fischer
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Patent number: 8786826Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the ac-tuators is arranged in a node of at least one natural vibration mode of the optical element.Type: GrantFiled: January 17, 2014Date of Patent: July 22, 2014Assignee: Carl Zeiss SMT GmbHInventors: Sascha Bleidistel, Ulrich Schoenhoff, Juergen Fischer
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Publication number: 20140043596Abstract: An arrangement actuates an element in a microlithographic projection exposure apparatus. The arrangement includes first and second actuators and first and second mechanical couplings. The first and second actuators are coupled to the element via corresponding ones of the first and second mechanical couplings for applying respective forces to the element which is regulatable in at least one degree of freedom. The first and second actuators have first and second actuator masses, respectively, and the first actuator mass and the first mechanical coupling conjointly define a first mass-spring system operating as a first low-pass filter. The second actuator mass and the second mechanical coupling conjointly define a second mass-spring system operating as a second low-pass filter. The first and second mass-spring systems have first and second natural frequencies deviating from each other by a maximum deviation equal to 10% of the largest of the first and second natural frequencies.Type: ApplicationFiled: October 21, 2013Publication date: February 13, 2014Applicants: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Juergen Fischer, Ulrich Schoenhoff, Bernhard Geuppert, Hans Butler, Robertus Johannes Marinus De Jongh
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Publication number: 20140016109Abstract: The invention relates to an arrangement for actuating an element in an optical system of a projection exposure apparatus, wherein the projection exposure apparatus has a carrying frame, comprising at least one actuator for exerting controllable forces on the element, wherein the actuator has a first actuator part, which is coupled to the carrying frame via at least one mechanical filter, and a second actuator part, which is mechanically coupled directly to the carrying frame, and wherein the loading on the first actuator part is at least partly relieved by the second actuator part when forces are exerted on the element.Type: ApplicationFiled: September 10, 2013Publication date: January 16, 2014Inventors: Markus Hauf, Ulrich Schoenhoff
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Publication number: 20130314681Abstract: The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising a weight force compensation device (103) for exerting a compensation force on the optical element (101), wherein said compensation force at least partly compensates for the weight force acting on the optical element (101), wherein the weight force compensation device (103) has a passive magnetic circuit for generating a force component of the compensation force acting on the optical element (101), and wherein at least one adjustment element (880) is provided by means of which the force component generated by the passive magnetic circuit is continuously adjustable.Type: ApplicationFiled: May 28, 2013Publication date: November 28, 2013Inventors: Michael Erath, Florian Bach, Ulrich Schoenhoff, Rodolfo Rabe, Norbert Muehlberger, Dirk Eicher, Jasper Wesselingh
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Publication number: 20130314771Abstract: The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising at least one actuator which exerts a controllable force on the optical element; wherein between the actuator and the optical element a mechanical coupling in the form of a pin is embodied in such a way that, relative to the drive axis of the actuator, the ratio of the stiffness of the mechanical coupling in an axial direction to the stiffness in a lateral direction is at least 100; and at least one damping element which brings about a damping of a natural vibration form of the pin in a lateral direction.Type: ApplicationFiled: July 12, 2013Publication date: November 28, 2013Inventors: Bernhard Geuppert, Rodolfo Rabe, Ulrich Schoenhoff
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Patent number: 8508854Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.Type: GrantFiled: December 13, 2010Date of Patent: August 13, 2013Assignee: Carl Zeiss SMT GmbHInventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
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Patent number: 8325322Abstract: The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.Type: GrantFiled: February 4, 2010Date of Patent: December 4, 2012Assignee: Carl Zeiss SMT GmbHInventors: Markus Hauf, Ulrich Schoenhoff, Payam Tayebati, Michael Thier, Tilmann Heil, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner, Aksel Goehnermeier, Dirk Hellweg
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Patent number: 8064151Abstract: A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.Type: GrantFiled: August 14, 2007Date of Patent: November 22, 2011Assignee: ASML Netherlands B.V.Inventors: Bastiaan Stephanus Hendricus Jansen, Ulrich Schönhoff, Markus Hauf
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Publication number: 20110273682Abstract: A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.Type: ApplicationFiled: July 21, 2011Publication date: November 10, 2011Applicant: ASML Netherlands B.V.Inventors: Bastiaan Stephanus Hendricus JANSEN, Ulrich SCHÖNHOFF, Markus HAUF
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Publication number: 20110080569Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.Type: ApplicationFiled: December 13, 2010Publication date: April 7, 2011Applicant: Carl Zeiss SMT GmbHInventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
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Publication number: 20100201958Abstract: The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.Type: ApplicationFiled: February 4, 2010Publication date: August 12, 2010Applicant: Carl Zeiss SMT AGInventors: Markus Hauf, Ulrich Schoenhoff, Payam Tayebati, Michael Thier, Tilmann Heil, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner, Aksel Goehnermeier, Dirk Hellweg
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Publication number: 20090257032Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.Type: ApplicationFiled: March 11, 2009Publication date: October 15, 2009Applicant: CARL ZEISS SMT AGInventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner