Patents by Inventor Uwe Schussler
Uwe Schussler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11713506Abstract: A depositing arrangement for evaporation of a material is disclosed herein. The depositing arrangement has an alkali metal or alkaline earth metal for deposition of the material on a substrate. The deposition arrangement has a first chamber configured for liquefying the material; a valve being in fluid communication with the first chamber, and being downstream of the first chamber, wherein the valve is configured for control of the flow rate of the liquefied material through the valve. The deposition arrangement has an evaporation zone being in fluid communication with the valve, and being downstream of the valve, wherein the evaporation zone is configured for vaporizing the liquefied material; a heating unit to heat the material to higher temperatures before providing the liquid material in the evaporation zone; and one or more outlets for directing the vaporized material towards the substrate.Type: GrantFiled: November 5, 2018Date of Patent: August 1, 2023Assignee: Applied Materials, Inc.Inventors: Stefan Keller, Uwe Schüssler, Jose Manuel Dieguez-Campo, Stefan Bangert, Byung-Sung Kwak
-
Publication number: 20190390322Abstract: A material deposition arrangement for depositing a material on a substrate in a vacuum deposition chamber is described. The material deposition arrangement includes at least one material deposition source having a crucible configured to evaporate the material, a distribution assembly configured for providing the evaporated material to the substrate, and a force application device configured for applying a contact force at a connection between the crucible and the distribution assembly.Type: ApplicationFiled: March 17, 2017Publication date: December 26, 2019Inventors: Jose Manuel DIEGUEZ-CAMPO, Harald WURSTER, Uwe SCHÜSSLER
-
Publication number: 20190071772Abstract: A depositing arrangement for evaporation of a material is disclosed herein. The depositing arrangement has an alkali metal or alkaline earth metal for deposition of the material on a substrate. The deposition arrangement has a first chamber configured for liquefying the material; a valve being in fluid communication with the first chamber, and being downstream of the first chamber, wherein the valve is configured for control of the flow rate of the liquefied material through the valve. The deposition arrangement has an evaporation zone being in fluid communication with the valve, and being downstream of the valve, wherein the evaporation zone is configured for vaporizing the liquefied material; a heating unit to heat the material to higher temperatures before providing the liquid material in the evaporation zone; and one or more outlets for directing the vaporized material towards the substrate.Type: ApplicationFiled: November 5, 2018Publication date: March 7, 2019Inventors: Stefan KELLER, Uwe SCHÜSSLER, Jose Manuel DIEGUEZ-CAMPO, Stefan BANGERT, Byung-Sung KWAK
-
Publication number: 20180187302Abstract: A measurement assembly for measuring a deposition rate of an evaporated material is described. The measurement assembly includes an oscillation crystal for measuring the deposition rate, a measurement outlet for providing evaporated material to the oscillation crystal, and a magnetic closing mechanism configured for opening and closing the measurement outlet by magnetic force.Type: ApplicationFiled: September 21, 2015Publication date: July 5, 2018Inventors: Jose Manuel DIEGUEZ-CAMPO, Andreas LOPP, Uwe SCHÜSSLER, Stefan BANGERT
-
Publication number: 20170092899Abstract: An evaporation source for organic material is described. The evaporation source includes an evaporation crucible, wherein the evaporation crucible is configured to evaporate the organic material, a distribution pipe with one or more outlets provided along the length of the distribution pipe, wherein the distribution pipe is in fluid communication with the evaporation crucible, and wherein the distribution pipe has a cross-section perpendicular to the length of the distribution pipe, which is non-circular, and which includes: an outlet side at which the one or more outlets are provided, wherein the width of the outlet side of the cross-section is 30% or less of the maximum dimension of the cross-section.Type: ApplicationFiled: March 21, 2014Publication date: March 30, 2017Inventors: Stefan BANGERT, Jose Manuel DIEGUEZ-CAMPO, Uwe SCHÜSSLER, Andreas LOPP
-
Publication number: 20170081755Abstract: An evaporation source array for depositing two or more organic materials on a substrate is described. The evaporation source array includes two or more evaporation crucibles, wherein the two or more evaporation crucibles are configured to evaporate the two or more organic materials, two or more distribution pipes with outlets provided along the length of the two or more distribution pipes, wherein a first distribution pipe of the two or more distribution pipes is in fluid communication with a first evaporation crucible of the two or more evaporation crucibles, two or more heat shields, which surround the first distribution pipe, a cooling shield arrangement provided at at least one side of the two or more distribution pipes, wherein the at least one side is the side at which the outlets are provided, and a cooling element provided at or in the cooling shield arrangement for active cooling of the cooling shield arrangement.Type: ApplicationFiled: March 21, 2014Publication date: March 23, 2017Inventors: Jose Manuel DIEGUEZ-CAMPO, Stefan BANGERT, Andreas LOPP, Uwe SCHÜSSLER
-
Publication number: 20150299853Abstract: A depositing arrangement for evaporation of a material including an alkali metal or alkaline earth metal, and for deposition of the material on a substrate (4) is described. The arrangement a first chamber (110) configured for liquefying the material, a valve (130) being in fluid communication with the first chamber, and being downstream of the first chamber, wherein the valve is configured for control of the flow rate of the liquefied material through the valve, an evaporation zone (114) being in fluid communication with the valve, and being downstream of the valve, wherein the evaporation zone is configured for vaporizing the liquefied material, and one or more outlets (116) for directing the vaporized material towards the substrate.Type: ApplicationFiled: December 20, 2013Publication date: October 22, 2015Applicant: Applied Materials, Inc.Inventors: Stefan KELLER, Uwe SCHÜSSLER, Jose Manuel DIEGUEZ-CAMPO, Stefan BANGERT, Leo KWAK BYUNG-SUNG
-
Patent number: 8733277Abstract: A mask support 10 comprises a frame element 20 and an elastic element 30. The elastic element 30 is fixed to the frame element 20. The elastic element 30 is a component integrally formed of a flexible material. It comprises a lever or arm portion 37 having a first engagement protrusion 38 extending in an angle of approximately 90° from the free end of the arm portion 37. A mask assembly 40 comprises a laminar mask 41, e.g. manufactured from a thin metal foil, and connecting elements 42. The connecting elements 42 include an engagement portion 43 for engagement with the engagement protrusion 38 of the elastic element 30. The mask 41 may be attached/stretched to the mask support 10 as well as to detached from the mask support 10 comfortably.Type: GrantFiled: December 1, 2008Date of Patent: May 27, 2014Assignee: Applied Materials, Inc.Inventors: Heike Landgraf, Uwe Schussler, Stefan Bangert
-
Patent number: 8715471Abstract: To be able to realize a relatively wide magnetron sputter cathode, it is proposed that on the vacuum side of a carrier (2) is disposed the sputter target (4) with a backing plate (3), which maintains a gap (14) from the carrier (2). The backing plate (3) is developed as a cooling plate. In it are located cooling means channels (15), which, via an inlet (16) through the carrier (2), are supplied with cooling fluid, which can flow out again via an outlet (17) through the carrier (2). On the atmospheric side is located a magnet configuration (5).Type: GrantFiled: November 21, 2005Date of Patent: May 6, 2014Assignee: Applied Materials GmbH & Co KGInventors: Jörg Krempel-Hesse, Andreas Jischke, Uwe Schüssler, Hans Wolf
-
Patent number: 8137510Abstract: This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode assembly (2) where the material to be sputtered is located on a target (4) with a curved surface, the material to be sputtered being located, in particular, on the lateral surface of a cylinder, there being in a single coating chamber for a coherent coating zone at least three, preferably more, cathode assemblies (2) with rotatable, curved targets (4) positioned one beside the other.Type: GrantFiled: May 4, 2005Date of Patent: March 20, 2012Assignee: Applied Materials GmbH & Co. KGInventors: Stefan Bangert, Frank Fuchs, Ralph Lindenberg, Andreas Lopp, Uwe Schüssler, Tobias Stolley
-
Publication number: 20110185561Abstract: A mask support 10 comprises a frame element 20 and an elastic element 30. The elastic element 30 is fixed to the frame element 20. The elastic element 30 is a component integrally formed of a flexible material. It comprises a lever or arm portion 37 having a first engagement protrusion 38 extending in an angle of approximately 90° from the free end of the arm portion 37. A mask assembly 40 comprises a laminar mask 41, e.g. manufactured from a thin metal foil, and connecting elements 42. The connecting elements 42 include an engagement portion 43 for engagement with the engagement protrusion 38 of the elastic element 30. The mask 41 may be attached/stretched to the mask support 10 as well as to detached from the mask support 10 comfortably.Type: ApplicationFiled: December 1, 2008Publication date: August 4, 2011Inventors: Heike Landgraf, Uwe Schüssler, Stefan Bangert
-
Publication number: 20090134019Abstract: Claimed is a sputtering target system comprising a plurality of backing plates to be individually cooled. Each backing plate is provided on its back side with a meandering groove that is closed off by a sealing plate. The sealing plate is welded around its circumference to the backing plate and at the same time is welded to at least one ridge located at a distance from the frame, which separates two grooved sections from one another. The sealing plate thus welded to the backing plate not only closes off the grooves to form a cooling channel, but also is used for reinforcement of the otherwise relatively flat backing plate.Type: ApplicationFiled: November 25, 2008Publication date: May 28, 2009Inventors: Jorg KREMPEL-HESSE, Andreas JISCHKE, Uwe SCHUSSLER, Hans WOLF
-
Patent number: 7479189Abstract: The present invention relates to a coating plant, especially a vacuum coating plant, with a charging lock, especially a rectangular vacuum lock for a coating chamber, with a lock aperture (13) having a length of at least 1000 mm that comprises a shutter (6) for closing and opening the lock aperture and a latch (7) to secure the shutter, wherein there are provided means for moving the shutter and the latch from a first open position to a second closed position, and vice versa, these means assuring also that the movements of the shutter (6) and the latch (7) will be coupled with each other in such manner that the shutter (6) will be automatically secured by the latch (7) after the shutter has been closed and will be released again before it is opened.Type: GrantFiled: March 11, 2004Date of Patent: January 20, 2009Assignee: Applied Films GmbH & Co. KGInventors: Uwe Schüssler, Stefan Bangert, Jürgen Henrich
-
Publication number: 20080086948Abstract: The present invention relates to a coating plant, especially a vacuum coating plant, with a charging lock, especially a rectangular vacuum lock for a coating chamber, with a lock aperture (13) having a length of at least 1000 mm that comprises a shutter (6) for closing and opening the lock aperture and a latch (7) to secure the shutter, wherein there are provided means for moving the shutter and the latch from a first open position to a second closed position, and vice versa, these means assuring also that the movements of the shutter (6) and the latch (7) will be coupled with each other in such manner that the shutter (6) will be automatically secured by the latch (7) after the shutter has been closed and will be released again before it is opened.Type: ApplicationFiled: December 13, 2007Publication date: April 17, 2008Inventors: Uwe Schussler, Stefan Bangert, Jurgen Henrich
-
Patent number: 7153367Abstract: The invention relates to a drive mechanism for a vacuum treatment apparatus by which substrate holders can be transported around an axis (A—A) from an entrance airlock to an exit airlock. A stationary supporting column (1) is disposed in the center and on it a rotatory drive chamber (6) is borne which has control rods (9) for a rotation and a radial displacement of the substrate holders. In the rotatory drive chamber (6), a motor (4) and rotatory displacement drives for the control rods (9) are arranged on the supporting column (1), the control rods being in active connection each with a corresponding substrate holder.Type: GrantFiled: July 23, 2004Date of Patent: December 26, 2006Assignee: Applied Materials GmbH & Co. KGInventors: Ralph Lindenberg, Michael Konig, Uwe Schussler, Stefan Bangert
-
Publication number: 20060162659Abstract: The present invention relates to a coating plant, especially a vacuum coating plant, with a charging lock, especially a rectangular vacuum lock for a coating chamber, with a lock aperture (13) having a length of at least 1000 mm that comprises a shutter (6) for closing and opening the lock aperture and a latch (7) to secure the shutter, wherein there are provided means for moving the shutter and the latch from a first open position to a second closed position, and vice versa, these means assuring also that the movements of the shutter (6) and the latch (7) will be coupled with each other in such manner that the shutter (6) will be automatically secured by the latch (7) after the shutter has been closed and will be released again before it is opened.Type: ApplicationFiled: March 11, 2004Publication date: July 27, 2006Inventors: Uwe Schussler, Stefan Bangert, Jurgen Henrich
-
Publication number: 20060118412Abstract: To be able to realize a relatively wide magnetron sputter cathode, it is proposed that on the vacuum side of a carrier (2) is disposed the sputter target (4) with a backing plate (3), which maintains a gap (14) from the carrier (2). The backing plate (3) is developed as a cooling plate. In it are located cooling means channels (15), which, via an inlet (16) through the carrier (2), are supplied with cooling fluid, which can flow out again via an outlet (17) through the carrier (2). On the atmospheric side is located a magnet configuration (5).Type: ApplicationFiled: November 21, 2005Publication date: June 8, 2006Inventors: Jorg Krempel-Hesse, Andreas Jischke, Uwe Schussler, Hans Wolf
-
Publication number: 20060108217Abstract: Claimed is a sputtering target system comprising a plurality of backing plates (2, 3, 4) to be individually cooled. Each backing plate (2, 3, 4) is provided on its back side with a meandering groove (5) that is closed off by a sealing plate. The sealing plate (9) is welded around its circumference to the backing plate (2), and at the same time is welded to at least one ridge (7), located at a distance from the frame, which separates two grooved sections from one another. The sealing plate thus welded to the backing plate (3) not only closes off the grooves to form a cooling channel, but also is used for reinforcement of the otherwise relatively flat backing plate (20).Type: ApplicationFiled: February 28, 2005Publication date: May 25, 2006Inventors: Jorg Krempel-Hesse, Andreas Jischke, Uwe Schussler, Hans Wolf
-
Publication number: 20060102863Abstract: This invention relates to a vacuum treatment installation and a device therefor for the tight, especially vacuum-tight closing of an aperture, in particular a slit-like or rectangular aperture with a length that is preferably a multiple of the width of the aperture, in particular for a lock arrangement of a vacuum treatment installation, said device having a closure member (2) and for said closure member a linear drive unit (3,4,5) which, by way of a translational movement, can move the closure member from an open position into a closed position, said closure member having a sealing surface which is disposed in a plane (16) and which, in the closed position, makes sealing contact with a counter-sealing surface on the aperture side, and said plane running perpendicular to the direction of the translational movement (14) and at an oblique angle to the aperture normal (13).Type: ApplicationFiled: June 2, 2005Publication date: May 18, 2006Inventors: Stefan Bangert, Michael Konig, Ralph Lindenberg, Uwe Schussler, Tobias Stolley, Frank Fuchs
-
Publication number: 20050263078Abstract: The invention relates to a drive mechanism for a vacuum treatment apparatus by which substrate holders can be transported around an axis (A-A) from an entrance airlock to an exit airlock. A stationary supporting column (1) is disposed in the center and on it a rotatory drive chamber (6) is borne which has control rods (9) for a rotation and a radial displacement of the substrate holders. In the rotatory drive chamber (6), a motor (4) and rotatory displacement drives for the control rods (9) are arranged on the supporting column (1), the control rods being in active connection each with a corresponding substrate holder.Type: ApplicationFiled: July 23, 2004Publication date: December 1, 2005Inventors: Ralph Lindenberg, Michael Konig, Uwe Schussler, Stefan Bangert