Patents by Inventor Uwe Schussler

Uwe Schussler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050252768
    Abstract: This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode assembly (2) where the material to be sputtered is located on a target (4) with a curved surface, the material to be sputtered being located, in particular, on the lateral surface of a cylinder, there being in a single coating chamber for a coherent coating zone at least three, preferably more, cathode assemblies (2) with rotatable, curved targets (4) positioned one beside the other.
    Type: Application
    Filed: May 4, 2005
    Publication date: November 17, 2005
    Inventors: Stefan Bangert, Frank Fuchs, Ralph Lindenberg, Andreas Lopp, Uwe Schussler, Tobias Stolley
  • Publication number: 20050081791
    Abstract: A vacuum treatment installation is provided for flat substrates of large edge lengths, which are conducted to and treated in an at least substantially perpendicular position. The treatment installation comprises a vacuum chamber with at least two treatment chambers, distributed over the circumference and open at the chamber side, a series of interlocks and a rotatable configuration of substrate holders (13) within the vacuum chamber with a driving mechanism (1) for the sequential rotation and radial movement of the substrate holders (13) relative to the treatment chambers.
    Type: Application
    Filed: September 2, 2004
    Publication date: April 21, 2005
    Inventors: Ralph Lindenberg, Frank Fuchs, Uwe Schussler, Stefan Bangert, Tobias Stolley
  • Publication number: 20050034981
    Abstract: The invention relates to a cathodic sputtering apparatus (8) for coating substrates (17) in a vacuum, comprising an essentially tubular support for the material to be sputtered (2) which is rotatable about its longitudinal axis, a cooling system which is suitable for circulating a cooling medium in the tubular support (2) in conjunction with a cooling device external to the support (2), a device for connecting to an electrical power circuit, and a device for the rotary drive of the tubular support about its longitudinal axis. This apparatus also is provided with a magnet system which extends along the axis for the magnetic confinement of a plasma which is provided near a target made of the material to be sputtered, the magnet system being composed of pole shoes (9, 10), magnet yokes (12, 13) made of magnetically permeable metal, and magnetization means (5) which are suitable for generating a magnetic flux in the magnet system.
    Type: Application
    Filed: May 20, 2004
    Publication date: February 17, 2005
    Inventors: Frank Fuchs, Stefan Bangert, Ralph Lindenberg, Helmut Grimm, Tobias Stolley, Uwe Schussler