Patents by Inventor Vadim Pinskiy

Vadim Pinskiy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200013155
    Abstract: Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.
    Type: Application
    Filed: September 19, 2019
    Publication date: January 9, 2020
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Joseph Succar
  • Patent number: 10518480
    Abstract: Additive manufacturing systems using artificial intelligence can identify an anomaly in a printed layer of an object from a generated topographical image of the printed layer. The additive manufacturing systems can also use artificial intelligence to determine a correlation between the identified anomaly and one or more print parameters, and adaptively adjust one or more print parameters. The additive manufacturing systems can also use artificial intelligence to optimize one or more printing parameters to achieve desired mechanical, optical and/or electrical properties.
    Type: Grant
    Filed: April 2, 2018
    Date of Patent: December 31, 2019
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, Vadim Pinskiy, James Williams, III, Damas Limoge, Aswin Raghav Nirmaleswaran, Mario Chris
  • Patent number: 10481579
    Abstract: Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.
    Type: Grant
    Filed: February 28, 2019
    Date of Patent: November 19, 2019
    Assignee: NANOTRONICS IMAGING, INC.
    Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
  • Publication number: 20190339503
    Abstract: An automatic focus system for an optical microscope that facilitates faster focusing by using at least two offset focusing cameras. Each offset focusing camera can be positioned on a different side of an image forming conjugate plane so that their sharpness curves intersect at the image forming conjugate plane. Focus of a specimen can be adjusted by using sharpness values determined from images taken by the offset focusing cameras.
    Type: Application
    Filed: December 3, 2018
    Publication date: November 7, 2019
    Inventors: John B. Putman, Matthew C. Putman, Vadim Pinskiy, Denis Y. Sharoukhov
  • Patent number: 10467740
    Abstract: Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.
    Type: Grant
    Filed: December 27, 2018
    Date of Patent: November 5, 2019
    Assignee: NANOTRONICS IMAGING, INC.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Joseph Succar
  • Publication number: 20190299536
    Abstract: Additive manufacturing systems using artificial intelligence can identify an anomaly in a printed layer of an object from a generated topographical image of the printed layer. The additive manufacturing systems can also use artificial intelligence to determine a correlation between the identified anomaly and one or more print parameters, and adaptively adjust one or more print parameters. The additive manufacturing systems can also use artificial intelligence to optimize one or more printing parameters to achieve desired mechanical, optical and/or electrical properties.
    Type: Application
    Filed: April 2, 2018
    Publication date: October 3, 2019
    Inventors: Matthew C. Putman, Vadim Pinskiy, James Williams, III, Damas Limoge, Aswin Raghav Nirmaleswaran, Mario Chris
  • Patent number: 10169852
    Abstract: Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.
    Type: Grant
    Filed: July 3, 2018
    Date of Patent: January 1, 2019
    Assignee: NANOTRONICS IMAGING, INC.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Joseph R. Succar
  • Patent number: 10146041
    Abstract: An automatic focus system for an optical microscope that facilitates faster focusing by using at least two offset focusing cameras. Each offset focusing camera can be positioned on a different side of an image forming conjugate plane so that their sharpness curves intersect at the image forming conjugate plane. Focus of a specimen can be adjusted by using sharpness values determined from images taken by the offset focusing cameras.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: December 4, 2018
    Assignee: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Matthew C. Putman, Vadim Pinskiy, Denis Y. Sharoukhov
  • Publication number: 20080251070
    Abstract: A method and apparatus for qualitative sensory signal, capnography-guided intubation is provided. A qualitative sensory signal, such as an audible signal, is generated during intubation of a patient to provide an audible indication of carbon dioxide levels, so as to facilitate proper placement of an intubation tube. The frequency of the audible signal corresponds to measured carbon dioxide levels, thereby providing a simple, easy-to-interpret, audible indication of the current position of an endotracheal tube during intubation, as well as confirmation of proper placement of the tube. Alternatively, the qualitative sensor signal may be an omni-directional visual signal or a palpable vibratory signal.
    Type: Application
    Filed: November 2, 2007
    Publication date: October 16, 2008
    Inventors: Vadim Pinskiy, Glen Atlas, Neil Mori, Harsh Shah, Poonam Dudhat, Vikki Hazel Wood