Patents by Inventor Vadim Yevgenyevich Banine

Vadim Yevgenyevich Banine has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120013872
    Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
    Type: Application
    Filed: September 23, 2011
    Publication date: January 19, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joannes Theodoor DE SMIT, Vadim Yevgenyevich BANINE, Theodorus Hubertus Josephus BISSCHOPS, Marcel Mathijs Theodore Marie DIERICHS, Theodorus Marinus MODDERMAN
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120008117
    Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
    Type: Application
    Filed: September 22, 2011
    Publication date: January 12, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joannes Theodoor DE SMIT, Vadim Yevgenyevich Banine, Theodorus Hubertus Josephus Bisschops, Marcel Mathijs Theodore Marie Dierichs, Theodorus Marinus Modderman
  • Lithographic apparatus and device manufacturing method
    Patent number: 8094288
    Abstract: A lithographic apparatus includes an illumination system configured to transmit a beam of radiation, the beam of radiation comprising desired radiation having a predetermined wavelength or a predetermined wavelength range, and undesired radiation having another wavelength or another wavelength range; a support structure configured to support a patterning structure, the patterning structure being configured to impart the beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate; wherein at least part of the lithographic apparatus, in use, includes a gas substantially transmissive for at least part of the desired radiation and substantially less transmissive for at least part of the undesired radiation.
    Type: Grant
    Filed: May 11, 2004
    Date of Patent: January 10, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors
  • MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS
    Publication number: 20110292366
    Abstract: A multilayer mirror to reflect radiation having a wavelength in the range of 2-8 nm has alternating layers. The alternating layers include a first layer and a second layer. The first and second layers are selected from the group consisting of: U and B4C layers, Th and B4C layers, La and B9C layers, La and B4C layers, U and B9C layers, Th and B9C layers, La and B layers, U and B layers, C and B layers, Th and B layers, U compound and B4C layers, Th compound and B4C layers, La compound and B9C layers, La compound and B4C layers, U compound and a B9C layers, Th compound and a B9C layers, La compound and a B layers, U compound and B layers, and Th compound and a B layers. An interlayer is disposed between at least one of the first layers and the second layer.
    Type: Application
    Filed: January 11, 2010
    Publication date: December 1, 2011
    Inventors: Denis Alexandrovich Glushkov, Vadim Yevgenyevich Banine, Leonid Aizikovitch Sjmaenok, Nikolay Nikolaevitch Salashchenko, Nikolay Ivanovich Chkhalo
  • OPTICAL ELEMENT FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS COMPRISING SUCH OPTICAL ELEMENT AND METHOD FOR MAKING THE OPTICAL ELEMENT
    Publication number: 20110249243
    Abstract: A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.
    Type: Application
    Filed: July 22, 2009
    Publication date: October 13, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Johannes Hubertus josephine Moors, Debis Alexandrovich Glushkov, Andrei Mikhailovich Yakunin
  • Fly's eye integrator, illuminator, lithographic apparatus and method
    Patent number: 8031404
    Abstract: A transmissive fly's eye integrator is disclosed that includes a first array of lenses and a second array of lenses. The first array of lenses and second array of lenses together form a fly's eye integrator, and the first array of lenses and second array of lenses comprise lenses which have a diameter selected from the range of 5 ?m-50 ?m, and a radius of curvature selected from the range of 25 ?m-2500 ?m.
    Type: Grant
    Filed: October 26, 2009
    Date of Patent: October 4, 2011
    Assignee: ASML Netherlands B.V.
    Inventor: Vadim Yevgenyevich Banine
  • IMPRINT LITHOGRAPHY
    Publication number: 20110233825
    Abstract: An imprint lithography apparatus is disclosed which includes a pattern fixing system configured to use actinic radiation to fix a pattern provided in a layer of imprintable medium by an imprint lithography template, and an inspection system configured to use inspection radiation to inspect an element constituting or, in use, being located within, the imprint lithography apparatus. The imprint lithography apparatus is configured such that the pattern fixing system and the inspection system are provided, in use, with, respectively, actinic radiation and inspection radiation from a single source of radiation.
    Type: Application
    Filed: March 23, 2011
    Publication date: September 29, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Sander Frederik Wuister, Vadim Yevgenyevich Banine
  • Mirror, Lithographic Apparatus and Device Manufacturing Method
    Publication number: 20110228243
    Abstract: Embodiments of the invention relate to a mirror (30). The mirror includes a mirroring surface and a profiled coating layer (32a) having an outer surface, wherein one or more wedged elements are formed by the outer surface with respect to the mirroring surface, and wherein the one or more wedged elements having a wedge angle (ΓΈ) in a range of approximately 10-200 mrad. The profiled coating layer may have a curved outer surface. The profiled coating layer may be formed from at least one of the following materials: Be, B, C, P, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Ru, Nb, Mo, Ba, La, Ce, Pr, Pa and U.
    Type: Application
    Filed: July 16, 2009
    Publication date: September 22, 2011
    Inventors: Vadim Yevgenyevich Banine, Leonid Aizikovitch Sjmaenok, Andrei Mikhailovich Yakunin
  • IMPRINT LITHOGRAPHY
    Publication number: 20110226735
    Abstract: An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.
    Type: Application
    Filed: March 18, 2011
    Publication date: September 22, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Sander Frederik Wuister, Vadim Yevgenyevich Banine, Arie Jeffrey Den Boef, Yvonne Wendela Kruijt-Stegeman, Tatyana Viktorovna Rakhimova, Dmitriy Viktorovich Lopaev, Denis Alexandrovich Glushkov, Andrei Mikhailovich Yakunin, Roelof Koole
  • RADIATION SOURCE APPARATUS, LITHOGRAPHIC APPARATUS, METHOD OF GENERATING AND DELIVERING RADIATION AND METHOD FOR MANUFACTURING A DEVICE
    Publication number: 20110222040
    Abstract: A contaminant trap is used in an EUV radiation source apparatus. An EUV radiation beam is generated and focused through a low pressure gaseous atmosphere into a virtual source point. The EUV radiation creates a plasma in the low pressure hydrogen atmosphere through which it passes. A contaminant trap including electrodes is located in or around radiation beam as it approaches the virtual source point. A DC biasing source is connected to the electrodes to create an electric field oriented to deflect out of the beam path contaminant particles that have been negatively charged by the plasma. Additional RF electrodes and/or an ionizer enhance the plasma to increase the charging of the particles. The deflecting electrodes can be operated with RF bias for a short time, to ensure dissipation of the enhanced plasma.
    Type: Application
    Filed: March 11, 2011
    Publication date: September 15, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Jens Arno STEINHOFF, Vadim Yevgenyevich BANINE, Richard Joseph BRULS, Erik Roelof LOOPSTRA, Hendrik Antony Johannes NEERHOF, Adrianus Johannes Maria VAN DIJK, Andrei Mikhailovich YAKUNIN, Luigi SCACCABAROZZI
  • RADIATION SYSTEM, RADIATION COLLECTOR, RADIATION BEAM CONDITIONING SYSTEM, SPECTRAL PURITY FILTER FOR RADIATION SYSTEM AND METHOD FOR FORMING A SPECTRAL PURITY FILTER
    Publication number: 20110223543
    Abstract: A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.
    Type: Application
    Filed: May 5, 2009
    Publication date: September 15, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Wilhelmus Petrus De Boeij, Antonius Johannes Josephus Van Dijsseldonk, Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels
  • Lithographic apparatus, radiation system and device manufacturing method
    Patent number: 8018574
    Abstract: A foil trap is located in a path of a radiation beam. The foil trap includes an array of conductive strips. A voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips. The voltage application circuit includes a current limiting circuit arranged to limit currents to the strips to values below a threshold value above which self-sustained arc discharge may arise in the foil trap.
    Type: Grant
    Filed: June 30, 2005
    Date of Patent: September 13, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Robert Rafilevitch Gayazov, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Evgenii Dmitreevitch Korob, Konstantin Nikolaevitch Koshelev, Givi Georgievitch Zukavishvili, Yurii Victorovitch Sidelnikov
  • Pellicle, lithographic apparatus and device manufacturing method
    Patent number: 8018578
    Abstract: A pellicle for integrated circuit equipment operating in an EUV range includes a multi-layered structure of alternating layers. The pellicle is constructed and arranged to reflect or absorb undesired radiation and to intercept debris to enhance the spectral purity of a radiation beam.
    Type: Grant
    Filed: April 19, 2007
    Date of Patent: September 13, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Arno Jan Bleeker
  • Spectral Purity Filter, Radiation Source, Lithographic Apparatus, and Device Manufacturing Method
    Publication number: 20110211185
    Abstract: A spectral purity filter is configured to allow transmission therethrough of extreme ultraviolet (EUV) radiation and to refract or reflect non-EUV secondary radiation. The spectral purity filter may be part of a source module and/or a lithographic apparatus.
    Type: Application
    Filed: July 9, 2009
    Publication date: September 1, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Martin Jacobus Johan Jak, Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen, Wouter Anthon Soer, Andrei Mikhailovich Yakunin
  • RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110188014
    Abstract: A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation, the radiation source including a chamber in which a plasma is generated; a collector mirror configured to reflect radiation emitted by the plasma; and a debris mitigation system including a gas supply system configured to supply a first gas flow toward the plasma, the first gas flow being selected to thermalize debris generated by the plasma, and a plurality of gas manifolds arranged at a location proximate the collector mirror, the gas manifolds configured to supply a second gas flow in the chamber, the second gas flow being directed toward the plasma to prevent thermalized debris from depositing on the collector mirror.
    Type: Application
    Filed: July 30, 2009
    Publication date: August 4, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Erik Roelof, Johannes Hubertus Josephina Moors
  • LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD
    Publication number: 20110188016
    Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
    Type: Application
    Filed: September 21, 2009
    Publication date: August 4, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pieter Willem Herman De Jager, Vadim Yevgenyevich Banine, Jozef Petrus Henricus Benschop, Cheng-Qun Gui, Johannes Onvlee, Erwin Johan Van Zwet
  • Lithographic Apparatus and Device Manufacturing Method
    Publication number: 20110170083
    Abstract: A system and method are used to detect thermal radiation from a mask. Debris particles on the mask heat up, but do not cool down as quickly as the surrounding mask. Due to the temperature difference, the wavelength of radiation emitted by particles and the mask differs. Thus by detecting the thermal radiation, it is possible to detect the presence of particles deposited on the mask. If particles are detected, the mask can be cleaned.
    Type: Application
    Filed: October 14, 2010
    Publication date: July 14, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Luigi Scaccabarozzi, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Andrei Mikhailovich Yakunin
  • RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS
    Publication number: 20110170079
    Abstract: A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.
    Type: Application
    Filed: April 30, 2009
    Publication date: July 14, 2011
    Applicant: ASML Netherlands B.V
    Inventors: Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Vladimir Vitalevich Ivanov, Vladimir Mihailovitch Krivtsun
  • RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
    Publication number: 20110164236
    Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.
    Type: Application
    Filed: July 21, 2009
    Publication date: July 7, 2011
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Dzmitry Labetski
  • Method of Detecting a Particle and a Lithographic Apparatus
    Publication number: 20110149276
    Abstract: A detector detects radiation from a mask to form an image, but the focal plane of the image is in front of the mask. Any particles arranged on the mask will be in focus. However, the pattern on the mask will be out of focus. It is therefore possible to detect the existence and location of particles on a mask having an arbitrary pattern. The depth of field of the detector is small and the focal plane is no further from the surface of the patterning device than two times the depth of field.
    Type: Application
    Filed: October 14, 2010
    Publication date: June 23, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Luigi SCACCABAROZZI, Vadim Yevgenyevich Banine, Christian Wagner