Patents by Inventor Victor Wang

Victor Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6506994
    Abstract: A heating chamber assembly for heating or maintaining the temperature of at least one wafer, employs thick film heater plates stacked at an appropriate distance to form a slot between each pair of adjacent heater plate surfaces. The heating chamber assembly may be employed adjacent one or more processing chambers to form a preheat station separate from the processing chambers, or may be incorporated in the load lock of one or more such processing chambers. The thick film heater plates are more efficient and have a better response time than conventional heat plates. A chamber surrounding the stack of heater plates is pressure sealable and nay include a purge gas inlet for supply purge gas thereto under pressure. A door to the chamber opens to allow wafers to be inserted or removed and forms a pressure seal upon closing. The slots in the stack are alignable with the door for loading and unloading of wafers.
    Type: Grant
    Filed: June 15, 2001
    Date of Patent: January 14, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Yen-Kun Victor Wang, Mark Fodor, Chen-An Chen, Himanshu Pokharna, Son T. Nguyen, Kelly Fong, Inna Shmurun
  • Publication number: 20020190051
    Abstract: A heating chamber assembly for heating or maintaining the temperature of at least one wafer, employs thick film heater plates stacked at an appropriate distance to form a slot between each pair of adjacent heater plate surfaces. The heating chamber assembly may be employed adjacent one or more processing chambers to form a preheat station separate from the processing chambers, or may be incorporated in the load lock of one or more such processing chambers. The thick film heater plates are more efficient and have a better response time than conventional heat plates. A chamber surrounding the stack of heater plates is pressure sealable and may include a purge gas inlet for supply purge gas thereto under pressure. A door to the chamber opens to allow wafers to be inserted or removed and forms a pressure seal upon closing. The slots in the stack are alignable with the door for loading and unloading of wafers.
    Type: Application
    Filed: June 15, 2001
    Publication date: December 19, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Yen-Kun Victor Wang, Mark Fodor, Chen-An Chen, Himanshu Pokharna, Son T. Nguyen, Kelly Fong, Inna Shmurun
  • Patent number: 6297173
    Abstract: A method for forming an oxynitride gate dielectric layer (202, 204) begins by providing a semiconductor substrate (200). This semiconductor substrate is cleaned via process steps (10-28). Optional nitridation and oxidation are performed via steps (50 and 60) to form a thin interface layer (202). Bulk oxynitride gate deposition occurs via a step (70) to form a bulk gate dielectric material (204) having custom tailored oxygen and nitrogen profile and concentration. A step (10) is then utilized to in situ cap this bulk dielectric layer (204) with a polysilicon or amorphous silicon layer (208). The layer (208) ensures that the custom tailors oxygen and nitrogen profile and concentration of the underlying gate dielectric (204) is preserved even in the presence of subsequent wafer exposure to oxygen ambients.
    Type: Grant
    Filed: August 26, 1999
    Date of Patent: October 2, 2001
    Assignee: Motorola, Inc.
    Inventors: Philip J. Tobin, Rama I. Hegde, Hsing-Huang Tseng, David O'Meara, Victor Wang
  • Patent number: 5972804
    Abstract: A method for forming an oxynitride gate dielectric layer (202, 204) begins by providing a semiconductor substrate (200). This semiconductor substrate is cleaned via process steps (10-28). Optional nitridation and oxidation are performed via steps (50 and 60) to form a thin interface layer (202). Bulk oxynitride gate deposition occurs via a step (70) to form a bulk gate dielectric material (204) having custom tailored oxygen and nitrogen profile and concentration. A step (10) is then utilized to in situ cap this bulk dielectric layer (204) with a polysilicon or amorphous silicon layer (208). The layer (208) ensures that the custom tailors oxygen and nitrogen profile and concentration of the underlying gate dielectric (204) is preserved even in the presence of subsequent wafer exposure to oxygen ambients.
    Type: Grant
    Filed: November 3, 1997
    Date of Patent: October 26, 1999
    Assignee: Motorola, Inc.
    Inventors: Philip J. Tobin, Rama I. Hegde, Hsing-Huang Tseng, David O'Meara, Victor Wang
  • Patent number: 5506500
    Abstract: A coil arrangement having a primary and two balanced secondaries is used to measure ac susceptibility and, using sample movement, also to perform absolute dc moment measurements. Since the same coil arrangement is used for both AC and DC measurements, the measurements can be made successively within a cryogenic chamber without removing the sample. This is a big advantage, because the changed conditions associated with removing and replacing a sample between measurements can cause confusing, uncorrelated results. A high speed voltmeter is used to perform the signal analysis for the moment measurement. The system can be configured to yield high resolution dc moment measurements to 25 ppm and sensitivities to better than 5.times.10.sup.-5 emu.
    Type: Grant
    Filed: April 22, 1994
    Date of Patent: April 9, 1996
    Assignee: Lake Shore Cryotronics, Inc.
    Inventors: John K. Krause, Victor Wang, Bradley C. Dodrill
  • Patent number: 5311125
    Abstract: A sensing coil arrangement including a pair of sensing coils connected in opposition is used to measure AC susceptibility and, using sample movement and a DC magnetization field source, also to sense signals for absolute DC moment measurements. Since the same sensing coil arrangement is used for both AC and DC measurements, the measurements can be made successively in situ without removing the sample from a sample space (e.g., within a cryogenic chamber). This is a big advantage, because the changed conditions associated with removing and replacing a sample between measurements can cause confusing, uncorrelated results. A high speed voltmeter is used to perform the signal analysis for the moment measurement. The system can be configured to yield high resolution DC moment measurements to 25 ppm and sensitivities to better than 5.times.10.sup.-5 emu.
    Type: Grant
    Filed: March 18, 1992
    Date of Patent: May 10, 1994
    Assignee: Lake Shore Cryotronics, Inc.
    Inventors: John K. Krause, Victor Wang, Bradley C. Dodrill
  • Patent number: 4563587
    Abstract: Focused ion beam microfabrication column (10) produces an ion beam from ion source (12), focuses the beam by objective lens (24) onto the plane of electrode (36). ExB filter (44) separates out the ion species at a low energy portion of the beam. The beam of selected species is first accelerated by energy central lens (38) which has a controllable potential for controlling the final beam energy to the target. The beam is accelerated by final accelerator lens (54) and is demagnified and focused on the target by that lens. Beam deflector (64) deflects the beam for programmed ion beam work on the target (60).
    Type: Grant
    Filed: April 7, 1983
    Date of Patent: January 7, 1986
    Assignee: Hughes Aircraft Company
    Inventors: J. William Ward, Victor Wang, Richard P. Vahrenkamp, Robert L. Seliger
  • Patent number: 4431923
    Abstract: The specification discloses a process for accurately aligning a chosen member with a focused beam of radiation or for aligning two chosen members with each other. A set of alignment marks having a predetermined spatial pattern is first provided on the surface of each member. Next, a detection signal is generated from the set of alignment marks, comprising a serial electronic signal as a function of time and containing serial information corresponding to the relative position of each mark in the set of alignment marks. Then, the detection signal is electronically processed to generate an alignment signal with a high signal-to-noise ratio. Next, the alignment signal is compared to a reference signal signifying a predetermined criterion of alignment, to generate an error signal which is indicative of the extent of misalignment.
    Type: Grant
    Filed: February 3, 1982
    Date of Patent: February 14, 1984
    Assignee: Hughes Aircraft Company
    Inventors: Victor Wang, Robert L. Seliger
  • Patent number: 4367429
    Abstract: Alloys suitable for use in liquid metal field ionization ion sources are provided. Such sources include an anode electrode for supporting an ion emitter comprising an alloy in the liquid state. The source further comprises means for generating an ionizing electric field and a reservoir for the liquid metal, ions of which are to be emitted by the source.The alloys are selected from the group consisting of (a) metal-metalloid alloys comprising about 10 to 30 atom percent of at least one metalloid element, the balance at least one transition metal element, (b) early transition-late transition alloys comprising about 30 to 85 atom percent of at least one early transition metal, the balance at least one late transition metal, and (c) Group II alloys comprising about 35 to 80 atom percent of at least one Group II element, the balance at least one metal element.Ions generated in liquid metal ion sources form a high brightness ion beam, which permits focusing a beam of emitted ions to a submicrometer spot.
    Type: Grant
    Filed: November 3, 1980
    Date of Patent: January 4, 1983
    Assignee: Hughes Aircraft Company
    Inventors: Victor Wang, Joseph A. Wysocki, Gregory L. Tangonan, Robert L. Seliger
  • Patent number: 4327292
    Abstract: The specification discloses a process for accurately aligning a chosen member with a focused beam of radiation or for aligning two chosen members with each other. A set of alignment marks having a predetermined spatial pattern is first provided on the surface of each member. Next, a detection signal is generated from the set of alignment marks, comprising a serial electronic signal as a function of time and containing serial information corresponding to the relative position of each mark in the set of alignment marks. Then, the detection signal is electronically processed to generate an alignment signal with a high signal-to-noise ratio. Next, the alignment signal is compared to a reference signal signifying a predetermined criterion of alignment, to generate an error signal which is indicative of the extent of misalignment.
    Type: Grant
    Filed: May 13, 1980
    Date of Patent: April 27, 1982
    Assignee: Hughes Aircraft Company
    Inventors: Victor Wang, Robert L. Seliger
  • Patent number: 4233571
    Abstract: A laser which self-corrects for distortions introduced into the laser beam wavefronts by aberrations and time-varying phenomena internal to the laser. The improved laser includes a partially transmissive first reflecting element, an aperture stop, a lasing medium and a nonlinear phase conjugate reflecting device as the second reflecting element. During laser operation, aberrated wavefronts impinging upon the second reflecting element are reflected as the phase conjugate waveform thereof. The aperture stop restricts laser operation to the fundamental mode which allows only corrected, unaberrated waves to pass through the aperture stop and to subsequently exit the laser. Four embodiments are described utilizing stimulated Brillouin scattering (SBS), four-wave mixing, three-wave mixing and photon echo devices as the second reflecting element.
    Type: Grant
    Filed: September 27, 1978
    Date of Patent: November 11, 1980
    Assignee: Hughes Aircraft Company
    Inventors: Victor Wang, Amnon Yariv
  • Patent number: 4005935
    Abstract: According to one herein disclosed embodiment, an initial uncompensated energy pulse is transmitted towards a remotely located target; a portion of the energy reflected from the target is received, processed so as to be back-scattered from a Brillouin mirror, amplified and then retransmitted along a path coincident with the received path. The backscattered energy from the Brillouin mirror is the complex phase conjugate of the received pulse and consequently the second transmitted pulse is phase encoded such that the effects of phase perturbations encountered along the received path are substantially canceled, and near diffraction-limited convergence of the beam upon the target is obtained.
    Type: Grant
    Filed: July 31, 1975
    Date of Patent: February 1, 1977
    Assignee: Hughes Aircraft Company
    Inventor: Victor Wang
  • Patent number: D438873
    Type: Grant
    Filed: March 17, 2000
    Date of Patent: March 13, 2001
    Assignee: Wells Fargo Bank, N.A.
    Inventors: Victor Wang, Kristofer Chun, Andrew Schmeling, Steve Gustafson, Sonja Aliesch
  • Patent number: D439584
    Type: Grant
    Filed: March 17, 2000
    Date of Patent: March 27, 2001
    Assignee: Wells Fargo Bank, N.A.
    Inventors: Victor Wang, Kristofer Chun, Andrew Schmeling, Steve Gustafson, Sonja Aliesch
  • Patent number: D440575
    Type: Grant
    Filed: March 17, 2000
    Date of Patent: April 17, 2001
    Assignee: Wells Fargo Bank, N.A.
    Inventors: Victor Wang, Kristofer Chun, Andrew Schmeling, Steve Gustafson, Sonja Aliesch
  • Patent number: D440979
    Type: Grant
    Filed: March 17, 2000
    Date of Patent: April 24, 2001
    Assignee: Wells Fargo Bank, N.A.
    Inventors: Victor Wang, Kristofer Chun, Andrew Schmeling, Steve Gustafson, Sonja Aliesch
  • Patent number: D445426
    Type: Grant
    Filed: March 17, 2000
    Date of Patent: July 24, 2001
    Assignee: Wells Fargo, N.A.
    Inventors: Victor Wang, Kristofer Chun, Andrew Schmeling, Steve Gustafson, Sonja Aliesch
  • Patent number: D446790
    Type: Grant
    Filed: March 17, 2000
    Date of Patent: August 21, 2001
    Assignee: Wells Fargo Bank N.A.
    Inventors: Victor Wang, Kristofer Chun, Andrew Schmeling, Steve Gustafson, Sonja Aliesch