Abstract: A hard mask layer and a developable bottom anti-reflective coating (dBARC) layer are formed over a dielectric layer of a substrate. A first photosensitive layer is formed above the dBARC layer, exposed, and developed to form a first pattern. The dBARC layer is developed. The first pattern is etched into the hard mask layer to form a first pattern of openings in the hard mask layer. Following removal of the first photosensitive layer, a second photosensitive layer is formed within the first pattern of openings. The second photosensitive layer is exposed and developed to form a second pattern. The dBARC layer is developed. The second pattern is etched into the hard mask layer to form a second pattern of openings in the hard mask layer. Following the removal of the second photosensitive layer and the dBARC layer, the first and the second patterns are etched into the dielectric layer.

Abstract: A method of performing immersion lithography on a semiconductor wafer is provided. The method includes providing a layer of resist onto a surface of the semiconductor wafer. Next, an edge-bead removal process spins the wafer at a speed greater than 1000 revolutions per minute and dispenses solvent through a nozzle while the wafer is spinning. Then, the resist layer is exposed using an immersion lithography exposure system.

Abstract: Provided is an exposure apparatus including a variable focusing device. The variable focusing device may include a transparent membrane that may be deformed in the presence of an electric field. The deformation of the transparent membrane may allow the focus length of a radiation beam to be modified. In an embodiment, the variable focusing device may be modulated such that a radiation beam having a first focus length is provided for a first position on an exposure target and a radiation beam having a second focus length is provided for a second position on the exposure target. A method and computer-readable medium are also provided.

Abstract: A method of performing immersion lithography on a semiconductor substrate includes providing a layer of resist onto a surface of the semiconductor substrate and exposing the resist layer using an immersion lithography exposure system. The immersion lithography exposure system utilizes a fluid during exposure and may be capable of removing some, but not all, of the fluid after exposure. After exposure, a treatment process is used to neutralize the effect of undesired elements that diffused into the resist layer during the immersion exposure. After treatment, a post-exposure bake and a development step are used.

Abstract: A method of performing immersion lithography on a semiconductor wafer is provided. The method includes providing a layer of resist onto a surface of the semiconductor wafer. Next, an edge-bead removal process spins the wafer at a speed greater than 1000 revolutions per minute and dispenses solvent through a nozzle while the wafer is spinning. Then, the resist layer is exposed using an immersion lithography exposure system.

Abstract: A method of performing immersion lithography on a semiconductor substrate includes providing a layer of resist onto a surface of the semiconductor substrate and exposing the resist layer using an immersion lithography exposure system. The immersion lithography exposure system utilizes a fluid during exposure and may be capable of removing some, but not all, of the fluid after exposure. After exposure, a treatment process is used to remove the remaining portion of fluid from the resist layer. After treatment, a post-exposure bake and a development step are used.

Abstract: An enforcement architecture and method for implementing digital rights management are disclosed. Digital content is distributed from a content server to a computing device of a user and received, and an attempt is made to render the digital content by way of a rendering application. The rendering application invokes a Digital Rights Management (DRM) system, and such DRM system determines whether a right to render the digital content in the manner sought exists based on any digital license stored in the computing device and corresponding to the digital content. If the right does not exist, a digital license that provides such right and that corresponds to the digital content is requested from a license server, and the license server issues the digital license to the DRM system. The computing device receives the issued digital license and stores the received digital license thereon.

Abstract: A digital rights management (DRM) system operates on a computing device and requires a black box for performing decryption and encryption functions. To obtain the black box from a black box server, the DRM system requests such black box from such black box server. The black box server in response generates the black box, where such black box is unique and has a public/private key pair. The black box server then delivers the generated black box to the DRM system and the DRM system installs the delivered black box in such DRM system.

Abstract: A method and device that prevents CD-Writers from writing-failure through a real-time monitor of CD-Writer temperature is provided. The writing-failure preventing device for CD-Writers comprises: a thermo-sensor, a thermo-fetching unit and a writing-setting module. The thermo-sensor installed inside the CD-Writer is used to measure its temperature, whereas the thermo-fetching unit fetches the temperature and has it displayed on a user interface. The writing-setting module has a number of adjustable writing-settings. The user can promptly adjust writing-settings according to the CD-Writer's temperatures to reduce writing speed or correct output Laser amplitude via the user interface. The CD-Writer will perform CD writing within an appropriate range of temperature according to the adjusted settings of writing.

Abstract: An enforcement architecture and method for implementing digital rights management are disclosed. Digital content is distributed from a content server to a computing device of a user and received, and an attempt is made to render the digital content by way of a rendering application. The rendering application invokes a Digital Rights Management (DRM) system, and such DRM system determines whether a right to render the digital content in the manner sought exists based on any digital license stored in the computing device and corresponding to the digital content. If the right does not exist, a digital license that provides such right and that corresponds to the digital content is requested from a license server, and the license server issues the digital license to the DRM system. The computing device receives the issued digital license and stores the received digital license thereon.

Abstract: An apparatus for sorting of equal length records with the sorting time maximally overlapped by the time taken for loading and unloading of records. The minimal structure consists of a decision mechanism linked to and associated with a network of ladder structures. The activity within the network is so synchronized that the sorting activity in most ladders occurs while some ladder within the network is still undergoing the loading of input data; and during the unloading phase, the individually sorted data from each ladder are merged concurrently to produce a sequence of sorted records. The overlap between sorting and loading varies from 0 for records requiring no loading/unloading, to 100% for multi-ladder networks with loading/unloading.A single ladder structure supporting a type of transposition sort is first described both in a full exchange scheme and a fast version. Then, the mechanism for loading/unloading equal length records to the single ladder is set forth.