Patents by Inventor Visweswaren Sivaramakrishnan

Visweswaren Sivaramakrishnan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11926903
    Abstract: Methods for etching alkali metal compounds are disclosed. Some embodiments of the disclosure expose an alkali metal compound to an alcohol to form a volatile metal alkoxide. Some embodiments of the disclosure expose an alkali metal compound to a ?-diketone to form a volatile alkali metal ?-diketonate compound. Some embodiments of the disclosure are performed in-situ after a deposition process. Some embodiments of the disclosure provide methods which selectively etch alkali metal compounds.
    Type: Grant
    Filed: June 9, 2022
    Date of Patent: March 12, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Nitin Deepak, Tapash Chakraborty, Prerna Sonthalia Goradia, Visweswaren Sivaramakrishnan, Nilesh Chimanrao Bagul, Bahubali S. Upadhye
  • Patent number: 11878532
    Abstract: Embodiments described herein relate to an inkjet printing platform. The inkjet printing platform is utilized for fabrication of optical films and optical device structures. The inkjet printing platform includes a transfer chamber, one or more inkjet chambers, a plurality of auxiliary modules, a substrate flipper, and load ports. The inkjet printing platform is operable to perform an inkjet printing process on a substrate to form an optical film and/or an optical device.
    Type: Grant
    Filed: January 12, 2022
    Date of Patent: January 23, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Daihua Zhang, Ludovic Godet, Michael David-Scott Kemp, Kang Luo, Kazuya Daito, Kenneth S. Ledford, Bahubali S. Upadhye, Hemantha Raju, John Rusconi, Elsa Massonneau, Mahendran Chidambaram, Alexey Stepanov, Visweswaren Sivaramakrishnan
  • Publication number: 20240014371
    Abstract: Embodiments of the present disclosure generally relate to battery technology, and more specifically, methods and systems for preparing lithium anodes. In one or more embodiments, a method for producing a lithium intercalated anode includes introducing a sacrificial substrate containing lithium films and an anode substrate containing graphite into a processing region within a chamber. The method also includes combining the sacrificial and anode substrates overlapping one another around a rewinder roller, rotating the rewinder roller to wind the sacrificial and anode substrates together to produce a rolled anode-sacrificial substrate bundle during a winding process. The method also includes heating the sacrificial substrate, the anode substrate, and/or the rolled anode-sacrificial substrate bundle while rotating the rewinder roller and applying a force to the rolled anode-sacrificial substrate bundle via an idle roller during the winding process.
    Type: Application
    Filed: May 19, 2023
    Publication date: January 11, 2024
    Inventors: PrasannaKalleshwara Buddappa RAMACHANDRAPPA, Sambhu Nath KUNDU, Visweswaren SIVARAMAKRISHNAN, Subramanya P. HERLE
  • Patent number: 11807008
    Abstract: Embodiments described herein relate to an inkjet service station and methods of servicing an inkjet printer with the inkjet service station. The inkjet service station is disposed in an inkjet printer of an inkjet chamber. The inkjet service station is operable to perform servicing operations on a processing apparatus of the inkjet printer. The servicing operations include at least one of printhead spitting, printhead purging, printhead flushing, printhead cleaning, printhead drying, or vacuum suction.
    Type: Grant
    Filed: January 12, 2022
    Date of Patent: November 7, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Daihua Zhang, Kang Luo, Kazuya Daito, Kenneth S. Ledford, Elsa Massonneau, Alexey Stepanov, Ludovic Godet, Mahendran Chidambaram, Visweswaren Sivaramakrishnan, Bahubali S. Upadhye, Hemantha Raju
  • Publication number: 20230132290
    Abstract: A deposition system includes an isolator or fume hood and a reactor for coating particles, the reactor including a rotatable reactor assembly positioned within the isolator or fume hood and including a reactor drum configured to hold a plurality of particles to be coated, an inlet tube, and an outlet tube. The reactor drum is configured to be detached from the inlet tube and the outlet tube by an operator while the reactor drum remains within the isolator or fume hood.
    Type: Application
    Filed: October 21, 2022
    Publication date: April 27, 2023
    Inventors: Brian Hayes Burrows, Sekar Krishnasamy, Ayyanagouda Raravi, Monika Mudalkar, Govindraj Desai, Hemantha Kumar Raju, Basavaraj Pattanshetty, David Masayuki Ishikawa, Visweswaren Sivaramakrishnan, Shrikant Swaminathan, Mario Cambron, Robert Navasca, Miaojun Wang, Jonathan Frankel
  • Publication number: 20230128094
    Abstract: A reactor for coating particles includes a rotatable reactor assembly includes a reactor drum configured to hold a plurality of particles to be coated, an inlet tube, and an outlet tube. The drum includes a cylindrical tube, and an inlet-side endplate secured to cover an inlet-side opening of the cylindrical tube and/or an outlet-side endplate secured to cover an outlet-side opening of the cylindrical tube. A stationary gas inlet line is coupled to the inlet tube by a rotary inlet seal, a stationary gas outlet line is coupled to the outlet tube by a rotary outlet seal, and a motor rotates the rotatable reactor assembly. The inlet tube is releasably mechanically secured to the inlet-side endplate and the outlet tube is releasably mechanically secured to the outlet-side endplate.
    Type: Application
    Filed: October 21, 2022
    Publication date: April 27, 2023
    Inventors: Brian Hayes Burrows, Sekar Krishnasamy, Ayyanagouda Raravi, Monika Mudalkar, Govindraj Desai, Hemantha Kumar Raju, Basavaraj Pattanshetty, David Masayuki Ishikawa, Visweswaren Sivaramakrishnan, Shrikant Swaminathan, Mario Cambron, Robert Navasca, Miaojun Wang, Jonathan Frankel
  • Publication number: 20230127489
    Abstract: A reactor for coating particles includes a rotatable reactor assembly including a drum configured to hold a plurality of particles to be coated, an inlet tube, and an outlet tube, a stationary gas inlet line coupled to the inlet tube by a rotary inlet seal, a stationary gas outlet line coupled to the outlet tube by a rotary outlet seal, and a motor to rotate the rotatable reactor assembly.
    Type: Application
    Filed: October 21, 2022
    Publication date: April 27, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Brian Hayes Burrows, Sekar Krishnasamy, Ayyanagouda Raravi, Monika Mudalkar, Govindraj Desai, Hemantha Kumar Raju, Basavaraj Pattanshetty, David Masayuki Ishikawa, Visweswaren Sivaramakrishnan, Shrikant Swaminathan, Mario Cambron, Robert Navasca, Miaojun Wang, Jonathan Frankel
  • Publication number: 20230123795
    Abstract: A method and apparatus for dicing optical devices from a substrate are described herein. The method includes the formation of a plurality of trenches using radiation pulses delivered to the substrate. The radiation pulses are delivered in a pattern to form trenches with varying depth as the trenches extend outward from a top surface of the optical device. The varying depth of the trenches provides edges of each of the optical devices which are slanted. The radiation pulses are UV radiation pulses and are delivered in bursts around the silhouette of the optical devices.
    Type: Application
    Filed: September 15, 2022
    Publication date: April 20, 2023
    Inventors: Wei-Sheng LEI, Zhengping YAO, Mahendran CHIDAMBARAM, Kangkang WANG, Zhihong John LIN, Ludovic GODET, Visweswaren SIVARAMAKRISHNAN
  • Publication number: 20230112873
    Abstract: Embodiments of the present disclosure generally relate to optical devices. More specifically, embodiments described herein relate to a system and method of forming an optical device film. In an embodiment, a method is provided for positioning a substrate in a pre-cleaning chamber disposed in a cluster processing system and pre-cleaning the substrate to remove a native oxide layer from one or more surfaces of the substrate. The substrate is then transferred in an air free state to a deposition chamber disposed in the cluster processing system for forming an optical device film layer on the substrate.
    Type: Application
    Filed: September 30, 2022
    Publication date: April 13, 2023
    Inventors: Kenichi OHNO, Visweswaren SIVARAMAKRISHNAN, Ludovic GODET
  • Publication number: 20230113276
    Abstract: Methods and apparatuses for processing lithium batteries with a laser source having a wide process window, high efficiency, and low cost are provided. The laser source is adapted to achieve high average power and a high frequency of picosecond pulses. The laser source can produce a line-shaped beam either in a fixed position or in scanning mode. The system can be operated in a dry room or vacuum environment. The system can include a debris removal mechanism, for example, inert gas flow, to the processing site to remove debris produced during the patterning process.
    Type: Application
    Filed: September 16, 2022
    Publication date: April 13, 2023
    Inventors: Wei-Sheng LEI, Girish Kumar GOPALAKRISHNAN NAIR, Kent Qiujing ZHAO, Daniel STOCK, Tobias STOLLEY, Thomas DEPPISCH, Jean DELMAS, Kenneth S. LEDFORD, Subramanya P. HERLE, Kiran VACHHANI, Mahendran CHIDAMBARAM, Roland TRASSL, Neil MORRISON, Frank SCHNAPPENBERGER, Kevin Laughton CUNNINGHAM, Stefan BANGERT, James CUSHING, Visweswaren SIVARAMAKRISHNAN
  • Publication number: 20230048728
    Abstract: A method and apparatus for thermal evaporation are provided. The thermal evaporator includes a flat crucible design, which provides an increased surface area for evaporation of the material to be deposited relative to conventional designs. The increased surface area for evaporation means that the more vapor of the evaporated material can be produced, which increases pressure inside the evaporator body leading to increased flow of the evaporated material out of the nozzles. The flat crucible can be attached to an evaporator body of the thermal evaporator. The flat crucible can be integrated within the evaporator body. The evaporator body can include a plurality of longitudinal grooves, which increase the surface area of the evaporator body. The thermal evaporator can include a plurality of baffles which divide the thermal evaporator into separate compartments.
    Type: Application
    Filed: August 4, 2022
    Publication date: February 16, 2023
    Inventors: Sambhu KUNDU, PrasannaKalleshwara Buddappa RAMACHANDRAPPA, Vicente M. LIM, Subramanya P. HERLE, Visweswaren SIVARAMAKRISHNAN
  • Publication number: 20230032638
    Abstract: A physical vapor deposition system includes a deposition chamber, a support to hold a substrate in the deposition chamber, a target in the chamber, a power supply configured to apply power to the target to generate a plasma in the chamber to sputter material from the target onto the substrate to form a piezoelectric layer on the substrate, and a controller configured to cause the power supply to alternate between deposition phases in which the power supply applies power to the target and cooling phases in which power supply does not apply power to the target. Each deposition phase lasts at least 30 seconds and each cooling phase lasts at least 30 seconds.
    Type: Application
    Filed: October 17, 2022
    Publication date: February 2, 2023
    Inventors: Abhijeet Laxman Sangle, Vijay Bhan Sharma, Ankur Kadam, Bharatwaj Ramakrishnan, Visweswaren Sivaramakrishnan, Yuan Xue
  • Patent number: 11557987
    Abstract: Embodiments of the present disclosure generally relate to substrate support assemblies for retaining a surface of a substrate having one or more devices disposed on the surface without contacting the one or more devices and deforming the substrate, and a system having the same. In one embodiment, the substrate support assembly includes an edge ring coupled to a body of the substrate support assembly. A controller is coupled to actuated mechanisms of a plurality of pixels coupled to the body of the substrate support assembly such that portions of pixels corresponding to a portion of the surface of a substrate to be retained are positioned to support the portion without contacting one or more devices disposed on the surface of the substrate to be retained on the support surface.
    Type: Grant
    Filed: November 17, 2021
    Date of Patent: January 17, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Wayne McMillan, Visweswaren Sivaramakrishnan, Joseph C. Olson, Ludovic Godet, Rutger Meyer Timmerman Thijssen, Naamah Argaman
  • Publication number: 20230011303
    Abstract: An evaporation system for providing a gas for a reactive deposition process, reactive deposition apparatuses, and methods of reactive deposition are provided. The evaporation system in includes a multi-zone diffuser assembly for single or double-sided continuous roll-to-roll or batch coating of web substrates. The diffuser assembly is sized to accommodate at least a portion of a coating drum. The diffuser assembly includes a plurality of interchangeable solid plates and diffuser plates for delivering an evaporated material toward a web substrate. The diffuser plates are fluidly coupled with an evaporation source.
    Type: Application
    Filed: May 26, 2022
    Publication date: January 12, 2023
    Inventors: David Masayuki ISHIKAWA, Sumedh Dattatraya ACHARYA, Visweswaren SIVARAMAKRISHNAN
  • Publication number: 20230002268
    Abstract: A method and apparatus for substrate dicing are described. The method includes utilizing a laser to dice a substrate along a dicing path to form a perforated line around each device within the substrate. The dicing path is created by exposing the substrate to bursts of laser pulses at different locations around each device. The laser pulses are delivered to the substrate and may have a pulse repetition frequency of greater than about 25 MHz, a pulse width of less than about 15 picoseconds, and a laser wavelength of about 1.0 ?m to about 5 ?m.
    Type: Application
    Filed: June 9, 2022
    Publication date: January 5, 2023
    Inventors: Wei-Sheng LEI, Mahendran CHIDAMBARAM, Kangkang WANG, Ludovic GODET, Visweswaren SIVARAMAKRISHNAN
  • Publication number: 20220396732
    Abstract: Methods for etching alkali metal compounds are disclosed. Some embodiments of the disclosure expose an alkali metal compound to an alcohol to form a volatile metal alkoxide. Some embodiments of the disclosure expose an alkali metal compound to a ?-diketone to form a volatile alkali metal ?-diketonate compound. Some embodiments of the disclosure are performed in-situ after a deposition process. Some embodiments of the disclosure provide methods which selectively etch alkali metal compounds.
    Type: Application
    Filed: June 9, 2022
    Publication date: December 15, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Nitin Deepak, Tapash Chakraborty, Prerna Sonthalia Goradia, Visweswaren Sivaramakrishnan, Nilesh Chimanrao Bagul, Bahubali S. Upadhye
  • Patent number: 11518100
    Abstract: An additive manufacturing apparatus includes a platform, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform, at least one light source configured to generate a first light beam and a second light beam, a polygon mirror scanner, an actuator, and a galvo mirror scanner. The polygon mirror scanner is configured to receive the first light beam and reflect the first light beam towards the platform. Rotation of the first polygon mirror causes the light beam to move in a first direction along a path on a layer of feed material on the platform. The actuator is configured to cause the path to move along a second direction at a non-zero angle relative to the first direction. The galvo mirror scanner system is configured to receive the second light beam and reflect the second light beam toward the platform.
    Type: Grant
    Filed: May 9, 2019
    Date of Patent: December 6, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Wei-Sheng Lei, Mahendran Chidambaram, Visweswaren Sivaramakrishnan, Kashif Maqsood
  • Publication number: 20220372612
    Abstract: Methods and systems for the delivery of molten metals and metal alloys at a fixed volume are provided. The system includes an evaporation system having a fluid inlet port and a fluid delivery system. The fluid delivery system includes an ampoule operable to hold a source material. The ampoule includes a fluid outlet port and a gas inlet port. The fluid delivery system further includes a fluid delivery line operable to deliver the source material to the evaporation system. The fluid delivery line includes a first end fluidly coupled with the fluid outlet port and a second end fluidly coupled to the fluid inlet port. The fluid delivery line further includes a first isolation valve disposed along the fluid delivery line and a second isolation valve disposed along the fluid delivery line which define a fixed volume of the fluid delivery line.
    Type: Application
    Filed: May 16, 2022
    Publication date: November 24, 2022
    Inventors: PRASANNAKALLESHWARA BUDDAPPA RAMACHANDRAPPA, Sambhu Nath Kundu, Vicente M. Lim, Visweswaren Sivaramakrishnan, Subramanya P. Herle
  • Publication number: 20220372614
    Abstract: Embodiments of the present disclosure generally relate to flexible substrate fabrication. In particular, embodiments described herein relate to an apparatus and methods for flexible substrate fabrication using nip rollers to improve tension uniformity. In one embodiment, a roller assembly includes a primary roller for transporting a flexible substrate, wherein the primary roller has a first end and a second end, wherein the flexible substrate has a coating disposed hereon, and wherein one or more edge regions are not covered by the coating. The roller assembly further includes a first nip roller disposed at the first end of the primary roller that contacts a first edge region of the one or more edge regions, and a second nip roller disposed at the second end of the primary roller that contacts a second edge region of the one or more edge regions.
    Type: Application
    Filed: April 28, 2022
    Publication date: November 24, 2022
    Inventors: Sambhu KUNDU, PrasannaKalleshwara Buddappa RAMACHANDRAPPA, Subramanya P. HERLE, Visweswaren SIVARAMAKRISHNAN
  • Publication number: 20220363060
    Abstract: Embodiments described herein relate to an inkjet service station and methods of servicing an inkjet printer with the inkjet service station. The inkjet service station is disposed in an inkjet printer of an inkjet chamber. The inkjet service station is operable to perform servicing operations on a processing apparatus of the inkjet printer. The servicing operations include at least one of printhead spitting, printhead purging, printhead flushing, printhead cleaning, printhead drying, or vacuum suction.
    Type: Application
    Filed: January 12, 2022
    Publication date: November 17, 2022
    Inventors: Daihua ZHANG, Kang LUO, Kazuya DAITO, Kenneth S. LEDFORD, Elsa MASSONNEAU, Alexey STEPANOV, Ludovic GODET, Mahendran CHIDAMBARAM, Visweswaren SIVARAMAKRISHNAN, Bahubali S. UPADHYE, Hemantha RAJU