Patents by Inventor Vladimir Gorokhovsky
Vladimir Gorokhovsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240043142Abstract: An apparatus generates energetic particles and generates a plasma of a vaporized solid material and gaseous precursors for the application of coatings to surfaces of a substrate by way of condensation of plasma and for electric propulsion applications.Type: ApplicationFiled: October 18, 2023Publication date: February 8, 2024Inventor: Vladimir Gorokhovsky
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Patent number: 11834204Abstract: An apparatus generates energetic particles and generates a plasma of a vaporized solid material and gaseous precursors for the application of coatings to surfaces of a substrate by way of condensation of plasma and for electric propulsion applications.Type: GrantFiled: April 2, 2019Date of Patent: December 5, 2023Assignee: Nano-Product Engineering, LLCInventor: Vladimir Gorokhovsky
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Publication number: 20210340684Abstract: An electrode for an ozone generator or chlorine generator includes an electrically conductive substrate, a doped-Si layer disposed over the conductive substrate, and a boron-doped diamond (BDD) layer disposed over the doped-silicon layer. The doped-silicon layer defines a discrete architecture that maintains adhesion throughout a high temperature CVD boron-doped diamond process. Another electrode having a PVD nitrogen-doped diamond (ta-C:N) layer disposed over a conductive substrate is also provided.Type: ApplicationFiled: July 13, 2021Publication date: November 4, 2021Inventors: Vladimir GOROKHOVSKY, Patrick A. SULLIVAN, Klaus BRONDUM, Patrick Byron JONTE
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Patent number: 11085122Abstract: An electrode for an ozone generator or chlorine generator includes an electrically conductive substrate, a doped-Si layer disposed over the conductive substrate, and a boron-doped diamond (BDD) layer disposed over the doped-silicon layer. The doped-silicon layer defines a discrete architecture that maintains adhesion throughout a high temperature CVD boron-doped diamond process. Another electrode having a PVD nitrogen-doped diamond (ta-C:N) layer disposed over a conductive substrate is also provided.Type: GrantFiled: June 11, 2015Date of Patent: August 10, 2021Assignee: VAPOR TECHNOLOGIES, INC.Inventors: Vladimir Gorokhovsky, Patrick A. Sullivan, Klaus Brondum, Patrick Byron Jonte
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Patent number: 10900117Abstract: A coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall defines a chamber center. A plasma source is positioned at the chamber center. The coating system also includes a sample holder that holds a plurality of substrates to be coated which is rotatable about the chamber center at a first distance from the chamber center. A first isolation shield is positioned about the chamber center at a second distance from the chamber center, the first isolation shield being negatively charged.Type: GrantFiled: October 24, 2018Date of Patent: January 26, 2021Assignee: VAPOR TECHNOLOGIES, INC.Inventors: Vladimir Gorokhovsky, Ganesh Kamath, Bryce Anton, Rudi Koetter
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Patent number: 10900116Abstract: An arc coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall, the top wall, and the bottom wall define a coating cavity and a chamber center. A plasma source is positioned at the chamber center wherein the plasma source comprises a central cathode rod and a plurality of cathode rods surrounding the central cathode rod. The coating system also includes a sample holder that holds a plurality of substrates to be coated. Characteristically, the sample holder rotatable about the chamber center at a first distance from the chamber center.Type: GrantFiled: October 24, 2018Date of Patent: January 26, 2021Assignee: VAPOR TECHNOLOGIES, INC.Inventors: Bryce Anton, Vladimir Gorokhovsky
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Patent number: 10767270Abstract: Electrodes for use within an ozone generator and method for assembling and using the same.Type: GrantFiled: July 13, 2016Date of Patent: September 8, 2020Assignee: Delta Faucet CompanyInventors: Patrick B. Jonte, Klaus Brondum, Patrick Sullivan, Vladimir Gorokhovsky
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Patent number: 10679829Abstract: A reactor includes a plasma duct; a gas inlet, at a distal end of the plasma duct, for receiving a gas; a gas outlet at a proximal end of the plasma duct for removing a portion of the gas to generate a gas flow through the plasma duct; a separating baffle positioned between the plasma duct and the gas outlet for restricting gas flow to maintain high pressure in the plasma duct; a shielded cathodic arc source positioned in a cathode chamber at the proximal end; a remote anode, positioned in the plasma duct, for holding a substrate and cooperating with the cathodic arc source to generate an electron flow opposite the gas flow, to initiate a plasma discharge perpendicular to the remote anode at least in vicinity of the remote anode and deposit ions of the plasma discharge on the substrate to form a diamond coating.Type: GrantFiled: August 17, 2017Date of Patent: June 9, 2020Assignee: Nano-Product Engineering, LLCInventor: Vladimir Gorokhovsky
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Publication number: 20200131620Abstract: An arc coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall, the top wall, and the bottom wall define a coating cavity and a chamber center. A plasma source is positioned at the chamber center wherein the plasma source comprises a central cathode rod and a plurality of cathode rods surrounding the central cathode rod. The coating system also includes a sample holder that holds a plurality of substrates to be coated. Characteristically, the sample holder rotatable about the chamber center at a first distance from the chamber center.Type: ApplicationFiled: October 24, 2018Publication date: April 30, 2020Inventors: BRYCE ANTON, Vladimir Gorokhovsky
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Publication number: 20200131621Abstract: A coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall defines a chamber center. A plasma source is positioned at the chamber center. The coating system also includes a sample holder that holds a plurality of substrates to be coated which is rotatable about the chamber center at a first distance from the chamber center. A first isolation shield is positioned about the chamber center at a second distance from the chamber center, the first isolation shield being negatively charged.Type: ApplicationFiled: October 24, 2018Publication date: April 30, 2020Inventors: VLADIMIR GOROKHOVSKY, GANESH KAMATH, BRYCE ANTON, RUDI KOETTER
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Patent number: 10304665Abstract: A reactor for plasma-assisted chemical vapor deposition includes a plasma duct for containing one or more substrates to be coated by ions; an arc discharge generation system for generating a flow of electrons through the plasma duct from a proximal end toward a distal end of the plasma duct; a gas inlet coupled to the distal end for receiving a reactive gas; a gas outlet coupled to the proximal end for removing at least a portion of the reactive gas to generate a flow of the reactive gas through the plasma duct from the distal end toward the proximal end, to generate the ions from collisions between the electrons and the reactive gas; and a separating baffle positioned for restricting flow of the reactive gas out of the plasma duct to maintain a high pressure in the plasma duct to increase rate of deposition of the ions onto the substrates.Type: GrantFiled: February 18, 2016Date of Patent: May 28, 2019Assignee: Nano-Product Engineering, LLCInventor: Vladimir Gorokhovsky
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Patent number: 10287670Abstract: A low friction top coat over a multilayer metal/ceramic bondcoat provides a conductive substrate, such as a rotary tool, with wear resistance and corrosion resistance. The top coat further provides low friction and anti-stickiness as well as high compressive stress. The high compressive stress provided by the top coat protects against degradation of the tool due to abrasion and torsional and cyclic fatigue. Substrate temperature is strictly controlled during the coating process to preserve the bulk properties of the substrate and the coating. The described coating process is particularly useful when applied to shape memory alloys.Type: GrantFiled: April 16, 2018Date of Patent: May 14, 2019Assignee: G & H Technologies, LLCInventors: Vladimir Gorokhovsky, Brad B. Heckerman, Yuhang Cheng
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Publication number: 20180245202Abstract: A low friction top coat over a multilayer metal/ceramic bondcoat provides a conductive substrate, such as a rotary tool, with wear resistance and corrosion resistance. The top coat further provides low friction and anti-stickiness as well as high compressive stress. The high compressive stress provided by the top coat protects against degradation of the tool due to abrasion and torsional and cyclic fatigue. Substrate temperature is strictly controlled during the coating process to preserve the bulk properties of the substrate and the coating. The described coating process is particularly useful when applied to shape memory alloys.Type: ApplicationFiled: April 16, 2018Publication date: August 30, 2018Applicant: G & H Technologies, LLCInventors: Vladimir GOROKHOVSKY, Brad B. HECKERMAN, Yuhang CHENG
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Publication number: 20180247797Abstract: A reactor for plasma-assisted chemical vapor deposition includes a plasma duct for containing one or more substrates to be coated by ions; an arc discharge generation system for generating a flow of electrons through the plasma duct from a proximal end toward a distal end of the plasma duct; a gas inlet coupled to the distal end for receiving a reactive gas; a gas outlet coupled to the proximal end for removing at least a portion of the reactive gas to generate a flow of the reactive gas through the plasma duct from the distal end toward the proximal end, to generate the ions from collisions between the electrons and the reactive gas; and a separating baffle positioned for restricting flow of the reactive gas out of the plasma duct to maintain a high pressure in the plasma duct to increase rate of deposition of the ions onto the substrates.Type: ApplicationFiled: February 18, 2016Publication date: August 30, 2018Inventor: Vladimir Gorokhovsky
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Publication number: 20180240656Abstract: A hybrid filtered arc-magnetron sputtering deposition apparatus includes a coating chamber including a substrate holder for holding a substrate to be coated, a filtered vapor plasma source for generating and delivering a filtered vapor plasma to the substrate, and a first magnetron sputtering source, in the coating chamber, for generating a flow of sputtered metal atoms such that deposition of the sputtered metal atoms onto the substrate coincides with deposition of the filtered vapor plasma onto the substrate. A hybrid filtered arc-magnetron sputtering deposition method includes producing a vapor plasma, filtering the vapor plasma to produce a filtered vapor plasma that is at least partially ionized, sputtering metal atoms from a target, and simultaneously depositing the filtered vapor plasma and the metal atoms onto a substrate, such that deposition onto the substrate of the sputtered metal atoms spatially overlaps with deposition onto the substrate of the filtered vapor plasma.Type: ApplicationFiled: February 18, 2016Publication date: August 23, 2018Inventor: Vladimir Gorokhovsky
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Patent number: 10056237Abstract: A coating system includes a vacuum chamber and a coating assembly. The coating assembly includes a vapor source, a substrate holder, a remote anode electrically coupled to the cathode target, and a cathode chamber assembly. The cathode chamber assembly includes a cathode target, an optional primary anode and a shield which isolates the cathode target from the vacuum chamber. The shield defines an opening for transmitting an electron emission current of a remote arc discharge from the cathode target to the remote anode that streams along the target face long dimension. A primary power supply is connected between the cathode target and the primary anode while a secondary power supply is connected between the cathode target and the remote anode. Characteristically, a linear remote anode dimension and a vapor source short dimension are parallel to a dimension in which an arc spot is steered along the cathode target.Type: GrantFiled: March 15, 2013Date of Patent: August 21, 2018Assignee: VAPOR TECHNOLOGIES, INC.Inventors: Vladimir Gorokhovsky, William Grant, Edward Taylor, David Humenik
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Publication number: 20180171491Abstract: Electrodes for use within an ozone generator and method for assembling and using the same.Type: ApplicationFiled: July 13, 2015Publication date: June 21, 2018Applicant: Delta Faucet CompanyInventors: Patrick B. Jonte, Klaus Brondum, Patrick Sullivan, Vladimir Gorokhovsky
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Patent number: 9945021Abstract: A low friction top coat over a multilayer metal/ceramic bondcoat provides a conductive substrate, such as a rotary tool, with wear resistance and corrosion resistance. The top coat further provides low friction and anti-stickiness as well as high compressive stress. The high compressive stress provided by the top coat protects against degradation of the tool due to abrasion and torsional and cyclic fatigue. Substrate temperature is strictly controlled during the coating process to preserve the bulk properties of the substrate and the coating. The described coating process is particularly useful when applied to shape memory alloys.Type: GrantFiled: August 28, 2015Date of Patent: April 17, 2018Assignee: G&H TECHNOLOGIES, LLCInventors: Vladimir Gorokhovsky, Brad B. Heckerman, Yuhang Cheng
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Patent number: 9793098Abstract: A vacuum coating and plasma treatment system includes a magnetron cathode with a long edge and a short edge. The magnetic pole of the magnetron results in an electromagnetic barrier. At least one remote arc discharge is generated separate from the magnetron cathode and in close proximity to the cathode so that it is confined within a volume adjacent to the magnetron target. The remote arc discharge extends parallel to the long edge of the magnetron target and is defined by the surface of the target on one side and the electromagnetic barrier on all other sides. There is a remote arc discharge cathode hood and anode hood extending over the arc discharge and across the short edge of the magnetron cathode. Outside of the plasma assembly is a magnetic system creating magnetic field lines which extend into and confine the plasma in front of the substrate.Type: GrantFiled: October 28, 2013Date of Patent: October 17, 2017Assignee: Vapor Technologies, Inc.Inventors: Vladimir Gorokhovsky, William Grant, Edward Taylor, David Humenik
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Patent number: 9765635Abstract: An erosion and corrosion resistant protective coating for turbomachinery application includes at least one ceramic or metal-ceramic coating segment deposited on surface of a conductive metal substrate subjected to a pre-deposition treatment by at least blasting to provide the surface with texture. The erosion and corrosion resistant coating has a plurality of dome-like structures with dome width between in range from about 0.01 ?m to about 30 ?m. The at least one coating segment is formed by condensation of ion bombardment from a metal-gaseous plasma flow, wherein, at least during deposition of first micron of the coating segment, deposition rate of metal ions is at least 3 ?m/hr and kinetic energy of deposited metal ions exceeds 5 eV.Type: GrantFiled: August 11, 2016Date of Patent: September 19, 2017Assignee: Nano-Product Engineering, LLC.Inventor: Vladimir Gorokhovsky