Patents by Inventor Vladimir Kamenov
Vladimir Kamenov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10281824Abstract: Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.Type: GrantFiled: January 24, 2017Date of Patent: May 7, 2019Assignee: Carl Zeiss SMT GmbHInventors: Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc, Vladimir Kamenov, Olaf Conradi, Toralf Gruner, Thomas Okon, Alexander Epple
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Publication number: 20180373006Abstract: A method of providing a catadioptric projection includes: providing a first partial objective for imaging an object field onto a first real intermediate image; providing a second partial objective for imaging the first real intermediate image onto a second real intermediate image, in which the second partial objective includes a concave mirror; providing a third partial objective for imaging the second intermediate image onto an image field, the third partial objective including an aperture stop; providing a first folding mirror and a second folding mirror; and providing an antireflection coating onto a surface of at least one lens that is directly adjacent to the concave mirror or that is separate from the concave mirror by a single lens, in which the antireflection coating is designed to have reflectivity of less than 0.2% for a wavelength between 150 nm and 250 nm and for an angle-of-incidence range between 0° and 30°.Type: ApplicationFiled: June 28, 2018Publication date: December 27, 2018Inventors: Alexander Epple, Vladimir Kamenov, Toralf Gruner, Thomas Schicketanz
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Patent number: 10042146Abstract: A method of providing a catadioptric projection includes: providing a first partial objective for imaging an object field onto a first real intermediate image; providing a second partial objective for imaging the first real intermediate image onto a second real intermediate image, in which the second partial objective includes a concave mirror; providing a third partial objective for imaging the second intermediate image onto an image field, the third partial objective including an aperture stop; providing a first folding mirror and a second folding mirror; and providing an antireflection coating onto a surface of at least one lens that is directly adjacent to the concave mirror or that is separate from the concave mirror by a single lens, in which the antireflection coating is designed to have reflectivity of less than 0.2% for a wavelength between 150 nm and 250 nm and for an angle-of-incidence range between 0° and 30°.Type: GrantFiled: July 20, 2017Date of Patent: August 7, 2018Assignee: Carl Zeiss SMT GmbHInventors: Alexander Epple, Vladimir Kamenov, Toralf Gruner, Thomas Schicketanz
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Publication number: 20180095258Abstract: A method of providing a catadioptric projection includes: providing a first partial objective for imaging an object field onto a first real intermediate image; providing a second partial objective for imaging the first real intermediate image onto a second real intermediate image, in which the second partial objective includes a concave mirror; providing a third partial objective for imaging the second intermediate image onto an image field, the third partial objective including an aperture stop; providing a first folding mirror and a second folding mirror; and providing an antireflection coating onto a surface of at least one lens that is directly adjacent to the concave mirror or that is separate from the concave mirror by a single lens, in which the antireflection coating is designed to have reflectivity of less than 0.2% for a wavelength between 150 nm and 250 nm and for an angle-of-incidence range between 0° and 30°.Type: ApplicationFiled: July 20, 2017Publication date: April 5, 2018Inventors: Alexander Epple, Vladimir Kamenov, Toralf Gruner, Thomas Schicketanz
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Patent number: 9921483Abstract: A mirror (1) for EUV lithography includes a substrate (2) and a reflective coating (3, 4). The reflective coating has a first group (3) of layers (3a, 3b) and a second group (4) of layers (4a, 4b), wherein the first group and second group of layers (3a, 3b; 4a, 4b) reflect radiation having a used wavelength between 5 nm and 30 nm. The first group of layers is arranged between the substrate and the second group of layers, and a decoupling coating (6) is arranged between the first group and second group of layers, said decoupling coating optically decoupling the second group of layers from the first group of layers by preventing the radiation having the used wavelength from reaching the first group of layers. The reflective coating preferably has a correction layer (5) having a layer thickness variation for correcting the surface form of the mirror.Type: GrantFiled: December 28, 2015Date of Patent: March 20, 2018Assignee: Carl Zeiss SMT GmbHInventors: Oliver Dier, Tobias Hackl, Franz-Josef Stickel, Ulrich Loering, Tilmann Assmus, Juergen Mueller, Vladimir Kamenov, Siegfried Rennon
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Publication number: 20170322343Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.Type: ApplicationFiled: July 24, 2017Publication date: November 9, 2017Inventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
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Patent number: 9733395Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.Type: GrantFiled: May 20, 2011Date of Patent: August 15, 2017Assignee: Carl Zeiss SMT GmbHInventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
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Patent number: 9726870Abstract: A projection objective for microlithography for imaging an object field onto an image field includes: a first partial objective for imaging the object field onto a first real intermediate image; a second partial objective for imaging the first intermediate image onto a second real intermediate image; a third partial objective for imaging the second intermediate image onto the image field, the third partial objective including an aperture; and a first folding mirror for deflecting radiation toward a concave mirror and a second folding mirror for deflecting the radiation from the concave mirror toward the image plane; in which the projection objective is an immersion projection objective in which during operation an immersion liquid is situated between a last lens surface and an image plane, and at least one surface of at least one lens in the second partial objective has an antireflection coating including at least six layers.Type: GrantFiled: January 21, 2016Date of Patent: August 8, 2017Assignee: Carl Zeiss SMT GmbHInventors: Alexander Epple, Vladimir Kamenov, Toralf Gruner, Thomas Schicketanz
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Publication number: 20170192362Abstract: Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.Type: ApplicationFiled: January 24, 2017Publication date: July 6, 2017Inventors: Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc, Vladimir Kamenov, Olaf Conradi, Toralf Gruner, Thomas Okon, Alexander Epple
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Publication number: 20160231546Abstract: Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.Type: ApplicationFiled: January 21, 2016Publication date: August 11, 2016Inventors: Alexander Epple, Vladimir Kamenov, Toralf Gruner, Thomas Schicketanz
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Publication number: 20160209750Abstract: A mirror (1) for EUV lithography includes a substrate (2) and a reflective coating (3, 4). The reflective coating has a first group (3) of layers (3a, 3b) and a second group (4) of layers (4a, 4b), wherein the first group and second group of layers (3a, 3b; 4a, 4b) reflect radiation having a used wavelength between 5 nm and 30 nm. The first group of layers is arranged between the substrate and the second group of layers, and a decoupling coating (6) is arranged between the first group and second group of layers, said decoupling coating optically decoupling the second group of layers from the first group of layers by preventing the radiation having the used wavelength from reaching the first group of layers. The reflective coating preferably has a correction layer (5) having a layer thickness variation for correcting the surface form of the mirror.Type: ApplicationFiled: December 28, 2015Publication date: July 21, 2016Inventors: Oliver DIER, Tobias HACKL, Franz-Josef STICKEL, Ulrich LOERING, Tilmann ASSMUS, Juergen MUELLER, Vladimir KAMENOV, Siegfried RENNON
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Patent number: 9279969Abstract: Catadioptric projection objectives for microlithography include: a first partial objective for imaging an object field onto a first real intermediate image; a catadioptric partial objective having one concave mirror and a lens for imaging the first intermediate image onto a second real intermediate image; a third partial objective including an aperture stop and no more than four lenses between the aperture stop and an image field, the third partial objective for imaging the second intermediate image onto the image field; and a first folding mirror for deflecting the radiation from the object plane toward the concave mirror and a second folding mirror for deflecting the radiation from the concave mirror toward the image plane. The projection objective is an immersion projection objective. At least one surface of the lens in the catadioptric partial objective has an antireflection coating including at least six layers.Type: GrantFiled: October 9, 2014Date of Patent: March 8, 2016Assignee: Carl Zeiss SMT GmbHInventors: Alexander Epple, Vladimir Kamenov, Toralf Gruner, Thomas Schicketanz
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Patent number: 9097984Abstract: Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.Type: GrantFiled: July 22, 2014Date of Patent: August 4, 2015Assignee: Carl Zeiss SMT GmbHInventors: Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc, Vladimir Kamenov, Olaf Conradi, Toralf Gruner, Thomas Okon, Alexander Epple
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Patent number: 9063439Abstract: A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed. The projection objective includes an optical component configured so that, during use of the projection objective, the optical component generates a stray light component in the exposure field of the projection objective which adapts a parameter of the projection objective to a parameter of a second projection objective. The parameter is the stray light component at the exposure field of the projection objective and/or a variation of the stray light component at the exposure field of the projection objective.Type: GrantFiled: November 24, 2009Date of Patent: June 23, 2015Assignee: Carl Zeiss SMT GmbHInventors: Aksel Goehnermeier, Daniel Kraehmer, Vladimir Kamenov, Michael Totzeck
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Publication number: 20150055212Abstract: Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.Type: ApplicationFiled: October 9, 2014Publication date: February 26, 2015Inventors: Alexander Epple, Vladimir Kamenov, Toralf Gruner, Thomas Schicketanz
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Publication number: 20140333913Abstract: Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.Type: ApplicationFiled: July 22, 2014Publication date: November 13, 2014Inventors: Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc, Vladimir Kamenov, Olaf Conradi, Toralf Gruner, Thomas Okon, Alexander Epple
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Publication number: 20140320955Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.Type: ApplicationFiled: July 15, 2014Publication date: October 30, 2014Inventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
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Patent number: 8873137Abstract: Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.Type: GrantFiled: April 26, 2013Date of Patent: October 28, 2014Assignee: Carl Zeiss SMT GmbHInventors: Alexander Epple, Vladimir Kamenov, Toralf Gruner, Thomas Schicketanz
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Publication number: 20140293256Abstract: Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.Type: ApplicationFiled: June 10, 2014Publication date: October 2, 2014Inventors: Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc, Vladimir Kamenov, Olaf Conradi, Toralf Gruner, Thomas Okon, Alexander Epple
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Publication number: 20130242279Abstract: Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.Type: ApplicationFiled: April 26, 2013Publication date: September 19, 2013Applicant: CARL ZEISS SMT GmbHInventors: Alexander EPPLE, Vladimir KAMENOV, Toralf GRUNER, Thomas SCHICKETANZ