Abstract: An interferometer measuring system comprising two moveable members and a reference member that may have significantly less movement, the group having a number of attached measurement mirrors, interferometers for measuring position and two optical support blocks for the interferometers. The interferometers are used to determine the measured optical path lengths to each of the moveable members and reference member and these positions are used to calculate the misalignment, or error in the relative positions of the moveable members with respect to the reference member. This calculated error is then used to correct the misalignment by moving the appropriate members in the manner directed by the calculation.

Abstract: A stage positioning system including a stationary frame, a slide movable relative to the frame in a first direction, and a support platform connected to the slide and movable therewith in the first direction. The support platform is movably attached to the slide for movement in a second direction generally orthogonal to the first direction. The system will further include a first linear motor containing a first magnet assembly and a first coil device that engages the first magnet assembly to move the slide in the first direction. A second linear will contain a second magnet assembly and a second coil device that engages the second magnet assembly to move the support platform in the second direction. The stage positioning system is particularly suited for positioning an article in electron beam or EUV light lithography systems.

Abstract: A lithography system for processing a substrate is disclosed. The lithography system includes a stage for moving the substrate relative to a beam. The lithography system further includes a chuck for securely holding the substrate during stage movement. The lithography system additionally includes a support assembly for holding the chuck in a fixed position relative to the stage while accommodating for deformations in either the chuck or the stage during processing so as to precisely locate the substrate relative to the stage and to reduce external stresses that cause substrate distortions.

Abstract: A high accuracy stage supported in six degrees of freedom by electromagnetic bearings. Movements in the horizontal plane of the stage are supported by variable reluctance actuators which are mounted between the high accuracy stage and a coarse stage so as not to distort the high accuracy stage during movements thereof. The high accuracy stage is supported in three vertical degrees of freedom by electromagnetic actuator devices which are preferably voice coil motors extending between the coarse stage and the high accuracy stage. Additionally, dead weight supports are provided between the coarse stage and the high accuracy stage for vertically supporting the dead weight of the high accuracy stage. The dead weight supports are preferably air bellows.

Abstract: A simplified reticle removal system used with an electron beam system. The simplified reticle removal system includes a reticle chamber having an angled opening and a maintenance panel removably or pivotably attached thereto. The angled opening provides access to a reticle stage housed within the reticle chamber. The angled opening further permits removal of the reticle stage from the reticle chamber without having to disassemble and remove the optics system of the electron beam system. This reduces maintenance and repair costs, as well as reduces down time of the electron beam system.

Abstract: A three-degree-of-freedom guideless reticle stage is used with a reaction force-countermass assembly. An anti-gravity device such as a flexure is provided between the reticle stage and the reaction force-countermass assembly. The anti-gravity device offsets the weight of the stage to the reaction force-countermass assembly. Improved reticle-positioning is provided, with minimized distortion to the stage base, reduced forces on the frame, high servo bandwidth, three-degree-of-freedom positioning, high throughput, minimized geometry and low moving mass.

Abstract: A method for determining and calibrating substrate plane tilt and image plane tilt in a photolithography system, which includes subjecting a test substrate to multiple exposure series to form image from which image plane tilt and substrate plane tilt about the first axis can be separately determined. For a first exposure series, two test areas aligned along a second axis are subject to the same exposures at the same position along a third axis orthogonal to the horizontal reference plane. The image from this exposure series would indicate the presence of substrate plane tilt if the relative locations of the best focus images in the test areas were substantially different. For a second exposure series, the substrate plane is stepped along the third axis direction and at least one of the test areas is subjected to the same exposure at different positions in the third axis direction.

Abstract: A three-degree-of-freedom guideless reticle stage is used with a reaction force-countermass assembly. An anti-gravity device such as a flexure is provided between the reticle stage and the reaction force-countermass assembly. The anti-gravity device offsets the weight of the stage to the reaction force-countermass assembly. Improved reticle-positioning is provided, with minimized distortion to the stage base, reduced forces on the frame, high servo bandwidth, three-degree-of-freedom positioning, high throughput, minimized geometry and low moving mass.

Abstract: An interferometer measuring system comprising two moveable members and a reference member that may have significantly less movement, the group having a number of attached measurement mirrors, interferometers for measuring position and two optical support blocks for the interferometers. The interferometers are used to determine the measured optical path lengths to each of the moveable members and reference member and these positions are used to calculate the misalignment, or error in the relative positions of the moveable members with respect to the reference member. This calculated error is then used to correct the misalignment by moving the appropriate members in the manner directed by the calculation.

Abstract: The invention provides a reference assembly that is mounted coaxially with an axis of a projection unit used in lithographic equipment to form semiconductor devices and LCDs. The reference assembly is made of a material having a low coefficient of thermal expansion, and the reference assembly has one or more reference features such as a mirror or off-axis alignment system that represent the axis of the projection unit. The reference assembly is attached to a housing of the projection unit by expansion joints such as flexures, which absorb the thermal expansion and contraction of the housing without significantly affecting the relationship of the reference features to the axis of the projection unit. The invention also provides a projection unit incorporating a reference assembly as well as a method of providing reference features and a method of making a semiconductor device.

Abstract: An air bearing stage device which is suitable for use with a vacuum environment is disclosed. According to one aspect of the present invention, a stage apparatus includes a table that is positioned in a system vacuum chamber, a first rod that carries the table, and first and second plates that support the first rod. The first plate includes an air bearing surface that is held against the first side of a first wall by a first vacuum force. A first drive mechanism drives the first plate to move the first rod in a first direction, and also drives the second plate to move the first rod in the first direction, while a second drive mechanism which includes a second rod and a first linear motor causes the second rod to move the first rod in a second direction.

Abstract: A cantilever stage for precision movement and positioning an article such as a reticle in an electron beam photolithography system is disclosed. The cantilever stage comprises a cantilevered support platform for supporting the article extending from a movable member. The cantilever stage is supported by at least one elongate guide extending through a channel defined by the movable member. The cantilever stage may be driven by one or more actuators mechanically coupled to the movable member to move and position the cantilever stage in a first direction along the elongate guide. The actuator may be any suitable actuator such as an electromagnetic drive motors. The movable portion defines an open region which includes the center of gravity of the cantilever stage and is configured to receive a counterbalance or reaction force balancing device. The cantilever stage may also be driven in a second direction, generally perpendicular to the first direction, by an actuator mechanically coupled to the elongate guide.

Abstract: In order to provide a static pressure air bearing having two axes usable in a vacuum environment in which the connection of the supporting air exhaust pipe does not adversely affect the motion of the bearing mechanism, air exhaust pipes are connected only with the fixed part(s) of the lower axis. Air exhaust from the upper axis is conducted through inner air exhaust piping (passages) formed within the fixed parts of the upper and lower axes, so that the exhaust pipes need not be connected with the movable parts.

Abstract: A method for determining and calibrating substrate plane tilt and image plane tilt in a photolithography system, which includes subjecting a test substrate to multiple exposure series to form image from which image plane tilt and substrate plane tilt about the first axis can be separately determined. For a first exposure series, two test areas aligned along a second axis are subject to the same exposures at the same position along a third axis orthogonal to the horizontal reference plane. The image from this exposure series would indicate the presence of substrate plane tilt if the relative locations of the best focus images in the test areas were substantially different. For a second exposure series, the substrate plane is stepped along the third axis direction and at least one of the test areas is subjected to the same exposure at different positions in the third axis direction.

Abstract: A positioning stage system for precise and accurate movement of an article in an electron beam lithography system. The positioning stage system includes a support platform for supporting the article, an X-direction linear motor coupled to an X-member, a Y-direction linear motor coupled a Y-member, and a slide attached to the support platform and slidably engaged to the X-member and the Y-member. The X-member and Y-member, upon actuation of the X-direction and Y-direction linear motors, cause the support platform to move in an X-direction and a Y-direction, respectively.

Abstract: In order to provide a static pressure air bearing having two axes usable in a vacuum environment in which the connection of the supporting air exhaust pipe does not adversely affect the motion of the bearing mechanism, air exhaust pipes are connected only with the fixed part(s) of the lower axis. Air exhaust from the upper axis is conducted through inner air exhaust piping (passages) formed within the fixed parts of the upper and lower axes, so that the exhaust pipes need not be connected with the movable parts.

Abstract: In a system and method for automatically transporting and precisely positioning a work piece at a station for processing, a relatively low precision transport mechanism is utilized to transfer a chuck that holds the work piece to and from the processing station. Notwithstanding the use of the low precision transport mechanism, the chuck can be precisely positioned at the processing station by using a quasi-kinematic coupling. More specifically, the chuck is precisely located at the coupling by engaging pre-defined indexing notches at the coupling. The chuck is securely held against the coupling at the processing station by suction. The coupling may be supported on a precision stage, which is configured to further position the chuck with the work piece thereon with high precision for processing at the processing station. In another aspect of the invention, the chuck is configured to securely hold a smooth surface of the work piece by suction.

Abstract: Apparatus associated with air bearings which are suitable for use in an environment with high vacuum levels. According to one aspect, an air bearing linear guide that is suitable for use in a vacuum environment is arranged to substantially wrap around a portion of a guide beam without covering the ends of the guide beam. The air bearing linear guide includes a sleeve that has an inner surface, and a first air pad that is located on the inner surface of the sleeve. A first land is arranged on the inner surface of the sleeve at least partially around the first air pad, e.g., such that the land is substantially offset from the perimeter of the air pad. The first land and the air pad define a first channel therebetween.

Abstract: A positioning stage assembly having a coarse stage which includes a planar motor driveable in at least two degrees of freedom, and a fine stage positioned on the coarse stage which is driveable in at least three degrees of freedom with respect to the coarse stage. More preferably, the fine stage is driveable in six degrees of freedom and includes variable reluctance actuators for positioning in three degrees of freedom.

Abstract: A wafer stage assembly is provided to be used in combination with a projection lens assembly, such as in a semiconductor wafer manufacturing process. The wafer stage assembly includes a wafer table supported and positioned by a wafer stage and a wafer stage base for carrying a semiconductor wafer. The wafer stage assembly also includes a plurality of sets of sensors to determine a position and a rotation of the wafer table in six degrees of freedom relative to the projection lens assembly. A first set of sensors determines a position and a rotation of the wafer table relative to the projection lens assembly in at least one of the six degrees of freedom, while a second set of sensors determines a position and a rotation of the wafer table relative to the wafer stage base in the remaining of the six degrees of freedom.