Abstract: In a system and method for automatically transporting and precisely positioning a work piece at a station for processing, a relatively low precision transport mechanism is utilized to transfer a chuck that holds the work piece to and from the processing station. Notwithstanding the use of the low precision transport mechanism, the chuck can be precisely positioned at the processing station by using a quasi-kinematic coupling. More specifically, the chuck is precisely located at the coupling by engaging pre-defined indexing notches at the coupling. The chuck is securely held against the coupling at the processing station by suction. The coupling may be supported on a precision stage, which is configured to further position the chuck with the work piece thereon with high precision for processing at the processing station. In another aspect of the invention, the chuck is configured to securely hold a smooth surface of the work piece by suction.

Abstract: A stage positioning system including a stationary frame, a slide movable relative to the frame in a first direction, and a support platform connected to the slide and movable therewith in the first direction. The support platform is movably attached to the slide for movement in a second direction generally orthogonal to the first direction. The system will further include a first linear motor containing a first magnet assembly and a first coil device that engages the first magnet assembly to move the slide in the first direction. A second linear will contain a second magnet assembly and a second coil device that engages the second magnet assembly to move the support platform in the second direction. The stage positioning system is particularly suited for positioning an article in electron beam or EUV light lithography systems.

Abstract: A chuck assembly for use in semiconductor processing equipment includes elements that permit reticle expansion and assembly misalignment without additional reticle deformation. Reticle expansion is allowed by flexible support elements that are positioned to move in the direction of expansion, but that also combine to provide the control necessary for processing. Misalignment is allowed by connections that attach the reticle securely and uniquely to the support elements despite some amount of imperfection in the reticle, or the connections themselves. Accounting in this way for expansion and misalignment prevents additional reticle distortion and thus improves the accuracy of the product.

Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) direction and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam.

Abstract: In order to provide a static pressure air bearing having two axes usable in a vacuum environment in which the connection of the supporting air exhaust pipe does not adversely affect the motion of the bearing mechanism, air exhaust pipes are connected only with the fixed part(s) of the lower axis. Air exhaust from the upper axis is conducted through inner air exhaust piping (passages) formed within the fixed parts of the upper and lower axes, so that the exhaust pipes need not be connected with the movable parts.

Abstract: The embodiments describe linear motor configurations having a polygonal shaped motor coil. The motor coil is e.g. hexagonal, diamond shaped, or double diamond shaped. Coil units are formed in a closed electrically conductive band surrounding a void. Coil units are formed e.g. from flex circuit material or by winding in a racetrack or folded tip fashion. Coil units are arranged in an overlapped shingle like manner to form a motor coil with substantially uniform thickness and high conductor density, providing high efficiency. Due to its substantially uniform thickness, the motor coil has a substantially flat cross section that allows the motor coil to be easily installed and removed from its associated linear magnetic track. The embodiments enable both moving coil and moving magnet linear motor configurations.

Abstract: Methods and apparatus for enabling a high performance reticle stage to be used to scan within an electron beam projection lithography system are disclosed. According to one aspect of the present invention, a scanning apparatus that is suitable for use in an electron beam projection system includes a first guide beam and a translational structure. The first guide beam includes a first vacuum chamber and a second vacuum chamber which are in fluid communication with a first airbearing structure that is a part of the translational structure. The transactional structure is generally arranged to move linearly with respect to the first guide beam, which is at least partially disposed within the translational structure. In one embodiment, the first guide beam includes four contact sides, and the first airbearing structure includes air pads arranged to substantially contact each of the four contact sides.

Abstract: Apparatus and associated method for cooling a linear motor coil includes a motor coil having side walls, and at least one enclosure member which encloses each linear side wall and extends generally co-extensively with a width and a length of the side walls and juxtaposed to the side walls. Coolant passages are formed between and around an exterior of the side walls and the interior walls of at least one enclosure member for enclosing a coolant fluid flowable against the side walls. An inlet plenum is in flow connection to the coolant passages for flowing the coolant fluid through the coolant passages to cool the side walls and an outlet plenum is in flow connection to the coolant passages for removal of coolant fluid heated by operation of the motor coil.

Abstract: A cell for mounting a lens includes a set of resilient mounting structures which can include a plurality of seats affixed to radial flexure mounts, a set of compliant soft mounts or a combination of the radial flexure mounts and soft mounts. The radial flexure mounts additionally include a pair of flexures extending at opposite ends of the flexure mount. The flexures permit the lens to radially expand and contract relative to the cell due to temperature changes. The seats are affixed to the flexure mounts to prevent torsional moments on the flexure mounts due to gravity or vibration. Additionally, there is no torsion moment on the radial flexure mounts due to radial expansion. The set of soft mounts include a spring member for distributing the gravitational load without overconstraining the lens.

Abstract: The invention comprises a platform positionable in at least three degrees of freedom at least partly by interaction with coils. The platform includes a support member having a surface. Magnets are attached to the surface and part of a magnet bearing is attached to the support member. Inner and outer platforms are coupled to each other by magnet bearings and interact with coils to position the inner platform in six degrees of freedom. The invention may be particularly useful in precise positioning of semiconductor wafers and materials during photolithography and other processing.

Abstract: Regular windings for use in an armature in an electric motor. Windings, each having approximately the same shape as a regular winding, may be overlapped to increase a conductor density within a volume encompassing portions of the windings by having a portion of each winding at least partially fill an aperture of an adjacent overlapping winding. The windings are associated with phases used to operate an electric motor. The windings and armature should be particularly useful in linear electric motors and in steppers used in semiconductor manufacture. Windings of the same shape improve manufacturability of the armature and electric motor. High conductor densities in the windings significantly improve efficiency of the electric motor.

Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) direction and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam.

Abstract: A lithographic system includes a chamber housing a stage mechanism and a linear motor coil that drives the stage mechanism. The linear motor includes a coil having two sidewalls, the coil being movable along a magnet track generating a magnetic field. A pair of jacket walls are attached to respective ones of each of the coil sidewalls. Each jacket wall has a pair of relatively thin non-magnetic plates of about 0.75 mm thickness bonded together, at least one facing surface of each of the plates including a liquid flow channel. The plates are made of a non-conductive (and non-magnetic) material, e.g. ceramic such as alumina. Coolant liquid from a liquid source flows through the flow channel in each of the jacket walls. In one embodiment a cooling system is provided where the linear motor coil has a cooling and recirculation circuit including a tank which is kept at a negative pressure of from about -3 psig to about -13 psig.

Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) difection and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam.

Abstract: A dual guide beam stage mechanism for accurate X-Y positioning for use e.g. in semiconductor processing equipment provides accurate planar motion and yaw control. Over-constraint between components in their relative motion is minimized by utilizing flexibly mounted air bearings at the connection between at least one of the moveable guide beams and its corresponding stationary guide, and between at least one of the guide beams and the adjacent stage itself. Thus stage yaw motion is provided by allowing yaw motion of one of the guide beams. Preloading provides enough constraint through the air bearings without over-constraining the moving components, thereby improving accuracy and also reducing the need for close manufacturing tolerances.

Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) direction and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam.

Abstract: The positioning system, particularly useful for moving a stage mounting a semiconductor wafer for the manufacture of semiconductor devices, provides a lead screw and zero backlash nut for coarse motion of the stage. A thrust member fixedly mounts the nut and the member is flexurally mounted to a housing supporting the stage acting through a piezoelectric motor connection. This action brings the stage in a coarse adjustment mode into the capture range of the piezoelectric motor for fine adjustment by in and out movement of a pusher rod extending from the motor. Flexures allow motion of the thrust member parallel to the lead screw and protects the piezoelectric motor from undesirable side loads. A separate duplicate mechanism is used for each of x-axis and y-axis movements of the housing and stage to bring the stage to a precise position by the respective coarse and fine translationary movements of the lead screw, thrust members and piezoelectric motors.

Abstract: An optical alignment apparatus and method for a semiconductor lithography mask and wafer utilizes two monochromatic light sources of different wavelengths. The mask contains targets in the form of linear Fresnel zone plates and the wafer contains a reflecting grating. Incident illumination from the two light sources illuminates the mask targets and is reflected from the wafer gratings in various intensity depending on the physical characteristics of the wafer and mask layers and thicknesses and by the targets. A detector detects the strongest of the diffracted return beams from each of the monochromatic light sources and uses the strongest to align the targets and grating on the mask and wafer for more accurate printing of mask patterns on the wafer.

Abstract: A controlled flow of X-ray attenuating gas such as helium is provided to an upper portion of a beam exposure chamber. A vent tube (21) extends from a lower portion of the chamber adjacent a mask to an exterior exit orifice (23) positioned at mask level to prevent ingress of air to the chamber and prevent mask membrane deflecton and change in the mask-to-silicon wafer substrate gap distance. The substrate (20) is positioned below the mask membrane and is surrounded by a mask-to-wafer zone into which is flowed a substrate fabrication process gas which is vented either by a gas flange (25) in spaced gapped relation to the mask holder and mask, or by a vent tube (46) extending from the zone to an orifice end (46a) approximate the level of the mask. There is then no pressure differential on the top and bottom surfaces of the mask membrane affecting the mask-to-wafer gap distance (8) during substrate fabrication operations.

Abstract: A mask loading apparatus and method employing a cassette (200) detachably mounted on an in-out cassette holder (212). The cassette is made of low Z-materials, and comprises a cover (211) and a bottom mask-supporting tray (202) locked by machine-operable locking members (224) to the cover. A lift cylinder (218) has a vacuum cup (216) which is raised to support and hold the underside (213) of the tray and, when the tray is unlocked from the cover, to move the vacuum cup, tray and mask downwardly and then laterally by a transport arm (203) to a fixed location under a mask holder (205, 220) in a lithographic apparatus.The lift cylinder then raises the cup, tray and mask to abut the mask holder and to transfer the mask to the mask holder. The lift cylinder and empty tray is then lowered and removed from a position blocking the mask as it is to be used in the lithography processing. A reversal of the sequence of steps is utilized to unload the mask from its use mode and return it to its cassette cover.