Patents by Inventor Wataru Shimizu

Wataru Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7960521
    Abstract: To provide a dye capable of forming an anisotropic dye film showing high dichroism and having a high degree of molecular orientation, a composition containing the dye, an anisotropic dye film using the dye and a polarizing element. A trisazo dye, of which the free acid form is represented by the following formula (1), wherein at least one of B1 and D1 has at least one substituent as defined by the following Q1, a dye composition for an anisotropic dye film containing the dye, an anisotropic dye film and a polarizing element using the anisotropic dye film: Q1: an alkyl group or alkoxy group substituted by a hydrogen bond-forming group: wherein A1 is a phenyl group or a naphthyl group, each of B1 and D1 is a phenylene group or a naphthylene group, X1 is an amino group which may be substituted or a hydroxyl group, and m is 0 or 1.
    Type: Grant
    Filed: December 14, 2005
    Date of Patent: June 14, 2011
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Hideo Sano, Masami Kadowaki, Ryuichi Hasegawa, Wataru Shimizu
  • Publication number: 20100304505
    Abstract: There is provided a processing method for performing a recovery process on a damaged layer formed on a surface of a low-k film of a target substrate by introducing a processing gas containing a methyl group into a processing chamber. The method includes: increasing an internal pressure of the processing chamber up to a first pressure lower than a processing pressure for the recovery process by introducing a dilution gas into the processing chamber maintained in a depressurized state; then stopping the introduction of the dilution gas, and increasing the internal pressure of the processing chamber up to a second pressure as the processing pressure for the recovery process by introducing the processing gas into a region where the target substrate exists within the processing chamber; and performing the recovery process on the target substrate while the processing pressure is maintained.
    Type: Application
    Filed: June 1, 2010
    Publication date: December 2, 2010
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Wataru Shimizu, Kazuhiro Kubota, Daisuke Hayashi
  • Patent number: 7658816
    Abstract: A focus ring and a plasma processing apparatus capable of improving an in-surface uniformity of a surface and reducing occurrences of deposition on a backside surface of a peripheral portion of a semiconductor wafer compared to a conventional case are provided. Installed in a vacuum chamber is a susceptor for mounting the semiconductor wafer thereon and a focus ring is installed to surround the semiconductor wafer mounted on the susceptor. The focus ring includes an annular lower member made of a dielectric, and an annular upper member made of a conductive material and mounted on the lower member. The upper member includes a flat portion which is an outer peripheral portion having a top surface positioned higher than a surface to be processed of the semiconductor wafer W, and an inclined portion which is an inner peripheral portion inclined inwardly.
    Type: Grant
    Filed: September 3, 2004
    Date of Patent: February 9, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Akira Koshiishi, Hideaki Tanaka, Nobuyuki Okayama, Masaaki Miyagawa, Shunsuke Mizukami, Wataru Shimizu, Jun Hirose, Toshikatsu Wakaki, Tomonori Miwa, Jun Ooyabu, Daisuke Hayashi
  • Publication number: 20090275742
    Abstract: It is to provide a dye for an anisotropic dye film to be formed by a wet system film-forming method, which is achromatic and has high dichroism and a high degree of molecular orientation, an anisotropic dye film containing the dye and a polarizing element employing the film. A dye for an anisotropic dye film to be formed by a wet system film-forming method, of which the free acid form is represented by the following formula (I), a composition for an anisotropic dye film containing the dye, an anisotropic dye film and a polarizing element employing the anisotropic dye film: wherein A11: a (substituted) phenyl group, a (substituted) naphthyl group or a (substituted) aromatic heterocyclic group; B11: a bivalent aromatic hydrocarbon group or aromatic hydrocyclic group; R11, R22: H, OH, a (substituted) alkyl group, a (substituted) phenyl group or a (substituted) acyl group; n?: 1 or 2; m: 0 or 1.
    Type: Application
    Filed: April 4, 2006
    Publication date: November 5, 2009
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Hideo Sano, Tomio Yoneyama, Masaaki Nishimura, Wataru Shimizu, Ryuichi Hasegawa, Masami Kadowaki, Junichi Oizumi
  • Publication number: 20090267031
    Abstract: To provide a dye capable of forming an anisotropic dye film showing high dichroism and having a high degree of molecular orientation, a composition containing the dye, an anisotropic dye film using the dye and a polarizing element. A trisazo dye, of which the free acid form is represented by the following formula (1), wherein at least one of B1 and D1 has at least one substituent as defined by the following Q1, a dye composition for an anisotropic dye film containing the dye, an anisotropic dye film and a polarizing element using the anisotropic dye film: Q1: an alkyl group or alkoxy group substituted by a hydrogen bond-forming group: wherein A1 is a phenyl group or a naphthyl group, each of B1 and D1 is a phenylene group or a naphthylene group, X1 is an amino group which may be substituted or a hydroxyl group, and m is 0 or 1.
    Type: Application
    Filed: December 14, 2005
    Publication date: October 29, 2009
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Hideo Sano, Masami Kadowaki, Ryuichi Hasegawa, Wataru Shimizu
  • Publication number: 20090209111
    Abstract: A method for fabricating a semiconductor device, according to the present invention includes the steps of: preparing an SOI substrate, which comprises a semiconductor supporting layer, an oxide layer formed on the semiconductor supporting layer and an SOI layer formed on the oxide layer; forming a semiconductor device on the SOI layer; forming a passivation layer over the SOI substrate, the passivation layer allowing a UV light to pass through it; and applying a UV light to the SOI substrate after the step of forming the semiconductor device is completed.
    Type: Application
    Filed: February 13, 2009
    Publication date: August 20, 2009
    Applicant: OKI SEMICONDUCTOR CO., LTD.
    Inventors: Wataru Shimizu, Ikuo Kurachi
  • Patent number: 7551184
    Abstract: There is disclosed a highly convenient user interface which can suitably perform enlarged display of a designated object and suitably allow the user to operate original objects occluded under the object which undergoes the enlarged display or the like. An arbitrary position on a reduced image displayed on a screen of a display unit is designated using a pointer. A pointer sensing unit determines whether or not the designated position falls within the display range of the reduced image, and an enlarged image corresponding to the reduced image is displayed at a position according to the designated position of the pointer within that region.
    Type: Grant
    Filed: August 4, 2006
    Date of Patent: June 23, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventor: Wataru Shimizu
  • Publication number: 20090063954
    Abstract: An XML document is parsed using one of a text XML parser (105) and binary XML parser (106) according to the format of the XML document. A helper application (111) accepts a request to acquire an element described in the XML element to have a designated type. When the parsed type matches the designated type, the helper application (111) outputs the element to a request source; otherwise, it converts the type of the element into the designated type, and then outputs the element to the request source.
    Type: Application
    Filed: August 22, 2008
    Publication date: March 5, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Wataru Shimizu
  • Publication number: 20090040609
    Abstract: The present invention provides an anisotropic dye film having a high dichroic ratio. For this reason, the present invention uses a composition for an anisotropic dye film containing an electron-deficient discotic compound and an electron-rich compound.
    Type: Application
    Filed: April 21, 2006
    Publication date: February 12, 2009
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Ryuichi Hasegawa, Masaaki Nishimura, Tomio Yoneyama, Hideo Sano, Wataru Shimizu, Masami Kadowaki, Kiyoshi Sugiyama
  • Patent number: 7257476
    Abstract: A select lever device for an automatic transmission includes: a torque sensor to detect an input torque to a drive shaft of a select lever; a select position sensor to detect the stroke angle of the select lever; a characteristic data storing unit in which a mechanical load characteristic of the select lever is stored; and a control unit to which signals and data of these elements are inputted. Further, the control unit includes an electric motor to output to the select lever assist torque for assisting the operating force by a driver, the assist torque being controlled based on the input torque to the select lever, the stroke angle of the select lever, and the mechanical load characteristic of the select lever.
    Type: Grant
    Filed: January 7, 2004
    Date of Patent: August 14, 2007
    Assignee: Calsonic Kansei Corporation
    Inventors: Yuzo Shimamura, Nobuaki Tsuchiya, Wataru Shimizu, Toru Aoki
  • Publication number: 20070169891
    Abstract: A focus ring and a plasma processing apparatus capable of improving an in-surface uniformity of a surface and reducing occurrences of deposition on a backside surface of a peripheral portion of a semiconductor wafer compared to a conventional case are provided. Installed in a vacuum chamber is a susceptor for mounting the semiconductor wafer thereon and a focus ring is installed to surround the semiconductor wafer mounted on the susceptor. The focus ring includes an annular lower member made of a dielectric, and an annular upper member made of a conductive material and mounted on the lower member. The upper member includes a flat portion which is an outer peripheral portion having a top surface positioned higher than a surface to be processed of the semiconductor wafer W, and an inclined portion which is an inner peripheral portion inclined inwardly.
    Type: Application
    Filed: September 3, 2004
    Publication date: July 26, 2007
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akira Koshiishi, Hideaki Tanaka, Nobuyuki Okayama, Masaaki Miyagawa, Shunsuke Mizukami, Wataru Shimizu, Jun Hirose, Toshikatsu Wakaki, Tomonori Miwa, Jun Ooyabu, Daisuke Hayashi
  • Publication number: 20070030293
    Abstract: There is disclosed a highly convenient user interface which can suitably perform enlarged display of a designated object and suitably allow the user to operate original objects occluded under the object which undergoes the enlarged display or the like. An arbitrary position on a reduced image displayed on a screen of a display unit is designated using a pointer. A pointer sensing unit determines whether or not the designated position falls within the display range of the reduced image, and an enlarged image corresponding to the reduced image is displayed at a position according to the designated position of the pointer within that region.
    Type: Application
    Filed: August 4, 2006
    Publication date: February 8, 2007
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Wataru Shimizu
  • Publication number: 20060278953
    Abstract: A semiconductor device comprises a lower substrate, an interlayer insulation film formed on the lower substrate, a first wiring pattern having a first wiring layer formed on the lower substrate, a first fuse formed on the interlayer insulation film, and a first contact plug electrically connected between the first wiring layer and first fuse; and a second wiring pattern having a second wiring layer, a second fuse formed on the interlayer insulation film, and a second contact plug electrically connected between the second wiring layer and the second fuse. The second fuse has a region which does not overlap with the first fuse in a width direction, the second wiring pattern is separated from the first wiring pattern by a predetermined distance, and the first fuse has a region which does not overlap with the second fuse in a width direction.
    Type: Application
    Filed: June 9, 2006
    Publication date: December 14, 2006
    Applicant: OKI ELECTRIC INDUSTRY CO., LTD.
    Inventor: Wataru SHIMIZU
  • Publication number: 20060270249
    Abstract: A semiconductor device includes a semiconductor substrate which has a major surface, and a MOS transistor which has a gate and first and second diffusion regions and which is formed on the major surface. The semiconductor device also includes a laminated structure of an SOG layer, wherein the laminated structure is composed of a base layer and a surface layer formed on the base layer. The laminated structure is formed over the MOS transistor, and the surface layer is denser than the base layer.
    Type: Application
    Filed: August 9, 2006
    Publication date: November 30, 2006
    Inventors: Kazuhiko Asakawa, Wataru Shimizu
  • Patent number: 7105464
    Abstract: A semiconductor device includes a semiconductor substrate which has a major surface and a MOS transistor which has a gate and first and second diffusion regions and which is formed on the major surface. The semiconductor device also includes a laminated structure of a SOG layer, wherein the laminated structure is composed of a base layer and a surface layer formed on the base layer and is formed over the MOS transistor and wherein the surface layer is denser than the base layer.
    Type: Grant
    Filed: June 8, 2004
    Date of Patent: September 12, 2006
    Assignee: Oki Electric Industry Co., Ltd.
    Inventors: Kazuhiko Asakawa, Wataru Shimizu
  • Patent number: 7097700
    Abstract: A water-soluble complex dye capable of forming an image having light resistance, ozone resistance and high saturation; a water-based recording fluid, particularly an ink jet recording fluid, employing such a dye; and an ink jet recording method, are presented.
    Type: Grant
    Filed: December 29, 2004
    Date of Patent: August 29, 2006
    Assignee: Mitsubishi Chemical Corporation
    Inventor: Wataru Shimizu
  • Patent number: 7094280
    Abstract: A water-soluble complex dye capable of forming an image having light resistance, ozone resistance and high saturation; a water-based recording fluid, particularly an ink jet recording fluid, employing such a dye; and an ink jet recording method, are presented.
    Type: Grant
    Filed: December 20, 2004
    Date of Patent: August 22, 2006
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Wataru Shimizu, Masahiro Yamada
  • Patent number: 7025815
    Abstract: A water-soluble complex dye capable of forming an image having light resistance, ozone resistance and high saturation; a water-based recording fluid, particularly an ink jet recording fluid, employing such a dye; an ink set employing such a recording fluid; and an ink jet recording method, are presented.
    Type: Grant
    Filed: December 7, 2004
    Date of Patent: April 11, 2006
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Wataru Shimizu, Mio Ishida, Hideo Sano, Yukichi Murata
  • Publication number: 20050204953
    Abstract: The present invention provides a recording liquid which provides clear printed matter even when applied as an aqueous ink-jet recording liquid to recording on plain or specialized paper, and which is also excellent in the density of recorded image, the light resistance, the indoor discoloring and fading resistance, and so on.
    Type: Application
    Filed: May 24, 2005
    Publication date: September 22, 2005
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Hideo Sano, Wataru Shimizu
  • Publication number: 20050109237
    Abstract: A water-soluble complex dye capable of forming an image having light resistance, ozone resistance and high saturation; a water-based recording fluid, particularly an ink jet recording fluid, employing such a dye; and an ink jet recording method, are presented. A water-soluble complex dye comprising an azo compound represented by the following formula (1) or its tautomer, and transition metal ions; a water-based recording fluid, particularly an ink jet recording fluid, containing such a dye; and an ink jet recording method employing such a recording fluid.
    Type: Application
    Filed: December 29, 2004
    Publication date: May 26, 2005
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventor: Wataru Shimizu