Abstract: Methods and systems involving automotive computing architectures with phased wake sequences and power control are disclosed herein. A disclosed automotive computing system includes at least three subsystems: a first subsystem that is in an always-on power domain, a second subsystem that is powered on from a sleep state in response to an event detected by the first subsystem, and a third subsystem that is powered on, from an off state, after the first subsystem and the second subsystem are powered on. The subsystems of the architecture can be activated in different phases based on a given scenario in which the automotive computing architecture is operating. The same subsystem can occupy a different phase in different scenarios. The phased wake sequences may conserve power without sacrificing utility and may be optimized for different scenarios and triggering events.

Abstract: This disclosure relates to automotive computing architectures and more specifically to specialized discrete scale out computational elements that enhance the performance of an automotive computing architecture in terms of efficient networking and sensor data processing. A disclosed automotive computing architecture includes a set of zones, a zonal network, a sensor in a first zone, and an actuator in a second zone. A discrete computational element, in the first zone, receives sensor data from the sensor according to a legacy protocol, and is programmed to process the sensor data to produce a command therefrom and packages the command in the legacy protocol with an Ethernet packet. A second discrete computational element, in a second zone, is coupled to the actuator and is programmed to receive the Ethernet packet with the command, unpack the command into the legacy protocol, and provide the command in the legacy protocol to the actuator.

Abstract: The present disclosure provides resist rinse solutions and corresponding lithography techniques that achieve high pattern structural integrity for advanced technology nodes. An example lithography method includes forming a resist layer over a workpiece, exposing the resist layer to radiation, developing the exposed resist layer using a developer that removes an unexposed portion of the exposed resist layer, thereby forming a patterned resist layer, and rinsing the patterned resist layer using a rinse solution. The developer is an organic solution, and the rinse solution includes water.

Abstract: An optical element driving mechanism is provided. The optical element driving mechanism includes a fixed part, a movable part, a first driving assembly, and a strengthening member. The fixed part includes a first base. The movable part is connected to an optical element with an optical axis. The movable part is movable relative to the fixed part, and the movable part is accommodated in the fixed part. The first driving assembly drives the movable part to move relative to the fixed part. The first driving assembly is disposed in the first base. The strengthening member is embedded in the first base. When viewed along a direction that is perpendicular to the optical axis, the strengthening member at least partially overlaps the first driving assembly. When viewed along the optical axis, the strengthening member does not overlap the first driving assembly.

Abstract: One or more embodiments of the present disclosure relate to a radiotherapy target device. The radiotherapy target device may include: a target component including a target body and a support supporting the target body; and a housing surrounding the target component. The housing may include a first surface and a second surface allowing radiation beams to pass through.

Abstract: Systems, apparatus, articles of manufacture, and methods are disclosed to implement seamless switching of dynamic range and/or refresh rate on display devices. An example apparatus disclosed herein causes a display to activate panel self refresh after a command to switch a graphics output from a first dynamic range to a second dynamic range, the graphics output provided to the display. The example apparatus also switches the graphics output from the first dynamic range to the second dynamic range after the panel self refresh is activated. The example apparatus further causes the display to deactivate the panel self refresh after the graphics output is switched to the second dynamic range.

Abstract: A photoresist composition comprises an organic polymer and a floatable polymer. The floatable polymer has a lower surface energy than the organic polymer. Upon curing, the floatable polymer forms a surface layer above the photoresist layer formed by the organic polymer. The presence of the surface layer reduces optical flare and chemical flare, thus improving the critical dimension of the features formed in a material layer below the photoresist layer.

Abstract: A method for manufacturing a semiconductor device includes forming a photoresist layer from a photoresist composition over a substrate. The photoresist layer is selectively exposed to actinic radiation to form a latent pattern and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a patterned photoresist. The photoresist composition includes a photoactive compound, a thiol-containing polymer comprising an aryl group and an acid labile group. The thiol group can crosslink the polymer via oxidative disulfide formation and/or thiol-ene/yne “click” reaction.

Abstract: A photoresist composition includes a solvent and a polymer. The polymer comprises a polymer backbone, an acid labile group monomer, a photo acid generator monomer and a quencher monomer. The acid labile group monomer is bonded to the polymer backbone. The acid labile group monomer is acid cleavable. The photo acid generator monomer is bonded to the polymer backbone. The quencher monomer is bonded to the polymer backbone.

Abstract: A lithography method includes the steps which are mentioned below. A photoresist layer is formed over a substrate. The photoresist layer is exposed. The photoresist layer is developed. A vacuum treatment is performed to the photoresist layer. The substrate is etched by using the photoresist layer as an etch mask.

Abstract: An apparatus can include: a processor; a voltage regulator configured to provide a processor voltage and a processor current to the processor; and a voltage regulator controller that can include a current sensor comprising an analog-to-digital converter (ADC) having an ADC input range and configured to provide current data based on an ADC input voltage, and a configuration manager configured to receive processor power data and adjust the ADC input range based on the processor power data. Various other methods, systems, and computer-readable media are also disclosed.

Abstract: A pulse pressure measuring apparatus including a plurality of pressing elements, a plurality of pressure sensors, and a processing unit is provided. The pressing elements are used to press the site to be measured, and each pressing element has a position coordinate Pi (i=1, 2, 3 . . . ). The pressure sensors are configured to respectively measure pressure on the pressing elements to generate measured values of pressure intensity Ii (i=1, 2, 3 . . . ) at the position coordinates Pi (i=1, 2, 3 . . . ). The processing unit utilizes the position coordinates Pi (i=1, 2, 3 . . . ) and the measured values of pressure intensity Ii (i=1, 2, 3 . . . ) to determine the blood vessel locus.

Abstract: A method of fabricating a semiconductor device is described. A substrate is provided. A plurality of fins is formed extending from the substrate, the fins including a first group of active fins arranged in an active region, and including an inactive fin having at least a portion in an inactive region, the active fins separated by first trench regions between adjacent of the active regions, the inactive fin separated from its closest active fin by a second trench region, the second trench region having a greater width than that of a trench region of the first trench regions. A dummy fin is formed on the isolation dielectric in the second trench region, the dummy fin disposed between the first group of active fins and the inactive fin. A dummy gate is formed over the fins. The gate isolation structure is disposed between the dummy fin and the inactive fin and separates regions of the dummy gate.

Abstract: Method of forming pattern in photoresist layer includes forming photoresist layer over substrate, selectively exposing photoresist layer to actinic radiation forming latent pattern. Latent pattern is developed by applying developer to form pattern. Photoresist layer includes photoresist composition including polymer: A1, A2, L are direct bond, C4-C30 aromatic, C4-C30 alkyl, C4-C30 cycloalkyl, C4-C30 hydroxylalkyl, C4-C30 alkoxy, C4-C30 alkoxyl alkyl, C4-C30 acetyl, C4-C30 acetylalkyl, C4-C30 alkyl carboxyl, C4-C30 cycloalkyl carboxyl, C4-C30 hydrocarbon ring, C4-C30 heterocyclic, —COO—, A1 and A2 are not both direct bonds, and are unsubstituted or substituted with a halogen, carbonyl, or hydroxyl; A3 is C6-C14 aromatic, wherein A3 is unsubstituted or substituted with halogen, carbonyl, or hydroxyl; R1 is acid labile group; Ra, Rb are H or C1-C3 alkyl; Rf is direct bond or C1-C5 fluorocarbon; PAG is photoacid generator; 0<x/(x+y+z)<1, 0<y/(x+y+z)<1, and 0<z/(x+y+z)<1.

Abstract: Methods for making a semiconductor device using an improved BARC (bottom anti-reflective coating) are provided herein. The improved BARC comprises a polymer formed from at least a styrene monomer having at least one or two hydrophilic substituents. The monomer(s) and substituents can be varied as desired to obtain a balance between film adhesion and wet etch resistance. Also provided is a semiconductor device produced using such methods.

Abstract: A method of manufacturing a semiconductor device includes forming a first layer including an organic material over a substrate. A second layer including a reaction product of a silicon-containing material and a photoacid generator is formed over the first layer. A photosensitive layer is formed over the second layer, and the second layer is patterned.

Abstract: The disclosed technology is generally directed to a personalized feed. In one example of the technology, selected key-value pairs from a profile associated with a user are provided. Based on a prompt that includes natural-language text instructions, the selected key-value pairs, and ranked content, a large language model is used to generate: pill prompts associated with the ranked content, such that the pill prompts are information requests that are unique and personalized to have particular relevance to the user based on selected key-value pairs, and a response to each pill prompt such that the response includes content corresponding to the requested information. A content feed is displayed to the user, including displaying selectable pills to the user as part of the displayed content feed such that each selectable pill includes a corresponding pill prompt. The response to the pill prompt that corresponds to the selection is displayed to the user.

Abstract: The present invention relates to a prefabricated infilled panel-frame structure capable of accommodating seismic-loading and seismic energy dissipation, and a construction method thereof, including a frame body, a prefabricated infilled panel group, a panel connector, and a disc spring assembly. During an earthquake, the present invention slides to dissipate energy only after the maximum starting sliding force is exceeded, thus providing the structure with a relatively high lateral stiffness prior to sliding. After an earthquake, the disc spring assembly of the present invention may provide a certain restoring force due to being compressed so as to reduce the residual displacement. Further, the present invention achieves the bidirectional deformation cooperation of the prefabricated infilled panel under earthquakes, so that the infilled panel may still achieve the function of seismic energy dissipation under the coupling action of in-plane and out-of-plane loads.

Abstract: A multi-axis operation apparatus in opposite arrangement includes a first operation mechanism, a second operation mechanism spaced apart from the first operation mechanism, and an indicator that is located between the first operation mechanism and the second operation mechanism. The first operation mechanism includes a first rail and a carrying platform that is assembled to the first rail. The second operation mechanism includes a second rail and a working member that is assembled to the second rail. The indicator includes a carrier, a first calibration, and a second calibration, the latter two of which are arranged on the carrier. The carrying platform and the working member respectively face toward the first calibration and the second calibration for obtaining current positions thereof, thereby allowing the working member to perform a predetermined step to a target object on the carrying platform through a window of the carrier.

Abstract: A camera structure, including a lens holder, a lens frame and a plurality of balls. The lens holder has a holder body, one end of which has a first rolling groove. The first groove wall part and the second groove wall part are disposed on two sides of the first rolling groove, and the groove bottom is disposed between the first groove wall part and the second groove wall part. The lens frame is mounted on an outer side of the holder body. The plurality of balls are located inside the first rolling groove, wherein the first groove wall part and the second groove wall part support the plurality of balls, there is a gap between each of the plurality of balls and the groove bottom, and the plurality of balls lay between the lens holder and the lens frame.