Patents by Inventor Wei-Hsiang Wang

Wei-Hsiang Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030184893
    Abstract: A multi-layer mirror and the fabricating method thereof. The mirror is applicable for manufacture of micro-cavities in light emitting devices. The method of fabricating the multi-layer mirror includes sputtering a first-layer mirror with a first refractive index on a transparent substrate of a light-emitting device using a first reactive gas, sputtering a second-layer mirror with a second refractive index using a second reactive gas, and repeating the previous two steps to form a multi-layer mirror having at least two adjacent layers with various refractive indices.
    Type: Application
    Filed: March 27, 2003
    Publication date: October 2, 2003
    Applicant: Ritek Corporation
    Inventors: Tung-Kuei Lu, Wei-Hsiang Wang
  • Patent number: 6387467
    Abstract: An optical recording medium structure and its method of manufacture. The optical recording medium structure includes, from bottom to top, a transparent substrate, a first dielectric layer, a first buffer layer, a recording layer, a second buffer layer, a second dielectric layer, an optical compensation layer and a reflection layer. The optical recording medium structure is manufactured by forming the first dielectric layer, the first buffer layer, the recording layer, the second buffer layer, the second dielectric layer, the optical compensation layer and the reflection layer in sequence over the transparent substrate. The first buffer layer and the second buffer layer serves to prevent the diffusion of at least one element from the recording layer into the first and the second dielectric layer and vice versa. The optical compensation layer enhances thermal sensitivity of the recording layer during an optical read/write operation.
    Type: Grant
    Filed: October 23, 2000
    Date of Patent: May 14, 2002
    Assignee: Ritek Corporation
    Inventors: Wei-Hsiang Wang, Min-Hui Huang