Abstract: An image displaying device includes a planar display panel and a light penetrating unit. The planar display panel displays a plane image. The planar display panel at least includes a first pixel group, a second pixel group and a third pixel group. The second pixel group is located between the first pixel group and the third pixel group. When vision passes through the light penetrating unit toward the planar display panel, the vision acquires a second distance of a second imaging position within the plane image relevant to the second pixel group relative to the planar display panel being greater than a first distance of a first imaging position within the plane image relevant to the first pixel group relative to the planar display panel and a third distance of a third imaging position within the plane image relevant to the third pixel group relative to the planar display panel.

Abstract: A chip package is provided. The chip package includes a device substrate, a first redistribution layer (RDL), a carrier base, and at least one conductive connection structure. The device substrate has at least one first through-via opening extending from the backside surface of the device substrate to the active surface of the device substrate. The first RDL is disposed on the backside surface of the device substrate and extends in the first through-via opening. The carrier base carries the device substrate, and has a first surface facing the backside surface of the device substrate and a second surface opposite the first surface. The conductive connection structure is disposed on the second surface of the carrier base and is electrically connected to the first RDL.

Abstract: Techniques pertaining to power saving by data throughput pattern prediction in wireless communications are described. A user equipment (UE) determines whether a probability of a first value being greater than a second value is higher than a threshold. The UE triggers a radio resource control (RRC) connection release with a network responsive to the probability being higher than the threshold. The first value represents a succeeding continuous duration of no uplink (UL) and downlink (DL) data. The second value represents an RRC inactivity timer duration plus a threshold duration.

Abstract: A semiconductor device with multiple silicide regions is provided. In embodiments a first silicide precursor and a second silicide precursor are deposited on a source/drain region. A first silicide with a first phase is formed, and the second silicide precursor is insoluble within the first phase of the first silicide. The first phase of the first silicide is modified to a second phase of the first silicide, and the second silicide precursor being soluble within the second phase of the first silicide. A second silicide is formed with the second silicide precursor and the second phase of the first silicide.

Abstract: A centrifugal heat dissipation fan of a portable electronic device. The centrifugal heat dissipation fan includes a hub, multiple metal blades, and at least one ring. The metal blades are disposed surrounding the hub. The metal blades include multiple radial dimensions, and the structure of the metal blade with a shorter radial dimension is a part of the structure of the metal blade with a longer radial dimension. The metal blades having different radial dimensions form at least two ring areas, and the distribution numbers of the metal blades in the at least two ring areas are different from each other. The ring surrounds the hub and connects the metal blades.

Abstract: A semiconductor device includes source/drain regions, a gate structure, a first gate spacer, and a dielectric material. The source/drain regions are over a substrate. The gate structure is laterally between the source/drain regions. The first gate spacer is on a first sidewall of the gate structure, and spaced apart from a first one of the source/drain regions at least in part by a void region. The dielectric material is between the first one of the source/drain regions and the void region. The dielectric material has a gradient ratio of a first chemical element to a second chemical element.

Abstract: An antenna structure includes a metal cavity, a first radiation element, a second radiation element, a third radiation element, and a dielectric substrate. The metal cavity has an opening region. The first radiation element has a first feeding point. The first radiation element is coupled to the metal cavity. The second radiation element has a second feeding point. The second radiation element is coupled to the metal cavity. The third radiation element is adjacent to the first radiation element and the second radiation element. The third radiation element is coupled to the metal cavity. The dielectric substrate is adjacent to the opening region of the metal cavity. The first radiation element, the second radiation element, and the third radiation element are disposed on the dielectric substrate.

Abstract: A method for forming a thin film resistor with improved thermal stability is disclosed. A substrate having thereon a first dielectric layer is provided. A resistive material layer is deposited on the first dielectric layer. A capping layer is deposited on the resistive material layer. The resistive material layer is then subjected to a thermal treatment at a pre-selected temperature higher than 350 degrees Celsius in a hydrogen or deuterium atmosphere. The capping layer and the resistive material layer are patterned to form a thin film resistor on the first dielectric layer.

Abstract: A capacitor includes a bottom capacitor plate including a rough upper surface with a root mean square (RMS) surface roughness of at least 1.14, a capacitor dielectric layer on the bottom capacitor plate and contacting the rough upper surface of the bottom capacitor plate, and an upper capacitor plate on the capacitor dielectric layer. A semiconductor device includes a transistor located on a substrate, a dielectric layer on the transistor, and a capacitor in the dielectric layer and including a bottom capacitor plate connected to a source region of the transistor and having a rough upper surface with a root mean square (RMS) surface roughness of at least 1.14.

Abstract: A capacitor device and a manufacturing method thereof are disclosed in the present invention. The capacitor device includes pad structures, bottom electrodes, a top electrode, and a dielectric layer. The bottom electrodes are disposed on the pad structures, respectively. The top electrode is disposed on the bottom electrodes. The dielectric layer is disposed between the top electrode and the bottom electrodes. The top electrode includes at least one void. The manufacturing throughput of the manufacturing method of the memory device may be enhanced accordingly.

Abstract: An electronic device, projection system, and projection method are provided. The electronic device is communicatively coupled to the projection device. The electronic device includes a camera, a memory and a processor. The memory stores an application. The processor is coupled to the camera and the memory. The processor is configured to execute the following steps of the application: controlling the projection device to project a marked image having a plurality of predetermined marks to a target area; controlling the camera to take a first image of the target area, wherein the first image comprises a foreground object and a background object of the target area; analyzing the first image, to obtain a foreground contour corresponding to the foreground object; and overlaying a selected pattern onto the foreground contour to generate a second image, and controlling the projection device to project the second image to the target area.

Abstract: The present disclosure provides a method and an apparatus for testing a semiconductor device. The method includes providing an active area in an integrated circuit design layout; grouping the active area into a plurality of regions, each of the regions including at least one polysilicon gate; calculating an operating temperature of the at least one polysilicon gate in each of the regions; calculating a self-heating temperature of each of the regions based on the operating temperature of the at least one polysilicon gate in each of the regions; determining an Electromigration (EM) evaluation based on the self-heating temperatures of the regions; and generating a semiconductor device based on the integrated circuit design layout passing the EM evaluation, wherein one of the regions includes a number of polysilicon gates disposed thereon different from the number of polysilicon gates disposed on the rest of regions.

Abstract: A system including computer readable storage media including executable instructions and one or more processors configured to execute the executable instructions to obtain a schematic netlist and a performance specification for an integrated circuit, determine electrical constraints for nets in the schematic netlist based on the performance specification, determine physical constraints from the electrical constraints, rout the nets in the schematic netlist based on the electrical constraints and the physical constraints, and provide a data file of a layout.

Abstract: A pressure generating device includes a tank, a deformable membrane, a driving device, and an actuating arm. The tank defines a chamber therein, and includes an opening and a communication port each of which is in fluid communication with the chamber. The deformable membrane is disposed to seal the opening, and is deformable between a flat state and a deformed state. The actuating arm is coupled to be driven by the driving device to move between a first position, where the deformable membrane is in the flat state, and a second position, where the deformable membrane is forced to be in the deformed state, such that a predetermined negative pressure is generated through the communication port when the actuating arm is driven from one of the first and second positions to the other one of the first and second positions.

Abstract: The disclosure relates to methods for determining an endometrial status using a sample, for example, an endometrial biopsy, from a woman, comprising: (a) performing an assay on the endometrial sample from the woman to determine a microRNA (miRNA) expression profile of the endometrial sample, wherein the miRNA expression profile comprises expression levels of a plurality of miRNAs, for example, 167 miRNAs having the sequences of SEQ ID NOs:1-167, respectively; and (b) analyzing the miRNA expression profile to obtain a receptivity predictive score using, for example, a computer-based algorithm. Aspects of the disclosure further relate to kits suitable for performing the methods, as well as uses of the kits for diagnostic and therapeutic purposes.

Abstract: A system including computer readable storage media including executable instructions and one or more processors configured to execute the executable instructions to obtain a schematic netlist and a performance specification for an integrated circuit, determine electrical constraints for nets in the schematic netlist based on the performance specification, determine physical constraints from the electrical constraints, rout the nets in the schematic netlist based on the electrical constraints and the physical constraints, and provide a data file of a layout.

Abstract: The present disclosure generally relates to systems and methods for evaluating viability of oocytes. In some implementation examples, an image sequence associated with an oocyte being aspirated into a pressure tool is obtained. Based on the image sequence and pressures applied on the oocyte, morphological features and mechanical features associated with the oocyte can be derived. At least some of the features can then be fed into a machine learning model to determine metrics indicative of quality of the oocyte, where a particular metric may be indicative of blastocyst formation. Optionally, the determined oocyte quality information can be presented to a user via an interactive user interface.

Abstract: The present disclosure provides a method and a non-transitory computer-readable medium for arranging components within a semiconductor device. The method includes providing a plurality of electrical components in a pre-layout, generating a first layout by routing the plurality of electrical components, obtaining a first resistance between a power terminal of the first layout and a first terminal of a first electrical component in the first layout, comparing the first resistance and a first threshold, adjusting routing of the first layout such that the first resistance is less than the first threshold, and generating a tape out file for the semiconductor device according to the first layout.

Abstract: A conjugate cam reducer includes input and output units disposed at two opposite sides of a transmission unit. The transmission unit includes smaller-diameter and larger-diameter cam discs axially connected with each other. The smaller-diameter and larger-diameter cam discs have first and second grooves. The input unit includes an input disc, an eccentric shaft and a plurality of input rollers. The input disc has a smaller inner peripheral wall engaging with the smaller-diameter cam disc, and a plurality of first receiving grooves registered with the first grooves to receive the input rollers. The eccentric shaft is rotated to drive rotation of the transmission unit in an eccentric cycloidal motion. The output unit includes an output disc having a larger inner peripheral wall which engages with the larger-diameter cam disc, and a plurality of second receiving grooves which are registered with the second grooves to receive a plurality of output rollers.

Abstract: The present disclosure provides a method for evaluating a heat sensitive structure. The method includes identifying a heat sensitive structure in an integrated circuit design layout and identifying a heat generating structure in the integrated circuit design layout. The method also includes calculating an operating temperature of the heat generating structure by taking a practical current distribution into consideration. The method also includes calculating an anticipated temperature increase for the heat sensitive structure induced by thermal coupling of the heat generating structure at the operating temperature.