Abstract: Embodiments of the present disclosure include a scanning electron microscope (SEM) having an electron gun configured to generate an electron beam that is directed along an axis through a column of the SEM towards a sample stage. In some embodiments, the SEM includes a first backscattered electron (BSE) detector mounted along the axis. In some examples, the SEM further includes a second BSE detector mounted off the axis, where the second BSE detector wraps around a bottom portion of the column. The second BSE detector, in some examples, includes a plurality of blades having either a flat shape or an arc shape in a side view. Additionally, in some embodiments, the plurality of blades are arranged in a circular configuration in a top view.

Abstract: The invention provides a porous polyurethane polishing pad that includes a porous matrix having large pores that extend upward from a base surface and open to an upper surface. The large pores extend to the top polishing surface and have lower and upper sections with a vertical orientation. The lower and upper sections are offset in a horizontal direction. Middle-sized pores with a columnar shape and a vertical orientation originate adjacent the middle sections and small pores with a columnar shape and a vertical orientation originate between the middle-sized pores. The pores combine for increasing compressibility of the polishing pad and contact area of the top polishing surface during polishing.

Abstract: A method includes: positioning a mask in a processing chamber of a mask repair apparatus; determining whether a first abnormality is present by a first gas analysis device during forming a first vacuum in a column over the processing chamber; determining whether a second abnormality is present by a second gas analysis device during forming a second vacuum in the processing chamber; determining whether a third abnormality is present by a third gas analysis device during flowing a process gas into the processing chamber; determining whether a fourth abnormality is present by a fourth gas analysis device during directing an electron beam or ion beam at the mask with the process gas in the processing chamber; and in response to determining that one of the first, second, third or fourth abnormalities is present: halting the directing an electron beam or ion beam at the mask; and performing a repair associated with the first, second, third or fourth abnormality that is present.

Abstract: A touch sensor includes a resistive layer on a substrate and electrodes on the resistive layer. The electrodes and portions of the resistive layer between the electrodes form series resistor chains disposed at peripheral regions of the touch sensor and surrounding a touch region of the touch sensor. The electrodes are formed by forming a conductive layer on the resistive layer in a thin-film deposition process, followed by patterning the conductive layer into the electrodes. A sheet resistivity of the resistive layer is between about 200? and about 800?. A sheet resistivity of the conductive layer is between about 0.03? and about 0.2?. A ratio of the sheet resistivity of the resistive layer to the sheet resistivity of the conductive layer is between about 2,500 and about 10,000.

Abstract: A protein analysis platform includes a platform body comprising: a gel working unit provided in a top portion of the platform body and comprising a gel accommodation area for accommodating at least one gel; at least one electrophoresis tank provided along a side of the gel accommodation area and provided with at least one electrode; and a blotting layer stack provided in a bottom portion of the gel working unit and comprising an electrode layer; wherein a removable bottom plate is provided between the gel working unit and the blotting layer stack and detachably corresponds to a bottom side of the gel accommodation area. The protein analysis platform is used for western blotting or next-generation western blotting, wherein the protein analysis platform can quickly complete steps such as gel casting, electrophoresis, and blotting in one platform.

Abstract: An extreme ultraviolet mask including a substrate, a reflective multilayer stack on the substrate and patterned absorber layer on the reflective multilayer stack is provided with a pellicle membrane frame attached to the substrate. In some embodiments, the pellicle membrane frame is attached to the substrate using an adhesive between the pellicle membrane frame and the substrate. In some embodiments, the pellicle membrane frame is located in a trench formed in the reflective multilayer stack and patterned absorber layer. In other embodiments, the pellicle membrane frame not located in a trench formed in the reflective multilayer stack and patterned absorber layer.

Abstract: A connection cable (1) includes an insulation seat (10), a circuit board (20) and a protection cover (30). The insulation seat (10) includes a main body (11) formed with a slot (110) and a conduction opening (111). The conduction opening (111) is connected to the slot (110) and located on the bottom side of the main body (11). The circuit board (20) includes a substrate (21) and a plurality of conductive portions (22) disposed on the substrate (21). The substrate (21) is inserted in the slot (110). The conductive portions (22) are exposed from the conduction opening (111). The protection cover (30) is combined on the main body (11) to shield the conduction opening (111). The protection cover (30) is pushed by the dock connector (2) to expose the conduction opening (111) and to be separated from the main body (11).

Abstract: A cleaning apparatus for cleaning a surface of a photomask includes a housing defining a chamber, a photomask holder disposed within the chamber, and a gas dispenser disposed within the chamber to direct gas toward the photomask holder. The gas dispenser has two or more gas dispensing outlets. A driver is coupled to at least one of the photomask holder or the gas dispenser to establish relative movement between the photomask holder and the gas dispenser.

Abstract: This disclosure provides a semiconductor package including a chip, a drain lead frame assembly, a source lead frame assembly, and an insulation layer. The chip includes an opposite drain surface and source surface. The drain lead frame assembly includes a drain contact plate, a drain connecting section, and drain leads integrally formed into one piece. The drain contact plate is physically connected to the drain surface. An area of the drain contact plate is larger than that of the drain surface. The source lead frame assembly includes a source contact plate, a source connecting section, and source leads integrally formed into one piece. The source contact plate is physically connected to the source surface. An area of the source contact plate is smaller than that of the source surface. The insulation layer encapsulates the chip and surrounds the drain contact plate and the source contact plate.

Abstract: A recessed induction cooker with a heat insulation protection pad structure and a temperature detection device includes: a heat insulation protection pad, having at least one through hole; a recessed induction cooker, having a housing, a support, a coil and an arched panel; and a temperature detection module, having a temperature detector, a central processing unit and a circuit controller, wherein the temperature detector is for detecting a temperature of the arched panel to generate a temperature value, the central processing unit has a threshold unit and a comparison unit, the threshold unit pre-stores a temperature threshold, the comparison unit compares the temperature threshold with the temperature value, and the central processing unit drives the circuit controller to control the coil to stop heating when the temperature value is greater than or equal to the temperature threshold.

Abstract: A restructurable hybrid-wing VTOL aircraft includes a fuselage, two wings, two canard wings and a cabin door. The two wings are provided to opposite sides of the fuselage. Each the wing is provided vertically and symmetrically by two rotary wing modules, and thus an H configuration to the fuselage can be formed. While the lower rotary wing module rotates to align the corresponding wing, a change of relative position with respect to the upper rotary wing module can be generated. Through the rotation of the lower rotary wing module, the vertical surface thereof would be transformed into a lift surface for enlarging the aspect ratio of the wing to improve the corresponding lift-drag ratio. Thereupon, a disadvantage of hyper flight-directional stability to the H-configured tail seat-type aircraft caused by the vertical area of the aircraft can be reduced, and so the tail-seat type aircraft can slide to emergency land.

Abstract: The present disclosure provides a method for removing particles. The method includes: receiving a pellicle including a pellicle membrane, wherein a particle is disposed on the pellicle membrane; passing a light beam through an object lens, wherein the light beam is focused on a focal region in front of the pellicle membrane by the object lens, and the particle is attracted to be trapped at the focal region; and removing the particle from the pellicle membrane at the focal region.

Abstract: New 7xxx aluminum alloys are disclosed. The new 7xxx aluminum alloys may comprise from 5-10 wt. % Zn, 1-3 wt. % Mg, 1-3 wt. % Cu, a thickness of at least 2 inches, from 10% to 40% recrystallized grains, and an average grain size of at least 300 micrometers. The new 7xxx aluminum alloys may have recrystallized areas and the ratio of intercept distances for the recrystallized areas to the average to grain size may be from 0.5 and 2.0. In some embodiments, at least some recrystallized grains are located on a periphery of unrecrystallized grains. The recrystallized grains may be achieved at least partially due to (i) the use of not greater than 0.11 wt. % Zr in the 7xxx aluminum alloy product, (ii) particle stimulated nucleation, or (iii) both.

Abstract: The invention provides a porous polyurethane polishing pad that includes a porous matrix. The matrix has large pores that extend upward from a base surface and open to an upper surface. The large pores are interconnected with tertiary pores, a portion of the large pores is open to a top polishing surface and at least a portion of the large pores extend to the top polishing surface. Spring-arm sections connect lower and upper sections of the large pores. The spring-arm sections all are in a same horizontal direction as measured from the vertical orientation and they combine for increasing compressibility of the polishing pad and contact area of the top polishing surface during polishing.

Abstract: The present invention provides a multi-degree-of-freedom conductor depositing system for tokamak toroidal field coil winding packs, belongs to the field of development of toroidal field superconducting coils for nuclear fusion. The multi-degree-of-freedom conductor depositing system is mounted on a winding table and distributed along the contour of the toroidal field coil. The optical proximity switches detect the position signals between the winding table and the bending unit and transmit them to an automatic control system. The multi-degree-of-freedom conductor depositing system is distributed in a spiral shape from the top to the bottom from the position of the bending unit along the direction of coil winding. The conductor is deposited onto the track drive mechanism of the multi-degree-of-freedom conductor depositing device, which has a bidirectional moving and rotating function.

Abstract: A tin (Sn) auto-filling device and system provided to provide new liquid Sn to an inner sidewall surface of a rotation crucible. A laser is exposed to the liquid Sn at the inner sidewall surface of the rotation crucible to generate extreme-ultraviolet-light (EUV) that is utilized to process workpieces within a semiconductor manufacturing plant (FAB). The auto-filling device automatically refills as the liquid Sn at the inner sidewall surface of the rotation crucible is consumed due to the liquid Sn at the inner sidewall surface of the rotation crucible being exposed to the laser.

Abstract: A touch sensor includes a resistive layer on a substrate and electrodes on the resistive layer. The electrodes and portions of the resistive layer between the electrodes form series resistor chains disposed at peripheral regions of the touch sensor and surrounding a touch region of the touch sensor. The electrodes are formed by forming a conductive layer on the resistive layer in a thin-film deposition process, followed by patterning the conductive layer into the electrodes. A sheet resistivity of the resistive layer is between about 200? and about 800?. A sheet resistivity of the conductive layer is between about 0.03? and about 0.2?. A ratio of the sheet resistivity of the resistive layer to the sheet resistivity of the conductive layer is between about 2,500 and about 10,000.

Abstract: A method may include acquiring a first image that is obtained by adding noise to a second image, the second image comprising a target restoration region. The method may include performing at least one first denoising process on the first image using a first artificial intelligence (AI) network to obtain a first denoising result. The method may include restoring the target restoration region based on the first denoising result using a second AI network to obtain a restored image.

Abstract: An apparatus for attaching an intubated non-human animal to a gas delivery system is provided, the apparatus including: a first component having a first end configured to attach to an outlet of a gas delivery system; a second component having a first end configured to intubate a non-human animal; and a hollow tubular component connecting the first component to the second component to form a gas flow path within the apparatus, the gas flow path extending from the first end of the first component to the first end of the second component, the hollow tubular component being movable between at least: a first position, in which the first end of first component has a first orientation relative to the first end of second component, and a second position, in which the first end of first component has a second orientation relative to the first end of second component.