Patents by Inventor Wei Wen

Wei Wen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240422888
    Abstract: A laser produced plasma (LPP)-extreme ultraviolet (EUV) light source includes a vacuum chamber, a rotatable crucible disposed in the vacuum chamber with an annular inner surface for carrying a liquid metal, and a laser arranged to apply laser light to the liquid metal carried on the annular inner surface of the rotatable crucible to cause the liquid metal to emit EUV light. The LPP-EUV light source further includes a stationary component disposed in the vacuum chamber and positioned proximate to the annular inner surface of the rotatable crucible or surrounding the rotatable crucible, a coolant fluid delivery inlet or nozzle, and a cooling element secured with the stationary component and including a feature configured to operatively couple with coolant fluid delivered by the coolant fluid delivery inlet or nozzle.
    Type: Application
    Filed: April 12, 2024
    Publication date: December 19, 2024
    Inventors: Chien-Hsing Lu, Chih-Chiang Tu, Fei-Gwo Tsai, Chih-Wei Wen, Hsin-Fu Tseng, Tzu Jeng Hsu
  • Publication number: 20240412337
    Abstract: A method performed by an electronic device, includes acquiring a first image comprising at least a first region and a second region and a target object to be moved in the first image from the second region to the first region; and performing target object removal processing on the first image using a first artificial intelligence (AI) network based on guidance information related to at least one of first region and the second region, wherein the second region is a region of the target object in the first image in which the target object is located prior to the removal processing.
    Type: Application
    Filed: August 19, 2024
    Publication date: December 12, 2024
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Mengmeng BAI, Huiling Chang, Zhuoxin Gan, Jaekeun Na, Changwei Wang, Li Zuo, Wei Wen
  • Publication number: 20240398390
    Abstract: This invention relates to a method and system for detecting ovulation in female's menstrual cycles, which involves collecting menstrual cycle information of a subject to calculate ovulation interval dates. Daily heart rate waveform signals are used to obtain heart rate-related physiological parameters, including the first cumulative power (LF), second cumulative power (HF), standard deviation of interbeat intervals (SDNN), root mean square of successive differences (RMSSD), cumulative power ratio (LF/HF), and heart rate parameter ratio (SDNN/RMSSD). The invention selects the day with the highest cumulative power ratio (LF/HF) and heart rate parameter ratio (SDNN/RMSSD) within the ovulation interval as the day of ovulation.
    Type: Application
    Filed: April 10, 2024
    Publication date: December 5, 2024
    Inventor: Wei-Wen Hung
  • Patent number: 12160065
    Abstract: Disclosed is a connector housing module which comprises a housing body having a housing body end region, which surrounds an opening in said housing body, and having a sealing ring, a lateral face of said housing body end region being in detent engagement with a lateral face of the sealing ring. A connector housing is also disclosed. The connector housing comprises a connector housing module and a hood, wherein an end face of the hood surrounding an opening in said hood, when the hood and the housing body are in a closed state, in part directly contacts an end face of the housing body end region and in part presses a curved edge of a bulge of the sealing ring so that the bulge is completely interlockingly engaged with a recess of the housing body, thereby improving the electromagnetic shielding capacity and the water tightness of the entire connector housing.
    Type: Grant
    Filed: July 10, 2020
    Date of Patent: December 3, 2024
    Assignee: HARTING ELECTRIC GMBH & CO. KG
    Inventor: Shao Wei Wen
  • Publication number: 20240393679
    Abstract: In pellicle cleaning, a gas is flowed on a pellicle using at least one gas nozzle. During the flowing, the pellicle is moved respective to the at least one gas nozzle. During the flowing, the pellicle is exposed to ionized gas generated by at least one alpha ionizer. Also during the flowing, an ultrasonic wave is applied to the pellicle using an ultrasound transducer or transducer array. The gas nozzle may have a nozzle aperture comprising a slit or a linear array of apertures arranged parallel with a pellicle membrane of the pellicle.
    Type: Application
    Filed: July 30, 2024
    Publication date: November 28, 2024
    Inventors: Kun-Lung Hsieh, Tzu Han Liu, Hao-En Luo, Chih-Wei Wen
  • Publication number: 20240393680
    Abstract: A photomask cleaning tool includes various components to automatically remove a particle from a pellicle, such as a multi-jet nozzle to standardize and control the use of a gas to remove the particle, an ultrasonic probe to loosen the particle from the surface of the pellicle, a plurality of multi-jet nozzles to direct gas toward the particle from different directions, a control system to control the automated blower for various sizes and shapes of photomasks and for optimized particle removal techniques, and/or the like. In this way, the photomask cleaning tool is capable of removing a particle from a pellicle of a photomask in a manner that increases the effectiveness of removing the particle and reduces the likelihood of damage to the pellicle, which would otherwise result in expensive and time-consuming photomask rework.
    Type: Application
    Filed: July 30, 2024
    Publication date: November 28, 2024
    Inventors: Pin Cheng CHEN, Chih-Wei WEN, Chung-Hung LIN, Ting-Hsien KO
  • Patent number: 12153341
    Abstract: A method for cleaning a reflective photomask, a method of manufacturing a semiconductor structure, and a system for forming a semiconductor structure are provided. The method for cleaning a reflective photomask includes placing a photomask in a first chamber, and performing a dry cleaning operation on the photomask in the first chamber, wherein the dry cleaning operation includes providing hydrogen radicals to the first chamber, generating hydrocarbon gases as a result of reactions of the hydrogen radicals, and removing the hydrocarbon gases from the first chamber.
    Type: Grant
    Filed: July 28, 2023
    Date of Patent: November 26, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Wu-Hung Ko, Chung-Hung Lin, Chih-Wei Wen
  • Publication number: 20240389023
    Abstract: According to one aspect of the present disclosure, a method of wireless communication of a first node is provided. The method may include generating, by at least one processor, a first low-power listening (LPL) frame with a first LPL subfield set to “enable.” The method may include transmitting, by a communication interface, the first LPL frame with the first LPL subfield set to “enable” to a second node. The method may include enabling, by the at least one processor, an LPL mode after the first LPL frame with the first LPL subfield set to “enable” is transmitted to the second node.
    Type: Application
    Filed: April 18, 2023
    Publication date: November 21, 2024
    Inventors: Xiaogang CHEN, Wei WEN, Bo LU, Bo WANG
  • Publication number: 20240385544
    Abstract: A dis-pellicle tool or pellicle removal tool that includes one or more clamp structures that each include a respective group of pins. The respective pins of the groups of pins of the one or more clamp structures are configured to, in operation, be inserted into holes that are present within a pellicle frame of a pellicle. Once the respective pins of the groups of pins are inserted into the holes of the pellicle frame, a removal force may be applied to the pellicle frame to remove the pellicle from a photomask to which the pellicle is coupled to by an adhesive, glue, or some other similar type of coupling material.
    Type: Application
    Filed: May 17, 2023
    Publication date: November 21, 2024
    Inventors: H.J. CHANG, Kun-Lung HSIEH, Ting-Hsien KO, Chih-Wei WEN
  • Publication number: 20240387601
    Abstract: Pellicles are inspected by projecting a light pattern thereon and monitoring the reflected light by CCD module or the like. Software-based inspection of the reflected pattern recognizes any distortions in the pattern or contamination, and thus identifies wrinkles or other defects in the pellicle prior to use in the manufacturing process. Recognition of defects and replacement will avoid instances of pellicle rupture thereby avoiding damage to wafers being patterned.
    Type: Application
    Filed: May 16, 2023
    Publication date: November 21, 2024
    Inventors: Yao-Ren KUO, Chih-Wei WEN, Kun-Lung HSIEH, Tzu Han LIU, Hung-Jul CHANG
  • Publication number: 20240385543
    Abstract: A cleaning apparatus for cleaning a surface of a photomask includes a housing defining a chamber, a photomask holder disposed within the chamber, and a gas dispenser disposed within the chamber to direct gas toward the photomask holder. The gas dispenser has two or more gas dispensing outlets. A driver is coupled to at least one of the photomask holder or the gas dispenser to establish relative movement between the photomask holder and the gas dispenser.
    Type: Application
    Filed: July 30, 2024
    Publication date: November 21, 2024
    Inventors: Ting-Hsien KO, Chih-Wei WEN, Chung-Hung LIN
  • Publication number: 20240385512
    Abstract: A method for cleaning a reflective photomask, a method of manufacturing a semiconductor structure, and a system for forming a semiconductor structure are provided. The system for forming a semiconductor structure includes a photomask comprises a photomask substrate and a pellicle; an exposure tool configured to perform an exposure operation to transfer a pattern of the photomask to a semiconductive substrate, and a cleaning tool configured to perform a cleaning operation on the photomask. The cleaning tool includes a processing chamber configured to accommodate the photomask for a cleaning operation, and a hydrogen radical producer configured to produce hydrogen radicals into the processing chamber and having the hydrogen radicals reacting with contaminants attached on the photomask. The pellicle is attached on the photomask substrate during the cleaning operation.
    Type: Application
    Filed: July 30, 2024
    Publication date: November 21, 2024
    Inventors: WU-HUNG KO, CHUNG-HUNG LIN, CHIH-WEI WEN
  • Publication number: 20240379464
    Abstract: One or more embodiments of the present disclosure describe an artificial intelligence assisted substrate defect repair apparatus and method. The AI assisted defect repair apparatus employs an object detection algorithm. Based on the plurality of images taken by detectors located at different respective positions, the detectors capture various views of an object including a defect. The composition information as well as the morphology information (e.g., shape, size, location, height, depth, width, length, or the like) of the defect and the object are obtained based on the plurality of images. The object detection algorithm analyzes the images and determines the type of defect and the recommends a material (e.g., etching gas) and the associated information (e.g., supply time of the etching gas, flow rate of the etching gas, etc.) for fixing the defect.
    Type: Application
    Filed: July 25, 2024
    Publication date: November 14, 2024
    Inventors: Po-Chien HUANG, Chung-Hung LIN, Chih-Wei WEN
  • Publication number: 20240369936
    Abstract: An EUV radiation source apparatus includes an EUV source vessel including a chamber; a crucible disposed in the chamber; a tin layer disposed on the crucible; a catcher disposed in the chamber and configured to collect fuel debris generated from a collision of the tin layer and a laser beam; a heat dissipation structure disposed over the catcher; and a venting system coupled to the EUV source vessel and communicable with the chamber. A method for generating EUV radiation includes: collecting fuel debris on a catcher disposed in a chamber of an EUV source vessel; dissipating heat from the catcher to the chamber; and venting a gas out of the EUV source vessel to cool the chamber to a decreased temperature through an opening disposed on the EUV source vessel.
    Type: Application
    Filed: May 4, 2023
    Publication date: November 7, 2024
    Inventors: HSIN-FU TSENG, CHIH-CHIANG TU, CHIH-WEI WEN, CHIEN-HSING LU, TZU JENG HSU
  • Publication number: 20240369939
    Abstract: An EUV radiation source apparatus includes an EUV source vessel; a tin layer disposed in the EUV source vessel; a chamber disposed adjacent to the EUV source vessel; and a first filter disposed in the chamber, wherein the first filter includes a membrane and a mesh disposed on the membrane, and the membrane and the mesh are integrally formed. A method for generating EUV radiation includes: forming a first filter including a membrane and a mesh integrally formed with the membrane; disposing the first filter in a chamber adjacent to an EUV source vessel; and collecting fuel debris on the first filter in the chamber.
    Type: Application
    Filed: August 25, 2023
    Publication date: November 7, 2024
    Inventors: CHIEN-HSING LU, CHIH-CHIANG TU, CHIH-WEI WEN, HSIN-FU TSENG, TZU JENG HSU
  • Publication number: 20240361684
    Abstract: An inspection apparatus includes: an inspection apparatus includes: a stage configured to receive a photomask; a radiation source configured to emit a first radiation beam for inspecting the photomask; and an aperture stop configured to receive a second radiation beam reflected from the photomask through an aperture of the aperture stop, wherein the aperture is tangent at a center of the aperture stop.
    Type: Application
    Filed: July 8, 2024
    Publication date: October 31, 2024
    Inventors: CHIH-WEI WEN, HSIN-FU TSENG, CHIEN-LIN CHEN
  • Patent number: 12124758
    Abstract: A multi-host system and an operation sharing method are provided. In the method, whether operating information of a human-machine interface device being conformed with a switching condition is determined through a first software. When the operating information is conformed with the switching condition, operating the screen displayed by the second display according to the operating information of the human-machine interface device through a first host device or a second host device. Accordingly, interaction convenience and flexibility between multiple host devices are improved.
    Type: Grant
    Filed: December 19, 2023
    Date of Patent: October 22, 2024
    Assignee: GENESYS LOGIC, INC.
    Inventors: Huan-Sen Ge, Chih-Wei Wen, Feng-Chang Lo
  • Patent number: 12123078
    Abstract: New aluminum alloys having magnesium and zinc are disclosed. The new magnesium-zinc aluminum alloys may include from 2.5 to 4.0 wt. % Mg, from 2.25 to 4.0 wt. % Zn, wherein (wt. % Mg/wt. % Zn)?1.0, and wherein (wt. % Mg/wt. % Zn)?1.6, from 0.20 to 0.9 wt. % Mn, from 0.10 to 0.40 wt. % Cu, up to 1.0 wt. % Li, up to 0.50 wt. % Fe, up to 0.50 wt. % Si, and optional secondary element(s), the balance being aluminum, optional incidental elements and impurities.
    Type: Grant
    Filed: August 12, 2021
    Date of Patent: October 22, 2024
    Assignee: Howmet Aerospace Inc.
    Inventors: Jen C. Lin, Wei Wen, Santosh Prasad, Mark D. Crowley, Gabriele F. Ciccola, Matthew C. Brest
  • Publication number: 20240320807
    Abstract: An image processing method includes: performing mask processing on a first-type object included in an obtained target video frame image to obtain a candidate image; performing inpainting processing on the first-type object in the candidate image to obtain a first inpainting image, and generating an image initial mask template based on an initial blurred region; performing, when a first quantity of initial blurred pixels included in the image initial mask template reaches a first threshold, morphological processing on a blurred region corresponding to the initial blurred pixel to obtain an image target mask template; performing, when a second quantity of intermediate blurred pixels included in the image target mask template reaches a second threshold, inpainting processing on a pixel region corresponding to the intermediate blurred pixel in the first inpainting image, to obtain a second inpainting image; and determining a target inpainting image based on the second inpainting image.
    Type: Application
    Filed: June 5, 2024
    Publication date: September 26, 2024
    Inventors: Ligeng ZHONG, Yunquan ZHU, Wenran LIU, Wei WEN
  • Publication number: 20240313625
    Abstract: A duty cycle control circuit generates a duty cycle control signal for controlling the duty cycle of a DC-DC buck conversion signal. The duty cycle control circuit includes: a dual ramp generator for generating a first ramp signal and a second ramp signal having the same frequency and different phases; a first comparator for comparing the first ramp signal with a feedback signal to generate a first control signal; a second comparator for comparing the second ramp signal with the feedback signal to generate a second control signal; and a logical circuit for performing a first predetermined logical operation according to the first control signal and a first conduction-control signal to generate a first part of the duty cycle control signal, and performing a second predetermined logical operation according to the second control signal and a second conduction-control signal to generate a second part of the duty cycle control signal.
    Type: Application
    Filed: March 11, 2024
    Publication date: September 19, 2024
    Inventors: WEN-HAU YANG, YEN-TING LIN, CHUN-YU LUO, WEI-WEN OU, HUNG-HSUAN CHENG