Abstract: An electronic device includes a semiconductor chip and a first memory device. The semiconductor chip includes an input/output (I/O) interface circuit. The first memory device is external to the semiconductor chip. The semiconductor chip communicates with the first memory device via the I/O interface circuit. The semiconductor chip stores at least one hardware setting of the semiconductor chip into the first memory device before a power-off event of the semiconductor chip.

Abstract: A hysteresis circuit to be produced within a receiver of a chip is shown. The hysteresis circuit is powered by an overdrive voltage (2VDD), and has a protection circuit, an inverter, and a latch. The input of the hysteresis circuit is coupled to the inverter through the protection circuit, to be transformed into an output, and the latch is coupled to the inverter for positive feedback control. The protection circuit has a first sub-circuit (coupling the input to the inverter to control the pull-up path of the inverter) biased by a first bias voltage that is lower than VDD, and a second sub-circuit (coupling the input to the inverter to control the pull-down path of the inverter) biased by a second bias voltage that is greater than VDD.

Abstract: A hysteresis circuit to be produced within a receiver of a chip is shown. The hysteresis circuit is powered by an overdrive voltage (2VDD), and has a protection circuit, an inverter, and a latch. The input of the hysteresis circuit is coupled to the inverter through the protection circuit, to be transformed into an output, and the latch is coupled to the inverter for positive feedback control. The protection circuit has a first sub-circuit (coupling the input to the inverter to control the pull-up path of the inverter) biased by a first bias voltage that is lower than VDD, and a second sub-circuit (coupling the input to the inverter to control the pull-down path of the inverter) biased by a second bias voltage that is greater than VDD.

Abstract: An integrated circuit includes two or more substrates stacked one over another and a first set of electrical components on one or more of the two or more substrates. The two or more substrates include a first substrate having a first predetermined doping type and a second substrate having the first predetermined doping type. The first set of electrical components is configured to form a first circuit. The integrated circuit further includes a first ground reference rail electrically connected to the first circuit, a first common ground reference rail, and a first ESD conduction element electrically connected between the first ground reference rail and the first common ground reference rail. The first ESD conduction element includes a first diode on the first substrate and a second diode on the second substrate. The first diode and the second diode are electrically connected in parallel and have opposite polarities.

Abstract: A method includes forming signal lines in a pair of neighboring metal layers of a semiconductor device, and forming first dummy conductive cells in an empty area without metal lines passing therethrough, between the pair of neighboring metal layers. At least two dummy conductive cells of the first dummy conductive cells that are separated from each other, and the at least two dummy conductive cells fully overlap one of the signal lines in plan view.

Abstract: A method includes forming a transistor at a surface of a semiconductor substrate, wherein the step of forming the transistor comprises forming a gate electrode, and forming a source/drain region adjacent the gate electrode. First metal features are formed to include at least portions at a same level as the gate electrode. Second metal features are formed simultaneously, and are over and contacting the first metal features. A first one of the second metal features is removed and replaced with a third metal feature, wherein a second one of the second metal features is not removed. A fourth metal feature is formed directly over and contacting the gate electrode, wherein the third and the fourth metal features are formed using a same metal-filling process.

Abstract: An integrated circuit including: two or more substrates stacked one over another and including first and second substrates having a P-type doping, and third and fourth substrates having an N-type doping; the first substrate including a first dielectric isolation structure electrically separating the first substrate into first and second portions; the second substrate including a second dielectric isolation structure electrically separating the second substrate into first and second portions a set of electrical components on one or more of the two or more substrates, and configured to form a circuit, the circuit comprising an internal ground node; a ground reference rail electrically connected to the first substrate and the second substrate and free from being electrically connected to the third substrate and the fourth substrate; and an electrostatic discharge (ESD) protection circuit electrically coupled between the internal ground node and the ground reference rail.

Abstract: A method is disclosed and includes forming a plurality of dummy conductive cells that provides different densities in empty areas in metal layers of a semiconductor device according to overlap conditions of the empty areas each arranged between a pair of neighboring metal layers of metal layers. Forming the plurality of dummy conductive cells includes operations of forming a group of dummy conductive cells in a single empty area of the empty areas when the single empty area in one pair of the neighboring metal layers is overlapped by a signal line in the same pair of the neighboring metal layers. When viewed in plan view, projection areas of the group of dummy conductive cells are vertically overlapped by a projection area of the signal line. A semiconductor device is also disclosed herein.

Abstract: An EOS/ESD protection apparatus includes a voltage detection circuit, a controlling circuit having a switch unit, an inverter circuit, and a clamp transistor. The voltage detection circuit is configured to detect whether an over voltage event occurs in a power supply line to generate a switch control signal. The switch unit is turned on/off to generate a voltage control signal according to the switch control signal. The inverter circuit has an output and an input coupled to the voltage control signal transmitted from the controlling circuit. The clamp transistor has a control terminal coupled to the output of the inverter and is configured to be turned on when the over voltage event occurs in the power supply line.

Abstract: A method (of forming an integrated circuit) includes: forming a first diode on a first substrate of two or more stacked substrates, the first substrate having a first predetermined doping type; forming a second diode on a second substrate of the two or more stacked substrates, the second substrate being formed on the first substrate, and the second substrate having the first predetermined doping type; and forming conductive paths electrically connecting the first diode 3A and the second diode between a circuit and a first common ground rail, the first diode and the second diode being connected in parallel and having opposite polarities.

Abstract: A method includes forming a transistor at a surface of a semiconductor substrate, wherein the step of forming the transistor comprises forming a gate electrode, and forming a source/drain region adjacent the gate electrode. First metal features are formed to include at least portions at a same level as the gate electrode. Second metal features are formed simultaneously, and are over and contacting the first metal features. A first one of the second metal features is removed and replaced with a third metal feature, wherein a second one of the second metal features is not removed. A fourth metal feature is formed directly over and contacting the gate electrode, wherein the third and the fourth metal features are formed using a same metal-filling process.

Abstract: A method includes forming a transistor at a surface of a semiconductor substrate, wherein the step of forming the transistor comprises forming a gate electrode, and forming a source/drain region adjacent the gate electrode. First metal features are formed to include at least portions at a same level as the gate electrode. Second metal features are formed simultaneously, and are over and contacting the first metal features. A first one of the second metal features is removed and replaced with a third metal feature, wherein a second one of the second metal features is not removed. A fourth metal feature is formed directly over and contacting the gate electrode, wherein the third and the fourth metal features are formed using a same metal-filling process.

Abstract: A method is disclosed and includes forming a plurality of dummy conductive cells that provides different densities in empty areas in metal layers of a semiconductor device according to overlap conditions of the empty areas each arranged between a pair of neighboring metal layers of metal layers. Forming the plurality of dummy conductive cells includes operations of forming a group of dummy conductive cells in a single empty area of the empty areas when the single empty area in one pair of the neighboring metal layers is overlapped by a signal line in the same pair of the neighboring metal layers. When viewed in plan view, projection areas of the group of dummy conductive cells are vertically overlapped by a projection area of the signal line. A semiconductor device is also disclosed herein.

Abstract: A semiconductor device includes metal layers, first dummy conductive cells, and groups of second dummy conductive cells. The metal layers include empty areas and are grouped into pairs of neighboring metal layers. The first dummy conductive cells are each formed in each of the empty areas in each of the pairs of neighboring metal layers that is overlapped by another empty area or a line in the same pair of neighboring metal layers. Each group of the second dummy conductive cells is formed in each of the empty areas in each of the pairs of neighboring metal layers that is overlapped by a signal line in the same pair of neighboring metal layer.

Abstract: A method includes forming a transistor at a surface of a semiconductor substrate, wherein the step of forming the transistor comprises forming a gate electrode, and forming a source/drain region adjacent the gate electrode. First metal features are formed to include at least portions at a same level as the gate electrode. Second metal features are formed simultaneously, and are over and contacting the first metal features. A first one of the second metal features is removed and replaced with a third metal feature, wherein a second one of the second metal features is not removed. A fourth metal feature is formed directly over and contacting the gate electrode, wherein the third and the fourth metal features are formed using a same metal-filling process.

Abstract: An EOS/ESD protection apparatus includes a voltage detection circuit, a controlling circuit having a switch unit, an inverter circuit, and a clamp transistor. The voltage detection circuit is configured to detect whether an over voltage event occurs in a power supply line to generate a switch control signal. The switch unit is turned on/off to generate a voltage control signal according to the switch control signal. The inverter circuit has an output and an input coupled to the voltage control signal transmitted from the controlling circuit. The clamp transistor has a control terminal coupled to the output of the inverter and is configured to be turned on when the over voltage event occurs in the power supply line.

Abstract: A method includes forming a transistor at a surface of a semiconductor substrate, wherein the step of forming the transistor comprises forming a gate electrode, and forming a source/drain region adjacent the gate electrode. First metal features are formed to include at least portions at a same level as the gate electrode. Second metal features are formed simultaneously, and are over and contacting the first metal features. A first one of the second metal features is removed and replaced with a third metal feature, wherein a second one of the second metal features is not removed. A fourth metal feature is formed directly over and contacting the gate electrode, wherein the third and the fourth metal features are formed using a same metal-filling process.

Abstract: A method includes determining an active region pattern density of a first region of an integrated circuit layout based on a total area of each active region in the first region and an area of the first region. The method includes determining an active region pattern density of a second region of the integrated circuit layout based on a total area of each active region in the second region and an area of the second region. The method includes determining an active region pattern density gradient between the first region to the second region. The method includes determining whether the first region or the second region includes a resistive device. The method includes modifying a portion of the resistive device to include an incremental resistor in response to the first region or the second region including the resistive device.

Abstract: A method (of forming an integrated circuit) includes: forming a first diode on a first substrate of two or more stacked substrates, the first substrate having a first predetermined doping type; forming a second diode on a second substrate of the two or more stacked substrates, the second substrate being formed on the first substrate, and the second substrate having the first predetermined doping type; and forming conductive paths electrically connecting the first diode 3A and the second diode between a circuit and a first common ground rail, the first diode and the second diode being connected in parallel and having opposite polarities.

Abstract: A semiconductor device includes metal layers, first dummy conductive cells, and groups of second dummy conductive cells. The metal layers include empty areas and are grouped into pairs of neighboring metal layers. The first dummy conductive cells are each formed in each of the empty areas in each of the pairs of neighboring metal layers that is overlapped by another empty area or a line in the same pair of neighboring metal layers. Each group of the second dummy conductive cells is formed in each of the empty areas in each of the pairs of neighboring metal layers that is overlapped by a signal line in the same pair of neighboring metal layer.