Patents by Inventor Weihong Lang

Weihong Lang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060276608
    Abstract: A method of making a silicone hydrogel biomedical device involves forming a monomer mixture comprising a silicone-containing monomer and a hydrophilic monomer, and heating the monomer mixture to reduce cloudiness of the mixture.
    Type: Application
    Filed: June 6, 2005
    Publication date: December 7, 2006
    Inventors: Weihong Lang, Yu-Chin Lai
  • Publication number: 20060142525
    Abstract: Hydrogel copolymers are useful for forming biomedical devices, particularly ophthalmic devices including contact lenses, intraocular lenses and ophthalmic implants. The copolymers have a desirable combination of oxygen permeability, tensile modulus, and water content, especially for soft contact lenses.
    Type: Application
    Filed: December 2, 2005
    Publication date: June 29, 2006
    Inventors: Yu-Chin Lai, Weihong Lang, Edmond Quinn, Dominic Ruscio
  • Publication number: 20060142526
    Abstract: A polysiloxane prepolymer that is useful for forming biomedical devices has the formula: M(*Dii*PS)x*Dii*M??(I) wherein: each M is independently a polymerizable ethylenically unsaturated radical; each Dii is independently a diradical residue of a diisocyanate; each PS is independently a diradical residue of a polysiloxane-diol or a polysiloxane-diamine; each * is independently —NH—CO—NH—, —NH—COO— or —OCO—NH—; and x is at least 2.
    Type: Application
    Filed: December 2, 2005
    Publication date: June 29, 2006
    Inventors: Yu-Chin Lai, Weihong Lang, Edmond Quinn
  • Publication number: 20060142524
    Abstract: A polysiloxane prepolymer that is useful for forming biomedical devices comprises blocks (I) and (II) and is terminated at each end with an ethylenically unsaturated radical: (*Dii*Diol*Dii*PS)x??(I) (*Dii*PS)y??(II) wherein: each Dii is independently a diradical residue of a diisocyanate; each Diol is independently a diradical residue of a diol having 1 to 10 carbon atoms; each PS is independently a diradical residue of a polysiloxane-containing diol or diamine; each * is independently —NH—CO—NH—, —NH—COO— or —OCO—NH—: x represents the number of blocks (I) and is at least 2, and y represents the number of blocks (II) and is at least 1.
    Type: Application
    Filed: December 2, 2005
    Publication date: June 29, 2006
    Inventors: Yu-Chin Lai, Weihong Lang, Edmond Quinn