Patents by Inventor Wen-Chung Liu

Wen-Chung Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240145378
    Abstract: An interconnect structure on a semiconductor die includes: a lower conductive layer; an upper conductive layer disposed above the lower conductive layer; and a VIA disposed between the lower conductive layer and the upper conductive layer. The VIA includes: a primary interconnect structure and a sacrificial stress barrier ring disposed around the primary interconnect structure and separated a distance from the primary interconnect structure. A fabrication method for the interconnect structure includes: forming a dielectric layer over a lower conductive layer; patterning photoresist (PR) layer over the dielectric layer to define a location for a plurality of VIA trenches, wherein the patterning includes patterning the PR layer to provide a center opening for the VIA trenches that is surrounded by a ring opening for the VIA trenches, wherein the center opening and the ring opening are spaced apart.
    Type: Application
    Filed: February 7, 2023
    Publication date: May 2, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tzu-Ting Liu, Chen-Chiu Huang, Dian-Hau Chen, Hung-Chao Kao, Hsiang-Ku Shen, Wen-Chiung Tu, Li Chung Yu, Yu-Chung Lai
  • Publication number: 20240136444
    Abstract: A flash memory device and method of making the same are disclosed. The flash memory device is located on a substrate and includes a floating gate electrode, a tunnel dielectric layer located between the substrate and the floating gate electrode, a smaller length control gate electrode and a control gate dielectric layer located between the floating gate electrode and the smaller length control gate electrode. The length of a major axis of the smaller length control gate electrode is less than a length of a major axis of the floating gate electrode.
    Type: Application
    Filed: December 22, 2023
    Publication date: April 25, 2024
    Inventors: Yu-Chu Lin, Chi-Chung Jen, Wen-Chih Chiang, Yi-Ling Liu, Huai-Jen Tung, Keng-Ying Liao
  • Publication number: 20240096834
    Abstract: A method is provided. The method includes determining a first bump map indicative of a first set of positions of bumps. The method includes determining, based upon the first bump map, a first plurality of bump densities associated with a plurality of regions of the first bump map. The method includes smoothing the first plurality of bump densities to determine a second plurality of bump densities associated with the plurality of regions of the first bump map. The method includes determining, based upon the second plurality of bump densities, a second bump map indicative of the first set of positions of the bumps and a set of sizes of the bumps.
    Type: Application
    Filed: March 27, 2023
    Publication date: March 21, 2024
    Inventors: Shih Hsuan HSU, Chan-Chung CHENG, Chun-Chen LIU, Cheng-Hung CHEN, Peng-Ren CHEN, Wen-Hao CHENG, Jong-l MOU
  • Patent number: 11824281
    Abstract: An antenna element comprises one or more directors, a resonator, and a three dimensional ground assembly. Parts of the antenna element are arranged on three metal layers. A top layer has an unconnected metal bar which forms a beam director, a resonator and a top part of the ground assembly. The resonator is an integral piece substantially in the form of a loop connected to a feed line and a feed line terminal ending. The feed line terminal ending serves as the ground plane for the feed line as well as providing impedance matching from the external transceiver circuit to the resonator. The ground assembly includes a top layer ground connected to a plurality of metallized half cylindrical hole channels (or metallized via holes) which connect to a ground terminal in a bottom layer.
    Type: Grant
    Filed: July 21, 2022
    Date of Patent: November 21, 2023
    Assignee: Micro Mobio Corporation
    Inventors: Guan-Wu Wang, Terng-Jie Lin, Yi-Hung Chen, Wen-Chung Liu, Weiping Wang
  • Patent number: 11774241
    Abstract: Embodiments disclosed herein relate generally to methods for measuring a characteristic of a substrate. In an embodiment, the method includes scanning over the substrate with a scanning probe microscope, the substrate having fins thereon, the scanning obtaining images showing respective fin top regions of the fins, the scanning probe microscope interacting with respective portions of sidewalls of the fins by a scanning probe oscillated during the scanning, selecting images obtained at a predetermined depth below the fin top regions to obtain a line edge profile of the fins, by a processor-based system, analyzing the line edge profile of the fins using power spectral density (PSD) method to obtain spatial frequency data of the line edge profile of the fins, and by the processor-based system, calculating line edge roughness of the fins based on the spatial frequency data.
    Type: Grant
    Filed: December 15, 2021
    Date of Patent: October 3, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wei-Shan Hu, Dong Gui, Jang Jung Lee, Che-Liang Li, Duen-Huei Hou, Wen-Chung Liu
  • Publication number: 20230040346
    Abstract: A semiconductor device with different configurations of gate structures and a method of fabricating the same are disclosed. The semiconductor device includes a first gate structure and a second gate structure. The first gate structure includes a first interfacial oxide (IO) layer, a first high-K (HK) dielectric layer disposed on the first interfacial oxide layer, and a first dipole layer disposed at an interface between the first IL layer and the first HK dielectric layer. The HK dielectric layer includes a rare-earth metal dopant or an alkali metal dopant. The second gate structure includes a second IL layer, a second HK dielectric layer disposed on the second IL layer, and a second dipole layer disposed at an interface between the second IL layer and the second HK dielectric layer. The second HK dielectric layer includes a transition metal dopant and the rare-earth metal dopant or the alkali metal dopant.
    Type: Application
    Filed: March 22, 2022
    Publication date: February 9, 2023
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hsiang-Pi CHANG, Huang-Lin CHAO, Chung-Liang CHENG, Pinyen LIN, Chun-Chun LIN, Tzu-Li LEE, Yu-Chia LIANG, Duen-Huei HOU, Wen-Chung LIU, Chun-I WU
  • Patent number: 11404788
    Abstract: An antenna element comprises one or more directors, a resonator, and a three dimensional ground assembly. Parts of the antenna element are arranged on three metal layers. A top layer has an unconnected metal bar which forms a beam director, a resonator and a top part of the ground assembly. The resonator is an integral piece substantially in the form of a loop connected to a feed line and a feed line terminal ending. The feed line terminal ending serves as the ground plane for the feed line as well as providing impedance matching from the external transceiver circuit to the resonator. The ground assembly includes a top layer ground connected to a plurality of metallized half cylindrical hole channels (or metallized via holes) which connect to a ground terminal in a bottom layer.
    Type: Grant
    Filed: February 28, 2021
    Date of Patent: August 2, 2022
    Assignee: Micro Mobio Corporation
    Inventors: Guan-Wu Wang, Terng-Jie Lin, Yi-Hung Chen, Wen-Chung Liu, Weiping Wang
  • Publication number: 20220107179
    Abstract: Embodiments disclosed herein relate generally to methods for measuring a characteristic of a substrate. In an embodiment, the method includes scanning over the substrate with a scanning probe microscope, the substrate having fins thereon, the scanning obtaining images showing respective fin top regions of the fins, the scanning probe microscope interacting with respective portions of sidewalls of the fins by a scanning probe oscillated during the scanning, selecting images obtained at a predetermined depth below the fin top regions to obtain a line edge profile of the fins, by a processor-based system, analyzing the line edge profile of the fins using power spectral density (PSD) method to obtain spatial frequency data of the line edge profile of the fins, and by the processor-based system, calculating line edge roughness of the fins based on the spatial frequency data.
    Type: Application
    Filed: December 15, 2021
    Publication date: April 7, 2022
    Inventors: Wei-Shan HU, Dong GUI, Jang Jung LEE, Che-Liang LI, Duen-Huei HOU, Wen-Chung LIU
  • Patent number: 11236996
    Abstract: Embodiments disclosed herein relate generally to methods for measuring a characteristic of a substrate. In an embodiment, the method includes scanning over the substrate with a scanning probe microscope, the substrate having fins thereon, the scanning obtaining images showing respective fin top regions of the fins, the scanning probe microscope interacting with respective portions of sidewalls of the fins by a scanning probe oscillated during the scanning, selecting images obtained at a predetermined depth below the fin top regions to obtain a line edge profile of the fins, by a processor-based system, analyzing the line edge profile of the fins using power spectral density (PSD) method to obtain spatial frequency data of the line edge profile of the fins, and by the processor-based system, calculating line edge roughness of the fins based on the spatial frequency data.
    Type: Grant
    Filed: July 13, 2020
    Date of Patent: February 1, 2022
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wei-Shan Hu, Dong Gui, Jang Jung Lee, Che-Liang Li, Duen-Huei Hou, Wen-Chung Liu
  • Publication number: 20200340807
    Abstract: Embodiments disclosed herein relate generally to methods for measuring a characteristic of a substrate. In an embodiment, the method includes scanning over the substrate with a scanning probe microscope, the substrate having fins thereon, the scanning obtaining images showing respective fin top regions of the fins, the scanning probe microscope interacting with respective portions of sidewalls of the fins by a scanning probe oscillated during the scanning, selecting images obtained at a predetermined depth below the fin top regions to obtain a line edge profile of the fins, by a processor-based system, analyzing the line edge profile of the fins using power spectral density (PSD) method to obtain spatial frequency data of the line edge profile of the fins, and by the processor-based system, calculating line edge roughness of the fins based on the spatial frequency data.
    Type: Application
    Filed: July 13, 2020
    Publication date: October 29, 2020
    Inventors: Wei-Shan HU, Dong GUI, Jang Jung LEE, Che-Liang LI, Duen-Huei HOU, Wen-Chung LIU
  • Patent number: 10746542
    Abstract: Embodiments disclosed herein relate generally to methods for measuring a characteristic of a substrate. In an embodiment, the method includes scanning over the substrate with a scanning probe microscope, the substrate having fins thereon, the scanning obtaining images showing respective fin top regions of the fins, the scanning probe microscope interacting with respective portions of sidewalls of the fins by a scanning probe oscillated during the scanning, selecting images obtained at a predetermined depth below the fin top regions to obtain a line edge profile of the fins, by a processor-based system, analyzing the line edge profile of the fins using power spectral density (PSD) method to obtain spatial frequency data of the line edge profile of the fins, and by the processor-based system, calculating line edge roughness of the fins based on the spatial frequency data.
    Type: Grant
    Filed: March 22, 2019
    Date of Patent: August 18, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Wei-Shan Hu, Dong Gui, Jang Jung Lee, Che-Liang Li, Duen-Huei Hou, Wen-Chung Liu
  • Publication number: 20200096332
    Abstract: Embodiments disclosed herein relate generally to methods for measuring a characteristic of a substrate. In an embodiment, the method includes scanning over the substrate with a scanning probe microscope, the substrate having fins thereon, the scanning obtaining images showing respective fin top regions of the fins, the scanning probe microscope interacting with respective portions of sidewalls of the fins by a scanning probe oscillated during the scanning, selecting images obtained at a predetermined depth below the fin top regions to obtain a line edge profile of the fins, by a processor-based system, analyzing the line edge profile of the fins using power spectral density (PSD) method to obtain spatial frequency data of the line edge profile of the fins, and by the processor-based system, calculating line edge roughness of the fins based on the spatial frequency data.
    Type: Application
    Filed: March 22, 2019
    Publication date: March 26, 2020
    Inventors: Wei-Shan Hu, Dong Gui, Jang Jung Lee, Che-Liang Li, Duen-Huei Hou, Wen-Chung Liu
  • Publication number: 20160012393
    Abstract: In a parcel delivery method and system, a server continuously receives recipient geographic position information (GPI) from a recipient terminal associated with and carried by a recipient, and unmanned aerial vehicle (UAV) GPI from a UAV loaded with a to-be-delivered parcel via a communication network, and transmits, to the UAV, destination information, which is the recipient GPI that is last received by the server. The UAV transports, based on the destination information from the server, the parcel to an unloading position where the recipient terminal is located.
    Type: Application
    Filed: March 23, 2015
    Publication date: January 14, 2016
    Inventors: Guan-Wu WANG, Yi-Hung CHEN, Yi-Jeng WANG, Wen-Chung LIU
  • Patent number: 8907372
    Abstract: A thyristor includes a base region, a pair of first doping regions, at least one second doping region, at least one third doping region, and a pair of metal layers. The first doping regions are formed in two opposite sides of the base region and touch the base region. The second doping region is formed between the base region and one of the first doping regions. The second doping region touches the base region and the first doping region. The third doping region is formed in one of the first doping regions and touches the first doping region. The type of the first doping region is different from the types of the second doping region, the third doping region, and the base region. The metal layers touch the first doping regions respectively. The first doping regions and the third doping region are located between the metal layers.
    Type: Grant
    Filed: October 19, 2012
    Date of Patent: December 9, 2014
    Assignee: Lite-On Semiconductor Corp.
    Inventors: Pen-Te Chang, Wen-Chung Liu
  • Publication number: 20140187095
    Abstract: A female socket for power cord, including a plug terminal and an integrally formed jack body, the jack body comprises of an interconnecting piece of terminal hole, the matrix extended from the interconnecting piece and a side cover connected to the lateral margin of the matrix and buckled with the matrix. There is a scab on the matrix, there is a trip on said scab, there is a blocking part matching the trip on the inner wall of the side cover, there is a tenon on the side cover, and there is a tenon hole matching the tenon on the lateral margin of the matrix.
    Type: Application
    Filed: December 28, 2012
    Publication date: July 3, 2014
    Inventor: Wen-Chung Liu
  • Publication number: 20140110751
    Abstract: A thyristor includes a base region, a pair of first doping regions, at least one second doping region, at least one third doping region, and a pair of metal layers. The first doping regions are formed in two opposite sides of the base region and touch the base region. The second doping region is formed between the base region and one of the first doping regions. The second doping region touches the base region and the first doping region. The third doping region is formed in one of the first doping regions and touches the first doping region. The type of the first doping region is different from the types of the second doping region, the third doping region, and the base region. The metal layers touch the first doping regions respectively. The first doping regions and the third doping region are located between the metal layers.
    Type: Application
    Filed: October 19, 2012
    Publication date: April 24, 2014
    Applicant: LITE-ON SEMICONDUCTOR CORP.
    Inventors: PAN-TE CHANG, WEN-CHUNG LIU
  • Patent number: 8254489
    Abstract: A transmission method executed in a multiple input multiple output wireless communication system may include the following steps: receiving a transmitting bit sequence; providing an X level pulse amplitude modulation (X-PAM) signal set, wherein distances between any two adjacent signal points in the X-PAM are the same; generating M signal sets according to the X-PAM signal set, wherein the ith signal set is formed by multiplying the X-PAM signal set with a parameter (1/X)(i?1), wherein i is an integer from 1 to M, and generating a X-PAM signal set joint coding/decoding table according a superposition result of the M signal sets; generating M transmitting bit sub-sequences according to the transmitting bit sequence; generating M transmitting signals according to the M transmitting bit sub-sequences and the X-PAM signal set joint coding/decoding table; transmitting the M transmitting signals to a wireless transmission channel via M transmitting antennae.
    Type: Grant
    Filed: March 18, 2009
    Date of Patent: August 28, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Wen-Chung Liu, Gin-Kou Ma, Muh-Rong Yang
  • Publication number: 20120092087
    Abstract: A noise reduction device for ports of DSL filters and a method thereof are revealed. A plurality of signal transmission line sets is arranged at the ports of a DSL filter. A first cross part is formed between the first signal transmission line and the second signal transmission line of the first signal transmission line set. Before the first cross part, the first signal transmission line of the second signal transmission line set is adjacent to the second signal transmission line of the first signal transmission line set while after the first cross part, the first signal transmission line of the second signal transmission line set is adjacent to the first signal transmission line of the first signal transmission line set. Thus the noises induced by interference between two adjacent signal transmission lines cancel each other out. Therefore, no interference noise occurs between two adjacent signal transmission lines.
    Type: Application
    Filed: October 15, 2010
    Publication date: April 19, 2012
    Applicant: ARCHICORE ELECTRONICS CO., LTD.
    Inventor: Wen Chung LIU
  • Patent number: 7769355
    Abstract: A substantially rectangular shaped power amplifier module includes a power amplifier for amplifying radio frequency signals, a bias control terminal and a power sensing terminal disposed on the same side of the power amplifier module, an input terminal and a ground terminal disposed on the same side of the power amplifier module, and an output terminal and one or more power supply terminals disposed on the same side of the power amplifier module.
    Type: Grant
    Filed: June 14, 2005
    Date of Patent: August 3, 2010
    Assignee: Micro Mobio Corporation
    Inventors: Ikuroh Ichitsubo, Kanya Kubota, Wen Chung Liu
  • Publication number: 20100166096
    Abstract: A transmission method executed in a multiple input multiple output wireless communication system may include the following steps: receiving a transmitting bit sequence; providing an X level pulse amplitude modulation (X-PAM) signal set, wherein distances between any two adjacent signal points in the X-PAM are the same; generating M signal sets according to the X-PAM signal set, wherein the ith signal set is formed by multiplying the X-PAM signal set with a parameter (1/X)(i-1), wherein i is an integer from 1 to M, and generating a X-PAM signal set joint coding/decoding table according a superposition result of the M signal sets; generating M transmitting bit sub-sequences according to the transmitting bit sequence; generating M transmitting signals according to the M transmitting bit sub-sequences and the X-PAM signal set joint coding/decoding table; transmitting the M transmitting signals to a wireless transmission channel via M transmitting antennae.
    Type: Application
    Filed: March 18, 2009
    Publication date: July 1, 2010
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wen-Chung Liu, Gin-Kou Ma, Muh-Rong Yang