Abstract: A substrate protecting member for clamping a substrate includes an elastic case and a conductive case. The elastic case defines a first latching slot for clamping an edge of the substrate. The conductive case defines a second latching slot with inner walls thereof contacting an outer surface of the elastic case. In the substrate protecting member of the present disclosure, the elastic case is capable of clamping on the edge of the substrate for buffering impacts on the substrate, and the conductive case is capable of surrounding the elastic case for protecting the substrate from being damaged by static electricity. Therefore, with the elastic case and the conductive case, the substrate protecting member can protect the substrate from being damaged by impacts or static electricity.

Abstract: A method of photo-etching is proposed. The method includes steps as follows. Expose a photoresist layer with a stack of at least two masks. Each mask defines a corresponding pattern, and a new pattern is formed when the at least two masks are stacked. Process the exposed photoresist layer to derive a hollow-out structure that complements the new pattern. A mask system is also proposed. The adoption of the abovementioned method can lower the possibility of manufacturing new masks and reduce production costs.

Abstract: A detecting apparatus for a substrate includes a light source, a light detecting device and a control device. The light source and the light detecting device are both arranged on the same side of the substrate, a first included angle is formed between the light from the light source and the substrate, and a second included angle is formed between the light received by the light detecting device and the light from the light source. The control device is connected to the light detecting device for controlling the light detecting device to move along a preset path. The light source and the light detecting device of the present disclosure are arranged at appropriate positions where the light detecting device is allowed to only receive light being refracted by glass particles. Therefore, the detecting apparatus is able to detect whether there are glass particles on the substrate in an efficient way.

Abstract: A conveyor control apparatus of liquid crystal panel substrates and a control method thereof is disclosed. The apparatus has multiple first side pillars and multiple second side pillars mounted opposite to the first side pillars. A movement control assembly is mounted outside the first side pillars and the second side pillars. The movement control assembly is used to move to a slot where the liquid crystal panel substrate is to move is inserted, and control the certain liquid crystal panel substrate inserted in the slot to move out from the conveyor control apparatus.

Abstract: A thin film transistor (TFT) substrate and a manufacturing method thereof are disclosed. The manufacturing method comprises: after a first metallic layer is formed on the TFT substrate, annealing the TFT substrate so that lattices of the first metallic layer are re-arranged to prevent occurrences of grain boundary defects in the first metallic layer. According to the present disclosure, after the first metallic layer is formed on the TFT substrate, the TFT substrate is annealed in sequence to re-arrange lattices of the first metallic layer. This effectively prevents occurrences of grain boundary defects and, consequently, metal protrusions in the first metallic layer.

Abstract: The present invention provides a pattern layer and a manufacturing method thereof. The manufacturing method of the pattern layer includes: performing coating on the substrate and at the same time, controlling coating parameter to vary with time so as to form a thin film of which film quality varies with coated film thickness on the substrate; and performing etching on the thin film so as to have lateral etch rate of the thin film changing with the film quality to thereby form the pattern layer having a side surface of a predetermined curvature. The present invention also provides a thin film. With the above-discussed method, the lateral etch rate of the thin film can be controlled through change of film quality.

Abstract: A wet etching apparatus and a wet etching method for etching a glass substrate are disclosed. The wet etching apparatus comprises a driving device, a supporting stage, a vibrating device and a substrate fixing rack. The glass substrate is fixed at the top of the substrate fixing rack and a bottom portion of the substrate fixing rack is connected with the vibrating device; the vibrating device is fixed on the supporting stage to drive the substrate fixing rack to reciprocate; and the supporting stage is disposed on the driving device and moves along with the driving device. According to the present disclosure, by controlling the vibrating device to drive the glass substrate to reciprocate in a direction where it is desired to accelerate the etching speed, the probability that the etched material interacts with the etching solution can be enhanced to increase the side etching rate.

Abstract: A thin film transistor (TFT) substrate and a manufacturing method thereof are disclosed. The manufacturing method comprises: after a first metallic layer is formed on the TFT substrate, annealing the TFT substrate so that lattices of the first metallic layer are re-arranged to prevent occurrences of grain boundary defects in the first metallic layer. According to the present disclosure, after the first metallic layer is formed on the TFT substrate, the TFT substrate is annealed in sequence to re-arrange lattices of the first metallic layer. This effectively prevents occurrences of grain boundary defects and, consequently, metal protrusions in the first metallic layer.

Abstract: Disclosed is an inspection device for a glass substrate, comprising at least one probe, a holder, a stretch controller and a control circuit. The probe is installed on the stretch controller, the stretch controller is employed to stretch the probe out of the holder as an electrical signal is received; and to retract the probe backward in the holder as the electrical signal stops. The present invention promotes the inspection efficiency for the glass substrate.

Abstract: The present invention provides an inspection method for a pixel array and an inspection apparatus thereof. The inspection method firstly charges a sample pixel area containing a flawed pixel unit and normal pixel units with different testing voltages, then creates a lookup table of brightness threshold value according to the brightness values of the pixel units under those testing voltages ; and then charges a pixel area under test when inspecting the pixel area under test, selects a suitable brightness threshold value from the lookup table according to the current voltage value and the brightness value thereof, and then determines if pixel units of the pixel area under test have any defect according to the brightness threshold value. Therefore, the present invention reduces defect-identifying error and enhances inspection accuracy.

Abstract: Disclosed are a detection method and a detection system for an array substrate. The method comprises: supplying power to data lines and/or gate lines of the array substrate continuously in a setting time; proceeding temperature sensing to the data line and/or the gate line of the array substrate and recording results of the temperature sensing; find defect points on the data lines and/or the gate lines according to the results of the temperature sensing. The skill solution provided by the present invention is capable of detecting the inner defects of the data lines and/or the gate lines of the array substrate for preventing defect products entering the follow-up processes to promote the production quality and avoid the waste.

Abstract: The present invention discloses a method of selectively oxidizing hydrogen sulfide to elemental sulfur, in which a H.sub.2 S-containing gas mixture contacts with an oxygen-containing gas at 50.degree.-500.degree. C. in the presence of a mixed-metal catalyst. The reaction product mixture contains substantially no sulfur dioxide. The mixed-metal catalyst contains vanadium atom and molybdenum atom or magnesium atom.

Abstract: The present invention discloses a method of selectively oxidizing hydrogen sulfide to elemental sulfur, in which a H.sub.2 S-containing gas mixture contacts with an oxygen-containing gas at 50.degree.-500.degree. C. in the presence of a bismuth-based catalyst. The reaction product mixture contains substantially no sulfur dioxide. The bismuth-based catalyst may further contain molybdenum or vanadium atom.